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1. 发明授权

US07700256B2 Phenolic/alicyclic copolymers and photoresists 有权
标题翻译：酚醛/脂环族共聚物和光致抗蚀剂
公开(公告)号：US07700256B2
公开(公告)日：2010-04-20
申请号：US10313954
申请日：2002-12-06
申请人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
发明人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
摘要翻译：本发明涉及包含苯酚重复单元和含有脂环族基团的光酸不稳定酯的新聚合物，优选适合含有7至约20个碳原子的大体积基团，例如烷基金刚烷基，乙基戊基，三环癸烷基或蒎烷基组。本发明的聚合物可用作化学增效正性抗蚀剂的组分。

2. 发明授权

US06492086B1 Phenolic/alicyclic copolymers and photoresists 有权
标题翻译：酚醛/脂环族共聚物和光致抗蚀剂
公开(公告)号：US06492086B1
公开(公告)日：2002-12-10
申请号：US09414738
申请日：1999-10-08
申请人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
发明人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
IPC分类号： G03F7039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
摘要翻译：本发明涉及包含苯酚重复单元和含有脂环族基团的光酸不稳定酯的新聚合物，优选适合含有7至约20个碳原子的大体积基团，例如烷基金刚烷基，乙基戊基，三环癸烷基或蒎烷基组。本发明的聚合物可用作化学增效正性抗蚀剂的组分。

3. 发明授权

US07674571B2 Laser sensitive lithographic printing plate comprising specific acrylate monomer and initiator 有权
标题翻译：包含特定丙烯酸酯单体和引发剂的激光平版印刷版
公开(公告)号：US07674571B2
公开(公告)日：2010-03-09
申请号：US11638932
申请日：2006-12-13
申请人： Gary Ganghui Teng
发明人： Gary Ganghui Teng
IPC分类号： G03C5/18 , G03F7/00
CPC分类号： G03F7/027 , G03F7/11 , G03F7/38
摘要： High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a substrate a specific photosensitive composition is described. The photosensitive layer comprises a multifunctional (meth)acrylate monomer, a hexaarylbiimidazole compound, and a sensitizing dye. Combination of both multifunctional urethane (meth)acrylate monomer and multifunctional non-urethane (meth)acrylate monomer can be advantageously used. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 1000 μJ/cm2, and then developed either off press or on press.
摘要翻译：描述了在基板上包含特定光敏组合物的高速紫色或紫外线激光平版印刷版。感光层包含多官能（甲基）丙烯酸酯单体，六芳基联咪唑化合物和增感染料。可以有利地使用多官能氨基甲酸酯（甲基）丙烯酸酯单体和多官能非氨基甲酸酯（甲基）丙烯酸酯单体的组合。用紫外线或紫外线激光以小于1000μJ/ cm 2的剂量将板成像曝光，然后按压或按压显影。

4. 发明申请

US20090246697A1 Method of processing overcoated lithographic printing plate 有权
标题翻译：涂布平版印刷版的加工方法
公开(公告)号：US20090246697A1
公开(公告)日：2009-10-01
申请号：US12056256
申请日：2008-03-26
申请人： Gary Ganghui Teng
发明人： Gary Ganghui Teng
IPC分类号： G03F7/12
CPC分类号： G03F7/26 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/14 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24 , G03F7/11 , G03F7/38
摘要： A method of processing an on-press developable lithographic printing plate involves the removal of overcoat by brushing or rubbing while in contact with water or an aqueous solution after imagewise exposure and before on-press development. The plate comprises a substrate, an on-press ink and/or fountain solution developable photosensitive layer, and a water soluble or dispersible overcoat. Preferably, the overcoat is incapable of being completely removed with ink and/or fountain solution on a lithographic press during roll up. Such a method allows the use of more durable overcoat for on-press developable plate.
摘要翻译：一种加工可印刷的平版印刷版的方法涉及通过在成像曝光后和在印刷前显影之前与水或水溶液接触时通过刷涂或摩擦来除去外涂层。板包括基底，印刷油墨和/或润版液显影感光层，以及水溶性或可分散的外涂层。优选地，在卷起期间，外涂层不能用油墨和/或润版液完全除去在平版印刷机上。这种方法允许使用更耐用的外涂层用于印刷显影板。

