专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08460748B2 Patterned magnetic bit data storage media and a method for manufacturing the same 失效
标题翻译：图案化磁位数据存储介质及其制造方法
公开(公告)号：US08460748B2
公开(公告)日：2013-06-11
申请号：US12855399
申请日：2010-08-12
申请人： Frank Sinclair , Vikram Singh
发明人： Frank Sinclair , Vikram Singh
IPC分类号： B05D5/12
CPC分类号： G11B5/012 , B82Y10/00 , G11B5/743
摘要： An improved patterned magnetic bit data storage media and a method for manufacturing the same is disclosed. In one particular exemplary embodiment, the improved patterned magnetic bit data storage media may comprise an active region exhibiting substantially ferromagnetism; and an inactive region exhibiting substantially paramagnetism, the inactive region comprising at least two grains and a grain boundary interposed therebetween, wherein each of the at least two grains contain ferromagnetic material, and wherein the at least two grains are antiferromagnetically coupled.
摘要翻译：公开了一种改进的图案化磁位数据存储介质及其制造方法。在一个特定示例性实施例中，改进的图案化磁位数据存储介质可以包括显示出基本上铁磁性的有源区; 和表现出基本上顺磁性的非活性区域，所述非活性区域包含至少两个晶粒和插入其间的晶界，其中所述至少两个晶粒中的每一个含有铁磁材料，并且其中所述至少两个晶粒是反铁磁耦合的。

2. 发明申请

US20110124186A1 APPARATUS AND METHOD FOR CONTROLLABLY IMPLANTING WORKPIECES 有权
标题翻译：用于控制工件的装置和方法
公开(公告)号：US20110124186A1
公开(公告)日：2011-05-26
申请号：US12947078
申请日：2010-11-16
申请人： Anthony Renau , Ludovic Godet , Timothy J. Miller , Joseph C. Olson , Vikram Singh , James Buonodono , Frank Sinclair , Deepak A. Ramappa , Russell Low , Atul Gupta , Kevin M. Daniels
发明人： Anthony Renau , Ludovic Godet , Timothy J. Miller , Joseph C. Olson , Vikram Singh , James Buonodono , Frank Sinclair , Deepak A. Ramappa , Russell Low , Atul Gupta , Kevin M. Daniels
IPC分类号： H01L21/265 , G21K5/10
CPC分类号： B01J19/081 , H01J37/3171 , H01J37/32357 , H01J37/32422 , H01J37/32623 , H01J2237/0453 , H01J2237/1205 , H01L21/2236 , H01L31/022425 , H01L31/068 , H01L31/08 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.
摘要翻译：等离子体处理装置包括等离子体源，其被配置为在等离子体室中产生等离子体，使得等离子体包含用于注入工件的离子。该装置还包括聚焦板装置，该聚焦板装置具有孔结构，其被配置为修改离开聚焦板附近的等离子体鞘的等离子体鞘的形状，使得离开孔结构的孔的离子限定聚焦离子。该设备还包括处理室，其包含与聚焦板间隔开的工件，使得在工件处的聚焦离子的固定注入区域基本上比孔更窄。该装置被配置为通过在离子注入期间扫描工件来在工件中产生多个图案化区域。

3. 发明授权

US09567691B2 Melt purification and delivery system 有权
标题翻译：熔体净化和输送系统
公开(公告)号：US09567691B2
公开(公告)日：2017-02-14
申请号：US12487119
申请日：2009-06-18
申请人： Peter L. Kellerman , Frank Sinclair , Frederick Carlson , Julian G. Blake
发明人： Peter L. Kellerman , Frank Sinclair , Frederick Carlson , Julian G. Blake
IPC分类号： C01B33/02 , C30B11/00 , C01B33/037 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/40 , C30B29/60
CPC分类号： C30B11/003 , C01B33/037 , C30B11/001 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/406 , C30B29/60
摘要： An apparatus to purify a melt is disclosed. A first portion of a melt in a chamber is frozen in a first direction. A fraction of the first portion is melted in the first direction. A second portion of the melt remains frozen. The melt flows from the chamber and the second portion is removed from the chamber. The freezing concentrates solutes in the melt and second portion. The second portion may be a slug with a high solute concentration. This system may be incorporated into a sheet forming apparatus with other components such as, for example, pumps, filters, or particle traps.
摘要翻译：公开了一种净化熔体的设备。室中的熔体的第一部分在第一方向上被冷冻。第一部分的一部分在第一方向熔化。熔体的第二部分保持冷冻。熔体从腔室流出，第二部分从腔室中移出。冷冻浓缩物溶解在熔体和第二部分中。第二部分可以是高溶质浓度的塞子。该系统可以结合到具有其它部件例如泵，过滤器或颗粒捕集器的片材成形设备中。

