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    • 3. 发明申请
    • SUBSTRATE COMPRISING A STACK HAVING THERMAL PROPERTIES
    • 包括具有热性能的堆叠的基板
    • US20090130409A1
    • 2009-05-21
    • US12281774
    • 2007-03-06
    • Pascal ReutlerNicolas NadaudEstelle MartinLaurent Labrousse
    • Pascal ReutlerNicolas NadaudEstelle MartinLaurent Labrousse
    • B32B17/06C23C14/34C23C14/35
    • B32B17/10036B32B17/10018B32B17/10174B32B17/10761B32B17/10788C03C17/36C03C17/3626C03C17/3639C03C17/3652C03C17/366C03C17/3668C03C17/3681Y10T428/2495Y10T428/24975
    • The invention relates to a substrate (10), provided with a thin-film multilayer comprising an alternation of n functional layers (40, 80) having reflection properties in the infrared and/or in solar radiation and (n+1) coatings (20, 60, 100), where n is an integer ≧2, said coatings being composed of a plurality of dielectric layers (24, 26; 64, 66; 104), so that each functional layer (40, 80) is placed between two coatings (20, 60, 100), at least two functional layers (40, 80) each being deposited on a wetting layer (30, 70) itself deposited respectively directly onto a subjacent coating (20, 60), characterized in that two subjacent coatings (20, 60) each comprise at least one dielectric layer (24, 64) and at least one noncrystalline smoothing layer (26, 66) made from a material that is different from the material of said dielectric layer within each coating, said smoothing layer (26, 66) being in contact with said superjacent wetting layer (30, 70) and in that these two subjacent coatings (20, 60) being of different thicknesses, the thickness of the smoothing layer (26, 66) of the subjacent coating (20, 60) that has a total thickness of less than that of the other subjacent coating (60, 20) is less than or equal to the thickness of the smoothing layer (66, 26) of this other subjacent coating (60, 20).
    • 本发明涉及一种具有薄膜多层体的基片(10),该薄膜多层包括在红外和/或太阳辐射和(n + 1)涂层(20)中具有反射特性的n个功能层(40,80) ,60,100),其中n是≥2的整数,所述涂层由多个电介质层(24,26; 64,66; 104)组成,使得每个功能层(40,80)位于 两个涂层(20,60,100),至少两个功能层(40,80)分别沉积在分别直接沉积在下层涂层(20,60)上的润湿层(30,70)上,其特征在于两个 相邻的涂层(20,60)各自包括至少一个电介质层(24,64)和至少一个不同于每个涂层内的所述介电层的材料的材料制成的非结晶平滑层(26,66),所述 平滑层(26,66)与所述相邻的润湿层(30,70)接触,并且这两个相邻的辅助层 (20,60)具有不同厚度的层(20,60),其厚度小于其它下层涂层(60,20)的总厚度的下层涂层(20,60)的平滑层(26,66)的厚度, 小于或等于该另一相邻涂层(60,20)的平滑层(66,26)的厚度。
    • 4. 发明授权
    • Substrate comprising a stack having thermal properties
    • 底物包括具有热性质的叠层
    • US08420207B2
    • 2013-04-16
    • US12281774
    • 2007-03-06
    • Pascal ReutlerNicolas NadaudEstelle MartinLaurent Labrousse
    • Pascal ReutlerNicolas NadaudEstelle MartinLaurent Labrousse
    • B32B17/06C23C14/34C23C14/35
    • B32B17/10036B32B17/10018B32B17/10174B32B17/10761B32B17/10788C03C17/36C03C17/3626C03C17/3639C03C17/3652C03C17/366C03C17/3668C03C17/3681Y10T428/2495Y10T428/24975
    • The invention relates to a substrate (10), provided with a thin-film multilayer comprising an alternation of n functional layers (40, 80) having reflection properties in the infrared and/or in solar radiation and (n+1) coatings (20, 60, 100), where n is an integer ≧2, said coatings being composed of a plurality of dielectric layers (24, 26; 64, 66; 104), so that each functional layer (40, 80) is placed between two coatings (20, 60, 100), at least two functional layers (40, 80) each being deposited on a wetting layer (30, 70) itself deposited respectively directly onto a subjacent coating (20, 60), characterized in that two subjacent coatings (20, 60) each comprise at least one dielectric layer (24, 64) and at least one noncrystalline smoothing layer (26, 66) made from a material that is different from the material of said dielectric layer within each coating, said smoothing layer (26, 66) being in contact with said superjacent wetting layer (30, 70) and in that these two subjacent coatings (20, 60) being of different thicknesses, the thickness of the smoothing layer (26, 66) of the subjacent coating (20, 60) that has a total thickness of less than that of the other subjacent coating (60, 20) is less than or equal to the thickness of the smoothing layer (66, 26) of this other subjacent coating (60, 20).
