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1. 发明授权

US08354216B2 Negative-working imaging elements and methods of use 失效
标题翻译：负面影像元素和使用方法
公开(公告)号：US08354216B2
公开(公告)日：2013-01-15
申请号：US12173220
申请日：2008-07-15
申请人： Harald Baumann , Udo Dwars , Christopher D. Simpson , Bernd Strehmel , Michael Flugel
发明人： Harald Baumann , Udo Dwars , Christopher D. Simpson , Bernd Strehmel , Michael Flugel
IPC分类号： B41F7/00 , G03F7/00
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/033 , G03F7/092 , G03F7/3035
摘要： Negative-working imageable elements such as lithographic printing plate precursors, include a free-radically polymerizable component, an initiator composition that is capable of generating free radicals sufficient to initiate polymerization of the free-radically polymerizable component upon exposure to imaging radiation in the presence of a radiation absorbing compound, a radiation absorbing compound, an aerobic free radical inhibitor, optionally a polymeric binder that is not a free radically polymerizable component, and an anaerobic free radical inhibitor. The molar ratio of the anaerobic free radical inhibitor to the aerobic free radical inhibitor is at least 1:1. This combination of inhibitors provides increased shelf life and good latent image stability particularly when the element includes a polymeric topcoat layer that functions as an oxygen barrier.
摘要翻译：负面工作的可成像元件如平版印刷版前体包括可自由基聚合的组分，引发剂组合物，其能够产生足够的自由基，以便在存在可见光辐射的情况下暴露于成像辐射时引发可自由基聚合的组分的聚合辐射吸收化合物，辐射吸收化合物，需氧自由基抑制剂，任选的不是可自由基自由基组分的聚合物粘合剂和厌氧自由基抑制剂。厌氧自由基抑制剂与好氧自由基抑制剂的摩尔比至少为1:1。这种抑制剂的组合提供了增加的保质期和良好的潜影稳定性，特别是当元件包括用作氧阻隔层的聚合物顶涂层时。

2. 发明申请

US20100015556A1 NEGATIVE-WORKING IMAGING ELEMENTS AND METHODS OF USE 失效
标题翻译：负面工作成像元素和使用方法
公开(公告)号：US20100015556A1
公开(公告)日：2010-01-21
申请号：US12173220
申请日：2008-07-15
申请人： Harald Baumann , Udo Dwars , Christopher D. Simpson , Bernd Strehmel , Michael Flugel
发明人： Harald Baumann , Udo Dwars , Christopher D. Simpson , Bernd Strehmel , Michael Flugel
IPC分类号： G03F7/26 , B41N1/00
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/033 , G03F7/092 , G03F7/3035
摘要： Negative-working imageable elements such as lithographic printing plate precursors, include a free-radically polymerizable component, an initiator composition that is capable of generating free radicals sufficient to initiate polymerization of the free-radically polymerizable component upon exposure to imaging radiation in the presence of a radiation absorbing compound, a radiation absorbing compound, an aerobic free radical inhibitor, optionally a polymeric binder that is not a free radically polymerizable component, and an anaerobic free radical inhibitor. The molar ratio of the anaerobic free radical inhibitor to the aerobic free radical inhibitor is at least 1:1. This combination of inhibitors provides increased shelf life and good latent image stability particularly when the element includes a polymeric topcoat layer that functions as an oxygen barrier.
摘要翻译：负面工作的可成像元件如平版印刷版前体包括可自由基聚合的组分，引发剂组合物，其能够产生足够的自由基，以便在存在可见光辐射的情况下暴露于成像辐射时引发可自由基聚合的组分的聚合辐射吸收化合物，辐射吸收化合物，需氧自由基抑制剂，任选的不是可自由基自由基组分的聚合物粘合剂和厌氧自由基抑制剂。厌氧自由基抑制剂与好氧自由基抑制剂的摩尔比至少为1:1。这种抑制剂的组合提供了增加的保质期和良好的潜影稳定性，特别是当元件包括用作氧阻隔层的聚合物顶涂层时。

3. 发明授权

US08318405B2 Negative-working imageable elements with overcoat 有权
标题翻译：负面工作可成像元素与大衣
公开(公告)号：US08318405B2
公开(公告)日：2012-11-27
申请号：US12403458
申请日：2009-03-13
申请人： Christopher D. Simpson , Harald Baumann , Udo Dwars , Bernd Strehmel
发明人： Christopher D. Simpson , Harald Baumann , Udo Dwars , Bernd Strehmel
IPC分类号： B32B3/10 , G03F7/09 , G03F7/11
CPC分类号： G03F7/092 , G03F7/11 , Y10T428/24802
摘要： Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.
摘要翻译：负性可成像元件可用于提供平版印刷版。可成像元件具有合适的辐射敏感可成像层和设置在可成像层上的水溶性外涂层。该外涂层包含至少一种皂化度至少为90％的聚（乙烯醇），链烷醇的烷氧基化产物，2-磺酸丁二酸二烷基酯或1,4-丁二醇的烷氧基化产物。

