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    • 4. 发明授权
    • Getter pump module and system
    • 吸气泵模块和系统
    • US06142742A
    • 2000-11-07
    • US826866
    • 1997-04-11
    • Gordon P. KruegerD'Arcy H. LorimerSergio CarellaAndrea Conte
    • Gordon P. KruegerD'Arcy H. LorimerSergio CarellaAndrea Conte
    • C23C14/56F04B37/02
    • F04B37/02C23C14/564
    • A getter pump module includes a number of getter disks provided with axial holes, and a heating element which extends through the holes to support and heat the getter disks. The getter disks are preferably solid, porous, sintered getter disks that are provided with a titanium hub that engages the heating element. A thermally isolating shield is provided to shield the getter disks from heat sources and heat sinks within the chamber, and to aid in the rapid regeneration of the getter disks. In certain embodiments of the present invention the heat shields are fixed, and in other embodiments the heat shield is movable. In one embodiment, a focus shield is provided to reflect thermal energy to the getter material from an external heater element and provide high pumping speeds. An embodiment of the present invention also provides for a rotating getter element to enhance getter material utilization.
    • 吸气泵模块包括设置有轴向孔的多个吸气盘,以及延伸穿过孔以加热吸气盘的加热元件。 吸气盘优选是固体,多孔,烧结的吸气剂盘,其具有与加热元件接合的钛毂。 提供了一种隔热屏蔽件,用于屏蔽吸气剂盘从室内的热源和散热器,并帮助吸气剂盘的快速再生。 在本发明的某些实施例中,隔热罩是固定的,并且在其它实施例中,隔热罩是可移动的。 在一个实施例中,提供聚焦屏蔽以将来自外部加热器元件的吸热材料的热能反射并提供高的泵送速度。 本发明的一个实施方案还提供了一种旋转吸气剂元件以增强吸气剂材料的利用。
    • 7. 发明授权
    • Method and apparatus for cleaning flat workpieces
    • 用于清洁扁平工件的方法和设备
    • US06460552B1
    • 2002-10-08
    • US09166819
    • 1998-10-05
    • D'Arcy H. Lorimer
    • D'Arcy H. Lorimer
    • B08B310
    • H01L21/67167H01L21/67051H01L21/67207H01L21/67219H01L2924/0002Y10S134/902H01L2924/00
    • A semiconductor deposition system in accordance with the present invention includes a CMP apparatus operative to planarize an active surface of a semiconductor wafer, and a wafer cleaner for cleaning wafer after the CMP process. The wafer cleaner preferably includes a wafer rotating mechanism, a steam inlet for applying steam to the active surface of the wafer as it is rotated and a liquid inlet for simultaneously applying a liquid to the back side surface of the wafer. A method for manufacturing an integrated circuit in accordance with the present invention includes subjecting an active surface of the wafer to a plurality of processes selected from a group including deposition, patterning, doping, planarization, ashing and etching, and steam cleaning the active surface at least once before, during, and after the plurality of processes. Preferably, an aqueous vapor phase is applied to the first surface of the wafer as an aqueous liquid phase is applied to the other surface of the wafer. Spinning the wafer urges condensate from the vapor phase to move toward the edge of the wafer as the wafer surfaces are cleaned.
