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1. 发明申请

US20080020302A1 DEVICE HAVING ETCHED FEATURE WITH SHRINKAGE CARRYOVER 有权
标题翻译：具有收缩特征的设备
公开(公告)号：US20080020302A1
公开(公告)日：2008-01-24
申请号：US11864761
申请日：2007-09-28
申请人： Gary Cao , George Chen , Brandon Ward , Nancy Wheeler , Alan Wong
发明人： Gary Cao , George Chen , Brandon Ward , Nancy Wheeler , Alan Wong
IPC分类号： G03C5/00
CPC分类号： G01N23/225
摘要： In an embodiment of the present invention, a device includes a first etched feature located in a critical dimension scanning electron microscope (CD-SEM) characterization location, the first etched feature having an upper section, a middle section, and a lower section wherein the middle section is severely shrunk relative to a corresponding middle section of a second etched feature having similar dimensions and composition that is not located in a CD-SEM characterization location. In another embodiment of the present invention, the middle section of the first etched feature has a shrinkage carryover exceeding a threshold. In still another embodiment of the present invention, the middle section of the first etched feature exhibits a line edge roughness.
摘要翻译：在本发明的一个实施例中，一种器件包括位于临界尺寸扫描电子显微镜（CD-SEM）表征位置的第一蚀刻特征，第一蚀刻特征具有上部，中间部分和下部，其中中间部分相对于具有类似尺寸和组成的第二蚀刻特征的相应中间部分而严重缩小，该尺寸和组成不位于CD-SEM表征位置。在本发明的另一个实施例中，第一蚀刻特征的中间部分具有超过阈值的收缩滞留。在本发明的另一个实施例中，第一蚀刻特征的中间部分呈现线边缘粗糙度。

2. 发明申请

US20060006328A1 Characterizing resist line shrinkage due to CD-SEM inspection 失效
标题翻译：表征由于CD-SEM检查导致的抗蚀剂线收缩
公开(公告)号：US20060006328A1
公开(公告)日：2006-01-12
申请号：US10886387
申请日：2004-07-07
申请人： Gary Cao , George Chen , Brandon Ward , Nancy Wheeler , Alan Wong
发明人： Gary Cao , George Chen , Brandon Ward , Nancy Wheeler , Alan Wong
IPC分类号： G01N23/00
CPC分类号： G01N23/225
摘要： A CD-SEM (critical dimension-scanning electron microscope) system may utilize a technique for characterizing and reducing shrinkage carryover due to CD-SEM measurements. The system may identify the affects of CD-SEM measurements on the resist and adjust the operating parameters for a particular resist to avoid or significantly reduce shrinkage carryover. In this manner, the system may obtain more reliable CD measurements and avoid damage to the measured feature.
摘要翻译： CD-SEM（临界尺寸扫描电子显微镜）系统可以利用由于CD-SEM测量来表征和减少收缩携带的技术。该系统可以识别CD-SEM测量对抗蚀剂的影响，并调整特定抗蚀剂的操作参数以避免或显着减少收缩残留。以这种方式，系统可以获得更可靠的CD测量并避免损坏所测量的特征。

3. 发明申请

US20070237415A1 Local Processing (LP) of regions of arbitrary shape in images including LP based image capture 审中-公开
标题翻译：图像中任意形状区域的局部处理（LP），包括基于LP的图像捕获
公开(公告)号：US20070237415A1
公开(公告)日：2007-10-11
申请号：US11392203
申请日：2006-03-28
申请人： Gary Cao , George Chen
发明人： Gary Cao , George Chen
IPC分类号： G06K9/40
CPC分类号： H04N1/3871
摘要： Various embodiments of methods, apparatuses, articles of manufacture, and systems for determining one or more regions of one or more images for modification to remove information, through application of one or more criteria to the one or more images, selecting one or more modifications to be made to the one or more determined regions of the one or more images to remove information, the one or more modifications associated with at least one of the one or more criteria, and locally modifying the one or more regions of the one or more images in accordance with the selected one or more modifications to remove information, are described herein. In other embodiments, a plurality of the images taken under different conditions may be combined to form a composite image.
摘要翻译：用于通过对一个或多个图像应用一个或多个标准来确定用于修改以去除信息的一个或多个图像的一个或多个区域的方法，装置，制品和系统的各种实施例，选择一个或多个修改被制成一个或多个图像的一个或多个确定区域以去除信息，与一个或多个标准中的至少一个相关联的一个或多个修改，以及在一个或多个图像中的一个或多个区域进行本地修改根据所选择的一个或多个修改来移除信息，这里描述。在其他实施例中，可以组合在不同条件下拍摄的多个图像以形成合成图像。

