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1. 发明授权

US07089081B2 Modeling an abrasive process to achieve controlled material removal 失效
标题翻译：建模研磨过程以实现受控材料的去除
公开(公告)号：US07089081B2
公开(公告)日：2006-08-08
申请号：US10355659
申请日：2003-01-31
申请人： Gary M. Palmgren
发明人： Gary M. Palmgren
IPC分类号： G06F11/00
CPC分类号： B24B37/042 , B24B49/16 , B24B51/00
摘要： In general, techniques are described that allow an abrasive manufacturing process to achieve a controlled performance parameter, e.g., an amount of material removal, without requiring the use of feedback controls within the abrasive manufacturing process. For example, a system includes a machine to abrade a workpiece with an abrasive article, and a controller to control the application of the abrasive article to the workpiece by the machine to achieve a substantially constant cut rate for the abrasive article. The controller controls one or more process variables in accordance with an open-loop mathematical model that relates the cut rate of the abrasive article to an application force of the abrasive article to achieve controlled material removal. For example, a constant rate of cut can be achieved or a fixed amount of material can be removed while abrading one or more workpiece in accordance with the model.
摘要翻译：通常，描述了允许磨料制造工艺实现受控性能参数（例如，材料去除量）而不需要在磨料制造过程中使用反馈控制的技术。例如，系统包括用磨料制品磨削工件的机器，以及控制器，用于通过机器控制磨料制品对工件的应用，以实现磨料制品的基本恒定的切削速度。控制器根据开环数学模型控制一个或多个过程变量，该数学模型将磨料制品的切割速率与磨料制品的施加力相关联，以实现受控材料的去除。例如，可以根据型号对一个或多个工件进行研磨，可以实现恒定的切割速度或固定量的材料。

2. 发明授权

US06951509B1 Undulated pad conditioner and method of using same 有权
标题翻译：松动垫调节剂及其使用方法
公开(公告)号：US06951509B1
公开(公告)日：2005-10-04
申请号：US10797892
申请日：2004-03-09
申请人： Gary M. Palmgren
发明人： Gary M. Palmgren
IPC分类号： B24B53/007 , B24D9/08 , B24B1/00
CPC分类号： B24D9/08 , B24B53/017
摘要： A pad conditioner having an abrasive disk and an undulating disk and methods for using the same. The undulating disk has at least one raised portion and at least one recessed portion. The abrasive disk is releasably affixed to at least a portion of the recessed portion to form an undulated abrasive surface. The undulating disk allows the pad conditioner to be modified for use with multiple processes and for a variety of workpieces.
摘要翻译：具有研磨盘和起伏盘的垫调节器及其使用方法。起伏盘具有至少一个凸起部分和至少一个凹陷部分。研磨盘可释放地固定在凹部的至少一部分上，以形成波浪的研磨表面。起伏盘允许修整垫片调节器以用于多个工艺和各种工件。

3. 发明授权

US09162340B2 Polishing pads including phase-separated polymer blend and method of making and using the same 有权
标题翻译：抛光垫，包括相分离的聚合物共混物及其制备和使用方法
公开(公告)号：US09162340B2
公开(公告)日：2015-10-20
申请号：US13514741
申请日：2010-12-28
申请人： William D. Joseph , Gary M. Palmgren , Stephen C. Loper , Christopher N. Loesch
发明人： William D. Joseph , Gary M. Palmgren , Stephen C. Loper , Christopher N. Loesch
IPC分类号： B24B37/00 , B24B37/22 , B24B37/26
CPC分类号： B24B37/22 , B24B37/26
摘要： Polishing pads containing a phase-separated polymer blend, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed in a sheet. In another exemplary embodiment, the polishing elements are bonded to a support layer, for example by thermal bonding. In certain embodiments, the polishing pad may additionally include a compliant layer affixed to the support layer, and optionally, a polishing composition distribution layer.
摘要翻译：包含相分离的聚合物共混物的抛光垫，以及在抛光过程中制造和使用这种垫的方法。在一个示例性实施例中，抛光垫包括整体形成在片材中的多个抛光元件。在另一个示例性实施例中，抛光元件例如通过热粘合而结合到支撑层。在某些实施例中，抛光垫可以另外包括固定到支撑层的柔顺层，以及任选的抛光组合物分布层。

