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    • 3. 发明授权
    • Industrial apparatus for applying radio-frequency electromagnetic fields to semiconductive dielectric materials
    • 将射频电磁场应用于半导体介电材料的工业设备
    • US07328653B2
    • 2008-02-12
    • US10515972
    • 2002-05-28
    • Alessandro Tonello
    • Alessandro Tonello
    • A23L3/00
    • A23L2/48A23C3/0335A23L3/005A23L3/01H05B6/60Y10S99/14
    • Industrial apparatus for applying radio-frequency electromagnetic fields to semiconductive dielectric materials comprises a radio-frequency voltage generator and an applicator device for applying radio-frequency electromagnetic fields. The applicator device comprises a plurality of electrodes electrically connected to the electrical generator for generating between then a radio-frequency electromagnetic field with electrical and magnetic components arranged in a preferential direction. The applicator device further comprises at least one pair of equipotential electrodes substantially aligned in the preferential direction and material transportation means for housing and transporting semiconductive dielectric material within the applicator device in a direction substantially parallel to the preferential direction.
    • 将射频电磁场施加到半导体介电材料的工业装置包括射频电压发生器和用于施加射频电磁场的施加装置。 施加器装置包括电连接到发电机的多个电极,用于在具有以优先方向布置的电和磁性部件之间产生射频电磁场。 施用装置还包括至少一对基本上在优先方向上对准的等电位电极和材料输送装置,用于在基本上平行于优先方向的方向上容纳和输送施加器装置内的半导体电介质材料。