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    • 3. 发明授权
    • Epitaxial growth apparatus and epitaxial growth method
    • 外延生长装置和外延生长法
    • US09273414B2
    • 2016-03-01
    • US12945299
    • 2010-11-12
    • Fumihiko KimuraKazuhisa IwanagaTakeshi Masuda
    • Fumihiko KimuraKazuhisa IwanagaTakeshi Masuda
    • C30B25/02C30B29/06C30B25/12
    • C30B29/06C30B25/02C30B25/12
    • An object of the present invention is to provide an epitaxial growth apparatus and an epitaxial growth method that can suppress variation in in-face temperature of a semiconductor wafer caused by deflection of a susceptor and manufacture an epitaxial wafers of high quality. Specifically, the present invention provides an epitaxial growth apparatus for forming an epitaxial film on a semiconductor wafer placed in a chamber having a supply port and an exhaust port for a treatment gas, the apparatus comprising: a susceptor for placing the semiconductor wafer thereon within the chamber; and a susceptor support shaft for supporting the susceptor at an underneath portion of the susceptor, wherein the susceptor support shaft has a support column located substantially coaxial with the center of the susceptor, and at least four support arms extending radially from the top end of the support column with equal intervals therebetween.
    • 本发明的目的是提供一种能够抑制由于感受器的偏转引起的半导体晶片的面内温度变化的外延生长装置和外延生长方法,并且制造高质量的外延晶片。 具体地说,本发明提供了一种用于在放置在具有用于处理气体的供给口和排气口的室中的半导体晶片上形成外延膜的外延生长装置,该设备包括:用于将半导体晶片放置在其内的基座 房间 以及用于将基座支撑在基座的下部的基座支撑轴,其中,所述基座支撑轴具有与所述基座的中心基本同轴的支撑柱,以及从所述基座的顶端径向延伸的至少四个支撑臂 支撑柱之间具有相等的间隔。
    • 9. 发明授权
    • Illumination device, display device, and light guide plate
    • 照明装置,显示装置和导光板
    • US08520164B2
    • 2013-08-27
    • US12599566
    • 2008-07-25
    • Tetsuya UenoTakeshi MasudaYuhsaku Ajichi
    • Tetsuya UenoTakeshi MasudaYuhsaku Ajichi
    • G02F1/1335
    • G02B6/0055G02B6/0028G02B6/0043G02B6/0068G02B6/008
    • An illumination device (30) includes a plurality of light source units (BLU) each having a light guide plate (1) and a plurality of light sources (21). The light guide plate (1) has an illumination region (4) through which incident beams of light from the light sources (21) are emitted outward and a light guide region (3) through which the incident beams of light from the light sources (21) are guided toward the illumination region (4), with the light guide region (3) and the illumination region (4) laid side-by-side. The illumination region (4) is divided into a plurality of light-emitting sections by slit sections (8), provided in such a way as to extend along directions of optical axes of the light sources (21), which restrict transmission of light. At least one of the light sources (21) is provided to each of the light-emitting sections in such a way as to be placed side-by-side along the light guide region (3). Light source units (20) adjacent to each other along the directions of the optical axes of the light sources (21) are disposed so that the illumination region (4) of one of the light source units (BLU) covers at least a part of the light guide region (3) of the other light source unit (BLU). This makes it possible to retain the strength of the illumination device as a combination of light guide blocks while reducing leakage of light into an adjacent area.
    • 照明装置(30)包括多个各自具有导光板(1)和多个光源(21)的光源单元(BLU)。 导光板(1)具有照明区域(4),来自光源(21)的入射光束向外射出的照明区域(4)和来自光源的入射光束(3)的导光区域 21)被引导到照明区域(4),导光区域(3)和照明区域(4)并排放置。 照明区域(4)通过狭缝部分(8)被分成多个发光部分,其设置成沿着光源(21)的光轴的方向延伸,这限制了光的透射。 至少一个光源(21)以沿着导光区域(3)并排放置的方式设置到每个发光部分。 沿着光源(21)的光轴的方向彼此相邻的光源单元(20)被布置成使得光源单元(BLU)中的一个的照明区域(4)覆盖至少一部分 另一光源单元(BLU)的导光区域(3)。 这使得可以将照明装置的强度作为导光块的组合保持,同时减少光泄漏到相邻区域中。