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1. 发明授权

US5814588A Aqueous alkali cleaning compositions 失效
标题翻译：水性碱洗组合物
公开(公告)号：US5814588A
公开(公告)日：1998-09-29
申请号：US617606
申请日：1996-03-19
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： C11D1/58 , C11D1/722 , C11D1/835 , C11D3/10 , H05K3/26 , C11D3/28 , C11D3/37
CPC分类号： C11D1/58 , C11D1/835 , C11D3/10 , C11D1/722 , H05K3/26
摘要： Aqueous alkali cleaning compositions containing an alkali metal salt, an N-alkyl pyrrolidone derivative, and specific ethylene oxide/propylene oxide block copolymers having molecular weights of from about 1500 to about 2500. Such compositions can be employed as an aqueous concentrate or solution to clean a substrate such as a circuit board, wiring board or metal surface. Specific ethylene oxide/propylene oxide block copolymers protect plastic parts from corrosion by N-alkyl pyrrolidone derivatives without compromising N-alkyl pyrrolidone derivative cleaning ability.
摘要翻译：含有碱金属盐，N-烷基吡咯烷酮衍生物和分子量为约1500至约2500的特定环氧乙烷/环氧丙烷嵌段共聚物的碱性水洗涤组合物。这种组合物可用作浓缩水或溶液以清洁诸如电路板，布线板或金属表面的基板。特定的环氧乙烷/环氧丙烷嵌段共聚物可保护塑料部件免受N-烷基吡咯烷酮衍生物的腐蚀，而不影响N-烷基吡咯烷酮衍生物的清洗能力。

2. 发明授权

US5755893A Flux removing compositions 失效
标题翻译：助焊剂去除组合物
公开(公告)号：US5755893A
公开(公告)日：1998-05-26
申请号：US874593
申请日：1997-06-13
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： H05K3/26 , B08B3/02 , B08B3/08
CPC分类号： H05K3/26 , H05K2203/0793
摘要： An aqueous flux removing composition is provided comprising alkali metal carbonate salts, an alkali metal silicate corrosion inhibitor and a surfactant formulation which comprises an N-alkylpyrrolidone. The N-alkylpyrrolidone is added in amounts sufficient to permit significantly faster cleaning speeds.
摘要翻译：提供了含有碱金属碳酸盐，碱金属硅酸盐腐蚀抑制剂和包含N-烷基吡咯烷酮的表面活性剂制剂的水性助焊剂去除组合物。加入的N-烷基吡咯烷酮的量足以使显着更快的清洗速度。

3. 发明授权

US5821208A Aqueous cleaner for removing solder pastes 失效
标题翻译：用于清除焊膏的水性清洁剂
公开(公告)号：US5821208A
公开(公告)日：1998-10-13
申请号：US718865
申请日：1996-09-24
申请人： Francis R. Cala , Richard A. Reynolds , Eric E. Eichhorn
发明人： Francis R. Cala , Richard A. Reynolds , Eric E. Eichhorn
IPC分类号： B08B3/08 , C11D1/00 , C11D1/44 , C11D1/52 , C11D1/72 , C11D1/722 , C11D1/78 , C11D1/825 , C11D3/08 , C11D3/10 , C11D11/00 , H05K3/12 , H05K3/26 , H05K3/34
CPC分类号： C11D1/825 , B08B3/08 , C11D1/8255 , C11D11/0047 , C11D3/08 , C11D3/10 , H05K3/26 , C11D1/002 , C11D1/44 , C11D1/523 , C11D1/72 , C11D1/722 , C11D1/78 , H05K2203/0793 , H05K3/1233 , H05K3/3484
摘要： Printing applicators such as metal stencils and screens used to apply solder paste to printed circuit boards are cleaned to remove accumulated solder paste therefrom by an aqueous alkaline salt cleaner. The aqueous cleaner of the present invention comprises alkaline salts such as alkali metal carbonates, a surfactant formulation which contains at least one nonionic surfactant, an alkali metal silicate corrosion inhibitor and stabilizers to maintain the components in aqueous solution. The cleaner of the present invention contains no VOCs and is an effective and safe replacement for alcohol solvents previously used to clean solder paste from screens and stencils.
摘要翻译：清洁用于将印刷电路板用于涂敷焊膏的金属模板和屏幕的印刷施加器用碱性盐水清洁剂从其中除去积聚的焊膏。本发明的含水清洁剂包括碱金属盐如碱金属碳酸盐，含有至少一种非离子表面活性剂的表面活性剂制剂，碱金属硅酸盐腐蚀抑制剂和将组分保持在水溶液中的稳定剂。本发明的清洁剂不含VOC，并且是先前用于从筛网和模板清洁焊膏的醇溶剂的有效和安全的替代物。

