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    • 1. 发明申请
    • RAW MATERIAL VAPORIZATION AND SUPPLY APPARATUS
    • 原材料蒸发和供应装置
    • US20150322567A1
    • 2015-11-12
    • US14650496
    • 2013-11-20
    • FUJIKIN INCORPORATED
    • Atsushi HidakaMasaaki NagaseSatoru YamashitaKouji NishinoNobukazu Ikeda
    • C23C16/448F22B1/28F17C9/02
    • C23C16/4485C23C16/4481C23C16/4482C23C16/52F17C9/02F22B1/284F22B1/285
    • The present invention provides a raw material vaporization and supply device including a raw material receiving tank, a vaporizer for vaporizing liquid pressure-fed from the liquid receiving tank, a flow rate control device for adjusting a flow rate of raw material gas from the vaporizer, and a heating device for heating the vaporizer, the high-temperature pressure-type flow rate control device, and desired sections of flow passages connected to these devices, wherein Al2O3 passivation treatment, Cr2O3 passivation treatment, or FeF2 passivation treatment is applied to liquid contact parts or gas contact parts of metal surfaces of at least any of the raw material receiving tank, the vaporizer, the flow rate control device, the flow passages that links these component devices, or opening-and-closing valves that are disposed in the flow passages.
    • 本发明提供一种原料蒸发供给装置,其包括原料容纳槽,用于蒸发从液体接收罐供给的液体的蒸发器,用于调节来自蒸发器的原料气体的流量的流量控制装置, 以及用于加热蒸发器,高温压力型流量控制装置和连接到这些装置的流路的所需部分的加热装置,其中Al 2 O 3钝化处理,Cr 2 O 3钝化处理或FeF 2钝化处理被施加到液体接触 至少任何原料接收罐,蒸发器,流量控制装置,连接这些部件装置的流动通道或设置在流体中的开关阀的金属表面的零件或气体接触部分 段落。
    • 7. 发明授权
    • Raw material gas supply apparatus for semiconductor manufacturing equipment
    • 半导体制造设备用原料气供应装置
    • US09556518B2
    • 2017-01-31
    • US14150263
    • 2014-01-08
    • FUJIKIN INCORPORATED
    • Masaaki NagaseAtsushi HidakaKaoru HirataRyousuke DohiKouji NishinoNobukazu Ikeda
    • C23C16/448C23C16/455C23C16/52
    • C23C16/448C23C16/4485C23C16/45561C23C16/52Y10T137/86485
    • A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature.
    • 原料气体供给装置包括液体原料气体供给源,储存液体原料的源罐,将来自液体原料的含有液体原料蒸汽的原料气体从原料罐供给到处理室的气体分配通路, 安装在所述气体通路的上游侧的自动压力调节器,其中,所述自动压力调节器使所述原料气体的供给压力保持在设定值,所述供给气体切换阀安装在所述气体通路的下游侧, 打开和关闭气体通道,设置在阀的入口侧或出口侧中的至少一个上的孔,其中孔口调节原料气体的流速,恒温加热装置加热源罐,气体 通道,阀门和孔口达到设定温度。
    • 8. 发明申请
    • RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS
    • 原料气化和供应装置
    • US20140216339A1
    • 2014-08-07
    • US14170953
    • 2014-02-03
    • FUJIKIN INCORPORATED
    • Masaaki NagaseAtsushi HidakaKaoru HirataRyousuke DohiKouji NishinoNobukazu Ikeda
    • C23C16/448
    • C23C16/4485
    • A raw material vaporizing and supplying apparatus including a source tank in which a raw material is stored, a raw material gas supply channel through which raw material gas is supplied from an internal space portion of the source tank to a process chamber, a pressure type flow rate control system which is installed along the way of the supply channel, and controls a flow rate of the raw material gas which is supplied to the process chamber, and a constant temperature heating unit that heats the source tank, the supply channel, and the pressure type flow rate control system to a set temperature, wherein the raw material gas generated in an internal space portion of the source tank is supplied to the process chamber while the pressure type flow rate control system performs flow rate control.
    • 一种原料蒸发和供给装置,包括:原料储存在其中的原料罐,将原料气体从原料罐的内部空间供给到处理室的原料气体供给流路,压力型流 速率控制系统,其沿着供给通道的方式安装,并且控制供给到处理室的原料气体的流量;以及恒温加热单元,其加热源箱,供给通道和 压力型流量控制系统达到设定温度,其中在压力型流量控制系统进行流量控制的同时,将源槽内部空间部分中产生的原料气体供给到处理室。