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    • 4. 发明申请
    • Method of processing solid surface with gas cluster ion beam
    • 用气体簇离子束处理固体表面的方法
    • US20090305507A1
    • 2009-12-10
    • US12312266
    • 2007-10-30
    • Akiko SuzukiAkinobu SatoEmmanuel BourelleJiro MatsuoToshio Seki
    • Akiko SuzukiAkinobu SatoEmmanuel BourelleJiro MatsuoToshio Seki
    • H01L21/308H01L21/302
    • H01L21/3083H01J2237/0812H01L21/3065
    • A solid surface is processed while corner portions of a relief structure are protected from deformation. A method of processing a solid surface with a gas cluster ion beam includes a cluster protection layer formation step of forming, on the solid surface, a relief structure having protrusions with a cluster protection layer formed to cover an upper part thereof and recesses without the cluster protection layer; an irradiation step of emitting a gas cluster ion beam onto the solid surface having the relief structure formed in the cluster protection layer formation step; and a removal step of removing the cluster protection layer. A thickness T of the cluster protection layer satisfies T > nY + ( b 2  Y 2  n - nY 2  ( b 4 - 16  a 2 ) 1 2 2 ) 1 2 , where n is a dose of the gas cluster ion beam, and Y is an etching efficiency of the cluster protection layer, expressed as an etching volume per cluster (a and b are constants).
    • 处理浮雕结构的角部以防止变形的实心表面。 用气体簇离子束处理固体表面的方法包括:簇保护层形成步骤,在固体表面上形成具有突起的浮雕结构,所述突起具有形成为覆盖其上部的簇保护层和没有簇的凹部 保护层; 在所述簇保护层形成工序中形成有具有所述浮雕结构的固体表面上的气体簇离子束的照射工序; 以及去除簇保护层的去除步骤。 簇保护层的厚度T满足T> nY +(b 2 y 2 n n n 2(b 4 - 16 a a 2)1 2 2)1 2,其中n是气体簇的剂量 离子束,Y是簇保护层的蚀刻效率,表示为每簇的蚀刻体积(a和b是常数)。
    • 6. 发明授权
    • Gas cluster-ion irradiation apparatus
    • 气体簇离子照射装置
    • US07405394B2
    • 2008-07-29
    • US11173023
    • 2005-07-05
    • Shigeru OnoShinji SasakiKenji FurusawaJiro MatsuoToshio Seki
    • Shigeru OnoShinji SasakiKenji FurusawaJiro MatsuoToshio Seki
    • B01D59/44
    • H01J37/3053H01J2237/04756H01J2237/0812H01J2237/304
    • In a cluster ion beam irradiation apparatus including an apparatus for measuring size and energy distribution of gas cluster ions by using the time of flight (TOF) mass spectrometry, a unit for applying a retarding voltage is disposed in a stage preceding a TOF measuring instrument including a drift tube and a current measuring instrument. By measuring the size and energy distribution of the gas cluster ions and adjusting ionization conditions, cluster ions having predetermined energy and size are supplied to a work surface. In addition, a product of a pressure in an ion transportation device and an ion transportation length is controlled so as to satisfy the relation P×L≦30/N2/3/E1/2 Pa·m, where N is the size of gas cluster ions used for irradiation, and E is kinetic energy (eV) of the gas cluster ions.
