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1. 发明授权

US5849842A Sulfonamido substituted acetal polymers 失效
标题翻译：磺酰胺取代的缩醛聚合物
公开(公告)号：US5849842A
公开(公告)日：1998-12-15
申请号：US917057
申请日：1997-08-22
申请人： Hans-Joachim Timpe , Udo Dwars , Harald Baumann , Celin Savariar-Hauck
发明人： Hans-Joachim Timpe , Udo Dwars , Harald Baumann , Celin Savariar-Hauck
IPC分类号： C08F8/34 , G03F7/021 , G03F7/033 , C08F8/00
CPC分类号： G03F7/0212 , C08F8/34 , G03F7/0215 , G03F7/033
摘要： Binders useful in photosensitive compositions contain units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 and R.sup.2, R.sup.3 are hydrogen or methyl and R.sup.4 is alkyl, aralkyl or aryl.
摘要翻译：用于光敏组合物的粘合剂含有单元A，B，C和D，其中A以0.5至15wt。％且为式35重量％。％，并且具有式（B）的化合物C的存在量为10至50wt。％，并且具有式（C）的式（C）其中R 1是甲基，乙基，丙基和D以25至70重量％的量存在。％，具有式R 2，R 3是氢或甲基，R 4是烷基，芳烷基或芳基。

2. 发明授权

US5700619A Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates 失效
标题翻译：乙缩醛聚合物及其在光敏组合物和平版印刷版中的应用
公开(公告)号：US5700619A
公开(公告)日：1997-12-23
申请号：US675024
申请日：1996-07-03
申请人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
发明人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
IPC分类号： C08F2/50 , C08F8/00 , G03F7/021 , G03F7/033
CPC分类号： G03F7/033 , C08F8/00 , C08F8/12 , C08F8/28 , C08F8/30 , G03F7/0215
摘要： This invention relates to a binder containing the units A, B, C, D and E, wherein A is present in an amount of 10 to 60 mole % and is of the formula ##STR1## B is present in an amount of 1 to 30 mole % and is of the formula ##STR2## C is present in an amount of 5 to 60 mole % and is of the formula ##STR3## D is present in an amount of 0 to 60 mole % and is of the formula ##STR4## E is present in an amount of 1 to 40 mole % and is of the formula ##STR5## wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.1 is hydrogen or an aliphatic, aromatic or araliphatic group, R.sup.2, R.sup.3 and R.sup.4 are hydrogen or alkyl groups with carbon numbers of from 1 to 18 and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and photosensitive compositions containing this binder.
摘要翻译：本发明涉及含有单元A，B，C，D和E的粘合剂，其中A以10至60摩尔％的量存在并且具有式30摩尔％并且具有式（B））C以5至60摩尔％的量存在并且具有式（C）的化合物：D的存在量为0至60摩尔％，并且具有式0摩尔％，并且具有式（E）其中X是脂族，芳族或芳脂族间隔基，R 1是氢或脂族，芳族或芳脂族基团，R 2，R 3和R 4是氢或碳数为1至18的烷基，Y是饱和或不饱和的链或环形间隔基，以及含有该粘合剂的光敏组合物。

3. 发明授权

US5698360A Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates 失效
标题翻译：磺酰胺取代的缩醛聚合物及其在光敏组合物和平版印刷版中的应用
公开(公告)号：US5698360A
公开(公告)日：1997-12-16
申请号：US677703
申请日：1996-07-10
申请人： Hans-Joachim Timpe , Udo Dwars , Harald Baumann , Celin Savariar-Hauck
发明人： Hans-Joachim Timpe , Udo Dwars , Harald Baumann , Celin Savariar-Hauck
IPC分类号： C08F8/34 , G03F7/021 , G03F7/033
CPC分类号： G03F7/0212 , C08F8/34 , G03F7/0215 , G03F7/033
摘要： The present invention relates to binders and photosensitive compositions comprising said binders. The binder comprises units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl or isopropyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 and R.sup.2, R.sup.3 are hydrogen or methyl and R.sup.4 is alkyl, aralkyl or aryl.
摘要翻译：本发明涉及包含所述粘合剂的粘合剂和光敏组合物。粘合剂包含单元A，B，C和D，其中A的存在量为0.5-15wt。（A）B以10〜35重量％的量存在。％，并且具有式50重量％％，并且具有式（C）的式（C）其中R 1是甲基，乙基，丙基或异丙基，D以25至70重量％的量存在。％，并且具有式（D）的式（I）其中n是1至3的整数，R 2，R 3是氢或甲基，R 4是烷基，芳烷基或芳基。

