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1. 发明授权

US08815340B2 Thin film deposition method 有权
标题翻译：薄膜沉积法
公开(公告)号：US08815340B2
公开(公告)日：2014-08-26
申请号：US13148826
申请日：2010-03-10
申请人： Guillaume Bignon , Nicolas Nadaud , Binh Tran , Se-Jong Kim
发明人： Guillaume Bignon , Nicolas Nadaud , Binh Tran , Se-Jong Kim
IPC分类号： B05D3/08
CPC分类号： C03C17/002 , C03C2218/156 , C03C2218/32 , C03C2218/345 , C23C14/5806
摘要： The subject of the invention is a heat treatment process by flame treatment of at least one thin film deposited on a glass substrate (1) running in the path of at least one flame treatment device comprising at least one burner (2), said treatment being able to increase the degree of crystallization of said at least one thin film and/or to increase the size of the crystallites in said at least one thin film, said process being characterized in that the maximum transient bending “b” is less than 150 mm and respects the following condition: b≦0.9×d where the bending “b” corresponds to the distance, expressed in mm, between the plane of the substrate without heating (P1) and the point of the substrate closest to the plane (P2) passing through the tip (6) of the burner (2) and parallel to the plane of the substrate without heating (P1), “d” corresponds to the distance between the plane of the substrate without heating (P1) and the tip (6) of the burner (2), expressed in mm, the width of the substrate “L” in a direction perpendicular to the run direction (5) being greater than or equal to 1.1 m.
摘要翻译：本发明的主题是通过火焰处理沉积在包括至少一个燃烧器（2）的至少一个火焰处理装置的路径中的玻璃基板（1）上的至少一个薄膜的热处理工艺，所述处理是能够增加所述至少一个薄膜的结晶度和/或增加所述至少一个薄膜中的微晶尺寸，所述方法的特征在于最大瞬态弯曲“b”小于150mm 并且满足以下条件：b＆nlE; 0.9×d其中弯曲“b”对应于不加热衬底的平面（P1）与最接近平面（P2）的衬底的点之间的距离（以mm表示）通过燃烧器（2）的尖端（6）并且平行于基板的平面而不加热（P1），“d”对应于基板的平面与加热（P1）之间的距离和尖端（6））的燃烧器（2），以mm表示，在与行进方向（5）垂直的方向上的基板“L”的宽度大于或等于1.1μm。

2. 发明授权

US08420207B2 Substrate comprising a stack having thermal properties 有权
标题翻译：底物包括具有热性质的叠层
公开(公告)号：US08420207B2
公开(公告)日：2013-04-16
申请号：US12281774
申请日：2007-03-06
申请人： Pascal Reutler , Nicolas Nadaud , Estelle Martin , Laurent Labrousse
发明人： Pascal Reutler , Nicolas Nadaud , Estelle Martin , Laurent Labrousse
IPC分类号： B32B17/06 , C23C14/34 , C23C14/35
CPC分类号： B32B17/10036 , B32B17/10018 , B32B17/10174 , B32B17/10761 , B32B17/10788 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3652 , C03C17/366 , C03C17/3668 , C03C17/3681 , Y10T428/2495 , Y10T428/24975
摘要： The invention relates to a substrate (10), provided with a thin-film multilayer comprising an alternation of n functional layers (40, 80) having reflection properties in the infrared and/or in solar radiation and (n+1) coatings (20, 60, 100), where n is an integer ≧2, said coatings being composed of a plurality of dielectric layers (24, 26; 64, 66; 104), so that each functional layer (40, 80) is placed between two coatings (20, 60, 100), at least two functional layers (40, 80) each being deposited on a wetting layer (30, 70) itself deposited respectively directly onto a subjacent coating (20, 60), characterized in that two subjacent coatings (20, 60) each comprise at least one dielectric layer (24, 64) and at least one noncrystalline smoothing layer (26, 66) made from a material that is different from the material of said dielectric layer within each coating, said smoothing layer (26, 66) being in contact with said superjacent wetting layer (30, 70) and in that these two subjacent coatings (20, 60) being of different thicknesses, the thickness of the smoothing layer (26, 66) of the subjacent coating (20, 60) that has a total thickness of less than that of the other subjacent coating (60, 20) is less than or equal to the thickness of the smoothing layer (66, 26) of this other subjacent coating (60, 20).
摘要翻译：本发明涉及一种具有薄膜多层体的基片（10），该薄膜多层包括在红外和/或太阳辐射和（n + 1）涂层（20）中具有反射特性的n个功能层（40,80），60,100），其中n是≥2的整数，所述涂层由多个介电层（24,26; 64,66; 104）组成，使得每个功能层（40,80）位于两个涂层（20,60,100），至少两个功能层（40,80）分别沉积在分别直接沉积在下层涂层（20,60）上的润湿层（30,70）上，其特征在于两个下层涂层（20,60）各自包括至少一个介电层（24,64）和至少一个不同于每个涂层内的所述介电层材料的材料制成的非结晶平滑层（26,66），所述平滑化层（26,66）与所述相邻的润湿层（30,70）接触，并且这两个下相（20,60）的厚度不同于所述下层涂层（20,60）的平滑层（26,66）的总厚度小于所述另一个下层涂层（60,20）的厚度，小于或等于该另一相邻涂层（60,20）的平滑层（66,26）的厚度。