5. 发明申请

US20090220891A1 Method of on-press developing overcoated lithographic printing plate 有权
标题翻译：印刷机涂布平版印刷版的方法
公开(公告)号：US20090220891A1
公开(公告)日：2009-09-03
申请号：US12041657
申请日：2008-03-03
申请人： Gary Ganghui Teng
发明人： Gary Ganghui Teng
IPC分类号： G03F7/12
CPC分类号： G03F7/3035 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24
摘要： A method of processing an on-press developable lithographic printing plate involving the removal of overcoat after imagewise exposure and before on-press development is described. The plate comprises a substrate, an on-press ink and/or fountain solution developable photosensitive layer, and an overcoat. The laser imaged plate is stripped off the overcoat, and then under a white room light mounted on press and developed with ink and/or fountain solution. Here the plate is capable of hardening upon exposure to a laser, has limited white light stability before the removal of the overcoat, and has significantly improved white light stability after the removal of the overcoat.
摘要翻译：描述了在成像曝光之后和在印刷前显影之前处理涉及去除外涂层的可印刷的可印刷平版印刷版的方法。板包括基底，印刷油墨和/或润版液可显影感光层和外涂层。将激光成像板从外涂层剥离，然后在安装在压机上的白色室内照射并用油墨和/或润版液显影。这里，该板能够在暴露于激光器时硬化，在除去外涂层之前具有有限的白光稳定性，并且在除去外涂层之后显着提高了白光稳定性。

6. 发明授权

US07524615B2 Negative laser sensitive lithographic printing plate having specific photosensitive composition 有权
标题翻译：具有特定光敏组合物的负激光平版印刷版
公开(公告)号：US07524615B2
公开(公告)日：2009-04-28
申请号：US11651319
申请日：2007-01-09
申请人： Gary Ganghui Teng
发明人： Gary Ganghui Teng
IPC分类号： G03C5/18 , G03F7/00
CPC分类号： G03F7/027
摘要： High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises an alkaline soluble polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 300 μJ/cm2, and then developed with an aqueous alkaline developer. Higher monomer to polymer weight ratio is advantageously used. A pigment is preferably incorporated into the photosensitive coating solution as a liquid dispersion. The exposed plate is preferably developed on a processor with an alkaline developer coupled with a replenisher having higher pH.
摘要翻译：描述了在亲水基底上包含特定光敏组合物的高速紫色或紫外线激光平版印刷版。感光层包含碱溶性聚合物粘合剂，多官能（甲基）丙烯酸酯单体，自由基引发剂和增感染料。用紫外线或紫外线激光以小于300μJ/ cm 2的剂量对板进行成像曝光，然后用碱性显影剂水溶液显影。有利地使用更高的单体与聚合物的重量比。优选将颜料作为液体分散体引入感光性涂布液中。曝光的板优选在具有与具有较高pH的补充剂偶联的碱性显影剂的处理器上显影。

7. 发明申请

US20080213700A1 On-press development of high speed laser sensitive lithographic printing plates 失效
公开(公告)号：US20080213700A1
公开(公告)日：2008-09-04
申请号：US12106278
申请日：2008-04-19
申请人： Gary Ganghui Teng
发明人： Gary Ganghui Teng
IPC分类号： G03F7/12
CPC分类号： G03F7/2055 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24 , Y10S430/145 , Y10S430/146
摘要： A method of on-press developing a laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with a laser and on-press developed with ink and/or fountain solution. The exposure and development are performed with the plate under lightings that contain no or substantially no radiation below a wavelength selected from 400 to 650 nm, or in the dark or substantially dark.