4. 发明授权

US08519353B2 Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam 有权
标题翻译：围绕离子束的中心射线轨迹控制非对称静电透镜的方法和装置
公开(公告)号：US08519353B2
公开(公告)日：2013-08-27
申请号：US12981096
申请日：2010-12-29
申请人： Svetlana Radovanov , Peter L. Kellerman , Frank Sinclair , Robert C. Lindberg
发明人： Svetlana Radovanov , Peter L. Kellerman , Frank Sinclair , Robert C. Lindberg
IPC分类号： H01J1/88 , H01J3/18 , H01J3/38 , G21K1/06
CPC分类号： H01J37/12 , H01J37/15 , H01J37/3171 , H01J2237/121 , H01J2237/151
摘要： A method of controlling deflection of a charged particle beam in an electrostatic lens includes establishing a symmetrical electrostatic lens configuration comprising a plurality of electrodes disposed at unadjusted positions that are symmetric with respect to the central ray trajectory with applied unadjusted voltages that create fields symmetric with respect to the central ray trajectory. A symmetric electric field is calculated corresponding to the set of unadjusted voltages. A plurality of lower electrodes is arranged at adjusted positions that are asymmetric with respect to the central ray trajectory. A set of adjusted voltages is obtained for the plurality of lower electrodes, wherein the set of adjusted voltages corresponds to a set of respective potentials of the symmetric electric field at respective adjusted asymmetric positions. The adjusted voltages are applied to the asymmetric lens configuration when the charged particle beam passes therethrough.
摘要翻译：控制带电粒子束在静电透镜中的偏转的方法包括建立对称静电透镜配置，其包括设置在相对于中心射线轨迹对称的未调整位置的多个电极，其中施加的未调节电压产生对称的场到中心射线轨迹。对应于未调整电压组的对称电场。多个下电极被布置在相对于中心射线轨迹不对称的调整位置处。对于多个下电极获得一组调整的电压，其中所述一组调整的电压对应于在各自调整的非对称位置处的对称电场的各个电位的集合。当带电粒子束通过时，经调整的电压施加到非对称透镜构型。

5. 发明申请

US20120168622A1 SYSTEM AND METHOD FOR PRODUCING A MASS ANALYZED ION BEAM 审中-公开
标题翻译：用于生产质量分析离子束的系统和方法
公开(公告)号：US20120168622A1
公开(公告)日：2012-07-05
申请号：US12981002
申请日：2010-12-29
申请人： Victor M. Benveniste , Frank Sinclair , Svetlana Radovanov , Bon-Woong Koo
发明人： Victor M. Benveniste , Frank Sinclair , Svetlana Radovanov , Bon-Woong Koo
IPC分类号： H01J49/30
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/20 , H01J49/30 , H01J2237/055 , H01J2237/057 , H01J2237/20221
摘要： An implantation system includes an ion extraction plate having a set of apertures configured to extract ions from an ion source to form a plurality of beamlets. A magnetic analyzer is configured to provide a magnetic field to deflect ions in the beamlets in a first direction that is generally perpendicular to a principle axis of the beamlets. A mass analysis plate includes a set of apertures wherein first ion species having a first mass/charge ratio are transmitted through the mass analysis plate and second ion species having a second mass/charge ratio are blocked by the mass analysis plate. A workpiece holder is configured to move with respect to the mass analysis plate in a second direction perpendicular to the first direction, wherein a pattern of ions transmitted through the mass analysis plate forms a continuous ion beam current along the first direction at the substrate.
摘要翻译：植入系统包括具有一组孔口的离子提取板，其被配置为从离子源提取离子以形成多个子束。磁分析器被配置为提供磁场，以在大体上垂直于子束的主轴的第一方向上偏转子束中的离子。质量分析板包括一组孔，其中具有第一质量/荷率的第一离子种类通过质量分析板传输，具有第二质量/荷重比的第二离子种被质量分析板阻挡。工件保持器构造成在与第一方向垂直的第二方向上相对于质量分析板移动，其中通过质量分析板传输的离子图案在衬底处沿着第一方向形成连续的离子束电流。