3. 发明授权

US07737080B2 Substrate, in particular glass substrate, supporting at least one stack of a photocatalytic layer and a sublayer for the heteroepitaxial growth of said layer 失效
标题翻译：基板，特别是玻璃基板，支撑至少一层光催化层和用于所述层的异质外延生长的子层
公开(公告)号：US07737080B2
公开(公告)日：2010-06-15
申请号：US10576724
申请日：2004-10-22
申请人： Laurent Labrousse , Nicolas Nadaud
发明人： Laurent Labrousse , Nicolas Nadaud
IPC分类号： B01J21/06 , B01J23/02 , C23C16/40
CPC分类号： C03C17/3417 , C03C17/3435 , C03C25/52 , C03C2217/71
摘要： The invention relates to a structure, comprising a substrate supporting a layer with a photocatalytic and anti-soiling property on at least part of the surface thereof, said layer being based on titanium dioxide (TiO2) which is at least partially crystallized in the anatase form thereof. Said structure is characterised in comprising a sublayer (SC) directly under at least one TiO2 layer, said sublayer having a crystallographic structure which provides assistance to crystallization by heteroepitaxial growth in the anatase form of the TiO2-based upper layer, the photocatalytic property being obtained without any heating step.
摘要翻译：本发明涉及一种结构，其包括在其表面的至少一部分上支撑具有光催化和抗污染性质的层的基底，所述层基于二氧化钛（TiO 2），其以锐钛矿形式至少部分结晶其中。所述结构的特征在于，在至少一个TiO 2层下方具有亚层（SC），所述子层具有通过在锐钛矿形式的TiO 2类上层中异质外延生长而提供结晶的结晶结构，获得光催化性能没有任何加热步骤。

4. 发明授权

US07166360B2 Glazing provided with a stack of thin layers for solar protection and/or heat insulation 有权
标题翻译：玻璃窗设有一叠薄层，用于太阳能保护和/或隔热
公开(公告)号：US07166360B2
公开(公告)日：2007-01-23
申请号：US10450162
申请日：2001-12-12
申请人： Valérie Coustet , Nicolas Nadaud , Frédéric Barrieres , Jean-Pierre Brochot
发明人： Valérie Coustet , Nicolas Nadaud , Frédéric Barrieres , Jean-Pierre Brochot
IPC分类号： B32B17/06
CPC分类号： C03C17/3618 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , Y10T428/265
摘要： The subject of the invention is glazing comprising at least one transparent substrate provided with a stack of thin layers consisting of an alternation of n functional layers having reflection properties in the infrared and/or the solar radiation range and of n+1 coatings composed of one or more layers made of a dielectric, so that each functional layer is placed between two coatings. At Least one layer absorbent in the visible is inserted between two layers of dielectric of at least one of the said coatings.
摘要翻译：本发明的主题是玻璃，其包括至少一个透明基板，该透明基板设置有由在红外线和/或太阳辐射范围内具有反射特性的n个功能层的交替组成的薄层堆叠以及由一个或多层由电介质制成的层，使得每个功能层位于两个涂层之间。将可见光中的至少一层吸收剂插入到所述涂层中的至少一个的两层电介质之间。

