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1. 发明申请

US20070298687A1 APPARATUS AND METHOD FOR MODIFYING AN EDGE 审中-公开
标题翻译：装置和方法修改边缘
公开(公告)号：US20070298687A1
公开(公告)日：2007-12-27
申请号：US11425957
申请日：2006-06-22
申请人： Feben T. Gobena , William D. Joseph , Gary M. Palmgren , Daniel B. Pendergrass
发明人： Feben T. Gobena , William D. Joseph , Gary M. Palmgren , Daniel B. Pendergrass
IPC分类号： B24B51/00 , B24B1/00
CPC分类号： B24B9/065 , B24B47/10
摘要： Edge modifying apparatuses that include a disc chuck, a disc edge modifying unit having an abrasive article support, and a uniform velocity linear oscillation driver coupled to at least one of the disc chuck and the abrasive article support are described. The uniform velocity linear oscillation driver provides a substantially constant velocity for at least 80% of each half-cycle of oscillation. Methods of modifying the edge of disc using such apparatuses are also described.
摘要翻译：描述了包括盘卡盘，具有磨料制品支撑件的圆盘边缘修改单元和耦合到盘卡盘和磨料制品支撑件中的至少一个的均匀速度线性振荡驱动器的边缘修改装置。均匀速度线性振荡驱动器为振荡的每个半周期的至少80％提供基本恒定的速度。还描述了使用这种装置修改盘边缘的方法。

2. 发明申请

US20070298240A1 COMPRESSIBLE ABRASIVE ARTICLE 审中-公开
标题翻译：可磨蚀性物品
公开(公告)号：US20070298240A1
公开(公告)日：2007-12-27
申请号：US11425963
申请日：2006-06-22
申请人： Feben T. Gobena , William D. Joseph
发明人： Feben T. Gobena , William D. Joseph
IPC分类号： B32B5/16 , B32B27/00 , B32B27/04 , C09K3/14 , B32B33/00
CPC分类号： B24D13/12 , B24B9/065 , Y10T428/1352 , Y10T428/25 , Y10T428/31511 , Y10T428/31551 , Y10T428/31786
摘要： Abrasive articles having a compressible composite layer are described. The compressible composite layers include a compressible binder and abrasive agglomerates. Methods of using such abrasive articles to modify the edge of a workpiece are also described.
摘要翻译：描述了具有可压缩复合层的磨料制品。可压缩复合层包括可压缩粘合剂和磨料聚集体。还描述了使用这种磨料制品来改变工件边缘的方法。

3. 发明授权

US09162340B2 Polishing pads including phase-separated polymer blend and method of making and using the same 有权
标题翻译：抛光垫，包括相分离的聚合物共混物及其制备和使用方法
公开(公告)号：US09162340B2
公开(公告)日：2015-10-20
申请号：US13514741
申请日：2010-12-28
申请人： William D. Joseph , Gary M. Palmgren , Stephen C. Loper , Christopher N. Loesch
发明人： William D. Joseph , Gary M. Palmgren , Stephen C. Loper , Christopher N. Loesch
IPC分类号： B24B37/00 , B24B37/22 , B24B37/26
CPC分类号： B24B37/22 , B24B37/26
摘要： Polishing pads containing a phase-separated polymer blend, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed in a sheet. In another exemplary embodiment, the polishing elements are bonded to a support layer, for example by thermal bonding. In certain embodiments, the polishing pad may additionally include a compliant layer affixed to the support layer, and optionally, a polishing composition distribution layer.
摘要翻译：包含相分离的聚合物共混物的抛光垫，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括整体形成在片材中的多个抛光元件。在另一个示例性实施例中，抛光元件例如通过热粘合而结合到支撑层。在某些实施例中，抛光垫可以另外包括固定到支撑层的柔顺层，以及任选的抛光组合物分布层。