4. 发明授权

US07695808B2 Thermal transfer coating 有权
标题翻译：热转印涂层
公开(公告)号：US07695808B2
公开(公告)日：2010-04-13
申请号：US11268140
申请日：2005-11-07
申请人： Phillip E. Tuma , Gary M. Palmgren
发明人： Phillip E. Tuma , Gary M. Palmgren
IPC分类号： B32B5/16 , F24H9/02 , B05D3/02
CPC分类号： C23C26/00 , C23C28/023 , C23C28/321 , C23C28/322 , C23C28/341 , F28F13/187 , H01L23/3732 , H01L23/3733 , H01L23/3736 , H01L23/427 , H01L2924/0002 , Y10T428/25 , Y10T428/256 , Y10T428/2991 , H01L2924/00
摘要： Thermal transfer coating comprising a plurality of metal bodies and a plurality of interstitial elements disposed between and connecting the plurality of metal bodies to one another. The metal bodies comprise an inner portion comprising a first metal and an outer portion comprising an alloy comprising the first metal and a second metal. The interstitial elements comprise the alloy of the outer portion.
摘要翻译：热转印涂层包括多个金属体和多个间隙元素，其间设置在多个金属体之间并将多个金属体彼此连接。金属体包括内部部分，其包括第一金属和外部部分，外部部分包括包含第一金属和第二金属的合金。间隙元素包括外部部分的合金。

5. 发明授权

US07125324B2 Insulated pad conditioner and method of using same 有权
标题翻译：绝缘垫调节剂及其使用方法
公开(公告)号：US07125324B2
公开(公告)日：2006-10-24
申请号：US10797890
申请日：2004-03-09
申请人： Gary M. Palmgren , Brian D. Goers , Douglas J. Pysher
发明人： Gary M. Palmgren , Brian D. Goers , Douglas J. Pysher
IPC分类号： B24B7/00 , B24B9/00
CPC分类号： B24B53/017 , B24B37/042 , B24B37/046
摘要： A wafer planarization process with a conditioning tool having an electrical insulator that electrically insulates the abrasive surface of the conditioning tool. The electrical insulator extends the useful life of the abrasive surface of the conditioning tool by reducing the level of electrochemically driven corrosion.
摘要翻译：具有调节工具的晶片平面化工艺，该调节工具具有使调节工具的研磨表面电绝缘的电绝缘体。电绝缘体通过降低电化学腐蚀的水平来延长调节工具的研磨表面的使用寿命。

6. 发明授权

US06358133B1 Grinding wheel 有权
公开(公告)号：US06358133B1
公开(公告)日：2002-03-19
申请号：US09256837
申请日：1999-02-24
申请人： Robert T. Cesena , Naum N. Tselesin , Gary M. Palmgren , Jay B. Preston
发明人： Robert T. Cesena , Naum N. Tselesin , Gary M. Palmgren , Jay B. Preston
IPC分类号： B24B5502
CPC分类号： B24D3/06 , B24D5/02 , B24D5/066 , B24D5/10 , B24D5/16 , B24D18/00
摘要： A cylindrical, abrasive grinding wheel having a cylindrical abrasive region with an abrasive surface at an outer circular band thereof. The abrasive region includes layers of abrasive particles. The layers of abrasive particles can be tilted with respect to an axis of rotation of the grinding wheel or they can such that grooving in the grinding wheel and a workpiece ground by the grinding wheel can be reduced. Alternatively, the abrasive region can be formed from a plurality of abrasive segments each having layers of abrasive particles. The layers of abrasive particles can be staggered in the direction of the axis of rotation from one segment to another. This can also reduce grooving in the grinding wheel and workpieces.

7. 发明授权

US07840305B2 Abrasive articles, CMP monitoring system and method 有权
标题翻译：磨料制品，CMP监测系统及方法
公开(公告)号：US07840305B2
公开(公告)日：2010-11-23
申请号：US11427154
申请日：2006-06-28
申请人： Andrew H. Behr , Brian D. Goers , Vincent J. Laraia , Gary M. Palmgren , Daniel B. Pendergrass, Jr.
发明人： Andrew H. Behr , Brian D. Goers , Vincent J. Laraia , Gary M. Palmgren , Daniel B. Pendergrass, Jr.
IPC分类号： G06F19/00 , H01L21/00 , B24B49/00 , B24B21/18
CPC分类号： B24B53/017 , B24B37/04 , B24B49/02 , B24B49/04 , B24B49/14 , B24B49/16 , H01L2924/0002 , H01L2924/00
摘要： The disclosure relates to abrasive articles useful in chemical-mechanical polishing (CMP), the articles including a substrate with opposite major surfaces, an abrasive material overlaying at least a portion of at least one of the major surfaces, and at least one of a radio frequency identification (RFID) tag, a RFID tag reader, or a sensor for providing CMP information to a transmitter positioned near the substrate, the transmitter positioned near the substrate and adapted to wirelessly receive CMP information and wirelessly transmit the CMP information to a remote receiver. The disclosure also relates to a CMP pad conditioner for wirelessly communicating CMP information to a remote receiver, a CMP process monitoring system for wirelessly communicating CMP information to a remote receiver, and a method for conditioning a CMP pad using a CMP process monitoring system for wireless communicating CMP information to a remote receiver.
摘要翻译：本公开涉及可用于化学机械抛光（CMP）的磨料制品，所述制品包括具有相反主表面的基底，覆盖至少一个主表面的至少一部分的研磨材料，以及至少一个无线电频率识别（RFID）标签，RFID标签读取器或用于向位于衬底附近的发射器提供CMP信息的传感器，发射器位于衬底附近并适于无线地接收CMP信息并将CMP信息无线传输到远程接收器。本公开还涉及用于将CMP信息无线地传送到远程接收器的CMP垫调节器，用于将CMP信息无线传送到远程接收器的CMP处理监视系统，以及使用CMP无线通信的CMP处理监视系统来调节CMP垫的方法将CMP信息传送到远程接收器。

