专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130265557A1 TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL 有权
标题翻译： EUV RETICLE检验工具的温度控制
公开(公告)号：US20130265557A1
公开(公告)日：2013-10-10
申请号：US13857278
申请日：2013-04-05
申请人： Frank Chilese , Daniel Wack , Douglas Fowler
发明人： Frank Chilese , Daniel Wack , Douglas Fowler
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , G01N2021/95676 , G03F1/22 , G03F1/84 , G03F7/70875 , G03F7/70891
摘要： An apparatus comprises an optics assembly and a plate. The optics assembly configured to focus light from an EUV source onto a reticle or sensor. The plate has an opening to allow the EUV light to pass through disposed between the optics assembly and the reticle or sensor. The plate is cooled to a temperature less than that of the reticle or sensor. The plate is engineered to balance out heat absorbed from the reticle or sensor with heat absorbed by the plate. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：一种装置包括光学组件和板。光学组件被配置为将来自EUV源的光聚焦到掩模版或传感器上。该板具有允许EUV光穿过设置在光学组件和光罩或传感器之间的开口。将板冷却至比标线片或传感器的温度低的温度。该板被设计成平衡来自掩模版或传感器的热量被板吸收的热量。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

2. 发明授权

US09164388B2 Temperature control in EUV reticle inspection tool 有权
标题翻译： EUV光罩检测工具的温度控制
公开(公告)号：US09164388B2
公开(公告)日：2015-10-20
申请号：US13857278
申请日：2013-04-05
申请人： Frank Chilese , Daniel Wack , Douglas Fowler
发明人： Frank Chilese , Daniel Wack , Douglas Fowler
IPC分类号： G03B27/32 , G03B27/42 , G03F7/20 , G03F1/84 , G03F1/22
CPC分类号： G03F7/20 , G01N2021/95676 , G03F1/22 , G03F1/84 , G03F7/70875 , G03F7/70891
摘要： An apparatus comprises an optics assembly and a plate. The optics assembly configured to focus light from an EUV source onto a reticle or sensor. The plate has an opening to allow the EUV light to pass through disposed between the optics assembly and the reticle or sensor. The plate is cooled to a temperature less than that of the reticle or sensor. The plate is engineered to balance out heat absorbed from the reticle or sensor with heat absorbed by the plate. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：一种装置包括光学组件和板。光学组件被配置为将来自EUV源的光聚焦到掩模版或传感器上。该板具有允许EUV光穿过设置在光学组件和光罩或传感器之间的开口。将板冷却至比标线片或传感器的温度低的温度。该板被设计成平衡来自掩模版或传感器的热量被板吸收的热量。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

3. 发明申请

US20140036333A1 MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION 有权
标题翻译：反复检查中的多重EUV来源
公开(公告)号：US20140036333A1
公开(公告)日：2014-02-06
申请号：US13563850
申请日：2012-08-01
申请人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
发明人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
IPC分类号： G02B26/08
CPC分类号： G02B26/123 , G01N21/8806 , G01N2021/95676 , G01N2201/105 , G03F1/24 , G03F1/84 , G03F7/7005
摘要： The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
摘要翻译：本公开涉及一种照明系统。照明系统可以包括可围绕旋转轴线旋转的基座构件和沿着基座构件的周边设置在基座构件的外表面上的多个反射镜。反射镜可以以预定角度定向。照明系统还包括至少两个照明源。第一多个反射镜的每个反射镜被配置为在第一时间在每个反射镜的第一部分处接收来自第一照明源的辐射。镜被配置为将辐射反射到光路。每个反射镜被进一步配置成在第二时间在反射镜的第二部分处接收来自第二照明光源的辐射。反射镜将从第二照明源的辐射反射到公共光路。