4. 发明授权

US5985996A Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates 失效
标题翻译：乙缩醛聚合物及其在光敏组合物和平版印刷版中的应用
公开(公告)号：US5985996A
公开(公告)日：1999-11-16
申请号：US917631
申请日：1997-08-22
申请人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
发明人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
IPC分类号： C08F2/50 , C08F8/00 , G03F7/021 , G03F7/033
CPC分类号： G03F7/033 , C08F8/00 , C08F8/12 , C08F8/28 , C08F8/30 , G03F7/0215
摘要： This invention relates to a binder containing the units A, B, C, D and E, wherein A is present in an amount of 10 to 60 mole % and is of the formula ##STR1## B is present in an amount of 1 to 30 mole % and is of the formula ##STR2## C is present in an amount of 5 to 60 mole % and is of the formula ##STR3## D is present in an amount of 0 to 60 mole % and is of the formula ##STR4## and E is present in an amount of 1 to 40 mole % and is of the formula ##STR5## wherein X is an aliphatic, aromatic or araliphatic spacer group,R.sup.1 is hydrogen or an aliphatic, aromatic or araliphatic group,R.sup.2, R.sup.3 and R.sup.4 are hydrogen or alkyl groups with carbon numbers of from 1 to 18 andY is a saturated or unsaturated chain- or ring-shaped spacer group, and photosensitive compositions containing this binder.
摘要翻译：本发明涉及含有单元A，B，C，D和E的粘合剂，其中A以10至60摩尔％的量存在，并且式B的存在量为1至30摩尔％，和式C的存在量为5至60摩尔％，并且式D的存在量为0至60摩尔％，并且具有下式，并且E以1至40摩尔的量存在％，并具有下式：其中X是脂族，芳族或芳脂族间隔基，R 1是氢或脂族，芳族或芳脂族基团，R 2，R 3和R 4是氢或碳数为1至18的烷基和Y 是饱和或不饱和的链状或环状间隔基团，以及含有该粘合剂的光敏组合物。

5. 发明授权

US5925491A Amido substituted acetal polymer binders and their use in photosensitive compositions 失效
标题翻译：酰胺取代的缩醛聚合物粘合剂及其在光敏组合物中的用途
公开(公告)号：US5925491A
公开(公告)日：1999-07-20
申请号：US781313
申请日：1997-01-09
申请人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
发明人： Harald Baumann , Udo Dwars , Celin Savariar-Hauck , Hans-Joachim Timpe
IPC分类号： C08F8/12 , C08F8/28 , C08F8/32 , G03F7/021 , G03F7/033
CPC分类号： G03F7/033 , C08F8/14 , C08F8/32 , C08F8/44 , C08F8/48 , G03F7/0215 , C08F2800/10 , C08F2800/20 , C08F2810/30 , Y10S430/107 , Y10S430/11 , Y10S430/111
摘要： Polymeric binders for photosensitive compositions exhibiting improved ink acceptance, good developability and wetting, high photosensitivity, good image resolution, and larger printing runs for plates employing such photosensitive compositions.
摘要翻译：用于光敏组合物的聚合物粘合剂，其表现出改进的油墨接受性，良好的显影性和润湿性，高光敏性，良好的图像分辨率，以及使用这种光敏组合物的印版的较大印刷行程。