6. 发明授权

US08188448B2 Temperature controlled ion source 有权
标题翻译：温度控制离子源
公开(公告)号：US08188448B2
公开(公告)日：2012-05-29
申请号：US12754381
申请日：2010-04-05
申请人： Victor Benveniste , Bon-Woong Koo , Shardul Patel , Frank Sinclair
发明人： Victor Benveniste , Bon-Woong Koo , Shardul Patel , Frank Sinclair
IPC分类号： G21K5/10
CPC分类号： H01J37/3171 , H01J37/08 , H01J2237/002
摘要： An ion source is provided that utilizes the same dopant gas supplied to the chamber to generate the desired process plasma to also provide temperature control of the chamber walls during high throughput operations. The ion source includes a chamber having a wall that defines an interior surface. A liner is disposed within the chamber and has at least one orifice to supply the dopant gas to an inside of the chamber. A gap is defined between at least a portion of the interior surface of the chamber wall and the liner. A first conduit is configured to supply dopant gas to the gap where the dopant gas has a flow rate within the gap. A second conduit is configured to remove the dopant gas from the gap, wherein the flow rate of the dopant gas within the gap acts as a heat transfer media to regulate the temperature of the interior of the chamber.
摘要翻译：提供了一种离子源，其利用提供给腔室的相同掺杂剂气体来产生所需的工艺等离子体，以在高通量操作期间提供室壁的温度控制。离子源包括具有限定内表面的壁的室。衬套设置在腔室内并且具有至少一个孔口以将掺杂剂气体供应到腔室的内部。在室壁的内表面的至少一部分和衬垫之间限定间隙。第一管道被配置为向掺杂剂气体在间隙内具有流速的间隙提供掺杂剂气体。第二导管构造成从间隙去除掺杂剂气体，其中间隙内的掺杂剂气体的流速用作传热介质以调节室内部的温度。

7. 发明申请

US20120088035A1 PLATEN CONTROL 有权
标题翻译：板控制
公开(公告)号：US20120088035A1
公开(公告)日：2012-04-12
申请号：US13270644
申请日：2011-10-11
申请人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan , Antonella Cucchetti
发明人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan , Antonella Cucchetti
IPC分类号： C23C14/48 , B21C51/00
CPC分类号： H01L21/67109 , H01L21/67288
摘要： A system and method for maintain a desired degree of platen flatness is disclosed. A laser system is used to measure the flatness of a platen. The temperature of the platen is then varied to achieve the desired level of flatness. In some embodiments, this laser system is only used during a set up period and the resulting desired temperature is then used during normal operation. In other embodiments, a laser system is used to measure the flatness of the platen, even while the workpiece is being processed.
摘要翻译：公开了一种用于保持期望的压板平整度的系统和方法。激光系统用于测量压板的平整度。然后改变压板的温度以达到所需的平坦度水平。在一些实施例中，该激光系统仅在建立周期期间使用，然后在正常操作期间使用所得到的期望温度。在其他实施例中，即使在正在处理工件时，也使用激光系统来测量压板的平坦度。