    • 在包括用于通过使用飞行时间(TOF)质谱法测量气体簇离子的尺寸和能量分布的装置的集束离子束照射装置中,在TOF测量仪器之前的阶段中设置用于施加延迟电压的单元,包括 漂移管和电流测量仪器。 通过测量气体团簇离子的尺寸和能量分布并调节电离条件,将具有预定能量和尺寸的簇离子供应到工作表面。 此外,控制离子输送装置中的压力和离子输送长度的乘积,以满足关系式PxL <= 30 / N 2/3 / E 1/2 Pa.m,其中N是用于照射的气体簇离子的大小,E是气体簇离子的动能(eV)。
    • 10. 发明授权
    • Benzopyran compound and its pharmaceutical use
    • 苯并吡喃化合物及其药物用途
    • US5318969A
    • 1994-06-07
    • US897253
    • 1992-06-11
    • Tsutomu YamanakaToshio SekiTohru NakajimaOsamu Yaoka
    • Tsutomu YamanakaToshio SekiTohru NakajimaOsamu Yaoka
    • C07D311/68A61K31/35A61K31/352A61K31/443A61K31/4433A61K31/455A61K31/50A61K31/535A61P9/08A61P9/10A61P9/12A61P25/02C07D311/70C07D311/96C07D405/04C07D405/12C07D407/12C07D409/12
    • C07D405/12C07D311/68C07D407/12
    • A benzopyran compound of the general formula (I) ##STR1## wherein A represents --OR.sup.1 or --NH--COR.sup.2 ; R.sup.3 represents hydrogen, a lower alkyl, a lower alkoxy, amino, a mono- or di-lower alkylamino, an amino-lower alkyl, a hydroxy-lower alkyl, a halo-lower alkyl, a lower alkoxy-lower alkyl, an acyloxy-lower alkyl, a lower alkoxycarbonyl-lower alkyl, an aryl or a heteroaryl, or R.sup.2 and R.sup.3 combinedly together form an alkylene having 1 to 2 carbon atoms; R.sup.4 and R.sup.5 are the same or different, and respectively represent hydrogen or a lower alkyl, or combinedly together form an alkylene having 2 to 5 carbon atoms; R.sup.6 represents hydroxyl group, formyloxy, an alkanoyloxy, a haloalkanoyloxy, a lower alkoxycarbonyloxy, an aroyloxy, a heteroaroyloxy, carbamoyloxy, a mono- or di-lower alkylcarbamoyloxy and R.sup.7 represents hydrogen, or R.sup.6 and R.sup.7 combinedly together form a bond and X and Y are the same or different, and respectively represent hydrogen, halogen, nitro, cyano, a lower alkyl, a lower alkoxy, a halo-lower alkyl, carboxyl, formyl, an alkanoyl, an aroyl, a halo-alkanoyl, carbamoyl, a lower alkylsulfinyl, an arylsulfinyl, a lower alkylsulfonyl, an arylsulfonyl, sulfonamido or a mono- or di-lower alkylsulfonamido, or their pharmaceutically acceptable salts and its pharmaceutical use.
    • 通式(I)的苯并吡喃化合物其中A表示-OR1或-NH-COR2; R 3表示氢,低级烷基,低级烷氧基,氨基,一或二低级烷基氨基,氨基 - 低级烷基,羟基 - 低级烷基,卤代低级烷基,低级烷氧基 - 低级烷基,酰氧基 低级烷基,低级烷氧基羰基 - 低级烷基,芳基或杂芳基,或R2和R3组合在一起形成具有1至2个碳原子的亚烷基; R4和R5相同或不同,分别表示氢或低级烷基,或者组合在一起形成具有2-5个碳原子的亚烷基; R6表示羟基,甲酰氧基,烷酰氧基,卤代烷酰氧基,低级烷氧基羰氧基,芳酰氧基,杂芳氧基,氨基甲酰氧基,一或二低级烷基氨基甲酰氧基,R7表示氢,或R6和R7组合在一起形成键,X和 Y分别相同或不同,分别表示氢,卤素,硝基,氰基,低级烷基,低级烷氧基,卤代低级烷基,羧基,甲酰基,烷酰基,芳酰基,卤代烷酰基,氨基甲酰基, 低级烷基亚磺酰基,芳基亚磺酰基,低级烷基磺酰基,芳基磺酰基,亚磺酰氨基或单 - 或二 - 低级烷基亚磺酰氨基,或其药学上可接受的盐及其药物用途。