会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明授权
    • System and method for detecting surface charges of a MEMS device
    • 用于检测MEMS器件的表面电荷的系统和方法
    • US09174837B2
    • 2015-11-03
    • US13435236
    • 2012-03-30
    • Fang LiuKuang L. Yang
    • Fang LiuKuang L. Yang
    • G01R27/26G01L9/00B81B7/00G01R29/24
    • B81B7/008B81B2207/03G01R29/24
    • A method for measuring retained surface charges within a MEMS device includes performing an initial voltage sweep on the MEMS device, and recording the capacitance between a first and second electrode of the MEMS device. The method may then (1) apply a stress signal to the MEMS device that causes a first and/or second electrode within the MEMS device to retain a surface charge, and (2) perform at least one additional voltage sweep on the MEMS device. The method may record the capacitance during the additional voltage sweep(s), and calculate a C-V center voltage shift based upon the data obtained during the initial voltage sweep and additional voltage sweep. The voltage shift is representative of the retained surface charge.
    • 用于测量MEMS器件内的保持的表面电荷的方法包括在MEMS器件上执行初始电压扫描,以及在MEMS器件的第一和第二电极之间记录电容。 该方法可以(1)将应力信号施加到MEMS器件,其使MEMS器件内的第一和/或第二电极保持表面电荷,以及(2)在MEMS器件上执行至少一个额外的电压扫描。 该方法可以在附加电压扫描期间记录电容,并且基于在初始电压扫描期间获得的数据和附加电压扫描来计算C-V中心电压偏移。 电压偏移代表保留的表面电荷。
    • 9. 发明授权
    • Microphone with parasitic capacitance cancelation
    • 具有寄生电容消除的麦克风
    • US08755541B2
    • 2014-06-17
    • US13609872
    • 2012-09-11
    • Fang LiuKuang L. Yang
    • Fang LiuKuang L. Yang
    • H04R25/00
    • H04R19/005H04R3/06Y10T29/43
    • A microelectromechanical microphone and method of manufacturing the same are disclosed. The microphone has a moveable diaphragm and a fixed backplate that create a variable capacitance. A fixed anchor electrically coupled to the diaphragm has an electrode that measures the variable capacitance, but also measures an unwanted, additive, parasitic capacitance. Various embodiments include a reference electrode, manufactured in the same deposition layer as the diaphragm or anchor, that measures only the parasitic capacitance. A circuit is provided either on-chip or off-chip that subtracts the capacitance measured at the reference electrode from that measured at the anchor, thereby producing only the desired variable capacitance as output. Because the reference electrode is deposited at the same time as the diaphragm or anchor, only minimal changes are required to existing manufacturing techniques.
    • 公开了一种微机电麦克风及其制造方法。 麦克风具有可移动的隔膜和固定的背板,产生可变电容。 电耦合到隔膜的固定锚具有测量可变电容的电极,但也测量不想要的附加的寄生电容。 各种实施例包括参考电极,其制造在与隔膜或锚固件相同的沉积层中,仅测量寄生电容。 提供片上或片外的电路,其减去在参考电极处测量的电容与在锚处测量的电容,从而仅产生期望的可变电容作为输出。 因为参考电极与隔膜或锚固件同时沉积,所以现有制造技术只需要最小的变化。
    • 10. 发明申请
    • MEMS Device with Improved Charge Elimination and Methods of Producing Same
    • 具有改善电荷消除的MEMS器件及其生产方法相同
    • US20140001577A1
    • 2014-01-02
    • US13535781
    • 2012-06-28
    • Fang LiuKuang L. Yang
    • Fang LiuKuang L. Yang
    • H01L29/84H01L21/02
    • B81B3/0008
    • A method for producing a MEMS device having improved charge elimination characteristics includes providing a substrate having one or more layers, and applying a first charge elimination layer onto at least one portion of one given layer of the substrate. The method may then (1) apply a sacrificial layer onto the first charge elimination layer, (2) apply a second charge elimination layer onto at least a portion of the sacrificial layer, and (3) deposit a movable layer onto at least a portion of the second charge elimination layer. To form a structure within the movable layer the method may etch the movable layer. The method may then etch the sacrificial layer to release the structure.
    • 一种具有改善的电荷消除特性的MEMS器件的制造方法包括提供具有一个或多个层的衬底,以及在衬底的一个给定层的至少一部分上施加第一电荷消除层。 然后,该方法可以(1)在第一电荷消除层上施加牺牲层,(2)将第二电荷消除层施加到牺牲层的至少一部分上,以及(3)将可移动层沉积在至少一部分上 的第二电荷消除层。 为了在可移动层内形成结构,该方法可以蚀刻可移动层。 该方法然后可以蚀刻牺牲层以释放结构。