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1. 发明申请

US20120080054A1 RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM 审中-公开
标题翻译：辐射源模块和流体处理系统
公开(公告)号：US20120080054A1
公开(公告)日：2012-04-05
申请号：US13263675
申请日：2010-04-06
申请人： George Traubenberg , Christian Moglan
发明人： George Traubenberg , Christian Moglan
IPC分类号： B08B1/00
CPC分类号： C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/324
摘要： There is described a fluid treatment system particularly suited for radiation treatment of a flow of fluid (preferably water). The system comprises a fluid treatment zone for receiving a flow of fluid in contact with a surface of the fluid treatment zone. At least one elongate radiation source assembly is disposed in the fluid treatment zone. The elongate radiation source assembly has a longitudinal axis disposed transverse to a direction of fluid flow through the fluid treatment zone. The system further comprises a cleaning apparatus having at least one cleaning element in contact with an exterior surface of the at least one elongate radiation source assembly. A first motive element is provided and is operable to cause relative movement between a distal end of the at least one elongate radiation source assembly and the surface of the fluid treatment zone to define a gap therebetween. A second motive element is provided and is coupled to the cleaning system. The second motive element operable to move the cleaning system between a cleaning apparatus retracted position and a cleaning apparatus extended position. Movement of the cleaning system from the cleaning apparatus retracted position to the extended position causes debris contacting the at least one elongate radiation source assembly to be pushed into the gap. A radiation source module more use in such a fluid treatment system is also described.
摘要翻译：描述了特别适用于流体流动（优选水）的辐射处理的流体处理系统。该系统包括用于接收与流体处理区的表面接触的流体流的流体处理区。至少一个细长辐射源组件设置在流体处理区域中。细长辐射源组件具有横向于流过流体处理区的流体流动方向的纵向轴线。该系统还包括具有与至少一个细长辐射源组件的外表面接触的至少一个清洁元件的清洁设备。第一动力元件被提供并且可操作以引起至少一个细长辐射源组件的远端和流体处理区域的表面之间的相对运动，以限定它们之间的间隙。提供第二动力元件并且联接到清洁系统。第二动力元件可操作以在清洁装置缩回位置和清洁装置延伸位置之间移动清洁系统。清洁系统从清洁装置缩回位置移动到延伸位置使得与至少一个细长辐射源组件接触的碎屑被推入间隙中。还描述了在这种流体处理系统中更多使用的辐射源模块。

2. 发明授权

US09539351B2 Radiation source module and fluid treatment system 有权
标题翻译：辐射源模块和流体处理系统
公开(公告)号：US09539351B2
公开(公告)日：2017-01-10
申请号：US13994941
申请日：2011-12-13
申请人： George Traubenberg , Douglas Penhale
发明人： George Traubenberg , Douglas Penhale
IPC分类号： A61L2/10 , C02F1/32
CPC分类号： A61L2/10 , C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/328
摘要： There is described a radiation source module for use in a fluid treatment system. The radiation source module comprises: a housing having an inlet, an outlet and a fluid treatment zone disposed between. The fluid treatment zone comprises a first wall surface and a second wall surface interconnected by a floor surface. The first wall surface, the second wall surface and the floor surface are configured to receive a flow of fluid through the fluid treatment zone. The radiation source module further comprises at least one radiation source assembly secured with respect to the first wall surface and the second wall surface and a module motive coupling element connected to the housing and configured to be coupled to a module motive element to permit the radiation source module to be installed in and extracted from the fluid treatment system. A fluid treatment system comprising the radiation source module is also described.
摘要翻译：描述了用于流体处理系统的辐射源模块。辐射源模块包括：壳体，其具有设置在其间的入口，出口和流体处理区。流体处理区包括由地板表面互连的第一壁表面和第二壁表面。第一壁表面，第二壁表面和地板表面构造成接收通过流体处理区的流体流。所述辐射源模块还包括相对于所述第一壁表面和所述第二壁表面固定的至少一个辐射源组件和连接到所述壳体的模块运动耦合元件，并且被配置为耦合到模块运动元件以允许所述辐射源模块安装在流体处理系统中并从中提取。还描述了包括辐射源模块的流体处理系统。

