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1. 发明申请

US20100154835A1 CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS 有权
标题翻译：半导体加工系统的清洁
公开(公告)号：US20100154835A1
公开(公告)日：2010-06-24
申请号：US12298727
申请日：2007-04-26
申请人： Frank Dimeo , James Dietz , Karl W. Olander , Robert Kaim , Steven Bishop , Jeffrey W. Neuner , Jose Arno , Paul J. Marganski , Joseph D. Sweeney , David Eldridge , Sharad Yedave , Oleg Byl , Gregory T. Stauf
发明人： Frank Dimeo , James Dietz , Karl W. Olander , Robert Kaim , Steven Bishop , Jeffrey W. Neuner , Jose Arno , Paul J. Marganski , Joseph D. Sweeney , David Eldridge , Sharad Yedave , Oleg Byl , Gregory T. Stauf
IPC分类号： B08B5/00
CPC分类号： C23C14/564 , C23C16/4405 , H01J37/32412 , H01J37/32862
摘要： A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF2, XeF4, XeF6, NF3, IF5, IF7, SF6, C2F6, F2, CF4, KrF2, Cl2, HCl, ClF3, ClO2, N2F4, N2F2, N3F, NFH2, NH2F, HOBr, Br2, C3F8, C4F8, C5F8, CHF3, CH2F2, CH3F, COF2, HF, C2HF5, C2H2F4, C2H3F3, C2H4F2, C2H5F, C3F6, and organochlorides such as COCl2, CCl4, CHCl3, CH2Cl2 and CH3Cl.
摘要翻译：一种清洁残留物的方法和装置，用于制造微电子装置中使用的半导体处理系统的组件。为了有效地除去残留物，将组分与气相反应性材料接触足够的时间和足够的条件以至少部分地除去残余物。当残留物和构成组分的材料不同时，气相反应性材料与残余物选择性反应，并与构成离子注入机的组分的材料具有最低的反应性。当残留物和构成组分的材料相同时，气相反应性材料可以与残留物和组分部分反应。使用的特别优选的气相反应性材料包括气态化合物如XeF 2，XeF 4，XeF 6，NF 3，IF 5，IF 7，SF 6，C 2 F 6，F 2，CF 4，KrF 2，Cl 2，HCl，ClF 3，ClO 2，N 2 F 4，N 2 F 2，N 3 F，，NH2F，HOBr，Br2，C3F8，C4F8，C5F8，CHF3，CH2F2，CH3F，COF2，HF，C2HF5，C2H2F4，C2H3F3，C2H4F2，C2H5F，C3F6和有机氯化物，如COCl2，CCl4，CHCl3，CH2Cl2和CH3Cl。

2. 发明授权

US08603252B2 Cleaning of semiconductor processing systems 有权
标题翻译：半导体处理系统的清洁
公开(公告)号：US08603252B2
公开(公告)日：2013-12-10
申请号：US12298727
申请日：2007-04-26
申请人： Frank Dimeo , James Dietz , W. Karl Olander , Robert Kaim , Steven Bishop , Jeffrey W. Neuner , Jose Arno , Paul J. Marganski , Joseph D. Sweeney , David Eldridge , Sharad Yedave , Oleg Byl , Gregory T. Stauf
发明人： Frank Dimeo , James Dietz , W. Karl Olander , Robert Kaim , Steven Bishop , Jeffrey W. Neuner , Jose Arno , Paul J. Marganski , Joseph D. Sweeney , David Eldridge , Sharad Yedave , Oleg Byl , Gregory T. Stauf
IPC分类号： B08B7/00
CPC分类号： C23C14/564 , C23C16/4405 , H01J37/32412 , H01J37/32862
摘要： A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF2, XeF4, XeF6, NF3, IF5, IF7, SF6, C2F6, F2, CF4, KrF2, Cl2, HCl, ClF3, ClO2, N2F4, N2F2, N3F, NFH2, NH2F, HOBr, Br2, C3F8, C4F8, C5F8, CHF3, CH2F2, CH3F, COF2, HF, C2HF5, C2H2F4, C2H3F3, C2H4F2, C2H5F, C3F6, and organochlorides such as COCl2, CCl4, CHCl3, CH2Cl2 and CH3Cl.
摘要翻译：一种清洁残留物的方法和装置，用于制造微电子装置中使用的半导体处理系统的组件。为了有效地除去残留物，将组分与气相反应性材料接触足够的时间和足够的条件以至少部分地除去残余物。当残留物和构成组分的材料不同时，气相反应性材料与残余物选择性反应，并与构成离子注入机的组分的材料具有最低的反应性。当残留物和构成组分的材料相同时，气相反应性材料可以与残留物和组分部分反应。使用的特别优选的气相反应性材料包括气态化合物如XeF 2，XeF 4，XeF 6，NF 3，IF 5，IF 7，SF 6，C 2 F 6，F 2，CF 4，KrF 2，Cl 2，HCl，ClF 3，ClO 2，N 2 F 4，N 2 F 2，N 3 F，，NH2F，HOBr，Br2，C3F8，C4F8，C5F8，CHF3，CH2F2，CH3F，COF2，HF，C2HF5，C2H2F4，C2H3F3，C2H4F2，C2H5F，C3F6和有机氯化物，如COCl2，CCl4，CHCl3，CH2Cl2和CH3Cl。

