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1. 发明申请

US20080145790A1 Process for Production of Lithographic Printing Plates 审中-公开
公开(公告)号：US20080145790A1
公开(公告)日：2008-06-19
申请号：US11815578
申请日：2006-02-01
申请人： Harald Baumann , Ulrich Fiebag , Udo Dwars , Michael Flugel , Bernd Strehmel , Hans-Joachim Timpe
发明人： Harald Baumann , Ulrich Fiebag , Udo Dwars , Michael Flugel , Bernd Strehmel , Hans-Joachim Timpe
IPC分类号： G03F7/12
CPC分类号： G03F7/322
摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt.-% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from —CH═CH—, —C≡C—, formula (II), formula (III), and formula (IV), n+m results in a value of 2 to 30 and p+q results in a value of 0 to 30, wherein in the case of p+q≠0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.

2. 发明授权

US06383717B1 Aqueous developer for negative working lithographic printing plates 失效
公开(公告)号：US06383717B1
公开(公告)日：2002-05-07
申请号：US09686458
申请日：2000-10-11
申请人： Ulrich Fiebag , Harald Baumann , Hans-Joachim Timpe
发明人： Ulrich Fiebag , Harald Baumann , Hans-Joachim Timpe
IPC分类号： G03F730
CPC分类号： G03F7/322
摘要： An aqueous developer for imageable elements that contain a radiation-sensitive initiator system and at least one free radical polymerizable material is disclosed. The developer develops these plates quickly, with high throughput, but with no sludge formation in the developing process. The developer contains water, a buffer, and one or more filter dyes and/or one of more free radical inhibitors. The imageable elements are useful as printing plates.

3. 发明授权

US5698360A Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates 失效
标题翻译：磺酰胺取代的缩醛聚合物及其在光敏组合物和平版印刷版中的应用
公开(公告)号：US5698360A
公开(公告)日：1997-12-16
申请号：US677703
申请日：1996-07-10
申请人： Hans-Joachim Timpe , Udo Dwars , Harald Baumann , Celin Savariar-Hauck
发明人： Hans-Joachim Timpe , Udo Dwars , Harald Baumann , Celin Savariar-Hauck
IPC分类号： C08F8/34 , G03F7/021 , G03F7/033
CPC分类号： G03F7/0212 , C08F8/34 , G03F7/0215 , G03F7/033
摘要： The present invention relates to binders and photosensitive compositions comprising said binders. The binder comprises units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl or isopropyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 and R.sup.2, R.sup.3 are hydrogen or methyl and R.sup.4 is alkyl, aralkyl or aryl.
摘要翻译：本发明涉及包含所述粘合剂的粘合剂和光敏组合物。粘合剂包含单元A，B，C和D，其中A的存在量为0.5-15wt。（A）B以10〜35重量％的量存在。％，并且具有式50重量％％，并且具有式（C）的式（C）其中R 1是甲基，乙基，丙基或异丙基，D以25至70重量％的量存在。％，并且具有式（D）的式（I）其中n是1至3的整数，R 2，R 3是氢或甲基，R 4是烷基，芳烷基或芳基。

4. 发明授权

US5985996A Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates 失效
标题翻译：乙缩醛聚合物及其在光敏组合物和平版印刷版中的应用
公开(公告)号：US5985996A
公开(公告)日：1999-11-16
申请号：US917631
申请日：1997-08-22
申请人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
发明人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
IPC分类号： C08F2/50 , C08F8/00 , G03F7/021 , G03F7/033
CPC分类号： G03F7/033 , C08F8/00 , C08F8/12 , C08F8/28 , C08F8/30 , G03F7/0215
摘要： This invention relates to a binder containing the units A, B, C, D and E, wherein A is present in an amount of 10 to 60 mole % and is of the formula ##STR1## B is present in an amount of 1 to 30 mole % and is of the formula ##STR2## C is present in an amount of 5 to 60 mole % and is of the formula ##STR3## D is present in an amount of 0 to 60 mole % and is of the formula ##STR4## and E is present in an amount of 1 to 40 mole % and is of the formula ##STR5## wherein X is an aliphatic, aromatic or araliphatic spacer group,R.sup.1 is hydrogen or an aliphatic, aromatic or araliphatic group,R.sup.2, R.sup.3 and R.sup.4 are hydrogen or alkyl groups with carbon numbers of from 1 to 18 andY is a saturated or unsaturated chain- or ring-shaped spacer group, and photosensitive compositions containing this binder.
摘要翻译：本发明涉及含有单元A，B，C，D和E的粘合剂，其中A以10至60摩尔％的量存在，并且式B的存在量为1至30摩尔％，和式C的存在量为5至60摩尔％，并且式D的存在量为0至60摩尔％，并且具有下式，并且E以1至40摩尔的量存在％，并具有下式：其中X是脂族，芳族或芳脂族间隔基，R 1是氢或脂族，芳族或芳脂族基团，R 2，R 3和R 4是氢或碳数为1至18的烷基和Y 是饱和或不饱和的链状或环状间隔基团，以及含有该粘合剂的光敏组合物。

