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    • 4. 发明申请
    • Apparatus for cleaning a wafer
    • 清洁晶片的装置
    • US20070051393A1
    • 2007-03-08
    • US11516101
    • 2006-09-06
    • Mo-Hyun ChoDong-Chul HeoDuk-Lyol LeeTae-Hwan KimTae-Wan Kim
    • Mo-Hyun ChoDong-Chul HeoDuk-Lyol LeeTae-Hwan KimTae-Wan Kim
    • B08B3/00B08B3/04
    • B08B3/04H01L21/67051
    • An apparatus for cleaning a wafer includes a rotary chuck for supporting and rotating a wafer, a cleaning solution supply unit for supplying a cleaning solution onto the wafer, a bowl spaced apart from and surrounding the rotary chuck, and a protrusion portion protruded from the rotary chuck and having a slope face with respect to the rotary chuck. The protrusion portion can prevent an ascending air stream from being generated by a vortex when the rotary chuck rotates. A guide member can be positioned between the bowl and the rotary chuck to guide the cleaning solution downwardly to a bottom portion of the bowl. A protector can extend from an inner side surface of the guide member toward the rotary chuck, to prevent an ascending air stream caused by the vortex.
    • 一种用于清洗晶片的设备包括用于支撑和旋转晶片的旋转卡盘,用于将清洁溶液供应到晶片上的清洁溶液供应单元,与旋转卡盘间隔开并围绕旋转卡盘的碗,以及从旋转盘 并且相对于旋转卡盘具有倾斜面。 当旋转卡盘旋转时,突出部分可以防止上升的气流由涡流产生。 引导构件可以定位在碗和旋转卡盘之间,以将清洁溶液向下引导到碗的底部。 保护器可以从引导构件的内侧表面朝向旋转卡盘延伸,以防止由涡流引起的上升气流。