4. 发明授权

US5688753A Flux removing composition 失效
标题翻译：助焊剂去除组合物
公开(公告)号：US5688753A
公开(公告)日：1997-11-18
申请号：US668148
申请日：1996-06-21
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： C11D1/58 , C11D1/72 , C11D1/835 , C11D3/02 , C11D3/08 , C11D3/28 , C11D11/00 , H05K3/26 , C11D1/83
CPC分类号： C11D3/046 , C11D1/72 , C11D1/835 , C11D11/0047 , C11D3/08 , C11D3/28 , H05K3/26 , C11D1/58 , H05K2203/0793
摘要： An aqueous flux removing composition is provided comprising alkali metal carbonate salts, an alkali metal silicate corrosion inhibitor and a surfactant formulation which comprises an N-alkylpyrrolidone. The N-alkylpyrrolidone is added in amounts sufficient to permit significantly faster cleaning speeds.
摘要翻译：提供了含有碱金属碳酸盐，碱金属硅酸盐腐蚀抑制剂和包含N-烷基吡咯烷酮的表面活性剂制剂的水性助焊剂去除组合物。 N-烷基吡咯烷酮的添加量足以使显着更快的清洗速度。

5. 发明授权

US5558109A Aqueous cleaning method and composition with nonionic surfactants for removing water soluble flux 失效
标题翻译：水性清洗方法和组合物用非离子表面活性剂去除水溶性助焊剂
公开(公告)号：US5558109A
公开(公告)日：1996-09-24
申请号：US391015
申请日：1995-02-21
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： B08B3/08 , C11D1/72 , C11D1/825 , C11D3/00 , C11D3/02 , H05K3/26 , B08B3/02 , C11D1/83
CPC分类号： C11D3/046 , B08B3/08 , C11D1/825 , C11D3/0073 , H05K3/26 , C11D1/72 , H05K2203/0793
摘要： A cleaning composition for removing water soluble flux residues from circuit assemblies comprises a surfactant formulation containing three nonionic surfactants which have cloud points which differ by at least 5.degree. F. from each other so as to provide optimum cleaning performance over a broadened temperature range. The surfactant formulation is preferably in the form of an aqueous concentrate which further contains alkaline salts, a corrosion inhibitor, a carboxylated polymer stabilizer to maintain the corrosion inhibitor in solution and a hydrotrope to maintain the surfactants in solution.
摘要翻译：用于从电路组件中除去水溶性助焊剂残余物的清洁组合物包括含有三个非离子表面活性剂的表面活性剂制剂，其具有彼此相差至少5°F的浊点，以便在扩大的温度范围内提供最佳的清洁性能。表面活性剂配制剂优选为水性浓缩物的形式，其进一步含有碱性盐，腐蚀抑制剂，羧基化聚合物稳定剂以保持溶液中的腐蚀抑制剂，以及水溶助长剂将表面活性剂保持在溶液中。

6. 发明授权

US5958144A Flux-removing aqueous cleaning composition and method of use 失效
标题翻译：助焊剂去除水清洗组合物及其使用方法
公开(公告)号：US5958144A
公开(公告)日：1999-09-28
申请号：US859080
申请日：1997-05-20
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： C11D1/00 , C11D1/58 , C11D3/10 , C11D3/43 , C11D11/00 , H01L21/48 , H05K3/26 , B08B3/02 , B08B3/08 , C11D1/825
CPC分类号： H01L21/4835 , C11D1/004 , C11D1/58 , C11D11/0047 , C11D3/10 , C11D3/43 , H01L21/4864 , H01L21/4892 , H05K3/26 , H05K2203/0793
摘要： A flux-removing, aqueous cleaning composition contains: (A) a solvent phase consisting essentially of water; and (B) a flux-removing phase containing an alkaline salt component and a surfactant formulation, the alkaline salt component containing at least one alkali metal salt, and the surfactant formulation containing at least one fluorinated surfactant and at least one N-alkylpyrrolidone surfactant. A method of removing rosin flux residues from a substrate, preferably a substrate of an electronic circuit assembly, involves (a) cleaning the substrate with the above-described aqueous cleaning composition for a period of time sufficient to substantially emulsify the soldering rosin flux residues to form emulsified rosin flux residues; and (b) removing the emulsified rosin flux residues from the substrate.
摘要翻译：助熔剂除去水性清洗组合物含有：（A）基本上由水组成的溶剂相; 和（B）含有碱性盐组分和表面活性剂组分的助熔剂除去相，所述碱性盐组分含有至少一种碱金属盐，所述表面活性剂组合物含有至少一种氟化表面活性剂和至少一种N-烷基吡咯烷酮表面活性剂。从基底（优选电子电路组件的基底）去除松香助焊剂残留物的方法包括（a）用上述水性清洁组合物清洗基底一段足以使焊接松香助焊剂残留物乳化的时间形成乳化松香助焊剂残渣; 和（b）从基材除去乳化的松香助焊剂残留物。

