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1. 发明授权

US06277546B1 Process for imaging of photoresist 失效
标题翻译：光刻胶成像工艺
公开(公告)号：US06277546B1
公开(公告)日：2001-08-21
申请号：US08345290
申请日：1994-11-28
申请人： Gregory Breyta , Nicholas Jeffries Clecak , William Dinan Hinsberg, III , Donald Clifford Hofer , Hiroshi Ito , Scott Arthur MacDonald , Ratnam Sooriyakumaran
发明人： Gregory Breyta , Nicholas Jeffries Clecak , William Dinan Hinsberg, III , Donald Clifford Hofer , Hiroshi Ito , Scott Arthur MacDonald , Ratnam Sooriyakumaran
IPC分类号： G03F726
CPC分类号： G03F7/168 , G03F7/0045 , G03F7/38
摘要： The present invention relates to an improved lithographic imaging process for use in the manufacture of integrated circuits. The process provides protection to the photoresist film from airborne chemical contaminants.
摘要翻译：本发明涉及用于制造集成电路的改进的光刻成像方法。该工艺为光致抗蚀剂膜提供了防止空气传播的化学污染物的保护。

2. 发明授权

US07348127B2 Topcoats for use in immersion lithography 有权
标题翻译：用于浸渍光刻的面漆
公开(公告)号：US07348127B2
公开(公告)日：2008-03-25
申请号：US11621132
申请日：2007-01-09
申请人： William Dinan Hinsberg, III
发明人： William Dinan Hinsberg, III
IPC分类号： G03F7/11
CPC分类号： G03F7/2041 , G03F7/11 , Y10S430/136 , Y10S430/162
摘要： A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.
摘要翻译：一种形成用于浸渍光刻的顶涂层和顶涂层材料的方法。从与光致抗蚀剂层不混溶的水溶液在光致抗蚀剂层上形成面漆层。然后将面漆层变得不溶于中性水，但仍溶于水性显影剂溶液中，因此光致抗蚀剂可以使用水作为浸渍流体在浸没式光刻系统中曝光，但在光致抗蚀剂显影期间被除去。面漆材料适用于正，负，双色和化学放大（CA）光致抗蚀剂。

3. 发明授权

US07205093B2 Topcoats for use in immersion lithography 有权
标题翻译：用于浸渍光刻的面漆
公开(公告)号：US07205093B2
公开(公告)日：2007-04-17
申请号：US11145288
申请日：2005-06-03
申请人： William Dinan Hinsberg, III
发明人： William Dinan Hinsberg, III
IPC分类号： G03F7/16 , G03F7/20 , G03F7/11 , G03F7/30
CPC分类号： G03F7/2041 , G03F7/11 , Y10S430/136 , Y10S430/162
摘要： A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.
摘要翻译：一种形成用于浸渍光刻的顶涂层和顶涂层材料的方法。从与光致抗蚀剂层不混溶的水溶液在光致抗蚀剂层上形成面漆层。然后将面漆层变得不溶于中性水，但仍溶于水性显影剂溶液中，因此光致抗蚀剂可以使用水作为浸渍流体在浸没式光刻系统中曝光，但在光致抗蚀剂显影期间被除去。面漆材料适用于正，负，双色和化学放大（CA）光致抗蚀剂。

4. 发明授权

US07179571B2 Apparatus for characterization of photoresist resolution, and method of use 有权
标题翻译：用于表征光刻胶分辨率的装置及其使用方法
公开(公告)号：US07179571B2
公开(公告)日：2007-02-20
申请号：US11351578
申请日：2006-02-09
申请人： William Dinan Hinsberg, III , John Allen Hoffnagle , Frances Anne Houle , Martha Inez Sanchez
发明人： William Dinan Hinsberg, III , John Allen Hoffnagle , Frances Anne Houle , Martha Inez Sanchez
IPC分类号： G03F9/00
CPC分类号： G03F7/70108 , G03F7/70608 , Y10S430/143
摘要： An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.
摘要翻译：用于光致抗蚀剂材料的有效表征的光学装置包括至少一个具有至少两个光栅的光栅干涉仪，其一起限定光学复合平面。光学阻挡块阻止任何零级光束传播通过设备。位于复合平面处的掩模版在其中具有至少一个基准标记。光刻成像光学工具被定位成使得其输入光学平面与光学复合平面基本一致，并且其输出成像平面与晶片上的光致抗蚀剂基本一致。该装置写入光阻潜在正弦光栅图案，优选地具有不同的空间频率，以及至少一个基准标记，其图案由标线中的标记确定。在光致抗蚀剂显影之后，其固有空间分辨率可以通过自动化方式确定。