6. 发明授权

US6087066A Polyvinyl acetals having imido groups and use thereof in photosensitive compositions 失效
标题翻译：具有亚胺基的聚乙烯醇缩醛及其在光敏组合物中的用途
公开(公告)号：US6087066A
公开(公告)日：2000-07-11
申请号：US418284
申请日：1999-10-14
申请人： Harald Baumann , Celin Savariar-Hauck , Hans-Joachim Timpe
发明人： Harald Baumann , Celin Savariar-Hauck , Hans-Joachim Timpe
IPC分类号： C08F8/00 , G03F7/038 , G03C1/73 , C08G4/00 , C08J3/28 , G03C1/72 , G03C1/74
CPC分类号： G03F7/0388 , C08F8/00 , Y10S430/11 , Y10S430/127
摘要： This invention relates to polyvinyl acetals containing the units A, B, C and D, whereinA is present in an amount of 0.5 to 20 wt.-% and is of the formula ##STR1## B is present in an amount of 15 to 35 wt.-% and is of the formula ##STR2## C is present in an amount of 10 to 50 wt.-% and is of the formula ##STR3## wherein R.sup.1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X--NR.sup.6 --CO--Y--COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R.sup.1 independent of one another, and D is present in an amount of 25 to 70 wt.-% and is of the formula ##STR4## wherein n is an integer from 1 to 3 andR.sup.2 and R.sup.3 are a hydrogen or a methyl group, andR.sup.4 and R.sup.5 independent of one another are alkyl groups having no more than 4 carbons or R.sup.4 and R.sup.5, together with the two carbons they are attached to, represent a 5- or 6-membered carbocyclic ring.In addition, photosensitive compositions containing these polyvinyl acetals are described.
摘要翻译：本发明涉及含有单元A，B，C和D的聚乙烯醇缩醛，其中A以0.5至20重量％的量存在并且具有式B的量为15至35重量％％，并且式C的存在量为10至50重量％，并且具有下式：其中R 1是具有至多4个碳的烷基，其任选被酸基取代，或苯基，其中所述苯基任选地包含1至2个选自卤素，氨基，甲氧基，乙氧基，甲基和乙基的其它取代基，或为X-NR6-CO-Y-COOH基团，其中 X是脂族，芳族或芳脂族间隔基，R6是氢或脂族，芳族或芳脂族部分，Y是饱和或不饱和的链或环形间隔基，并且该单元C可以含有多个部分 R1彼此独立，D以25至70重量％的量存在，并具有下式其中n为 1至3的整数，R 2和R 3为氢或甲基，且R 4和R 5彼此独立地为不多于4个碳的烷基或R 4和R 5以及它们所连接的两个碳原子，代表5-或6-元碳环。此外，还描述了含有这些聚乙烯醇缩醛的光敏组合物。

7. 发明授权

US08043787B2 Negative-working imageable elements with improved abrasion resistance 有权
标题翻译：具有改善耐磨性的负性可成像元件
公开(公告)号：US08043787B2
公开(公告)日：2011-10-25
申请号：US12048452
申请日：2008-03-14
申请人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
发明人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
IPC分类号： G03F7/00 , G03F7/26
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

8. 发明授权

US07858292B2 Imageable elements with components having 1H-tetrazole groups 有权
标题翻译：具有1H-四唑基团的成像元件
公开(公告)号：US07858292B2
公开(公告)日：2010-12-28
申请号：US11949810
申请日：2007-12-04
申请人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
发明人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可具有垂直于主链的1H-四唑基团。在负片或正性可成像元件中使用这样的组分可提供高的感光速度和改进的显影性，以提供成像和显影元件，例如显示改善的耐化学性和游程长度的平版印刷版。

9. 发明申请

US20090233227A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE 有权
标题翻译：具有改进耐磨性的负离子成像元件
公开(公告)号：US20090233227A1
公开(公告)日：2009-09-17
申请号：US12048452
申请日：2008-03-14
申请人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
发明人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
IPC分类号： G03F7/004 , G03F7/12
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

10. 发明申请

US20090142695A1 IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS 有权
标题翻译：具有1H-四唑基的组分的成像元素
公开(公告)号：US20090142695A1
公开(公告)日：2009-06-04
申请号：US11949810
申请日：2007-12-04
申请人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
发明人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
IPC分类号： G03F7/028 , G03F7/30
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可具有垂直于主链的1H-四唑基团。在负片或正性可成像元件中使用这样的组分可提供高的感光速度和改进的显影性，以提供成像和显影元件，例如显示改善的耐化学性和游程长度的平版印刷版。

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