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1. 发明申请

US20180007771A1 DROPLET DETECTOR AND EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS 审中-公开
公开(公告)号：US20180007771A1
公开(公告)日：2018-01-04
申请号：US15697915
申请日：2017-09-07
申请人： Gigaphoton Inc.
发明人： Kouichi SATOU , Takayuki YABU , Yoshifumi UENO , Hirokazu HOSODA
IPC分类号： H05G2/00 , H01S3/10
CPC分类号： H05G2/008 , G21K2201/06 , H01S3/10 , H05G2/005 , H05G2/006
摘要： The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.

2. 发明申请

US20160037616A1 EXTREME UV LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发生装置
公开(公告)号：US20160037616A1
公开(公告)日：2016-02-04
申请号：US14879754
申请日：2015-10-09
申请人： Gigaphoton Inc.
发明人： Takashi SAITO , Fumio IWAMOTO , Osamu WAKABAYASHI , Takayuki YABU
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005 , H05G2/006
摘要： An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.
摘要翻译：一种极紫外光发生装置，具备将目标物作为液滴输出到室内的目标供给装置，在所述室内照射激光时产生极紫外光; 液滴测量单元，被配置为测量输出到所述室中的液滴的状态的参数; 压力调节器，被配置为调节所述目标供应器中容纳所述目标的压力; 以及目标产生控制器，其被配置为基于由所述液滴测量单元测量的参数来控制所述压力调节器。

3. 发明申请

US20180284617A1 EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE 审中-公开
公开(公告)号：US20180284617A1
公开(公告)日：2018-10-04
申请号：US16001239
申请日：2018-06-06
申请人： Gigaphoton Inc.
发明人： Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.

4. 发明申请

US20180224746A1 EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE 审中-公开
公开(公告)号：US20180224746A1
公开(公告)日：2018-08-09
申请号：US15941858
申请日：2018-03-30
申请人： Gigaphoton Inc.
发明人： Takayuki YABU
IPC分类号： G03F7/20 , H05G2/00 , G21K1/06
CPC分类号： G03F7/70033 , G03F7/20 , G21K1/062 , H05G2/00 , H05G2/008
摘要： An extreme ultraviolet light generating device may include a chamber in which extreme ultraviolet light is generated from a target supplied to a generation region, a focusing mirror configured to reflect the extreme ultraviolet light by a reflection surface and focus the light at a focal point, a light source unit configured to output illumination light, and a light receiving unit configured to receive reflected light from the target. The reflection surface may be formed in a spheroidal face that defines a first focus at the generation region and a second focus at the focal point. Assuming that a surface formed when an extended line, on the first focus side, of a line segment linking the outer peripheral edge of the reflection surface and the first focus is rotated about an axis passing through the first focus and the second focus is a first limit surface, and a surface formed when the line segment and an extended line on the outer peripheral side are rotated about the axis is a second limit surface, the light source unit and the light receiving unit may be disposed such that at least one of an optical path of the illumination light and an optical path of the reflected light passes through the first focus and is included between the first limit surface and the second limit surface.

5. 发明申请

US20170171955A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT 审中-公开
公开(公告)号：US20170171955A1
公开(公告)日：2017-06-15
申请号：US15430737
申请日：2017-02-13
申请人： GIGAPHOTON INC.
发明人： Yoshifumi UENO , Hirokazu HOSODA , Takayuki YABU
IPC分类号： H05G2/00 , H01S3/10 , H05H1/24 , H01L21/027
CPC分类号： H05G2/008 , G03F7/70033 , H01L21/027 , H01S3/10061 , H05G2/003 , H05G2/006 , H05H1/24 , H05H15/00
摘要： An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.