4. 发明申请

US20100233445A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH OVERCOAT 有权
标题翻译：负责工作的图像元素与OVERCOAT
公开(公告)号：US20100233445A1
公开(公告)日：2010-09-16
申请号：US12403458
申请日：2009-03-13
申请人： Christopher D. Simpson , Harald Baumann , Udo Dwars , Bernd Strehmel
发明人： Christopher D. Simpson , Harald Baumann , Udo Dwars , Bernd Strehmel
IPC分类号： B32B3/10 , G03F7/004 , G03F7/20
CPC分类号： G03F7/092 , G03F7/11 , Y10T428/24802
摘要： Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.
摘要翻译：负性可成像元件可用于提供平版印刷版。可成像元件具有合适的辐射敏感可成像层和设置在可成像层上的水溶性外涂层。该外涂层包含至少一种皂化度至少为90％的聚（乙烯醇），链烷醇的烷氧基化产物，2-磺酸丁二酸二烷基酯或1,4-丁二醇的烷氧基化产物。

5. 发明授权

US08043787B2 Negative-working imageable elements with improved abrasion resistance 有权
标题翻译：具有改善耐磨性的负性可成像元件
公开(公告)号：US08043787B2
公开(公告)日：2011-10-25
申请号：US12048452
申请日：2008-03-14
申请人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
发明人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
IPC分类号： G03F7/00 , G03F7/26
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

6. 发明授权

US07858292B2 Imageable elements with components having 1H-tetrazole groups 有权
标题翻译：具有1H-四唑基团的成像元件
公开(公告)号：US07858292B2
公开(公告)日：2010-12-28
申请号：US11949810
申请日：2007-12-04
申请人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
发明人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可具有垂直于主链的1H-四唑基团。在负片或正性可成像元件中使用这样的组分可提供高的感光速度和改进的显影性，以提供成像和显影元件，例如显示改善的耐化学性和游程长度的平版印刷版。

7. 发明申请

US20090233227A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE 有权
标题翻译：具有改进耐磨性的负离子成像元件
公开(公告)号：US20090233227A1
公开(公告)日：2009-09-17
申请号：US12048452
申请日：2008-03-14
申请人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
发明人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
IPC分类号： G03F7/004 , G03F7/12
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

8. 发明申请

US20090142695A1 IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS 有权
标题翻译：具有1H-四唑基的组分的成像元素
公开(公告)号：US20090142695A1
公开(公告)日：2009-06-04
申请号：US11949810
申请日：2007-12-04
申请人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
发明人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
IPC分类号： G03F7/028 , G03F7/30
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可具有垂直于主链的1H-四唑基团。在负片或正性可成像元件中使用这样的组分可提供高的感光速度和改进的显影性，以提供成像和显影元件，例如显示改善的耐化学性和游程长度的平版印刷版。

9. 发明申请

US20080145790A1 Process for Production of Lithographic Printing Plates 审中-公开
公开(公告)号：US20080145790A1
公开(公告)日：2008-06-19
申请号：US11815578
申请日：2006-02-01
申请人： Harald Baumann , Ulrich Fiebag , Udo Dwars , Michael Flugel , Bernd Strehmel , Hans-Joachim Timpe
发明人： Harald Baumann , Ulrich Fiebag , Udo Dwars , Michael Flugel , Bernd Strehmel , Hans-Joachim Timpe
IPC分类号： G03F7/12
CPC分类号： G03F7/322
摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt.-% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from —CH═CH—, —C≡C—, formula (II), formula (III), and formula (IV), n+m results in a value of 2 to 30 and p+q results in a value of 0 to 30, wherein in the case of p+q≠0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.

10. 发明授权

US09329485B2 Method for making lithographic printing plates 有权
标题翻译：平版印刷版的制作方法
公开(公告)号：US09329485B2
公开(公告)日：2016-05-03
申请号：US14484333
申请日：2014-09-12
申请人： Christopher D. Simpson , Harald Baumann , Michael Flugel , Saija Werner , Oliver Piestert , Udo Dwars
发明人： Christopher D. Simpson , Harald Baumann , Michael Flugel , Saija Werner , Oliver Piestert , Udo Dwars
IPC分类号： G03F7/32 , G03F7/38 , B41C1/10
CPC分类号： G03F7/38 , B41C1/1008 , G03F7/32
摘要： Lithographic printing plates are provided by imagewise exposing negative-working lithographic printing plate precursors having a negative-working radiation-sensitive imageable layer, followed by contacting with a processing solution that has a pH of at least 7 and up to and including 11. This processing solution also includes component (1) that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40° C.; component (2) that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40° C.; component (3) that is a hydroxy-containing solution promoter; and component (4) that is a hydrophilic surface protective compound. The method is carried out in a manner such that the exposed and processed precursor is not further treated with any liquid (such as gumming or rinsing solution) between processing and mounting onto a printing press.
摘要翻译：平版印刷版通过成像曝光具有负性辐射敏感可成像层的负性平版印刷版原版提供，然后与pH至少为7且高达11并且包括11的处理溶液接触。这种处理溶液还包括作为大气压熔点至少为40℃的含氮碱的组分（1）。组分（2），其是独立地具有至少40℃的大气压熔点，玻璃化转变温度或倾点的非离子表面活性剂。作为含羟基溶液促进剂的组分（3）; 和作为亲水性表面保护性化合物的成分（4）。该方法以这样的方式进行，使得在处理和安装到印刷机上之前，曝光和加工的前体不被任何液体（例如上胶或漂洗溶液）进一步处理。

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