4. 发明授权

US07514274B2 Enhanced uniqueness for pattern recognition 失效
公开(公告)号：US07514274B2
公开(公告)日：2009-04-07
申请号：US11005997
申请日：2004-12-06
申请人： Gary Cao , Alan Wong
发明人： Gary Cao , Alan Wong
IPC分类号： G01R31/26 , G01R31/305 , H01L29/00
CPC分类号： G06T7/001 , G06T2207/30148 , H01L22/34
摘要： The present invention describes a test structure with a first set of features which is a subset of product features; and a second set of features adjacent to the first set of features, the second set occupying a smaller area than the first set and the second set being similar to the first set yet being distinguishable from surrounding structures.

5. 发明申请

US20050173634A1 Optical metrology target design for simultaneous measurement of multiple periodic structures 审中-公开
标题翻译：用于同时测量多个周期性结构的光学计量目标设计
公开(公告)号：US20050173634A1
公开(公告)日：2005-08-11
申请号：US11071800
申请日：2005-03-02
申请人： Alan Wong , Gary Cao , Rex Eiserer
发明人： Alan Wong , Gary Cao , Rex Eiserer
IPC分类号： G02B27/46 , G01N23/00
CPC分类号： G02B27/46 , G03F7/70625 , G03F7/70633 , G03F7/70683
摘要： An optical metrology target is provided and has a first periodic structure and a second periodic structure. The first periodic structure has at least two features and a first pitch, and the second periodic structure has at least two features and a second pitch. The optical metrology target is illuminated with a light source, and an optical signal from the optical metrology target is received and analyzed.
摘要翻译：提供光学测量目标并具有第一周期性结构和第二周期性结构。第一周期结构具有至少两个特征和第一间距，并且第二周期结构具有至少两个特征和第二间距。用光源照射光学测量目标，并且接收并分析来自光学计量学目标的光学信号。

6. 发明申请

US20050105792A1 Enhanced uniqueness for pattern recognition 失效
标题翻译：增强模式识别的唯一性
公开(公告)号：US20050105792A1
公开(公告)日：2005-05-19
申请号：US11005997
申请日：2004-12-06
申请人： Gary Cao , Alan Wong
发明人： Gary Cao , Alan Wong
IPC分类号： G06T7/00 , H01L23/544 , G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148 , H01L22/34
摘要： The present invention describes a test structure with a first set of features which is a subset of product features; and a second set of features adjacent to the first set of features, the second set occupying a smaller area than the first set and the second set being similar to the first set yet being distinguishable from surrounding structures.
摘要翻译：本发明描述了具有第一组特征的测试结构，其是产品特征的子集; 以及与所述第一组特征相邻的第二组特征，所述第二组占据比所述第一组更小的面积，并且所述第二组与第一组相似，但是与周围结构可区分。

7. 发明授权

US07211449B2 Enhanced uniqueness for pattern recognition 有权
标题翻译：增强模式识别的唯一性
公开(公告)号：US07211449B2
公开(公告)日：2007-05-01
申请号：US10697825
申请日：2003-10-29
申请人： Gary Cao , Alan Wong
发明人： Gary Cao , Alan Wong
IPC分类号： H01L21/66
CPC分类号： G06T7/001 , G06T2207/30148 , H01L22/34
摘要： The present invention describes a test structure with a first set of features which is a subset of product features; and a second set of features adjacent to the first set of features, the second set occupying a smaller area than the first set and the second set being similar to the first set yet being distinguishable from surrounding structures.
摘要翻译：本发明描述了具有第一组特征的测试结构，其是产品特征的子集; 以及与所述第一组特征相邻的第二组特征，所述第二组占据比所述第一组更小的面积，并且所述第二组与第一组相似，但是与周围结构可区分。

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