4. 发明授权

US08917432B2 Multiplexing EUV sources in reticle inspection 有权
标题翻译：在掩模版检查中复用EUV源
公开(公告)号：US08917432B2
公开(公告)日：2014-12-23
申请号：US13563850
申请日：2012-08-01
申请人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
发明人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
IPC分类号： G02B26/08 , G03F7/20 , G02B26/12
CPC分类号： G02B26/123 , G01N21/8806 , G01N2021/95676 , G01N2201/105 , G03F1/24 , G03F1/84 , G03F7/7005
摘要： The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
摘要翻译：本公开涉及一种照明系统。照明系统可以包括可围绕旋转轴线旋转的基座构件和沿着基座构件的周边设置在基座构件的外表面上的多个反射镜。反射镜可以以预定角度定向。照明系统还包括至少两个照明源。第一多个反射镜的每个反射镜被配置为在第一时间在每个反射镜的第一部分处接收来自第一照明源的辐射。镜被配置为将辐射反射到光路。每个反射镜被进一步配置成在第二时间在反射镜的第二部分处接收来自第二照明光源的辐射。反射镜将从第二照明源的辐射反射到公共光路。

5. 发明授权

US09244368B2 Particle control near reticle and optics using showerhead 有权
标题翻译：使用喷头在光罩附近进行粒子控制
公开(公告)号：US09244368B2
公开(公告)日：2016-01-26
申请号：US14033929
申请日：2013-09-23
申请人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
发明人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , G03F1/00
CPC分类号： G03F7/70841 , G03F1/0092 , G03F1/84 , G03F7/70916 , G03F7/70933
摘要： A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal diffusers in the form of showerheads to provide a continual flow of clean gas. The main showerhead bathes the reticle surface to be inspected in smoothly flowing, low pressure gas, isolating it from particles coming from surrounding volumes. The secondary showerhead faces away from the reticle and toward the EUV illumination and projection optics, supplying them with purge gas while at the same time creating a buffer zone that is kept free of any particle contamination originating from those optics.
摘要翻译：介绍了一种保护标线片免受光化性EUV标线检查工具中的颗粒和化学物质的方法和设备。该方法和装置利用一对淋浴喷头形式的多孔金属扩散器来提供清洁气体的连续流动。主喷头用平滑流动的低压气体将掩模版表面沐浴，将其与周围体积的颗粒隔离。二次淋浴头面向远离掩模版并朝向EUV照明和投影光学元件，为其提供吹扫气体，同时创建一个缓冲区，保持没有源自这些光学元件的任何颗粒污染。

6. 发明授权

US07050170B2 Apparatus and method for maintaining uniform and stable temperature for cavity enhanced optical spectroscopy 有权
标题翻译：用于保持均匀和稳定的腔体增强光谱的温度的装置和方法
公开(公告)号：US07050170B2
公开(公告)日：2006-05-23
申请号：US10625231
申请日：2003-07-22
申请人： Frank Chilese , Bernard Fidric
发明人： Frank Chilese , Bernard Fidric
IPC分类号： G01N21/61
CPC分类号： G01J3/42 , G01J3/0286 , G01N21/39
摘要： An enclosure for a cavity enhanced optical spectroscopy instrument provides a highly temperature stable environment by positioning the instrument optical cavity away from the enclosure walls and providing a wall mounted heat pump, fan and heat exchanger. The fan causes the gas contained within the enclosure to circulate over the heat exchanger and in a laminar, non-turbulent flow path along interior wall surfaces of the enclosure thereby maintaining the optical cavity in a temperature and vibration stable zone.
摘要翻译：用于空腔增强型光谱仪的外壳通过将仪器光学腔放置在外壳壁上并提供壁式安装的热泵，风扇和热交换器来提供高度温度稳定的环境。风扇使得包封在外壳内的气体在热交换器和沿着外壳的内壁表面的层流非湍流流动路径中循环，从而将光学腔保持在温度和振动稳定的区域。

