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1. 发明申请

US20190318906A1 MEASUREMENT AND INSPECTION DEVICE 审中-公开
公开(公告)号：US20190318906A1
公开(公告)日：2019-10-17
申请号：US16251563
申请日：2019-01-18
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Wen LI , Shinichi MURAKAMI , Hiroyuki TAKAHASHI , Yuko SASAKI , Minoru YAMAZAKI , Hajime KAWANO
IPC分类号： H01J37/147 , H01J37/04 , H01L21/66 , G01N23/2251
摘要： A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.

2. 发明申请

US20160379795A1 Charged Particle Beam Apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20160379795A1
公开(公告)日：2016-12-29
申请号：US15183952
申请日：2016-06-16
申请人： Hitachi High-Technologies Corporation
发明人： Ryota WATANABE , Yuko SASAKI , Akira IKEGAMI
IPC分类号： H01J37/21 , H01J37/28
CPC分类号： H01J37/21 , H01J37/28 , H01J2237/2448 , H01J2237/24578 , H01J2237/281
摘要： An object of the invention is to provide a charged particle beam apparatus which can perform optimized adjustment of a focusing condition of a charged particle beam focused on a sample and optimized adjustment of an orbit of a charged particle emitted from the sample. In order to achieve the above-described object, there is provided a charged particle beam apparatus including a passage restriction member that partially restricts passage of a charged particle emitted from a sample, a first lens that is arranged between the passage restriction member and the sample, and that controls an orbit of the charged particle emitted from the sample, and a second lens that is arranged between the passage restriction member and the charged particle source, and that changes a focusing condition of the charged particle beam in accordance with a control condition of the first lens.
摘要翻译：本发明的目的是提供一种带电粒子束装置，其能够对聚焦在样品上的带电粒子束的聚焦条件进行优化调整，并优化对从样品发射的带电粒子轨道的调整。为了实现上述目的，提供了一种带电粒子束装置，其包括：通道限制部件，其部分地限制从样品发射的带电粒子的通过;布置在通道限制部件和样品之间的第一透镜并且控制从样品发射的带电粒子的轨道，以及布置在通道限制构件和带电粒子源之间的第二透镜，并且根据控制条件改变带电粒子束的聚焦条件的第一个镜头。

3. 发明申请

US20190206654A1 MEASURING DEVICE AND MEASURING METHOD 审中-公开
公开(公告)号：US20190206654A1
公开(公告)日：2019-07-04
申请号：US16325662
申请日：2016-08-31
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Noritsugu TAKAHASHI , Makoto SAKAKIBARA , Wataru MORI , Hajime KAWANO , Yuko SASAKI
IPC分类号： H01J37/12 , H01J37/20 , H01J37/21 , H01J37/244 , H01J37/141
摘要： A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.

4. 发明申请

US20160233049A1 Charged Particle Beam Device 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20160233049A1
公开(公告)日：2016-08-11
申请号：US15022662
申请日：2014-05-02
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Yuko SASAKI , Hiroyuki ITO
IPC分类号： H01J37/153 , H01J37/12
CPC分类号： H01J37/153 , H01J37/12 , H01J37/141 , H01J37/147 , H01J2237/103 , H01J2237/1532 , H01J2237/1534
摘要： Provided is a multifunctional charged particle beam device capable of inclining a beam with little aberration. The aberration is corrected by forming a local divergent field with a multipole, parallel current lines, or the like, matching the beam axis with the local divergent field via a conventional rotationally symmetric lens, deflector or astigmatism corrector, and counteracting an aberration occurring from another rotationally symmetric convex lens field.
摘要翻译：提供了一种能够使几乎没有像差的光束倾斜的多功能带电粒子束装置。通过用多极，平行电流线等形成局部发散场，通过常规旋转对称透镜，偏转器或像散校正器将光束轴与局部发散场匹配并抵消从另一个发生的像差来校正像差旋转对称凸透镜场。

5. 发明申请

US20200035449A1 Charged Particle Beam Device and Capturing Condition Adjusting Method in Charged Particle Beam Device 审中-公开
公开(公告)号：US20200035449A1
公开(公告)日：2020-01-30
申请号：US16436297
申请日：2019-06-10
申请人： Hitachi High-Technologies Corporation
发明人： Tomohito NAKANO , Toshiyuki YOKOSUKA , Yuko SASAKI , Minoru YAMAZAKI , Yuzuru MOCHIZUKI
IPC分类号： H01J37/28 , G01N23/225 , H01J37/147
摘要： A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.