5. 发明授权

US5925491A Amido substituted acetal polymer binders and their use in photosensitive compositions 失效
标题翻译：酰胺取代的缩醛聚合物粘合剂及其在光敏组合物中的用途
公开(公告)号：US5925491A
公开(公告)日：1999-07-20
申请号：US781313
申请日：1997-01-09
申请人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
发明人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
IPC分类号： C08F8/12 , C08F8/28 , C08F8/32 , G03F7/021 , G03F7/033
CPC分类号： G03F7/033 , C08F8/14 , C08F8/32 , C08F8/44 , C08F8/48 , G03F7/0215 , C08F2800/10 , C08F2800/20 , C08F2810/30 , Y10S430/107 , Y10S430/11 , Y10S430/111
摘要： Polymeric binders for photosensitive compositions exhibiting improved ink acceptance, good developability and wetting, high photosensitivity, good image resolution, and larger printing runs for plates employing such photosensitive compositions.
摘要翻译：用于光敏组合物的聚合物粘合剂，其表现出改进的油墨接受性，良好的显影性和润湿性，高光敏性，良好的图像分辨率，以及使用这种光敏组合物的印版的较大印刷行程。

6. 发明授权

US06649323B2 Overcoat for light-sensitive materials comprising (1-vinylimidazole) polymer or copolymer 失效
标题翻译：包含（1-乙烯基咪唑）聚合物或共聚物的感光材料的外涂层
公开(公告)号：US06649323B2
公开(公告)日：2003-11-18
申请号：US09489414
申请日：2000-01-21
申请人： Socrates Peter Pappas , Harald Baumann , Udo Dwars , Celin M. Savariar-Hauck , Hans-Joachim Timpe
发明人： Socrates Peter Pappas , Harald Baumann , Udo Dwars , Celin M. Savariar-Hauck , Hans-Joachim Timpe
IPC分类号： G03F7028
CPC分类号： G03F7/092 , Y10T428/31 , Y10T428/31721 , Y10T428/31855 , Y10T428/31935
摘要： A lithographic printing plate precursor comprises a substrate, a free radical polymerizable photosensitive layer comprising a light-sensitive composition on the substrate, and a water-soluble overcoat layer on the photosensitive layer, wherein the overcoat layer comprises polyvinyl alcohol, and a further component that is not amphoteric and is poly(1-vinylimidazole) or a copolymer of 1-vinylimidazole and at least one further monomer. The photosensitive layer comprises a free radical polymerizable component and a photoinitiator.
摘要翻译：平版印刷版原版包括基底，在基底上包含感光组合物的自由基可聚合感光层和感光层上的水溶性外涂层，其中外涂层包含聚乙烯醇，以及另外的成分不是两性的，是聚（1-乙烯基咪唑）或1-乙烯基咪唑与至少一种其它单体的共聚物。感光层包含可自由基聚合的组分和光引发剂。

7. 发明授权

US5849842A Sulfonamido substituted acetal polymers 失效
标题翻译：磺酰胺取代的缩醛聚合物
公开(公告)号：US5849842A
公开(公告)日：1998-12-15
申请号：US917057
申请日：1997-08-22
申请人： Hans-Joachim Timpe , Udo Dwars , Harald Baumann , Celin Savariar-Hauck
发明人： Hans-Joachim Timpe , Udo Dwars , Harald Baumann , Celin Savariar-Hauck
IPC分类号： C08F8/34 , G03F7/021 , G03F7/033 , C08F8/00
CPC分类号： G03F7/0212 , C08F8/34 , G03F7/0215 , G03F7/033
摘要： Binders useful in photosensitive compositions contain units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 and R.sup.2, R.sup.3 are hydrogen or methyl and R.sup.4 is alkyl, aralkyl or aryl.
摘要翻译：用于光敏组合物的粘合剂含有单元A，B，C和D，其中A以0.5至15wt。％且为式35重量％。％，并且具有式（B）的化合物C的存在量为10至50wt。％，并且具有式（C）的式（C）其中R 1是甲基，乙基，丙基和D以25至70重量％的量存在。％，具有式R 2，R 3是氢或甲基，R 4是烷基，芳烷基或芳基。