5. 发明授权

US07046342B2 Apparatus for characterization of photoresist resolution, and method of use 失效
标题翻译：用于表征光刻胶分辨率的装置及其使用方法
公开(公告)号：US07046342B2
公开(公告)日：2006-05-16
申请号：US10769132
申请日：2004-01-29
申请人： William Dinan Hinsberg, III , John Allen Hoffnagle , Frances Anne Houle , Martha Inez Sanchez
发明人： William Dinan Hinsberg, III , John Allen Hoffnagle , Frances Anne Houle , Martha Inez Sanchez
IPC分类号： G03B27/72
CPC分类号： G03F7/70108 , G03F7/70608 , Y10S430/143
摘要： An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.
摘要翻译：用于光致抗蚀剂材料的有效表征的光学装置包括至少一个具有至少两个光栅的光栅干涉仪，其一起限定光学复合平面。光学阻挡块阻止任何零级光束传播通过设备。位于复合平面处的掩模版在其中具有至少一个基准标记。光刻成像光学工具被定位成使得其输入光学平面与光学复合平面基本一致，并且其输出成像平面与晶片上的光致抗蚀剂基本一致。该装置写入光阻潜在正弦光栅图案，优选地具有不同的空间频率，以及至少一个基准标记，其图案由标线中的标记确定。在光致抗蚀剂显影之后，其固有空间分辨率可以通过自动化方式确定。

6. 发明授权

US06423465B1 Process for preparing a patterned continuous polymeric brush on a substrate surface 失效
标题翻译：在衬底表面上制备图案化连续聚合物刷的方法
公开(公告)号：US06423465B1
公开(公告)日：2002-07-23
申请号：US09493450
申请日：2000-01-28
申请人： Craig Jon Hawker , James Lupton Hedrick , William Dinan Hinsberg, III , Marc Husemann , Michael Morrison
发明人： Craig Jon Hawker , James Lupton Hedrick , William Dinan Hinsberg, III , Marc Husemann , Michael Morrison
IPC分类号： G03F711
CPC分类号： G03F7/168 , G03F7/0392 , G03F7/165
摘要： A method is disclosed for preparing a patterned continuous polymeric brush on a substrate surface. The method generally involves functionalization of the substrate surface followed by surface-initiated polymerization at the initiation sites so provided, e.g., using a living free radical polymerization technique or the like, whereby a covalently bound continuous polymeric brush results, with acid-labile groups present throughout. An acid is then applied to the continuous polymer brush in a predetermined pattern, under conditions that result in removal of the acid-labile groups in at least one first region of the continuous polymer brush but not in at least one second region of the continuous polymer brush. In a preferred embodiment, the acid is a photogenerated acid resulting from imagewise irradiation of a photoacid generator applied as a film or coating to the surface-bound polymer brush.
摘要翻译：公开了一种用于在衬底表面上制备图案化的连续聚合物刷的方法。该方法通常涉及基材表面的官能化，然后在例如使用活性自由基聚合技术等提供的起始位点进行表面引发聚合，由此产生共价键连续的聚合物刷，其中存在酸不稳定基团始终。然后在预定的图案中，在导致连续聚合物刷的至少一个第一区域中除去酸不稳定基团但不在连续聚合物的至少一个第二区域中的条件下，将酸施加到连续聚合物刷上刷。在一个优选的实施方案中，酸是由作为膜或涂层施加到表面结合聚合物刷的光致酸产生体的成像照射产生的光生酸。