7. 发明授权

US5932021A Aqueous cleaning composition for removing flux and method of use 失效
标题翻译：用于除去助焊剂的水性清洁组合物及其使用方法
公开(公告)号：US5932021A
公开(公告)日：1999-08-03
申请号：US859081
申请日：1997-05-20
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： C11D1/00 , C11D3/10 , C11D3/28 , C11D11/00 , B08B3/08 , B08B3/02
CPC分类号： C11D1/004 , C11D11/0047 , C11D3/10 , C11D3/28
摘要： A flux-removing, aqueous cleaning composition contains: (A) a solvent phase consisting essentially of water; and (B) a flux-removing phase containing an alkaline salt component and a surfactant formulation, the alkaline salt component containing at least one alkali metal salt, and the surfactant formulation containing at least one fluorinated, nonionic surfactant. A method of removing rosin flux residues from a substrate, preferably a substrate of an electronic circuit assembly, involves (a) cleaning the substrate with the above-described aqueous cleaning composition for a period of time sufficient to substantially emulsify the soldering rosin flux residues to form emulsified rosin flux residues; and (b) removing the emulsified rosin flux residues from the substrate.
摘要翻译：助熔剂除去水性清洗组合物含有：（A）基本上由水组成的溶剂相; 和（B）含有碱金属盐成分和表面活性剂制剂的助熔剂除去相，所述碱性盐成分含有至少一种碱金属盐，所述表面活性剂配方含有至少一种氟化非离子表面活性剂。从基底（优选电子电路组件的基底）去除松香助焊剂残留物的方法包括（a）用上述水性清洁组合物清洗基底一段足以使焊接松香助焊剂残留物乳化的时间形成乳化松香助焊剂残渣; 和（b）从基材除去乳化的松香助焊剂残留物。

8. 发明授权

US5849683A Aqueous cleaning composition for cleaning substrates and method of using same 失效
标题翻译：用于清洁基材的水性清洁组合物及其使用方法
公开(公告)号：US5849683A
公开(公告)日：1998-12-15
申请号：US851850
申请日：1997-05-06
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： C11D1/10 , C11D1/72 , C11D1/83 , C11D17/00 , C11D1/94
CPC分类号： C11D1/83 , C11D17/0004 , C11D1/10 , C11D1/72
摘要： An alkaline aqueous cleaning composition for cleaning a substrate contaminated with industrial-type soil contaminants contains (i) an aqueous portion and (ii) an active-ingredient portion composed of (A) an alkalinity-providing agent and (B) a surfactant mixture containing (a) an active concentration of an ethoxylated C.sub.9-11 alkanol surfactant having an HLB value at 25.degree. C. of from about 10 to about 12 and (b) an active concentration of at least one aminocarboxylic acid surfactant of the general formula: R--N(H)--R', (I) wherein R is a straight or branched chain aliphatic organic group having from 10 to 20 carbon atoms, and R' is a straight or branched chain carboxylic acid having from 1 to 7 carbon atoms. At an active-concentration ratio of surfactant (a) to surfactant (b) of about 2.5:1, the surfactants have a synergistic effect on the cleaning composition's ability to remove certain types of industrial soil contaminants from the substrate. Cleaning of the substrate with the aqueous cleaning composition involves contacting the substrate with the composition for a period of time sufficient to remove at least a substantial portion of the contaminants from the substrate.
摘要翻译：用于清洁被工业型污染污染物污染的基质的碱性水性清洁组合物包含（i）水性部分和（ii）由（A）碱性提供剂组成的活性成分部分和（B）含有（a）HLB值在25℃下的约10至约12的乙氧基化C 9-11链烷醇表面活性剂的活性浓度和（b）至少一种通式为RN的氨基羧酸表面活性剂的活性浓度：RN （H）-R'，（I）其中R是具有10-20个碳原子的直链或支链脂族有机基团，R'是具有1至7个碳原子的直链或支链羧酸。表面活性剂（a）与表面活性剂（b）的活性 - 浓度比为约2.5:1，表面活性剂对清洁组合物从基材中除去某些类型的工业污垢污染物的能力具有协同效应。用含水清洁组合物清洗基材包括使基材与组合物接触足以从基材中去除至少大部分污染物的时间。