4. 发明申请

US20120315830A1 POLISHING PADS INCLUDING PHASE-SEPARATED POLYMER BLEND AND METHOD OF MAKING AND USING THE SAME 有权
标题翻译：包括相分离聚合物混合物的抛光垫及其制备和使用方法
公开(公告)号：US20120315830A1
公开(公告)日：2012-12-13
申请号：US13514741
申请日：2010-12-28
申请人： William D. Joseph , Gary M. Palmgren , Stephen C. Loper , Christopher N. Loesch
发明人： William D. Joseph , Gary M. Palmgren , Stephen C. Loper , Christopher N. Loesch
IPC分类号： B24D11/00 , B24D18/00 , B24B1/00
CPC分类号： B24B37/22 , B24B37/26
摘要： Polishing pads containing a phase-separated polymer blend, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed in a sheet. In another exemplary embodiment, the polishing elements are bonded to a support layer, for example by thermal bonding. In certain embodiments, the polishing pad may additionally include a compliant layer affixed to the support layer, and optionally, a polishing composition distribution layer.
摘要翻译：包含相分离的聚合物共混物的抛光垫，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括整体形成在片材中的多个抛光元件。在另一个示例性实施例中，抛光元件例如通过热粘合而结合到支撑层。在某些实施例中，抛光垫可以另外包括固定到支撑层的柔顺层，以及任选的抛光组合物分布层。

5. 发明授权

US08251774B2 Structured abrasive article, method of making the same, and use in wafer planarization 有权
标题翻译：结构化磨料制品，其制造方法，并用于晶片平面化
公开(公告)号：US08251774B2
公开(公告)日：2012-08-28
申请号：US12539798
申请日：2009-08-12
申请人： William D. Joseph , Julie Y. Qian , Jimmie R. Baran, Jr. , John J. Gagliardi
发明人： William D. Joseph , Julie Y. Qian , Jimmie R. Baran, Jr. , John J. Gagliardi
IPC分类号： B24B49/00
CPC分类号： B24B37/245 , B24B37/205 , B24D18/00
摘要： A structured abrasive article comprises an at least translucent film backing and an abrasive layer disposed on the backing. The abrasive layer comprises a plurality of shaped abrasive composites. The shaped abrasive composites comprise abrasive particles dispersed in a binder. The abrasive particles consist essentially of ceria particles having an average primary particle size of less than 100 nanometers. The binder comprises a polyether acid and a reaction product of components comprising a carboxylic(meth)acrylate and a poly(meth)acrylate, and, based on a total weight of the abrasive layer, the abrasive particles are present in an amount of at least 70 percent by weight. Methods of making and using the structured abrasive article are also disclosed.
摘要翻译：结构化磨料制品包括至少半透明的膜背衬和设置在背衬上的研磨层。研磨层包括多个成形的磨料复合材料。成形磨料复合材料包括分散在粘合剂中的磨料颗粒。研磨颗粒主要由平均初级粒径小于100纳米的二氧化铈颗粒组成。粘合剂包括聚醚酸和包含羧酸（甲基）丙烯酸酯和聚（甲基）丙烯酸酯的组分的反应产物，并且基于研磨层的总重量，磨料颗粒的量至少为 70重量％。还公开了制造和使用结构化磨料制品的方法。

