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    • 9. 发明授权
    • Method for forming a modified semiconductor having a plurality of band gaps
    • 用于形成具有多个带隙的改性半导体的方法
    • US07223623B2
    • 2007-05-29
    • US10510357
    • 2003-04-04
    • Jing Hua TengSoo Jin ChuaJian Rong Dong
    • Jing Hua TengSoo Jin ChuaJian Rong Dong
    • H01L21/00
    • B82Y10/00B82Y20/00H01L21/182H01L29/122H01L29/125H01L29/127H01L33/0095H01S5/1003H01S5/1092H01S5/162H01S5/3412H01S5/3414H01S5/4087
    • A method for forming a modified semiconductor having a number of band gaps involves providing a semiconductor having a surface and a quantum region which emits photons in response to electrical or optical stimulation, the quantum region having an original band gap and being disposed under the surface and applying a number of layers of a number of materials to a number of selected regions of the surface, the materials being adapted to cause, upon thermal annealing, a number of different degrees of intermixing in a number of portions of the quantum region disposed immediately below each of the selected regions of the surface. The layers of materials can be applied in a dot or line pattern, or both, to increase the plurality of band gap tuning. The method includes thermally annealing the layers to the surface. The methods result in a modified semiconductor which exhibits a number of different band gaps in a number of portions of the quantum region depending upon the positioning of the layers of materials on the surface immediately above the respective portions of the quantum region.
    • 用于形成具有多个带隙的修改的半导体的方法涉及提供具有表面的半导体和响应于电或光刺激而发射光子的量子区域,该量子区域具有原始带隙并设置在该表面下方, 将多个材料层施加到表面的多个选定区域,该材料适于在热退火时引起在紧邻下面布置的量子区域的多个部分中的多个不同程度的混合 每个表面的选定区域。 可以以点或线图案或两者来施加材料层以增加多个带隙调谐。 该方法包括将层热层退火到表面。 该方法产生一种修饰的半导体,其取决于材料层在量子区的相应部分上方的表面上的位置,在量子区的多个部分中表现出许多不同的带隙。