6. 发明申请

US20140034759A1 TARGET SUPPLY DEVICE AND TARGET SUPPLY METHOD 有权
标题翻译：目标供应装置和目标供应方法
公开(公告)号：US20140034759A1
公开(公告)日：2014-02-06
申请号：US13953350
申请日：2013-07-29
申请人： GIGAPHOTON INC.
发明人： Takayuki YABU , Tamotsu ABE
IPC分类号： G03F7/20
CPC分类号： G03F7/2004 , B05B5/0255 , B05B5/0531 , B05B12/02 , G03F7/70033 , H05G2/003
摘要： A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.
摘要翻译：目标供给方法使用包括具有喷嘴的目标产生单元，具有压力传感器和致动器的压力控制单元，电极，潜在施加单元和定时器的目标供给装置; 此外，该方法包括：通过致动器将目标产生单元内的压力升高到设定压力，在检测到内部的压力的情况下，通过潜在施加单元在电极和目标材料之间施加不同的电位目标产生单元中途升高到设定压力，并且通过潜在施加单元向目标材料施加恒定的第一电位和第一脉冲电压，以在检测到的情况下用静电力提取目标材料目标产生单元内的压力已升至设定压力。

7. 发明申请

US20130209077A1 TARGET SUPPLY APPARATUS AND TARGET SUPPLY METHOD 有权
标题翻译：目标供应装置和目标供应方法
公开(公告)号：US20130209077A1
公开(公告)日：2013-08-15
申请号：US13753324
申请日：2013-01-29
申请人： Gigaphoton Inc.
发明人： Takayuki YABU , Osamu WAKABAYASHI
IPC分类号： F24H1/00
CPC分类号： F24H1/0018 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A target supply apparatus used in an extreme ultraviolet light apparatus that generates extreme ultraviolet light by irradiating a target with a laser beam may include a tank, a nozzle that includes a through-hole and is disposed so that the through-hole communicates with the interior of the tank, a first heater disposed along a wall of the tank, a second heater disposed along a wall of the tank in a position that is further from the nozzle than the first heater, and a control unit configured to control the first heater and the second heater so that a temperature of the first heater is greater than a temperature of the second heater.
摘要翻译：在通过用激光束照射目标物而产生极紫外光的极紫外光装置中使用的目标供给装置可以包括：罐，包括通孔并且设置成使得通孔与内部连通的喷嘴所述第一加热器沿着所述罐的壁布置，所述第二加热器沿着所述罐的壁布置在比所述第一加热器更远离所述喷嘴的位置，以及控制单元，其被配置为控制所述第一加热器和所述第二加热器使得所述第一加热器的温度大于所述第二加热器的温度。

8. 发明申请

US20220232690A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20220232690A1
公开(公告)日：2022-07-21
申请号：US17457342
申请日：2021-12-02
申请人： Gigaphoton Inc.
发明人： Yuichi NISHIMURA , Takayuki YABU , Hiroaki NAKARAI
IPC分类号： H05G2/00 , H01S3/11 , H01S3/13 , H01S3/16
摘要： An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.

9. 发明申请

US20220110205A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20220110205A1
公开(公告)日：2022-04-07
申请号：US17468395
申请日：2021-09-07
申请人： Gigaphoton Inc.
发明人： Takayuki YABU , Yoshifumi UENO
IPC分类号： H05G2/00 , G21K1/06 , G03F7/20
摘要： An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.

10. 发明申请

US20210410262A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20210410262A1
公开(公告)日：2021-12-30
申请号：US17314775
申请日：2021-05-07
申请人： Gigaphoton Inc.
发明人： Yuta TAKASHIMA , Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
IPC分类号： H05G2/00 , G03F7/20
摘要： An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism. The processor stores measurement results of the extreme ultraviolet light energy and the return light energy in association with each of the irradiation positions, limits a shift region of the irradiation position based on comparison between the return light energy and a threshold, and determines a target irradiation position based on the association between the irradiation position and the extreme ultraviolet light energy in a region where the return light energy does not exceed the threshold, and controlling the irradiation position adjustment mechanism in accordance with the target irradiation position.

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