8. 发明授权

US07360581B2 Structured thermal transfer article 有权
标题翻译：结构热转印制品
公开(公告)号：US07360581B2
公开(公告)日：2008-04-22
申请号：US11268139
申请日：2005-11-07
申请人： Phillip E. Tuma , Gary M. Palmgren
发明人： Phillip E. Tuma , Gary M. Palmgren
IPC分类号： F28F7/02
CPC分类号： H01L23/3736 , H01L23/3732 , H01L23/3733 , H01L23/44 , H01L2924/0002 , Y10T29/49393 , H01L2924/00
摘要： Structured thermal transfer article comprising a plurality of metal bodies and a plurality of interstitial elements disposed between and connecting the plurality of metal bodies to one another. The metal bodies comprise an inner portion comprising a first metal and an outer portion comprising an alloy comprising the first metal and a second metal. The interstitial elements comprise the alloy of the outer portion.
摘要翻译：结构化热转印制品包括多个金属体和多个间质元素，其间设置在多个金属体之间并将多个金属体彼此连接。金属体包括内部部分，其包括第一金属和外部部分，外部部分包括包含第一金属和第二金属的合金。间隙元素包括外部部分的合金。

9. 发明申请

US20080053000A1 EXTENDED LIFE ABRASIVE ARTICLE AND METHOD 有权
标题翻译：延长寿命磨砂文章和方法
公开(公告)号：US20080053000A1
公开(公告)日：2008-03-06
申请号：US11837774
申请日：2007-08-13
申请人： Gary M. Palmgren , Jay B. Preston , Brian D. Goers
发明人： Gary M. Palmgren , Jay B. Preston , Brian D. Goers
IPC分类号： B24D11/00
CPC分类号： B24D3/08 , B23D61/18 , B24B53/017 , B24D11/00
摘要： Provided is an abrasive article comprising (a) a metallic foil having a first and second surfaces and voids therebetween, (b) a plurality of abrasive particles substantially in the voids, and (c) an alloy at least partially between the abrasive particles and the foil in the voids, wherein the alloy comprises a second component and a portion of the metallic foil near the voids. Also provided are methods of making and using such abrasive articles.
摘要翻译：提供了一种磨料制品，其包括（a）金属箔，其间具有第一和第二表面和空隙，（b）基本上在空隙中的多个磨料颗粒，和（c）至少部分地在磨料颗粒和在所述空隙中形成箔，其中所述合金包括靠近所述空隙的第二部件和所述金属箔的一部分。还提供了制造和使用这种磨料制品的方法。

10. 发明申请

US20080004743A1 Abrasive Articles, CMP Monitoring System and Method 有权
标题翻译：磨料制品，CMP监测系统和方法
公开(公告)号：US20080004743A1
公开(公告)日：2008-01-03
申请号：US11427154
申请日：2006-06-28
申请人： Brian D. Goers , Vincent J. Laraia , Gary M. Palmgren , Daniel B. Pendergrass
发明人： Brian D. Goers , Vincent J. Laraia , Gary M. Palmgren , Daniel B. Pendergrass
IPC分类号： G06F19/00
CPC分类号： B24B53/017 , B24B37/04 , B24B49/02 , B24B49/04 , B24B49/14 , B24B49/16 , H01L2924/0002 , H01L2924/00
摘要： The disclosure relates to abrasive articles useful in chemical-mechanical polishing (CMP), the articles including a substrate with opposite major surfaces, an abrasive material overlaying at least a portion of at least one of the major surfaces, a means for providing CMP information positioned near the substrate, and a transmitter positioned near the substrate and adapted to transmit the CMP information to a remote receiver. The disclosure also relates to a CMP pad conditioner having a means for communicating CMP information, a CMP process monitoring system, and a method for conditioning a CMP pad.
摘要翻译：本公开涉及可用于化学机械抛光（CMP）的磨料制品，所述制品包括具有相反主表面的基材，覆盖至少一个主表面的至少一部分的研磨材料，用于提供定位的CMP信息的装置靠近基板，以及位于基板附近并适于将CMP信息发送到远程接收器的发射器。本公开还涉及具有用于传送CMP信息的装置，CMP处理监视系统和用于调节CMP垫的方法的CMP垫调节器。

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