5. 发明申请

US20060234064A1 Dielectric-layer-coated substrate and installation for production thereof 有权
标题翻译：电介质层被覆基板和其制造的安装
公开(公告)号：US20060234064A1
公开(公告)日：2006-10-19
申请号：US10562451
申请日：2004-06-28
申请人： Carole Baubet , Klaus Fischer , Marcus Loergen , Jean-Christophe Giron , Nicolas Nadaud , Eric Mattman , Jean-Paul Rousseau , Alfred Hofrichter , Manfred Jansen
发明人： Carole Baubet , Klaus Fischer , Marcus Loergen , Jean-Christophe Giron , Nicolas Nadaud , Eric Mattman , Jean-Paul Rousseau , Alfred Hofrichter , Manfred Jansen
IPC分类号： C23C14/00 , B32B17/06 , B32B9/00 , C23C16/00
CPC分类号： C03C17/22 , B32B17/10174 , C03C17/225 , C03C17/245 , C03C17/2456 , C03C17/36 , C03C17/3613 , C03C17/3618 , C03C17/3626 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C2217/21 , C03C2217/281 , C03C2217/78 , C03C2218/154 , C03C2218/155 , C23C14/0052 , C23C14/08 , C23C14/086 , C23C14/3442 , C23C14/5833 , H01J2211/446
摘要： The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.
摘要翻译：本发明涉及涂覆有通过溅射沉积的至少一个电介质薄膜层的衬底（1），特别是在氧气和/或氮气存在下，特别是磁性增强溅射和优选反应性溅射的衬底（1），暴露于来自离子源（4）的至少一个离子束（3），其特征在于，暴露于离子束的所述电介质层具有可根据离子源的参数进行调节的折射率，所述离子源为线性源。

6. 发明申请

US20060165963A1 Transparent substrate comprising antiglare coating 审中-公开
标题翻译：包含防眩涂层的透明基材
公开(公告)号：US20060165963A1
公开(公告)日：2006-07-27
申请号：US10519098
申请日：2003-07-02
申请人： Carinne Fleury , Thibaut Heitz , Nicolas Nadaud
发明人： Carinne Fleury , Thibaut Heitz , Nicolas Nadaud
IPC分类号： B32B7/02
CPC分类号： G02B1/115 , B32B17/10174 , B32B17/10376 , C03C17/3417 , C03C17/3435 , G02B1/116 , Y10T428/24942
摘要： A transparent substrate (6), comprising on at least one of its faces an antireflection coating, particularly at normal incidence made of a multilayer (A) of thin layers, characterized in that the multilayer comprises, in succession: a first layer (1), with a refractive index n1 of between 1.8 and 2.2 and geometrical thickness e1 of between 5 and 50 nm, a second layer (2), with a refractive index n2 of between 1.35 and 1.65 and a geometrical thickness e2 of between 5 and 50 nm, a third layer (3) with a refractive index n3 of between 1.8 and 2.2 and a geometrical thickness e3 of between 40 and 150 nm, a fourth layer (4) with a refractive index n4 of between 1.35 and 1.65 and a geometrical thickness e4 of between 40 and 150 nm,
摘要翻译：一种透明衬底（6），在其至少一个表面上包括抗反射涂层，特别是在由多层（A）薄层制成的正常入射处，其特征在于，所述多层包括：第一层（1），折射率n <1，在1.8和2.2之间，几何厚度e 1在5和50nm之间，第二层（2）具有折射率n 在5和50nm之间的几何厚度e 2 <2，在1.35和1.65之间，第三层（3）的折射率为n 3 / 的范围在1.8到2.2之间，几何厚度e 3在40和150nm之间，第四层（4）的折射率n <4 < 介于40和150nm之间的几何厚度e <4 <

7. 发明授权

US09199874B2 Method for depositing a thin film, and resulting material 有权
标题翻译：沉积薄膜的方法和所得材料
公开(公告)号：US09199874B2
公开(公告)日：2015-12-01
申请号：US13322995
申请日：2010-06-04
申请人： Emmanuelle Peter , Andriy Kharchenko , Nicolas Nadaud
发明人： Emmanuelle Peter , Andriy Kharchenko , Nicolas Nadaud
IPC分类号： C03C17/23 , C03C17/245 , C03C17/34 , C03C17/36 , C23C14/08 , C23C14/58 , H01L21/26 , H01L31/0224
CPC分类号： C03C17/23 , C03C17/245 , C03C17/3441 , C03C17/3678 , C03C2217/94 , C03C2218/32 , C03C2218/355 , C23C14/086 , C23C14/5813 , H01L21/26 , H01L31/022466 , Y10T428/24364
摘要： A method of obtaining a substrate coated on a first face with at least one transparent and electrically conductive thin layer based on at least one oxide, including depositing the at least one thin layer on the substrate and subjecting the at least one thin layer to a heat treatment in which the at least one layer is irradiated with aid of radiation having a wavelength between 500 and 2000 nm and focused on a zone of the at least one layer, at least one dimension of which does not exceed 10 cm. The radiation is delivered by at least one radiation device facing the at least one layer, a relative displacement being created between the radiation device and the substrate to treat the desired surface, the heat treatment being such that resistivity of the at least one layer is reduced during the treatment.
摘要翻译：一种基于至少一种氧化物获得涂覆在第一面上的至少一个透明和导电薄层的衬底的方法，包括将至少一个薄层沉积在衬底上并使至少一个薄层受热处理，其中借助于波长在500和2000nm之间的辐射照射所述至少一层，并聚焦在所述至少一层的至少一个维度不超过10cm的区域上。辐射由面向至少一个层的至少一个辐射装置传送，在辐射装置和衬底之间产生相对位移以处理所需表面，热处理使得至少一层的电阻率降低在治疗期间。