3. 发明授权

US06663318B2 Fluid level control system 失效
标题翻译：液位控制系统
公开(公告)号：US06663318B2
公开(公告)日：2003-12-16
申请号：US09921268
申请日：2001-08-03
申请人： Dusko Antonio Kezele , Jason J. Cerny , Alan J. Royce , Fariborz Taghipour , George Traubenberg
发明人： Dusko Antonio Kezele , Jason J. Cerny , Alan J. Royce , Fariborz Taghipour , George Traubenberg
IPC分类号： E02B740
CPC分类号： G05D7/0173 , E02B7/205 , E02B7/40
摘要： A fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system includes a gate having a flap port on interconnected to a lever portion. The flap portion is rotatable about a first pivot point. The system further includes a frame which is fixed with respect to the flap portion. A linkage interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point different than the first pivot point. Under changing flow conditions in the channel, the present system operates by both: (i) absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system and a method for controlling the level of a flowing fluid may also use such a fluid level control system.
摘要翻译：液位控制系统，特别适用于控制在开放通道中流动的水位。液位控制系统包括具有互连到杠杆部分的翼片端口的门。翼片部分可围绕第一枢转点旋转。该系统还包括相对于翼片部分固定的框架。连杆将翼片部分和杆部分互连，并且在与第一枢转点不同的第二枢轴点处连接到框架。在通道中的流动条件变化的情况下，本系统通过以下操作：（i）杠杆部分和翼片部分的绝对运动，以及（ii）杠杆部分和翼片部分之间的相对运动。流体处理系统和用于控制流动流体的水平的方法也可以使用这种液位控制系统。

4. 发明申请

US20100193421A1 FLUID TREATMENT SYSTEM 有权
标题翻译：流体处理系统
公开(公告)号：US20100193421A1
公开(公告)日：2010-08-05
申请号：US12514894
申请日：2007-11-06
申请人： Li Zheng Ma , George Traubenberg , Douglas Penhale
发明人： Li Zheng Ma , George Traubenberg , Douglas Penhale
IPC分类号： C02F1/32
CPC分类号： C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/328
摘要： In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fluid deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.
摘要翻译：在其一个方面，本发明涉及一种流体处理系统，包括：入口; 一个出口设置在入口和出口之间的流体处理区。流体处理区：（i）包括与第一壁表面相对的第一壁表面和第二壁表面，以及（ii）在其中设置有至少一排辐射源组件的阵列。每个辐射源组件具有横向于流过流体处理区的流体流动方向的纵向轴线，并且第一壁表面和第二壁表面中的每一个包括第一流体偏转器元件和第二流体偏转器元件。所述第一流体导流元件比所述第二流体导流元件突出到所述流体处理区域更大的程度。

5. 发明授权

US06803586B1 Fluid treatment system and method of treating fluid 失效
标题翻译：流体处理系统和处理流体的方法
公开(公告)号：US06803586B1
公开(公告)日：2004-10-12
申请号：US09567051
申请日：2000-05-08
申请人： Robert A. H. Brunet , George Traubenberg , Ted Mao , Feraz Hosein
发明人： Robert A. H. Brunet , George Traubenberg , Ted Mao , Feraz Hosein
IPC分类号： A61L210
CPC分类号： C02F1/325 , A61L2/10 , C02F2201/3227 , C02F2201/326 , C02F2201/328 , Y10S422/906
摘要： It is often desirable to operate ultraviolet (UV) water treatment systems at high fluid velocities; such as, when low UV doses are required, the UV transmittance of the water being treated is high, or when a high intensity radiation source is used. The operation of an open channel UV fluid treatment system at high fluid velocity causes a disproportionate amount of water to pass through the relatively low intensity region above the top lamp. This results in non-uniform UV dose delivery and poor reactor performance. In one embodiment of the invention, by elevating the inlet to the irradiation zone of the fluid treatment system with respect to the outlet, the amount of water that passes above the top lamp can be minimized, improving overall system performance. The means of elevation can consist of a step or slope in the channel, or a combination of both. Depending on the magnitude of elevation, an increase in maximum velocity of approximately two times can be obtained. In practice, a means must be provided to prevent damage to the radiation sources of the elevated banks that become exposed during periods of low flow. This can consist of either a mechanism for switching off the affected lamp when low water level or high temperature is detected, or a means of lamp cooling.
摘要翻译：经常需要以高流体速度操作紫外线（UV）水处理系统; 例如当需要低UV剂量时，待处理的水的UV透射率高，或者当使用高强度辐射源时。开放通道UV流体处理系统在高流体速度下的操作导致不相称量的水通过顶灯上方的相对低强度的区域。这导致UV剂量递送不均匀和反应器性能差。在本发明的一个实施例中，通过相对于出口将入口提升到流体处理系统的照射区域，可以最小化通过顶灯上方的水量，从而提高整体系统性能。升降装置可以由通道中的台阶或斜坡组成，或两者的组合。取决于高程的大小，可以获得大约两倍的最大速度的增加。在实践中，必须提供一种手段，以防止在低流量期间暴露的升高的银行的辐射源受到损害。这可以包括当检测到低水位或高温时关闭受影响的灯的机构或灯冷却装置。