9. 发明授权

US5789363A Aqueous alkaline cleaning composition containing surfactant mixture of N-octyl-2-pyrrolidone and N-coco-beta-aminocarboxylic (C.sub.2 -C.sub.4) acid for cleaning substrates and method of using same 失效
标题翻译：含有用于清洁底物的N-辛基-2-吡咯烷酮和N-椰油-β-氨基羧酸（C 2 -C 4）酸的表面活性剂混合物的水性碱性清洁组合物及其使用方法
公开(公告)号：US5789363A
公开(公告)日：1998-08-04
申请号：US852065
申请日：1997-05-06
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： C11D1/10 , C11D1/58 , C11D1/65 , C11D3/28 , C11D11/00 , C11D1/88 , C11D1/94
CPC分类号： C11D11/0041 , C11D1/10 , C11D1/65 , C11D3/28 , C11D1/58
摘要： An alkaline aqueous cleaning composition for cleaning a substrate, e.g., a plastic or metal substrate, contaminated with industrial-type soil contaminants contains (i) an aqueous portion and (ii) an active-ingredient portion composed of (A) an alkalinity-providing agent and (B) a surfactant mixture containing (a) an active concentration of an N-octyl-2-pyrrolidone surfactant and (b) an active concentration of at least one aminocarboxylic acid surfactant such as N-coco-beta-aminopropionic acid. The active-concentration ratio of surfactant (a) to surfactant (b) is such as to provide the cleaning composition with the ability to remove a substantial portion of the contaminants from the substrate. At an active-concentration ratio of surfactant (a) to surfactant (b) of about 2.5:1, the surfactants have a synergistic effect on the industrial-soil-removing ability of the aqueous composition. Cleaning of the substrate with the aqueous cleaning composition involves contacting the substrate with the composition for a period of time sufficient to remove at least a substantial portion of the contaminants from the substrate.
摘要翻译：用于清洁被工业类型污染污染物污染的基底（例如塑料或金属基底）的碱性水性清洁组合物包含（i）水性部分和（ii）由（A）碱性提供的活性成分部分试剂和（B）含有（a）活性浓度的N-辛基-2-吡咯烷酮表面活性剂和（b）至少一种氨基羧酸表面活性剂如N-椰油基-β-氨基丙酸的活性浓度的表面活性剂混合物。表面活性剂（a）与表面活性剂（b）的活性 - 浓度比例使得清洁组合物具有从基材中除去大部分污染物的能力。表面活性剂（a）与表面活性剂（b）的活性 - 浓度比为约2.5:1，表面活性剂对水性组合物的工业除尘能力具有协同效应。用含水清洁组合物清洗基材包括使基材与组合物接触足以从基材中去除至少大部分污染物的时间。

10. 发明授权

US06191094B1 Aqueous cleaning composition for cleaning substrates and method of using same 有权
标题翻译：用于清洁基材的水性清洁组合物及其使用方法
公开(公告)号：US06191094B1
公开(公告)日：2001-02-20
申请号：US09186273
申请日：1998-11-05
申请人： Francis R. Cala , Richard A. Reynolds
发明人： Francis R. Cala , Richard A. Reynolds
IPC分类号： C11D194
CPC分类号： C23G1/19 , C11D1/10 , C11D1/72 , C11D1/83 , C11D3/10 , C11D11/0029 , C11D11/0035
摘要： An alkaline aqueous cleaning composition for cleaning a substrate contaminated with industrial-type soil contaminants contains (i) an aqueous portion and (ii) an active-ingredient portion composed of (A) an alkalinity-providing agent and (B) a surfactant mixture containing (a) an active concentration of an ethoxylated C12-14 alkanol surfactant having an HLB value at 25° C. of from 8 to 12 and (b) an active concentration of at least one aminocarboxylic acid surfactant of the general formula R—N(H)—R′, wherein R is a straight or branched chain aliphatic organic group having from 10 to 20 carbon atoms, and R′ is a straight or branched chain carboxylic acid having from 1 to 7 carbon atoms. At an active-concentration ratio of surfactant (a) to surfactant (b) of about 2.5:1, the surfactants have a synergistic effect on the cleaning composition's ability to remove certain types of industrial-soil contaminants. Cleaning of the substrate with the aqueous cleaning composition involves contacting the substrate with the composition for a period of time sufficient to remove at least a substantial portion of the contaminants from the substrate.
摘要翻译：用于清洁被工业型污染污染物污染的基质的碱性水性清洁组合物包含（i）水性部分和（ii）由（A）碱性提供剂组成的活性成分部分和（B）含有（a）具有8至12的HLB值在25℃下的乙氧基化C 12-14链烷醇表面活性剂的活性浓度和（b）通式为RN（H）的至少一种氨基羧酸表面活性剂的活性浓度， -R'，其中R是具有10至20个碳原子的直链或支链脂族有机基团，R'是具有1至7个碳原子的直链或支链羧酸。表面活性剂（a）与表面活性剂（b）的活性 - 浓度比为约2.5:1，表面活性剂对清洁组合物去除某些类型的工业 - 土壤污染物的能力具有协同效应。用含水清洁组合物清洗基材包括使基材与组合物接触足以从基材中去除至少大部分污染物的时间。

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