6. 发明授权

US06645624B2 Composite abrasive particles and method of manufacture 有权
标题翻译：复合磨料颗粒及其制造方法
公开(公告)号：US06645624B2
公开(公告)日：2003-11-11
申请号：US09942007
申请日：2001-08-29
申请人： Negus B. Adefris , William D. Joseph , Kathleen A. Wagle-Peterson
发明人： Negus B. Adefris , William D. Joseph , Kathleen A. Wagle-Peterson
IPC分类号： B32B516
CPC分类号： B01J13/043 , B24D11/00 , B24D13/18 , Y10T428/2982 , Y10T428/2991 , Y10T428/2993 , Y10T428/2998
摘要： The present application discloses an agglomerate. The agglomerate comprises a crystalline matrix. The agglomerate may additionally comprise abrasive particles. The agglomerate has a normalized bulk density of less than about 0.38. The present application additionally discloses a method of manufacturing the agglomerate. The agglomerate is manufactured by forming a mixture comprising an abrasive particle with a sol, the sol comprising an oxide and water and introducing the mixture into a spray dryer. The mixture is then dried in the spray dryer. The mixture is then fired, for example in an oven. The resulting agglomerates comprise abrasive particles retained within a crystalline matrix of the oxide. The present invention additionally discloses methods of using the agglomerates of the resent invention.
摘要翻译：本申请公开了一种附聚物。附聚物包含结晶基质。附聚物可另外包含磨料颗粒。附聚物的标准化堆积密度小于约0.38。本申请另外公开了一种制造附聚物的方法。通过形成包含磨料颗粒与溶胶的混合物，所述溶胶包含氧化物和水，并将混合物引入喷雾干燥器来制造附聚物。然后将混合物在喷雾干燥器中干燥。然后将混合物烧制，例如在烘箱中。所得到的附聚物包含保留在氧化物的结晶基质内的研磨颗粒。本发明另外公开了使用本发明的附聚物的方法。

7. 发明授权

US08821214B2 Polishing pad with porous elements and method of making and using the same 有权
标题翻译：具有多孔元件的抛光垫及其制造和使用方法
公开(公告)号：US08821214B2
公开(公告)日：2014-09-02
申请号：US13000986
申请日：2009-06-26
申请人： William D. Joseph
发明人： William D. Joseph
IPC分类号： B24B37/26 , B24B37/04
CPC分类号： B24B37/042 , B24B37/26 , B24D18/0009
摘要： The disclosure is directed to polishing pads with porous polishing elements, and to methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pad includes a multiplicity of polishing elements, at least some of which are porous, each polishing element affixed to a support layer so as to restrict lateral movement of the polishing elements with respect to one or more of the other polishing elements, but remaining moveable in an axis normal to a polishing surface of the polishing elements. In certain embodiments, the polishing pad may include a guide plate positioned to arrange and optionally affix the plurality of polishing elements on the support layer, and additionally, a polishing composition distribution layer. In some embodiments, the pores are distributed throughout substantially the entire porous polishing element. In other embodiments, the pores are distributed substantially at the polishing surface of the elements.
摘要翻译：本发明涉及具有多孔抛光元件的抛光垫，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括多个抛光元件，至少其中一些抛光元件是多孔的，每个抛光元件固定在支撑层上，以便限制抛光元件相对于其它一个或多个的横向运动抛光元件，但是可以在垂直于抛光元件的抛光表面的轴上移动。在某些实施例中，抛光垫可以包括定位成布置并任选地将多个抛光元件固定在支撑层上的引导板，另外还包括抛光组合物分布层。在一些实施方案中，孔分布在基本上整个多孔抛光元件的整个部分。在其它实施例中，孔基本上分布在元件的抛光表面上。

8. 发明授权

US06623824B1 Method for making a microreplicated article using a substrate comprising a syndiotactic vinyl aromatic polymer 有权
标题翻译：使用包含间同立构乙烯基芳族聚合物的基材制备微复制品的方法
公开(公告)号：US06623824B1
公开(公告)日：2003-09-23
申请号：US09240521
申请日：1999-01-29
申请人： William D. Joseph , Lee A. Pavelka , Jaime R. Ojeda , Denise A. Barrera , Roberta E. Harelstad , Bruce A. Sventek
发明人： William D. Joseph , Lee A. Pavelka , Jaime R. Ojeda , Denise A. Barrera , Roberta E. Harelstad , Bruce A. Sventek
IPC分类号： C08L2500
CPC分类号： C09J7/403 , C09J7/401 , C09J2425/005 , Y10T428/14 , Y10T428/1476 , Y10T428/31855
摘要： A novel release liner is provided which has a release surface comprising a syndiotactic polymer. The release liners of the present invention offer superior release to a wide variety of materials without the application of release agents, have relatively high heat distortion temperatures, and are unaffected by radiation sources used to cure most polymeric compositions. The release liners of the present invention can be microreplicated with a pattern which can be transferred to coatings and other impressionable materials to impart unique physical or optical properties. Thus, a method of producing a patterned article is also provided, as is a method of producing a solid object from a curable composition.
摘要翻译：提供了一种具有包含间同立构聚合物的释放表面的新型剥离衬垫。本发明的防粘衬垫在不使用脱模剂的情况下提供对多种材料的优异释放，具有相对较高的热变形温度，并且不受用于固化大多数聚合物组合物的辐射源的影响。本发明的防粘衬垫可以用可以转移到涂层和其他可印刷材料的图案进行微复制，以赋予独特的物理或光学性质。因此，也提供了由可固化组合物制备固体物质的方法，制造图案制品的方法。

