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1. 发明授权

US5252440A Methacrylic resin composition for optical discs 失效
标题翻译：用于光盘的甲基丙烯酸树脂组合物
公开(公告)号：US5252440A
公开(公告)日：1993-10-12
申请号：US866303
申请日：1992-04-13
申请人： Fumio Sato , Yasunori Shimomura , Masaaki Kishimura
发明人： Fumio Sato , Yasunori Shimomura , Masaaki Kishimura
IPC分类号： C08K5/101 , G03C1/00
CPC分类号： C08K5/101 , Y10S430/146
摘要： A methacrylic resin composition for optical discs comprising 100 parts by weight of a copolymer composed of from 95 to 99.7% by weight of methyl methacrylate (A) and from 0.3 to 5% by weight of at least one monomer (B) selected from the group consisting of methyl acrylate, ethyl acrylate and butyl acrylate, and having a heat distortion temperature of at least 95.degree. C., a melt flow rate of from 1.0 to 10.0 g/10 min and a tensile strength of at least 660 kg/cm.sup.2, and from 0.05 to 2.0 parts by weight of at least one releasing agent (C) selected from the group consisting of a fatty acid alkyl ester of the formula R.sub.1 COOR.sub.2 wherein each of R.sub.1 and R.sub.2 is an alkyl group having from 5 to 20 carbon atoms, cetanol and a stearic acid glycerol ester.
摘要翻译：一种用于光盘的甲基丙烯酸树脂组合物，包括100重量份由95至99.7重量％的甲基丙烯酸甲酯（A）和0.3至5重量％的至少一种选自以下的单体（B）的共聚物由丙烯酸甲酯，丙烯酸乙酯和丙烯酸丁酯组成，热变形温度为95℃以上，熔体流动速率为1.0〜10.0g / 10min，拉伸强度为660kg / cm 2以上，和0.05〜2.0重量份的选自由式R 1 COOR 2的脂肪酸烷基酯组成的组中的至少一种脱模剂（C），其中R1和R2各自为具有5至20个碳原子的烷基，鲸蜡醇和硬脂酸甘油酯。

2. 发明授权

US4510279A Methacrylate resin composition for optical information recording medium 失效
标题翻译：用于光学信息记录介质的甲基丙烯酸酯树脂组合物
公开(公告)号：US4510279A
公开(公告)日：1985-04-09
申请号：US405740
申请日：1982-08-06
申请人： Masaaki Kishimura , Nobuyuki Arakawa
发明人： Masaaki Kishimura , Nobuyuki Arakawa
IPC分类号： C08L33/00 , C08L33/02 , C08L33/04 , C08L33/10 , G11B7/24 , G11B7/253 , G11B23/00 , C08L33/12
CPC分类号： G11B23/0092 , C08L33/10
摘要： A methacrylate resin composition for optical information recording medium, excellent in releasability from mold, consisting of (A) 100 parts by weight of a methacrylate resin and (B) 0.1 to 3.0 parts by weight of a surface active agent having a fluoroalkyl group.
摘要翻译：一种用于光学信息记录介质的甲基丙烯酸酯树脂组合物，其具有优异的脱模性，由（A）100重量份的甲基丙烯酸酯树脂和（B）0.1至3.0重量份的具有氟代烷基的表面活性剂组成。

3. 发明申请

US20080268377A1 PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS 有权
标题翻译：生产光催化剂聚合物的方法
公开(公告)号：US20080268377A1
公开(公告)日：2008-10-30
申请号：US12146594
申请日：2008-06-26
申请人： Hitoshi WATANABE , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi WATANABE , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： G03F7/004
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
摘要翻译：具有对应于选自具有内酯骨架的单体（a）的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法，具有通过用酸去除而变得易溶于碱的单体（b）和具有脂环族骨架的单体（c）具有羟基。方法包括（A）含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物的聚合，和（B）通过使用有机溶剂和水来分离聚合中形成的聚合物将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液，其含有对应于上述单体（a），（b）和（c）中的至少一种的重复单元的聚合物，并且金属含量其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb以下。光致抗蚀剂聚合物的金属杂质含量极低。

4. 发明申请

US20050100815A1 Process for the production of high-molecular compounds for photoresist 有权
标题翻译：用于制造光刻胶的高分子化合物的方法
公开(公告)号：US20050100815A1
公开(公告)日：2005-05-12
申请号：US10476211
申请日：2003-03-14
申请人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： C08F6/00 , C08F6/02 , C08F6/06 , G03F7/039 , G03C1/73
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： The process for producing a photoresist polymeric compound of the present invention is characterized by a process for producing a photoresist polymeric compound having a repeated unit corresponding to at least one monomer selected from a monomer (a) having a lactone skeleton, a monomer (b) having a group which becomes soluble in alkali by elimination with an acid and a monomer (c) having an alicyclic skeleton having a hydroxyl group, wherein the process comprises the step of; (i) the polymerization step (A) polymerizing a mixture of monomers containing at least one monomer selected from the above monomers (a), (b) and (c), and the extraction step (B) of extracting a polymer formed in the polymerization by using an organic solvent and water to partition the formed polymer into an organic solvent layer and a metal component as an impurity into an aqueous layer, or (ii) the step (I) passing a polymer solution, which contains a polymer having a repeated unit corresponding to at least one of the above monomers (a), (b) and (c), and a metal content of which is 1000 ppb by weight or less relative to the polymer, through a filter comprising a porous polyolefin membrane having cation-exchange group. The method of the present invention can efficiently provide a photoresist polymeric compound having an impurity content such as metal of extremely low.
摘要翻译：制备本发明的光致抗蚀剂聚合物的方法的特征在于一种制备光致抗蚀剂聚合物的方法，其具有对应于至少一种选自具有内酯骨架的单体（a），单体（b）具有通过用酸去除碱溶性的基团和具有羟基的脂环骨架的单体（c），其中该方法包括以下步骤：（i）聚合步骤（A）聚合含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物和提取步骤（B）通过使用有机溶剂和水将形成的聚合物分解成有机溶剂层和作为杂质的金属组分进入水层进行聚合，或（ii）通过聚合物溶液的步骤（I），所述聚合物溶液含有具有对应于上述单体（a），（b）和（c）中的至少一种的重复单元，其金属含量相对于聚合物为1000ppb以下，通过包含多孔聚烯烃膜的过滤器，所述多孔聚烯烃膜具有阳离子交换基团。本发明的方法可以有效地提供具有非常低的金属杂质含量的光致抗蚀剂聚合物。