3. 发明申请

US20050257828A1 In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration 失效
标题翻译：用于以预定浓度输送稀释气体的原位气体混合和稀释系统
公开(公告)号：US20050257828A1
公开(公告)日：2005-11-24
申请号：US10402759
申请日：2003-03-28
申请人： Jose Arno , James Dietz
发明人： Jose Arno , James Dietz
IPC分类号： G01N21/35 , H01L21/66 , G05D11/00
CPC分类号： H01L22/20 , G01N21/3504 , Y10T137/0329 , Y10T137/2509 , Y10T137/87676
摘要： Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.
摘要翻译：用于将稀释的活性流体递送到半导体制造工厂的下游有源流体消耗处理单元的装置和方法。输送系统包括主动流体源，稀释液流体源，用于以预定流速分配活性流体的流体流量计量装置，设置成混合来自主动流体源的活性气体的混合器，该活性气体以预定流量分配通过流体流量计量装置利用稀释液形成稀释的活性流体混合物，以及监测器，其布置成测量稀释的活性流体混合物中活性流体的浓度，并且响应地调节流体流量计量装置以控制分配速率的活性流体，并且在稀释的活性流体混合物中保持预定浓度的活性流体。

4. 发明申请

US20060237061A1 In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration 有权
公开(公告)号：US20060237061A1
公开(公告)日：2006-10-26
申请号：US11453700
申请日：2006-06-15
申请人： Jose Arno , James Dietz
发明人： Jose Arno , James Dietz
IPC分类号： G05D11/13
CPC分类号： H01L22/20 , G01N21/3504 , Y10T137/0329 , Y10T137/2509 , Y10T137/87676
摘要： Apparatus and method for delivery of dilute active fluid, e.g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

5. 发明授权

US06716271B1 Apparatus and method for inhibiting decomposition of germane 有权
标题翻译：用于抑制锗烷分解的装置和方法
公开(公告)号：US06716271B1
公开(公告)日：2004-04-06
申请号：US10282377
申请日：2002-10-29
申请人： Jose Arno , Edward Sturm , Luping Wang , James Dietz
发明人： Jose Arno , Edward Sturm , Luping Wang , James Dietz
IPC分类号： B01D5304
CPC分类号： B01D53/04 , B01D2253/102 , B01D2259/40083 , B01D2259/40086 , B01D2259/40088 , B01D2259/4525 , Y10S95/901
摘要： A germane storage and dispensing system, in which germane gas is sorptively retained on an activated carbon sorbent medium in a vessel containing adsorbed and free germane gas. The activated carbon sorbent medium is deflagration-resistant in relation to the germane gas adsorbed thereon, i.e., under deflagration conditions of 65° C. and 650 torr, under which free germane gas undergoes deflagration, the activated carbon sorbent medium does not sustain deflagration of the adsorbed germane gas or thermally desorb the germane gas so that it undergoes subsequent deflagration. The deflagration-resistance of the activated carbon sorbent medium is promoted by pre-treatment of the sorbent material to remove extraneous sorbables therefrom and by maintaining the fill level of the sorbent medium in the gas storage and dispensing vessel at a substantial value, e.g., of at least 30%.
摘要翻译：锗烷存储和分配系统，其中将锗烷气体吸附保留在含有吸附和游离的锗烷气体的容器中的活性炭吸附剂介质上。活性炭吸附剂介质相对于其上吸附的锗烷气体，即在65℃和650托的爆燃条件下，具有爆燃阻力，在此条件下，游离的锗烷气体经历爆燃，活性炭吸附剂介质不能保持爆燃吸附的锗烷气体或热解吸锗烷气体，使其经历随后的爆燃。通过预处理吸附剂材料来促进活性炭吸附剂介质的防爆性，以从其中除去外来的吸附物，并且通过将吸附剂介质在气体储存和分配容器中的填充水平保持在基本值，例如至少30％。