9. 发明申请

US20130102231A1 ORGANIC PARTICULATE LOADED POLISHING PADS AND METHOD OF MAKING AND USING THE SAME 审中-公开
标题翻译：有机颗粒加载抛光垫及其制造和使用方法
公开(公告)号：US20130102231A1
公开(公告)日：2013-04-25
申请号：US13517367
申请日：2010-12-28
申请人： William D. Joseph , Brian D. Goers
发明人： William D. Joseph , Brian D. Goers
IPC分类号： B24D11/00 , B24B37/24
CPC分类号： B24D11/00 , B24B37/22 , B24B37/245 , B24B37/26
摘要： Polishing pads including organic particulates in a continuous polymer phase, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed in a sheet. In another exemplary embodiment, the polishing elements are bonded to a support layer, for example by thermal bonding. In certain embodiments, the polishing pad may additionally include a compliant layer affixed to the support layer, and optionally, a polishing composition distribution layer.
摘要翻译：抛光垫包括连续聚合物相中的有机颗粒，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括整体形成在片材中的多个抛光元件。在另一个示例性实施例中，抛光元件例如通过热粘合而结合到支撑层。在某些实施例中，抛光垫可以另外包括固定到支撑层的柔顺层，以及任选的抛光组合物分布层。

10. 发明申请

US20090176443A1 STRUCTURED FIXED ABRASIVE ARTICLES INCLUDING SURFACE TREATED NANO-CERIA FILLER, AND METHOD FOR MAKING AND USING THE SAME 有权
标题翻译：包括表面处理的纳米陶瓷填料的结构固定的磨料制品及其制备和使用方法
公开(公告)号：US20090176443A1
公开(公告)日：2009-07-09
申请号：US12359817
申请日：2009-01-26
申请人： Jeffrey S. Kollodge , Julie Y. Qian , Jimmie R. Baran, JR. , William D. Joseph , John J. Gagliardi
发明人： Jeffrey S. Kollodge , Julie Y. Qian , Jimmie R. Baran, JR. , William D. Joseph , John J. Gagliardi
IPC分类号： B24B1/00 , C09C1/00 , B24D3/28 , C09K3/14 , B24D18/00
CPC分类号： B24B37/245 , B24D3/20 , C09K3/1409 , C09K3/1436
摘要： Structured fixed abrasive articles including a multiplicity of three-dimensional abrasive composites fixed to the abrasive article, the abrasive composites further including a multiplicity of ceria abrasive particles having a volume mean diameter from 100 to 500 nanometers (nm) in a matrix material, the matrix material further including a polymeric binder and a multiplicity of surface treated ceria filler particles having a volume mean diameter less than 100 nm. Also provided are methods of making and using structured fixed abrasive articles according to the disclosure.
摘要翻译：结构化的固定磨料制品，包括固定在磨料制品上的多种三维磨料复合材料，磨料复合材料还包括多个在基质材料中体积平均直径为100至500纳米（nm）的二氧化铈磨料颗粒，基质材料还包括聚合物粘合剂和多个体积平均直径小于100nm的经表面处理的二氧化铈填料颗粒。还提供了根据本公开的制造和使用结构化固体磨料制品的方法。

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