5. 发明申请

US20060116494A1 Process for producing photoresist polymeric compounds 审中-公开
公开(公告)号：US20060116494A1
公开(公告)日：2006-06-01
申请号：US11335589
申请日：2006-01-20
申请人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： C08F24/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.

6. 发明授权

US4604416A Methacrylic resin composition 失效
标题翻译：甲基丙烯酸树脂组合物
公开(公告)号：US4604416A
公开(公告)日：1986-08-05
申请号：US681125
申请日：1984-12-13
申请人： Yoshio Nakai , Katsusuke Yamauchi , Masaaki Kishimura , Masamitsu Tateyama
发明人： Yoshio Nakai , Katsusuke Yamauchi , Masaaki Kishimura , Masamitsu Tateyama
IPC分类号： C08K5/103 , C08K5/17 , C08K5/20 , C08K5/521 , C08L33/12 , C08L51/04 , C08K5/06 , C08K5/52
CPC分类号： C08K5/20 , C08K5/103 , C08K5/17 , C08K5/521 , C08L33/12 , C08L51/04 , Y10S260/15 , Y10S260/16 , Y10S260/19
摘要： A methacrylic resin composition having excellent impact resistance and antistatic property is described. This composition comprises (I) 50-99.8 wt. % of a methacrylic resin comprised of 80-100 wt. % of methyl methacrylate units and 0-20 wt. % of other copolymerizable monomer units, (II) 0.1-40 wt. % of a rubbery component which is a polymer containing an elastomeric portion comprising at least 50 wt. % of 1,3-butadiene and/or acrylic acid ester units, and (III) 0.1-10 wt. % of a specified compound.
摘要翻译：描述了具有优异抗冲击性和抗静电性能的甲基丙烯酸树脂组合物。该组合物包含（I）50-99.8wt。％的甲基丙烯酸树脂由80-100wt。％的甲基丙烯酸甲酯单元和0-20wt。％的其它可共聚单体单元，（II）0.1-40wt。％的橡胶组分，其是含有弹性体部分的聚合物，其包含至少50wt。％的1,3-丁二烯和/或丙烯酸酯单元，和（III）0.1-10重量％指定化合物的％。

7. 发明授权

US07816471B2 Process for producing photoresist polymeric compounds 有权
公开(公告)号：US07816471B2
公开(公告)日：2010-10-19
申请号：US12645842
申请日：2009-12-23
申请人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： C08F124/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.

8. 发明授权

US07662897B2 Process for producing photoresist polymeric compounds 有权
公开(公告)号：US07662897B2
公开(公告)日：2010-02-16
申请号：US11335580
申请日：2006-01-20
申请人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： C08F124/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.

9. 发明授权

US07655743B2 Process for producing photoresist polymeric compounds 有权
标题翻译：光致抗蚀剂聚合物的制备方法
公开(公告)号：US07655743B2
公开(公告)日：2010-02-02
申请号：US12146594
申请日：2008-06-26
申请人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： C08F124/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
摘要翻译：具有对应于选自具有内酯骨架的单体（a）的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法，具有通过用酸去除而变得易溶于碱的单体（b）和具有脂环族骨架的单体（c）具有羟基。方法包括（A）含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物的聚合，和（B）通过使用有机溶剂和水来分离聚合中形成的聚合物将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液，其含有具有对应于上述单体（a），（b）和（c）中的至少一种的重复单元的聚合物和金属含量其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb或更小。光致抗蚀剂聚合物的金属杂质含量极低。

10. 发明申请

US20060116493A1 Process for producing photoresist polymeric compounds 有权
标题翻译：光致抗蚀剂聚合物的制备方法
公开(公告)号：US20060116493A1
公开(公告)日：2006-06-01
申请号：US11335580
申请日：2006-01-20
申请人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi Watanabe , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： C08F24/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
摘要翻译：具有对应于选自具有内酯骨架的单体（a）的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法，具有通过用酸去除而变得易溶于碱的单体（b）和具有脂环族骨架的单体（c）具有羟基。方法包括（A）含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物的聚合，和（B）通过使用有机溶剂和水来分离聚合中形成的聚合物将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液，其含有具有对应于上述单体（a），（b）和（c）中的至少一种的重复单元的聚合物和金属含量其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb以下。光致抗蚀剂聚合物的金属杂质含量极低。

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