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    • 7. 发明申请
    • Replaceable plate expanded thermal plasma apparatus and method
    • 可更换板膨胀热等离子体装置及方法
    • US20050051094A1
    • 2005-03-10
    • US10655350
    • 2003-09-05
    • Mark SchaepkensCharles IacovangeloThomas Miebach
    • Mark SchaepkensCharles IacovangeloThomas Miebach
    • C23C16/513H01J37/32C23C16/00
    • C23C16/513H01J37/32009H01J37/32357
    • A deposition process comprises determining a target process condition within a chamber of an expanding thermal plasma generator for plasma enhanced chemical vapor deposition of a coating on a substrate; the generator comprising a cathode, replaceable cascade plate and anode with concentric orifice; and replacing the cascade plate with another plate having a configured orifice to effect the identified target process condition; and generating a plasma at the target process condition by providing a plasma gas to the plasma generator and ionizing the plasma gas in an arc between cathode and anode within the generator and expanding the gas as a plasma onto a substrate in a deposition chamber. A deposition apparatus for generating a controllable plasma; comprises a deposition chamber; adapted to be maintained at subatmospheric pressure; an article support within the deposition chamber; an expanding thermal plasma generator comprising a cathode, a single cascade plate and an anode and a communicating orifice through the cascade plate, the orifice having a length of 1 mm to less than 20 mm.
    • 沉积工艺包括确定膨胀热等离子体发生器的室内的目标工艺条件,用于等离子体增强化学气相沉积在衬底上的涂层; 发电机包括阴极,可更换的级联板和具有同心孔的阳极; 以及用具有配置的孔口的另一个板代替级联板以实现所识别的目标工艺条件; 以及通过向等离子体发生器提供等离子体气体并使等离子体气体在发电机内的阴极和阳极之间的电弧中离子化并且将等离子体气体作为等离子体扩散到沉积室中的衬底上,在目标工艺条件下产生等离子体。 一种用于产生可控等离子体的沉积装置; 包括沉积室; 适应维持在低于大气压的压力下; 沉积室内的物品支撑; 包括阴极,单个级联板和阳极以及通过级联板的连通孔的膨胀热等离子体发生器,该孔具有1mm至小于20mm的长度。