6. 发明授权

US06719491B2 Fluid level control system 失效
标题翻译：液位控制系统
公开(公告)号：US06719491B2
公开(公告)日：2004-04-13
申请号：US10067398
申请日：2002-02-07
申请人： Dusko Antonio Kezele , Jason J. Cerny , Alan J. Royce , Fariborz Taghipour , George Traubenberg , Edward P. Kambulow
发明人： Dusko Antonio Kezele , Jason J. Cerny , Alan J. Royce , Fariborz Taghipour , George Traubenberg , Edward P. Kambulow
IPC分类号： E02B740
CPC分类号： E02B7/40 , E02B7/205 , G05D7/0173 , Y10T137/7287
摘要： A fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system includes a gate having a flap portion interconnected to a lever portion. The flap portion is rotatable about a first pivot point. The system further includes a frame which is fixed with respect to the flap portion. A linkage interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point different than the first pivot point. Under changing flow conditions in the channel, the present system operates by both: (i) absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system and a method for controlling the level of a flowing fluid may also use such a fluid level control system.
摘要翻译：液位控制系统，特别适用于控制在开放通道中流动的水位。液位控制系统包括具有互连到杆部分的翼片部分的门。翼片部分可围绕第一枢转点旋转。该系统还包括相对于翼片部分固定的框架。连杆将翼片部分和杆部分互连，并且在与第一枢转点不同的第二枢轴点处连接到框架。在通道中的流动条件变化的情况下，本系统通过以下操作：（i）杠杆部分和翼片部分的绝对运动，以及（ii）杠杆部分和翼片部分之间的相对运动。流体处理系统和用于控制流动流体的水平的方法也可以使用这种液位控制系统。

7. 发明申请

US20130334438A1 RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM 有权
标题翻译：辐射源模块和流体处理系统
公开(公告)号：US20130334438A1
公开(公告)日：2013-12-19
申请号：US13994941
申请日：2011-12-13
申请人： George Traubenberg , Douglas Penhale
发明人： George Traubenberg , Douglas Penhale
IPC分类号： A61L2/10
CPC分类号： A61L2/10 , C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/328
摘要： There is described a radiation source module for use in a fluid treatment system. The radiation source module comprises: a housing having an inlet, an outlet and a fluid treatment zone disposed between. The fluid treatment zone comprises a first wall surface and a second wall surface interconnected by a floor surface. The first wall surface, the second wall surface and the floor surface are configured to receive a flow of fluid through the fluid treatment zone. The radiation source module further comprises at least one radiation source assembly secured with respect to the first wall surface and the second wall surface and a module motive coupling element connected to the housing and configured to be coupled to a module motive element to permit the radiation source module to be installed in and extracted from the fluid treatment system. A fluid treatment system comprising the radiation source module is also described.
摘要翻译：描述了用于流体处理系统的辐射源模块。辐射源模块包括：壳体，其具有设置在其间的入口，出口和流体处理区。流体处理区包括由地板表面互连的第一壁表面和第二壁表面。第一壁表面，第二壁表面和地板表面构造成接收通过流体处理区的流体流。所述辐射源模块还包括相对于所述第一壁表面和所述第二壁表面固定的至少一个辐射源组件和连接到所述壳体的模块运动耦合元件，并且被配置为耦合到模块运动元件以允许所述辐射源模块安装在流体处理系统中并从中提取。还描述了包括辐射源模块的流体处理系统。