6. 发明申请

US20080006775A1 INFRARED GAS DETECTION SYSTEMS AND METHODS 审中-公开
标题翻译：红外检测系统和方法
公开(公告)号：US20080006775A1
公开(公告)日：2008-01-10
申请号：US11767382
申请日：2007-06-22
申请人： Jose Arno , Paul Marganski , Robert Hillas , Steven Lurcott , Glenn Tom
发明人： Jose Arno , Paul Marganski , Robert Hillas , Steven Lurcott , Glenn Tom
IPC分类号： G01N21/00
CPC分类号： G01N21/05 , G01N21/3504 , G01N2021/178 , G01N2021/317 , G01N2201/0846
摘要： Thermopile-based detection and monitoring/control systems are described, in applications such as inferring concentration of a multicomponent gas by sensing a tracer gas therein, utilizing fiber optic cables to provide multiple sensing paths in a cell, utilizing a modulated IR source switched in on/off cycles, verifying chemical reagent identities, and sensing of effluent following discharge from a contamination removal 8 element or cold trap. A thermopile infrared (TPIR) detector of highly compact character is described for such applications, and permits monitoring of species that may be problematic or otherwise deleterious in such environments. In one implementation, light source modulation and signal processing techniques are employed to improve signal to noise ratio and minimize calibration and complexity of the TPIR detector.
摘要翻译：在基于热电堆检测和监测/控制系统的应用中，例如通过在其中感测示踪气体来推断多组分气体的浓度，利用光纤缆线在单元中提供多个感测路径，利用开启的调制IR源 /关闭循环，验证化学试剂标识，以及从排除污染物8元素或冷阱排出后的污染物检测。对于这种应用描述了具有高度紧密特性的热电堆红外（TPIR）检测器，并且允许监视在这种环境中可能是有问题或其它有害的物种。在一个实施方案中，采用光源调制和信号处理技术来提高信噪比并最小化TPIR检测器的校准和复杂性。

7. 发明申请

US20070200065A1 MONITORING SYSTEM COMPRISING INFRARED THERMOPILE DETECTOR 有权
标题翻译：包含红外热敏探测器的监测系统
公开(公告)号：US20070200065A1
公开(公告)日：2007-08-30
申请号：US11555094
申请日：2006-10-31
申请人： Jose Arno
发明人： Jose Arno
IPC分类号： G01J5/02
CPC分类号： G01N21/3504 , G01J3/32 , G01J3/427 , G01N21/05 , G01N21/15 , G01N21/85 , G01N2021/151 , G01N2021/8411 , H01L21/67253
摘要： The present invention relates to a semiconductor processing system that employs infrared-based thermopile detector for process control, by analyzing a material of interest, based on absorption of infrared light at a characteristic wavelength by such material. Specifically, an infrared light beam is transmitted through a linear transmission path from an infrared light source through a sampling region containing material of interest into the thermopile detector. The linear transmission path reduces the risk of signal loss during transmission of the infrared light. The transmission path of the infrared light may comprise a highly smooth and reflective inner surface for minimizing such signal loss during transmission.
摘要翻译：本发明涉及一种采用基于红外线热电堆检测器进行过程控制的半导体处理系统，通过利用这种材料对特征波长的红外光的吸收来分析感兴趣的材料。具体地说，将红外光束从红外光源通过包含感兴趣的材料的采样区域传送到热电堆检测器的线性传输路径。线性传输路径降低了红外光传输期间信号丢失的风险。红外光的传输路径可以包括高度平滑和反射的内表面，用于在传输期间最小化这种信号损失。