7. 发明授权

US08414688B1 Recirculation high purity system for protecting optical modules or inspection system during storage, transport and shipping 有权
标题翻译：循环高纯度系统，用于在储存，运输和运输过程中保护光学模块或检查系统
公开(公告)号：US08414688B1
公开(公告)日：2013-04-09
申请号：US13160878
申请日：2011-06-15
申请人： Gildardo Delgado , Frank Chilese , Rudolf Brunner
发明人： Gildardo Delgado , Frank Chilese , Rudolf Brunner
IPC分类号： B01D46/00
CPC分类号： B08B9/08
摘要： A purging apparatus for a storage chamber is disclosed. The purging apparatus is configured for establishing a purge gas flow through the storage chamber. The purging apparatus may include a gas purifier and a particle filter. The gas purifier may provide a purge gas to the storage chamber. The purge gas may flow through the storage chamber, and a mixture of the purge gas and potential contaminants may subsequently exit the storage chamber as exhaust gas. The particle filter may receive and filter the exhaust gas. The filtered gas may be provided to the gas purifier for purification and recirculation. The gas purifier may purify the filtered gas by substantially removing at least one of: an acid, a base, an organic compound, water or oxygen from the filtered gas. The purified filtered gas may then be recirculated and provided to the storage chamber as the purge gas.
摘要翻译：公开了一种用于储存室的清洗装置。清洗装置构造成用于建立通过储存室的净化气体流。吹扫装置可以包括气体净化器和颗粒过滤器。气体净化器可以向储存室提供净化气体。净化气体可以流过储存室，并且吹扫气体和潜在污染物的混合物随后可以作为废气排出存储室。颗粒过滤器可以接收和过滤废气。可以将过滤的气体提供给气体净化器以进行净化和再循环。气体净化器可以通过从过滤的气体中基本上除去酸，碱，有机化合物，水或氧中的至少一种来净化过滤的气体。净化的过滤气体然后可再循环，并作为净化气体提供给储存室。

8. 发明申请

US20050018193A1 Apparatus and method for maintaining uniform and stable temperature for cavity enhanced optical spectroscopy 有权
标题翻译：用于保持均匀和稳定的腔体增强光谱的温度的装置和方法
公开(公告)号：US20050018193A1
公开(公告)日：2005-01-27
申请号：US10625231
申请日：2003-07-22
申请人： Frank Chilese , Bernard Fidric
发明人： Frank Chilese , Bernard Fidric
IPC分类号： G01J3/42 , G01N21/39 , G01N21/00
CPC分类号： G01J3/42 , G01J3/0286 , G01N21/39
摘要： An enclosure for a cavity enhanced optical spectroscopy instrument provides a highly temperature stable environment by positioning the instrument optical cavity away from the enclosure walls and providing a wall mounted heat pump, fan and heat exchanger. The fan causes the gas contained within the enclosure to circulate over the heat exchanger and in a laminar, non-turbulent flow path along interior wall surfaces of the enclosure thereby maintaining the optical cavity in a temperature and vibration stable zone.
摘要翻译：用于空腔增强型光谱仪的外壳通过将仪器光学腔放置在外壳壁上并提供壁式安装的热泵，风扇和热交换器来提供高度温度稳定的环境。风扇使得包封在外壳内的气体在热交换器和沿着外壳的内壁表面的层流非湍流流动路径中循环，从而将光学腔保持在温度和振动稳定的区域。

9. 发明申请

US20140085618A1 PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD 有权
标题翻译：使用SHOWERHEAD的附近的粒子控制和光学
公开(公告)号：US20140085618A1
公开(公告)日：2014-03-27
申请号：US14033929
申请日：2013-09-23
申请人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
发明人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
IPC分类号： G03F7/20
CPC分类号： G03F7/70841 , G03F1/0092 , G03F1/84 , G03F7/70916 , G03F7/70933
摘要： A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal diffusers in the form of showerheads to provide a continual flow of clean gas. The main showerhead bathes the reticle surface to be inspected in smoothly flowing, low pressure gas, isolating it from particles coming from surrounding volumes. The secondary showerhead faces away from the reticle and toward the EUV illumination and projection optics, supplying them with purge gas while at the same time creating a buffer zone that is kept free of any particle contamination originating from those optics.
摘要翻译：介绍了一种保护标线片免受光化性EUV标线检查工具中的颗粒和化学物质的方法和设备。该方法和装置利用一对淋浴喷头形式的多孔金属扩散器来提供清洁气体的连续流动。主喷头用平滑流动的低压气体将掩模版表面沐浴，将其与周围体积的颗粒隔离。二次淋浴头面向远离掩模版并朝向EUV照明和投影光学元件，为其提供吹扫气体，同时创建一个缓冲区，保持没有源自这些光学元件的任何颗粒污染。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式