8. 发明授权

US5700619A Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates 失效
标题翻译：乙缩醛聚合物及其在光敏组合物和平版印刷版中的应用
公开(公告)号：US5700619A
公开(公告)日：1997-12-23
申请号：US675024
申请日：1996-07-03
申请人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
发明人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
IPC分类号： C08F2/50 , C08F8/00 , G03F7/021 , G03F7/033
CPC分类号： G03F7/033 , C08F8/00 , C08F8/12 , C08F8/28 , C08F8/30 , G03F7/0215
摘要： This invention relates to a binder containing the units A, B, C, D and E, wherein A is present in an amount of 10 to 60 mole % and is of the formula ##STR1## B is present in an amount of 1 to 30 mole % and is of the formula ##STR2## C is present in an amount of 5 to 60 mole % and is of the formula ##STR3## D is present in an amount of 0 to 60 mole % and is of the formula ##STR4## E is present in an amount of 1 to 40 mole % and is of the formula ##STR5## wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.1 is hydrogen or an aliphatic, aromatic or araliphatic group, R.sup.2, R.sup.3 and R.sup.4 are hydrogen or alkyl groups with carbon numbers of from 1 to 18 and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and photosensitive compositions containing this binder.
摘要翻译：本发明涉及含有单元A，B，C，D和E的粘合剂，其中A以10至60摩尔％的量存在并且具有式30摩尔％并且具有式（B））C以5至60摩尔％的量存在并且具有式（C）的化合物：D的存在量为0至60摩尔％，并且具有式0摩尔％，并且具有式（E）其中X是脂族，芳族或芳脂族间隔基，R 1是氢或脂族，芳族或芳脂族基团，R 2，R 3和R 4是氢或碳数为1至18的烷基，Y是饱和或不饱和的链或环形间隔基，以及含有该粘合剂的光敏组合物。

9. 发明授权

US06808858B2 Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates 失效
标题翻译：在光敏组合物和平版印刷版中使用含羧基的缩醛聚合物
公开(公告)号：US06808858B2
公开(公告)日：2004-10-26
申请号：US10221117
申请日：2002-12-10
申请人： Robert Fuss , Harald Baumann , Udo Dwars , Hans-Joachim Timpe
发明人： Robert Fuss , Harald Baumann , Udo Dwars , Hans-Joachim Timpe
IPC分类号： G03F7021
CPC分类号： G03F7/0212 , G03F7/0215 , G03F7/032
摘要： The present invention relates to a light-sensitive composition containing: (i) at least one diazonium polycondensation product or at least one system that can be radically polymerized and consists of photoinitiators and unsaturated compounds which can be radically polymerized or at least one hybrid system consisting of a diazonium polycondensation product and a system that can be radically polymerized and consists of photo initiators and unsaturated compounds which can be radically polymerized, (ii) at least one binding agent and optionally one or more exposure indicators, one or more dyes for increasing the image contrast and one or more acids for stabilizing the light-sensitive composition which is characterized in that the binding agent essentially consists of units (A, B, C, D), whereby A corresponds to formula (I), B corresponds to formula (II), C corresponds to formula (III) and D corresponds to formula (IV). The invention also relates to the use thereof for coating printing plates. The invention further relates to printing plates which are coated with said light-sensitive composition.

10. 发明授权

US5695905A Photosensitive compositions and lithographic printing plates utilizing oxazoline modified acid polymers 失效
标题翻译：使用恶唑啉改性的酸性聚合物的感光组合物和平版印刷版
公开(公告)号：US5695905A
公开(公告)日：1997-12-09
申请号：US649350
申请日：1996-05-17
申请人： Celin M. Savariar-Hauck , Harald Baumann , Hans-Joachim Timpe , Udo Dwars
发明人： Celin M. Savariar-Hauck , Harald Baumann , Hans-Joachim Timpe , Udo Dwars
IPC分类号： C08F2/50 , C08L1/10 , C08L29/14 , C09D101/10 , G03F7/012 , G03F7/032 , G03F7/033 , G03F7/021
CPC分类号： G03F7/033 , C08L1/10 , C08L29/14 , C09D101/10 , G03F7/0125 , G03F7/032
摘要： A photosensitive composition having a photoreactive component, selected from a diazonium polycondensation product or a free radical polymerizable system of photoinitiators and unsaturated compounds or a hybrid system and a binder formed by reacting a carboxyl group containing a polymer of formula P--(--X--COOH).sub.n (I), wherein P is a polymer, n is an integer and X is a single bond or a spacer group, with a 2-oxazoline of the formula ##STR1## wherein R is an alkyl-, aryl-, aralkyl-, alkoxy-, aryloxy- or aralkyloxy group and R' and R" are independently a hydrogen, alkyl- or aryl groups.
摘要翻译：具有光反应性组分的光敏组合物，其选自重氮缩聚产物或光引发剂和不饱和化合物的自由基可聚合体系，或杂化体系和通过使含有式P - （ - X-COOH）的聚合物的羧基反应而形成的粘合剂， n（I）其中P是聚合物，n是整数，X是单键或间隔基，与式（II）的2-恶唑啉其中R是烷基 - ，芳基 - 芳烷基 - ，烷氧基 - ，芳氧基或芳烷氧基，R'和R“独立地为氢，烷基或芳基。

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