7. 发明授权

US5826065A Software architecture for stochastic simulation of non-homogeneous systems 失效
标题翻译：用于非均匀系统随机模拟的软件架构
公开(公告)号：US5826065A
公开(公告)日：1998-10-20
申请号：US782164
申请日：1997-01-13
申请人： William Dinan Hinsberg, III , Frances Anne Houle
发明人： William Dinan Hinsberg, III , Frances Anne Houle
IPC分类号： G05B17/02 , G06F9/44 , G06F17/50 , G06F9/455
CPC分类号： G06F17/5009 , G05B17/02 , G06F2217/10
摘要： A stochastic simulation method and system are provided. The invention eliminates the need for the use of subroutine calls in a user-written simulation program, and of option flags to direct execution via decision trees, by allowing the user to configure the simulator through choices of options at run-time. The options are presented via a user interface as radio buttons or checkboxes which the user activates. The simulator sets itself up to incorporate only those options. The programmer (that is, the author of software according to the invention) only makes the objects available and ensures that they work together. It is the user who actually configures the simulator. The invention provides a highly extendable structure. By use of inheritance and dynamic allocation of memory, and by design of self-contained objects to represent various components of the simulation system, a simulation program according to the invention incorporates new features and options with a minimum of new code. This enables creation of a single simulation package that efficiently handles a wide variety of physical situations, useable for calculations as diverse as starved feed reactors, multi-compartment pharmacokinetics and heat flow, using single reaction volumes or multiply linked compartments. The efficiency is gained by minimizing the amount of memory required to run the program, and by eliminating repetitive and time-consuming progression through decision trees.
摘要翻译：提供了随机的模拟方法和系统。本发明消除了在用户编写的仿真程序中使用子程序调用的需要，并且通过允许用户通过运行时选项的选择来配置模拟器，消除了在用户编写的仿真程序中使用子程序调用的需要以及通过决策树直接执行的选项标志。选项通过用户界面显示为用户激活的单选按钮或复选框。模拟器将自己设置为仅包含那些选项。程序员（即根据本发明的软件的作者）仅使对象可用并确保它们一起工作。它是实际配置模拟器的用户。本发明提供了一种高度可扩展的结构。通过使用存储器的继承和动态分配，并且通过设计自包含对象来表示仿真系统的各种组件，根据本发明的仿真程序将新特征和选项与最少的新代码相结合。这使得能够创建一个单一的模拟包，可以有效地处理各种各样的物理情况，可用于使用单个反应体积或多个连接的隔室的饥饿饲料反应器，多室药代动力学和热流量的计算。通过最小化运行程序所需的内存量以及通过决策树消除重复和耗时的进程来获得效率。

8. 发明授权

US5745385A Method for stochastic and deterministic timebase control in stochastic simulations 失效
标题翻译：随机模拟中随机和确定性时基控制的方法
公开(公告)号：US5745385A
公开(公告)日：1998-04-28
申请号：US233022
申请日：1994-04-25
申请人： William Dinan Hinsberg, III , Frances Anne Houle
发明人： William Dinan Hinsberg, III , Frances Anne Houle
IPC分类号： B01J19/00 , G05B21/02 , G06F17/50 , G06F19/00 , G06Q50/00 , G06F9/455
CPC分类号： G05B21/02 , G06F17/5009 , G06F2217/10 , G06F2217/80
摘要： A system and method for simulating a mechanistic kinetic process, such as a chemical process including one or more chemical reactions, over a predetermined time period, subject to a programmed temperature variation, is provided. The simulation proceeds stochastically, by taking discrete time steps through the time period. The time steps vary in size, based on instantaneous reaction rate values for the reactions taking place. Reaction rates can vary by many orders of magnitude, and sometimes a stochastically calcualated time step will be so great that it might skip over a later increase in chemical activity. To avoid loss of accuracy and control of the simulation due to such excessively large time steps, when the stochastically determined time step exceeds a threshold, one or more smaller, deterministic time steps are made. The deterministic time steps "inch" forward in time, until an increase in chemical activity is detected. Then, stochastic time steps are resumed. In this manner, a simulation according to the invention detects and simulates the increase in activity. The invention more broadly covers any simulation over an interval of values for an independent state variable (e.g., time), where there are one or more programmed state variables (e.g., temperature, pressure, etc, expressed as a function of the independent state variable). Time steps are made based on a process parameter (related to the instantaneous reaction rates or probabilities of occurrence), whose value is related to a current system state related to the current programmed state variable values (e.g., temperature-dependent reaction rates).
摘要翻译：提供了一种在预定时间段内模拟机械动力学过程（例如包括一个或多个化学反应的化学过程）的系统和方法，其经受编程的温度变化。模拟通过在该时间段内采取离散时间步骤随机进行。时间步长根据发生的反应的瞬时反应速率值而有所不同。反应速率可以变化多个数量级，有时随机的时间步长将会很大，以至于可以跳过化学活性的后续增加。为了避免由于这种过大的时间步长引起的精度损失和模拟控制，当随机确定的时间步长超过阈值时，进行一个或多个更小的确定性时间步长。时间上的确定性时间步长“inch”，直到检测到化学活性的增加。然后，随机时间步骤恢复。以这种方式，根据本发明的模拟检测并模拟活动的增加。本发明更广泛地涵盖在独立状态变量（例如，时间）的值的间隔上的任何模拟，其中存在一个或多个编程状态变量（例如，温度，压力等，表示为独立状态变量的函数）。时间步骤基于与当前编程的状态变量值相关的当前系统状态（例如温度依赖性反应速率）的过程参数（与瞬时反应速率或出现概率相关）进行。

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