    • 根据本发明的半导体沉积系统包括可操作以平坦化半导体晶片的有源表面的CMP装置和用于在CMP处理之后清洁晶片的晶片清洁器。 晶片清洗器优选地包括晶片旋转机构,用于在旋转晶片时将蒸汽施加到晶片的有源表面的蒸汽入口以及用于同时向液晶的背面施加液体的液体入口。 根据本发明的用于制造集成电路的方法包括使晶片的有效表面经历从包括沉积,图案化,掺杂,平坦化,灰化和蚀刻的组中选择的多个工艺,以及将活性表面蒸汽清洗 在多个处理之前,期间和之后至少一次。 优选地,当将水相液相施加到晶片的另一个表面时,将水相气相施加到晶片的第一表面。 当晶片表面被清洁时,旋转晶片促使来自气相的冷凝物向晶片的边缘移动。
    • 9. 发明授权
    • In situ getter pump system and method
    • 原位吸气泵系统及方法
    • US5879134A
    • 1999-03-09
    • US807957
    • 1997-02-28
    • D'Arcy H. LorimerGordon P. Krueger
    • D'Arcy H. LorimerGordon P. Krueger
    • C23C14/54C23C14/56F04B37/02F04B37/08F04B37/16H01L21/02H01L21/20
    • C23C14/564C23C14/54C23C14/56F04B37/02F04B37/08
    • A wafer processing system including a processing chamber, a low pressure pump coupled to the processing chamber for pumping noble and non-noble gases, a valve mechanism coupling a source of noble gas to the processing chamber, an in situ getter pump disposed within the processing chamber which pumps certain non-noble gases during the flow of the noble gas into the chamber, and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gasses that are pumped from the chamber. A method for processing a wafer of the present invention includes the steps of placing a wafer within a processing chamber and sealing the chamber, flowing a noble gas into the chamber while simultaneously pumping the chamber with an external low pressure pump and with an in situ getter pump disposed within the chamber which pumps non-noble gases, and processing the wafer within the chamber while the noble gas continues to flow. The method also preferably includes the steps of monitoring the composition of the gas within the chamber and controlling the temperature of the getter material based upon the analysis of the composition.
    • 一种晶片处理系统,包括处理室,耦合到处理室的用于泵送贵重和非惰性气体的低压泵,将惰性气体源连接到处理室的阀机构,设置在处理中的原位吸气泵 在惰性气体流入室期间泵送某些非惰性气体的腔室,以及用于处理设置在处理室内的晶片的处理机构。 优选地,原位吸气泵可以在多个不同温度下操作,以在这些温度下优先泵送不同种类的气体。 气体分析仪用于自动控制吸气泵的温度,以控制从腔室泵送的气体种类。 本发明的晶片处理方法包括以下步骤:将晶片放置在处理室内并密封该腔室,将惰性气体流入腔室,同时用外部低压泵泵送腔室,并使用原位吸气剂 设置在室内的泵,其泵送非惰性气体,并且在惰性气体继续流动的同时处理室内的晶片。 该方法还优选包括以下步骤:基于组合物的分析来监测室内气体的组成并控制吸气剂材料的温度。
    • 10. 发明授权
    • Low particulate slit valve system and method for controlling same
    • 低颗粒狭缝阀系统及其控制方法
    • US5363872A
    • 1994-11-15
    • US32041
    • 1993-03-16
    • D'Arcy H. Lorimer
    • D'Arcy H. Lorimer
    • F16K1/10F16K51/02H01L21/00H01L21/677F16K39/02
    • H01L21/67748F16K1/10F16K51/02H01L21/67126Y10S251/90Y10T137/0318Y10T137/7761
    • Low particulate slit valve system and method for controlling the closure pressure applied to a slit valve. An apparatus in accordance with the present invention includes a barrier having a slit valve aperture, a valve seat surrounding the aperture, a closure movable towards and away from the valve seat, a sensing mechanism for determining the pressure differential on the two sides of the barrier, a processing unit responsive to the pressure differential and operative to produce a control signal, and a valve actuator responsive to the control signal and operative to control the force applied to the closure. The method of the invention includes determining a first fluid pressure on a first side of the barrier, determining a second pressure on a second side of the barrier, and applying a closure pressure to the closure which is related to the pressure differential between the first fluid pressure and the second fluid pressure. If the pressure differential is low, zero or very near to zero pressure is applied to the closure to seal the aperture. If the pressure differential is high, a proportionately larger pressure is applied to the closure.
    • 低颗粒狭缝阀系统和控制施加到狭缝阀的封闭压力的方法。 根据本发明的装置包括具有狭缝阀孔的屏障,围绕孔的阀座,可朝向和离开阀座移动的封闭件;用于确定屏障两侧的压力差的感测机构 响应于压力差并且可操作地产生控制信号的处理单元,以及响应于控制信号并可操作以控制施加到封闭件的力的阀致动器。 本发明的方法包括确定在隔离物的第一侧上的第一流体压力,确定在隔离物的第二侧上的第二压力,以及向封闭件施加闭合压力,所述闭合压力与第一流体 压力和第二流体压力。 如果压差低,则零或非常接近零压力被施加到封闭件以密封孔。 如果压力差高,则向封闭件施加相对较大的压力。