6. 发明申请

US20190311875A1 Charged Particle Beam Device 审中-公开
公开(公告)号：US20190311875A1
公开(公告)日：2019-10-10
申请号：US16354670
申请日：2019-03-15
申请人： Hitachi High-Technologies Corporation
发明人： Wataru YAMANE , Minoru YAMAZAKI , Yuko SASAKI , Wataru MORI , Takashi DOI
IPC分类号： H01J37/147 , H01J37/244 , H01J37/22 , H01J37/28 , H01J37/10
摘要： An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.

7. 发明申请

US20170092459A1 CHARGED-PARTICLE-BEAM DEVICE 有权
公开(公告)号：US20170092459A1
公开(公告)日：2017-03-30
申请号：US15310438
申请日：2015-04-28
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Noritsugu TAKAHASHI , Yasunari SOHDA , Wataru MORI , Yuko SASAKI , Hajime KAWANO
IPC分类号： H01J37/05 , H01J37/12 , H01J37/153 , H01J37/244 , H01J37/21
CPC分类号： H01J37/05 , H01J37/12 , H01J37/147 , H01J37/153 , H01J37/21 , H01J37/244 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/2448
摘要： A charged-particle-beam device used for measuring the dimensions, etc., of fine circuit patterns in a semiconductor manufacturing process, wherein corrections are made in the defocusing and astigmatism generated during changes in the operating conditions of a Wien filter acting as a deflector of secondary signals such as secondary electrons, and the display dimensions of obtained images are kept constant. In the charged-particle-beam device, the Wien filter (23) is arranged between a detector and a lens (11) arranged on the test-sample side among two stages of lenses for converging a charged-particle beam, and a computing device (93) is provided for the interlocked control of the Wien filter (23) and a lens (12) arranged on the charged-particle-source side among the two stages of lenses.

8. 发明申请

US20150102221A1 Charged Particle Beam Device 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20150102221A1
公开(公告)日：2015-04-16
申请号：US14573965
申请日：2014-12-17
申请人： Hitachi High-Technologies Corporation
发明人： Yuko SASAKI , Hiroyuki ITO
IPC分类号： H01J37/05 , H01J37/26 , H01J37/28
CPC分类号： H01J37/05 , H01J37/244 , H01J37/26 , H01J37/263 , H01J37/28 , H01J2237/057 , H01J2237/2446 , H01J2237/2448 , H01J2237/24485 , H01J2237/2801 , H01J2237/2806
摘要： Provided is a charged particle beam device to improve energy solution of its energy filter. In one embodiment, a charged particle beam device includes a deflector to deflect charged particles emitted from a sample to an energy filter, and a change in brightness value with the change of voltage applied to the energy filter is found for each of a plurality of deflection conditions for the deflector, and a deflection condition such that a change in the brightness value satisfies a predetermined condition is set as the deflection condition for the deflector.
摘要翻译：提供了一种用于改善其能量过滤器的能量解决方案的带电粒子束装置。在一个实施例中，带电粒子束装置包括偏转器，用于将从样品发射的带电粒子偏转到能量滤波器，并且针对多个偏转中的每一个发现随施加到能量滤波器的电压变化而引起的亮度值的变化偏转器的条件以及使得亮度值的变化满足预定条件的偏转条件被设定为偏转器的偏转状态。

9. 发明申请

US20190172676A1 Charged Particle Beam Apparatus and Method for Adjusting Imaging Conditions for the Same 审中-公开
公开(公告)号：US20190172676A1
公开(公告)日：2019-06-06
申请号：US16184107
申请日：2018-11-08
申请人： Hitachi High-Technologies Corporation
发明人： Tomohito NAKANO , Toshiyuki YOKOSUKA , Yuko SASAKI , Minoru YAMAZAKI , Yuzuru MOCHIZUKI
IPC分类号： H01J37/21 , H01J37/141 , H01J37/244 , H01J37/22 , H01J37/20 , H01J37/28
CPC分类号： H01J37/21 , H01J37/141 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/141 , H01J2237/216 , H01J2237/2809
摘要： A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.

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