8. 发明申请

US20060012794A1 Optical sensor system and method for detection of hydrides and acid gases 审中-公开
标题翻译：光学传感器系统和检测氢化物和酸性气体的方法
公开(公告)号：US20060012794A1
公开(公告)日：2006-01-19
申请号：US11230409
申请日：2005-09-20
申请人： Jose Arno
发明人： Jose Arno
IPC分类号： G01N21/00
CPC分类号： G01N21/78
摘要： A gas sensor for detection of hydride and/or acid gas species, featuring a color changing material that changes color in exposure to hydride and/or acid gas species, component(s) for impinging radiation on the color changing material for reflection therefrom, and component(s) for receiving reflected radiation from the color changing material and responsively generating an output upon a change of color of the color changing material indicative of a presence of hydride and/or acid gas species in gas contacting the color changing material. The gas sensor may be embodied in a compact and efficient probe assembly, utilizing optical fibers to transmit incident radiation to the color changing material and to transmit reflected radiation to a detector and signal processing circuitry.
摘要翻译：一种用于检测氢化物和/或酸性气体种类的气体传感器，其特征在于在暴露于氢化物和/或酸性气体物质时改变颜色的变色材料，用于将变色材料上的辐射照射的组分用于反射，以及用于接收来自颜色变化材料的反射辐射的部件，并且响应于颜色变化材料的颜色变化而响应地产生指示在与变色材料接触的气体中存在氢化物和/或酸性气体物质的输出。气体传感器可以体现在紧凑且有效的探针组件中，利用光纤将入射辐射传输到变色材料并将反射的辐射传输到检测器和信号处理电路。

9. 发明申请

US20050246107A1 Photometrically modulated delivery of reagents 有权
标题翻译：光度调制递送试剂
公开(公告)号：US20050246107A1
公开(公告)日：2005-11-03
申请号：US11157760
申请日：2005-06-21
申请人： Jose Arno
发明人： Jose Arno
IPC分类号： G01N21/35 , H01L21/66 , G06F19/00 , G01N31/00
CPC分类号： H01L22/20 , G01N21/3504
摘要： A process system adapted for processing of or with a material therein. The process system includes: a sampling region for the material; an infrared photometric monitor constructed and arranged to transmit infrared radiation through the sampling region and to responsively generate an output signal correlative of the material in the sampling region, based on its interaction with the infrared radiation; and process control means arranged to receive the output of the infrared photometric monitor and to responsively control one or more process conditions in and/or affecting the process system.
摘要翻译：一种适于处理其中或与其中的材料一起的过程系统。处理系统包括：材料的采样区域; 红外测光监测器，其构造和布置成基于其与红外辐射的相互作用，将红外辐射透射通过采样区域并且响应地产生与采样区域中的材料相关的输出信号; 以及过程控制装置，其布置成接收红外测光监视器的输出并且响应地控制处理系统中的一个或多个处理条件和/或影响处理系统。

10. 发明申请

US20050109207A1 Method and apparatus for the recovery of volatile organic compounds and concentration thereof 审中-公开
标题翻译：用于回收挥发性有机化合物及其浓度的方法和装置
公开(公告)号：US20050109207A1
公开(公告)日：2005-05-26
申请号：US10720398
申请日：2003-11-24
申请人： W. Olander , Jose Arno
发明人： W. Olander , Jose Arno
IPC分类号： B01D53/047 , B01D53/02
CPC分类号： B01D53/0476 , B01D2253/102 , B01D2257/708 , B01D2258/0216 , B01D2259/40009 , B01D2259/40056 , B01D2259/402 , Y02A50/235
摘要： A gas recovery apparatus and method for reclaiming and concentrating volatile organic compounds from the effluent of a semiconductor manufacturing operation is described. Vacuum Swing Adsorption is used to treat effluent containing volatile organic compounds to reversibly capture and subsequently release the volatile organic compounds, followed by recycle and/or cogeneration of the captured volatile organic compounds.
摘要翻译：描述了从半导体制造操作的流出物中回收和浓缩挥发性有机化合物的气体回收装置和方法。真空摆动吸附用于处理含有挥发性有机化合物的流出物，以可逆捕获和随后释放挥发性有机化合物，随后捕获的挥发性有机化合物的再循环和/或热电联产。

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