    • 本发明涉及一种具有薄膜多层体的基片(10),该薄膜多层包括在红外和/或太阳辐射和(n + 1)涂层(20)中具有反射特性的n个功能层(40,80) ,60,100),其中n是≥2的整数,所述涂层由多个介电层(24,26; 64,66; 104)组成,使得每个功能层(40,80)位于两个 涂层(20,60,100),至少两个功能层(40,80)分别沉积在分别直接沉积在下层涂层(20,60)上的润湿层(30,70)上,其特征在于两个下层 涂层(20,60)各自包括至少一个介电层(24,64)和至少一个不同于每个涂层内的所述介电层材料的材料制成的非结晶平滑层(26,66),所述平滑化 层(26,66)与所述相邻的润湿层(30,70)接触,并且这两个下相 (20,60)的厚度不同于所述下层涂层(20,60)的平滑层(26,66)的总厚度小于所述另一个下层涂层(60,20)的厚度, 小于或等于该另一相邻涂层(60,20)的平滑层(66,26)的厚度。
    • 5. 发明授权
    • Antireflection-coated transparent substrate exhibiting neutral color in reflection
    • 抗反射涂层的透明基材在反射中显示中性色
    • US07910215B2
    • 2011-03-22
    • US12282263
    • 2007-02-23
    • Vincent ReymondEstelle Martin
    • Vincent ReymondEstelle Martin
    • E06B3/06B32B9/00F21V9/00G02B1/11
    • C03C17/3435B32B17/10174C03C17/3417C03C2217/734G02B1/115Y10T428/24975
    • Transparent especially glass, substrate (6) having at least on one of its sides an antireflection coating made from a stack (A) of thin dielectric layers of alternating high and low refractive indices, characterized in that the stack comprises, in succession: a high-index first film (1) having a refractive index n1 between 1.8 and 2.3 and a geometrical thickness e1 of between 10 and 25 nm; a low-index second film (2) with a refractive index n2 of between 1.40 and 1.55 and a geometrical thickness e2 of between 20 and 50 nm; a high-index third film (3) with a refractive index n3 of between 1.8 and 2.3 and a geometrical thickness n3 of between 110 and 150 nm; and a low-index fourth film (4) with a refractive index n4 of between 1.40 and 1.55 and a geometrical thickness e4 of between 60 and 95 nm, the algebraic sum of the geometrical thickness e3+e1 being between 125 and 160 nm.
    • 特别是透明玻璃的基板(6),其至少在其一个侧面上具有由交替的高折射率和低折射率的薄介电层的叠层(A)制成的抗反射涂层,其特征在于,所述堆叠依次包括:高 - 折射率n1在1.8和2.3之间并且几何厚度e1在10和25nm之间的指示第一膜(1) 折射率n2在1.40和1.55之间的低折射率第二膜(2)和几何厚度e2在20和50nm之间; 折射率n3在1.8和2.3之间的高折射率第三膜(3)和几何厚度n3在110和150nm之间; 和折射率n4在1.40和1.55之间的低折射率第四膜(4)和几何厚度e4在60和95nm之间,几何厚度e3 + e1的代数和在125和160nm之间。
    • 6. 发明申请
    • ANTIREFLECTION-COATED TRANSPARENT SUBSTRATE EXHIBITING NEUTRAL COLOR IN REFLECTION
    • 抗反射涂层透明基材展示反光中性色
    • US20090104385A1
    • 2009-04-23
    • US12282263
    • 2007-02-23
    • Vincent ReymondEstelle Martin
    • Vincent ReymondEstelle Martin
    • B32B17/00
    • C03C17/3435B32B17/10174C03C17/3417C03C2217/734G02B1/115Y10T428/24975
    • Transparent especially glass, substrate (6) having at least on one of its sides an antireflection coating made from a stack (A) of thin dielectric layers of alternating high and low refractive indices, characterized in that the stack comprises, in succession: a high-index first film (1) having a refractive index n1 between 1.8 and 2.3 and a geometrical thickness e1 of between 10 and 25 nm; a low-index second film (2) with a refractive index n2 of between 1.40 and 1.55 and a geometrical thickness e2 of between 20 and 50 nm; a high-index third film (3) with a refractive index n3 of between 1.8 and 2.3 and a geometrical thickness n3 of between 110 and 150 nm; and a low-index fourth film (4) with a refractive index n4 of between 1.40 and 1.55 and a geometrical thickness e4 of between 60 and 95 nm, the algebraic sum of the geometrical thickness e3+e1 being between 125 and 160 nm.
    • 特别是透明玻璃的基板(6),其至少在其一个侧面上具有由交替的高折射率和低折射率的薄介电层的叠层(A)制成的抗反射涂层,其特征在于,所述堆叠依次包括:高 - 折射率n1在1.8和2.3之间并且几何厚度e1在10和25nm之间的指示第一膜(1) 折射率n2在1.40和1.55之间的低折射率第二膜(2)和几何厚度e2在20和50nm之间; 折射率n3在1.8和2.3之间的高折射率第三膜(3)和几何厚度n3在110和150nm之间; 和折射率n4在1.40和1.55之间的低折射率第四膜(4)和几何厚度e4在60和95nm之间,几何厚度e3 + e1的代数和在125和160nm之间。