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1. 发明授权

US06521099B1 Periodically clearing thin film plasma processing system 失效
标题翻译：定期清理薄膜等离子体处理系统
公开(公告)号：US06521099B1
公开(公告)日：2003-02-18
申请号：US09669489
申请日：2000-09-25
申请人： Geoffrey Drummond , Richard A. Scholl
发明人： Geoffrey Drummond , Richard A. Scholl
IPC分类号： C23C1434
CPC分类号： H01J37/34 , H01J37/3444
摘要： An enhanced DC plasma processing system which acts to immediately stop current from flowing through the plasma allows a variety of alternative embodiments for varying applications. In one embodiment, a tapped inductor is switched to ground to achieve substantial voltage reversal of about 10% upon detection of an arc condition through voltage and/or rate of voltage change techniques. This reversal of voltage is maintained long enough to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically applying a reverse voltage is effected through a timer system in the power supply.
摘要翻译：用于立即停止电流流过等离子体的增强型DC等离子体处理系统允许用于不同应用的各种替代实施例。在一个实施例中，抽头电感器被切换到地，以通过电压和/或电压变化技术的速率检测到电弧条件时实现大约10％的实质电压反转。电压的这种反转保持足够长以允许在恢复初始驾驶状况之前在等离子体内恢复均匀的电荷密度。用于防止电弧放电的技术包括周期性地施加反向电压通过电源中的定时器系统来实现。

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