8. 发明申请

US20080176171A1 Developing method for laser sensitive lithographic printing plate 有权
标题翻译：激光平版印刷版的开发方法
公开(公告)号：US20080176171A1
公开(公告)日：2008-07-24
申请号：US11873349
申请日：2007-10-16
申请人： Gary Ganghui Teng
发明人： Gary Ganghui Teng
IPC分类号： G03F7/12
CPC分类号： G03F7/40 , G03F7/30
摘要： A method of developing a laser sensitive lithographic printing plate is described. The plate comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with a laser and deactivated under a safe light or in the dark, and then on-press developed with ink and/or fountain solution preferably under white light. Alternatively, the plate is developed off press with ink and/or fountain solution, or with an organic solvent-based or oil-based liquid or paste and/or an aqueous solution, and then mounted on press for lithographic printing.
摘要翻译：描述了一种开发激光平版印刷版的方法。该板在基材上包含可溶于或可分散在油墨和/或润版液中的感光层，并且能够在暴露于激光时硬化。板用激光曝光并在安全的光线或黑暗中停用，然后最好在白光下用油墨和/或润版液进行压制显影。或者，将板用油墨和/或润版液，或与有机溶剂基或油基液体或糊状物和/或水溶液一起冲压，然后安装在压制机上用于平版印刷。

9. 发明申请

US20070172766A1 Laser sensitive lithographic printing plate comprising specific acrylate monomer and initiator 有权
标题翻译：包含特定丙烯酸酯单体和引发剂的激光平版印刷版
公开(公告)号：US20070172766A1
公开(公告)日：2007-07-26
申请号：US11638932
申请日：2006-12-13
申请人： Gary Ganghui Teng
发明人： Gary Ganghui Teng
IPC分类号： G03F7/00
CPC分类号： G03F7/027 , G03F7/11 , G03F7/38
摘要： High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a substrate a specific photosensitive composition is described. The photosensitive layer comprises a multifunctional (meth)acrylate monomer, a hexaarylbiimidazole compound, and a sensitizing dye. Combination of both multifunctional urethane (meth)acrylate monomer and multifunctional non-urethane (meth)acrylate monomer can be advantageously used. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 1000 μJ/cm2, and then developed either off press or on press.
摘要翻译：描述了在基板上包含特定光敏组合物的高速紫色或紫外线激光平版印刷版。感光层包含多官能（甲基）丙烯酸酯单体，六芳基联咪唑化合物和增感染料。可以有利地使用多官能氨基甲酸酯（甲基）丙烯酸酯单体和多官能非氨基甲酸酯（甲基）丙烯酸酯单体的组合。用小于1000μJ/ cm 2的剂量的紫外线或紫外线激光将该平板成像曝光，然后按压或按压显影。

10. 发明授权

US07220486B2 Photoresist compositions 有权
标题翻译：光刻胶组合物
公开(公告)号：US07220486B2
公开(公告)日：2007-05-22
申请号：US10377165
申请日：2003-03-01
申请人： Gary Ganghui Teng , Gary N. Taylor
发明人： Gary Ganghui Teng , Gary N. Taylor
IPC分类号： B32B27/06 , B32B27/18 , B32B27/30 , B32B27/38
CPC分类号： G03F7/085 , G03F7/0392 , G03F7/091 , G03F7/11 , Y10T428/31511 , Y10T428/31515 , Y10T428/3154 , Y10T428/31623 , Y10T428/31935
摘要： New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an adhesion-promoting additive compound. Photoresists of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.
摘要翻译：提供了适用于短波长成像的新型光致抗蚀剂，包括亚300nm和亚200nm，例如193nm和157nm。本发明的光刻胶含有具有光酸不稳定基团的树脂，一种或多种光致酸发生剂化合物和粘合促进添加剂化合物。本发明的光刻胶可以显示出对SiON和其它无机表面层的显着粘着。

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