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    • 4. 发明授权
    • Method of bond pad protection during wafer processing
    • 晶圆加工过程中焊盘保护的方法
    • US09443782B1
    • 2016-09-13
    • US14823069
    • 2015-08-11
    • FREESCALE SEMICONDUCTOR, INC.
    • Robert F. SteimleDwight L. DanielsVeera M. Gunturu
    • H01L21/00H01L23/31H01L21/02H01L21/82H01L21/56H01L23/00
    • H01L23/3157H01L21/02013H01L21/50H01L21/561H01L21/6835H01L21/78H01L21/82H01L23/04H01L23/10H01L23/564H01L2221/68377
    • A method for protecting terminal elements on a wafer during wafer level fabrication processes entails applying a protective coating to the terminal elements prior to further processing operations. These processing operations may include back side grinding of the wafer and/or saw-to-reveal operations to expose the terminal elements from a cap wafer of a wafer structure. The protective coating can protect the terminal elements from potentially damaging contaminants, such as debris from the grinding or saw-to-reveal operations. Furthermore, the protective coating can protect the bond pads from coming into contact with a rapidly oxidizing environment when exposed to water. The protective coating may be a hot-water soluble thermoplastic material the melts from a solid form to a liquid form at a relatively low temperature to enable application of the protective coating in liquid form onto the terminal elements and clean removal of the protective coating from the terminal elements.
    • 在晶片级制造过程中保护晶片上的端子元件的方法需要在进一步处理操作之前对端子元件施加保护涂层。 这些处理操作可以包括晶片的背面研磨和/或锯到显示操作,以从晶片结构的盖晶片露出端子元件。 保护涂层可以保护端子元件免受潜在的破坏性污染物,例如磨削或锯切操作中的碎屑。 此外,当暴露于水时,保护涂层可以保护接合垫不与快速氧化环境接触。 保护性涂层可以是热水可溶的热塑性材料,其在相对较低的温度下从固体形式熔化成液体形式,以使得能够将液体形式的保护涂层施加到端子元件上,并将保护涂层从 终端元素。