8. 发明授权

US08110815B2 Vapor delivery to devices under vacuum 失效
标题翻译：在真空下蒸气输送到设备
公开(公告)号：US08110815B2
公开(公告)日：2012-02-07
申请号：US12299702
申请日：2007-06-11
申请人： Frank Sinclair , Douglas R. Adams , Brent M. Copertino
发明人： Frank Sinclair , Douglas R. Adams , Brent M. Copertino
IPC分类号： H01J37/08
CPC分类号： C23C14/48 , C23C14/228 , H01J37/02 , H01J37/32412 , H01J2237/006 , H01J2237/022 , H01J2237/08 , H01J2237/31701
摘要： Providing vapor to a vapor-receiving device housed in a high vacuum chamber. An ion beam implanter, as an example, has a removable high voltage ion source within a high vacuum chamber and a vapor delivery system that delivers vapor to the ion source and does not interfere with removal of the ion source for maintenance. For delivering vapor to a vapor-receiving device, such as the high voltage ion source under vacuum, a flow interface device is in the form of a thermally conductive valve block. A delivery extension of the interface device automatically connects and disconnects within the high vacuum chamber with the removable vapor receiving device by respective installation and removal motions. In an ion implanter, the flow interface device or valve block and source of reactive cleaning gas are mounted in a non-interfering way on the electrically insulating bushing that insulates the ion source from the vacuum housing and the ion source may be removed without disturbing the flow interface device. Multiple vaporizers for solid material, provisions for reactive gas cleaning, and provisions for controlling flow are provided in the flow interface device.
摘要翻译：向容纳在高真空室中的蒸汽接收装置提供蒸汽。作为示例，离子束注入机在高真空室内具有可移除的高电压离子源，以及将蒸气输送到离子源并且不干扰离子源的去除以进行维护的蒸气输送系统。为了将蒸汽输送到蒸汽接收装置，例如在真空下的高压离子源，流动接口装置是导热阀块的形式。接口设备的传送延伸部通过相应的安装和移除动作，利用可移除的蒸气接收装置自动地在高真空室内连接和断开。在离子注入机中，流动界面装置或阀块和反应性清洁气体源以非干扰的方式安装在电绝缘衬套上，该电绝缘衬套使离子源与真空壳体绝缘，并且离子源可被去除而不会干扰流接口设备。在流体接口装置中提供了用于固体材料的多个蒸发器，用于反应性气体清洁的设备和用于控制流量的设备。

9. 发明授权

US08064071B2 Floating sheet measurement apparatus and method 有权
标题翻译：浮动片测量装置及方法
公开(公告)号：US08064071B2
公开(公告)日：2011-11-22
申请号：US12403200
申请日：2009-03-12
申请人： Christopher A. Rowland , Peter L. Kellerman , Frank Sinclair , Julian G. Blake , Nicholas P. T. Bateman
发明人： Christopher A. Rowland , Peter L. Kellerman , Frank Sinclair , Julian G. Blake , Nicholas P. T. Bateman
IPC分类号： G01B11/14
CPC分类号： G01B21/12
摘要： A sheet measurement apparatus has a sheet disposed in a melt. The measurement system uses a beam to determine a dimension of the sheet. This dimension may be, for example, height or width. The beam may be, for example, collimated light, a laser, x-rays, or gamma rays. The production of the sheet may be altered based on the measurements.
摘要翻译：片材测量装置具有设置在熔体中的片材。测量系统使用光束来确定纸张的尺寸。该尺寸可以是例如高度或宽度。光束可以是例如准直光，激光，X射线或γ射线。可以基于测量来改变片材的生产。

10. 发明申请

US20110240847A1 TRANSMISSION ENERGY CONTAMINATION DETECTOR 有权
标题翻译：传输能源污染检测器
公开(公告)号：US20110240847A1
公开(公告)日：2011-10-06
申请号：US12750893
申请日：2010-03-31
申请人： Frank Sinclair
发明人： Frank Sinclair
IPC分类号： H01J49/00
CPC分类号： H01J37/244 , H01J37/304 , H01J37/3171 , H01J2237/24507 , H01J2237/24585 , H01J2237/30472 , H01J2237/31703
摘要： An energy contamination detection apparatus includes a membrane and a charge collection plate disposed at a distance from the membrane. The membrane is configured to receive an ion beam and allow a portion of the ion beam having energy levels above a desired energy level to pass therethrough toward the charge collection plate and absorb or reflect portions of the ion beam having energy levels at or below the desired energy level. A voltage source is electrically coupled to the charge collection plate for providing a bias voltage to the charge collection plate. A detection circuit is coupled to the charge collection plate and is configured to detect energy contamination based on an amount of charge collected on the charge collection plate.
摘要翻译：能量污染检测装置包括设置在与膜隔开一定距离处的膜和电荷收集板。膜被配置为接收离子束并且允许具有高于期望能级的能量级的一部分离子束通过其中朝向电荷收集板，并吸收或反射具有等于或低于期望值的能级的离子束的部分能级。电压源电耦合到电荷收集板，用于向电荷收集板提供偏置电压。检测电路耦合到电荷收集板，并且被配置为基于在电荷收集板上收集的电荷量来检测能量污染。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式