8. 发明申请

US20080044320A1 FLUID TREATMENT SYSTEM 有权
标题翻译：流体处理系统
公开(公告)号：US20080044320A1
公开(公告)日：2008-02-21
申请号：US11840590
申请日：2007-08-17
申请人： George Traubenberg , Douglas Penhale , Li-Zheng Ma
发明人： George Traubenberg , Douglas Penhale , Li-Zheng Ma
IPC分类号： B01J19/08
CPC分类号： C02F1/325 , C02F1/008 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2201/326 , C02F2201/328 , C02F2209/42
摘要： There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be “parked” when not in use. In the so-called “parked” position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.
摘要翻译：描述了一种流体处理系统。流体处理系统包括：用于接收流体流的开放通道和流体处理区。所述流体处理区包括多个细长的辐射源组件，其定向成：（i）每个辐射源组件的纵向轴线横向于通过流体处理区域的流体流动的方向，和（ii）每个辐射的末端源组件设置在开放通道中的流体流的预定最大高度之上。第一挡板设置在流体处理区的上游。第一挡板被定位成使得其远端低于开放通道中流体流量的预定最大高度。在优选实施例中，本流体处理系统提供了在不使用时用于辐射源组件的清洁系统可以“停放”的区域。在所谓的“停放”位置，清洁系统可以容易地进行维修等，而不影响通过流体处理区和流体处理系统的流体的流动。这是流体处理系统的显着优点。

9. 发明申请

US20060091326A1 Fluid treatment system and radiation source module for use therein 有权
标题翻译：流体处理系统和辐射源模块
公开(公告)号：US20060091326A1
公开(公告)日：2006-05-04
申请号：US11250473
申请日：2005-10-17
申请人： George Traubenberg , Steven Bakker , Kuang-Ping Chiu
发明人： George Traubenberg , Steven Bakker , Kuang-Ping Chiu
IPC分类号： G21F5/02
CPC分类号： C02F1/325 , B01J19/123 , B01J2219/0877 , C02F2201/3227 , C02F2201/324 , C02F2201/328 , C02F2303/14 , Y10S422/906
摘要： A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source having a source longitudinal axis and a module-to-surface seal disposed on a first elongate surface of the module, the first elongate surface comprising a first longitudinal axis transverse to the source longitudinal axis, the seal operable to provide a substantially fluid tight seal between the first surface and a second surface which is adjacent to the first surface. A fluid treatment system employ the radiation source module is also described.
摘要翻译：辐射源模块，包括支撑构件，连接到所述支撑构件的辐射源组件，所述辐射源组件包括至少一个细长辐射源，所述辐射源组件具有源纵向轴线和模块到表面密封件，所述辐射源组件设置在第一细长表面上所述模块，所述第一细长表面包括横向于所述源纵向轴线的第一纵向轴线，所述密封件可操作以在所述第一表面与邻近所述第一表面的第二表面之间提供基本上流体密封的密封。还描述了采用辐射源模块的流体处理系统。

10. 发明授权

US06646269B1 Radiation source module and cleaning apparatus therefor 失效
标题翻译：辐射源模块及其清洁装置
公开(公告)号：US06646269B1
公开(公告)日：2003-11-11
申请号：US09258142
申请日：1999-02-26
申请人： George Traubenberg , Vivian Francesca Dall'Armi , Steven Mark Bakker
发明人： George Traubenberg , Vivian Francesca Dall'Armi , Steven Mark Bakker
IPC分类号： C02F132
CPC分类号： C02F1/325 , C02F2201/3227 , C02F2201/324
摘要： A cleaning apparatus for a radiation source assembly in a fluid treatment system is described. The cleaning apparatus comprises: a carriage movable with respect to an exterior of the radiation source assembly; at least one cleaning sleeve in sliding engagement with the exterior of the radiation source assembly, the at least one cleaning sleeve being moveable with respect to the carriage; and drive means coupled to the carriage to translate the carriage whereby the at least one cleaning sleeve is translated over the exterior of the radiation source assembly. A radiation source module comprising the cleaning apparatus is also disclosed. The radiation source module is particularly useful for ultraviolet radiation of wastewater while having the advantages of in situ cleaning of the radiation source when it becomes fouled. Radiation source replacement is also facilitated.
摘要翻译：描述了用于流体处理系统中的辐射源组件的清洁装置。清洁装置包括：可相对于辐射源组件的外部移动的托架; 至少一个与所述辐射源组件的外部滑动接合的清洁套筒，所述至少一个清洁套筒可相对于所述托架移动; 以及驱动装置，其联接到滑架以平移滑架，由此至少一个清洁套筒在辐射源组件的外部平移。还公开了一种包括清洁装置的辐射源模块。辐射源模块特别适用于废水的紫外线辐射，同时具有当辐射源成为污垢时原位清洁辐射源的优点。辐射源更换也方便。

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