8. 发明申请

US20120171439A1 THIN FILM DEPOSITION METHOD 有权
标题翻译：薄膜沉积法
公开(公告)号：US20120171439A1
公开(公告)日：2012-07-05
申请号：US13496090
申请日：2010-09-30
申请人： Andriy Kharchenko , Anne Durandeau , Nicolas Nadaud
发明人： Andriy Kharchenko , Anne Durandeau , Nicolas Nadaud
IPC分类号： B32B3/00 , C23C14/34 , B82Y30/00 , B82Y40/00
CPC分类号： C03C17/002 , C03C17/245 , C03C2217/71 , C03C2218/154 , C03C2218/322 , C23C14/0635 , C23C14/0641 , C23C14/14 , C23C14/185 , C23C14/541 , C23C14/5813 , C23C14/5853 , Y10S977/755 , Y10S977/891 , Y10T428/24917
摘要： The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or less, said oxide film not being part of a multilayer comprising at least one silver film, said process comprising the following steps: at least one intermediate film of a material chosen from the metal M, a nitride of the metal M, a carbide of the metal M and an oxygen-substoichiometric oxide of the metal M is deposited by sputtering, said intermediate film not being deposited above or beneath a titanium-oxide-based film, the physical thickness of said intermediate film being 30 nm or less; and at least part of the surface of said intermediate film is oxidized using a heat treatment, during which said intermediate film is in direct contact with an oxidizing atmosphere, especially air, the temperature of said substrate during said heat treatment not exceeding 150° C.
摘要翻译：本发明的主题是用至少一种金属M的氧化物的至少一部分获得涂覆在其表面的至少一部分的基板的方法，其物理厚度为30nm以下，所述氧化膜不是所述方法包括以下步骤：选自金属M，金属M的氮化物，金属M的碳化物和氧化合物的氧化物的至少一种中间膜金属M通过溅射沉积，所述中间膜不沉积在氧化钛基膜之上或之下，所述中间膜的物理厚度为30nm或更小; 并且所述中间膜的表面的至少一部分通过热处理而被氧化，在此期间所述中间膜与氧化气氛，特别是空气直接接触，所述热处理期间所述基板的温度不超过150℃。

9. 发明申请

US20120087005A1 THIN FILM DEPOSITION METHOD AND RESULTING PRODUCT 有权
标题翻译：薄膜沉积方法和结果产品
公开(公告)号：US20120087005A1
公开(公告)日：2012-04-12
申请号：US13376983
申请日：2010-06-11
申请人： Vincent Reymond , Andriy Kharchenko , Nicolas Nadaud
发明人： Vincent Reymond , Andriy Kharchenko , Nicolas Nadaud
IPC分类号： G02B5/26 , C08J7/18
CPC分类号： C03C17/36 , C03C17/3613 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C23/0025 , C03C23/007
摘要： A process for producing a substrate coated on a face with a low-E thin film multilayer, the process including: depositing a thin-film multilayer containing a thin silver film between at least two thin dielectric films and an absorbent film on a face a substrate; and heat treating the coated face with laser radiation between 500 and 2000 nm to reduce at least one selected from the group of the emissivity and the sheet resistance of the multilayer by at least 5%, wherein the absorbent film at least partially absorbs the laser radiation so that the absorption of the multilayer the wavelength of the laser radiation is such that the absorption of a clear glass substrate 4 mm in thickness coated with the multilayer at the wavelength of the laser radiation is greater than or equal to 10%.
摘要翻译：一种用低-E薄膜多层涂布在基材上的基材的制造方法，该方法包括：在至少两个薄介电膜和吸收膜之间沉积含有薄银膜的薄膜多层 ; 以及在500和2000nm之间的激光辐射下对所述涂覆面进行热处理，以将从所述多层体的发射率和薄层电阻组中选出的至少一种减少至少5％，其中所述吸收膜至少部分地吸收激光辐射使得多层激光辐射的波长的吸收使得在激光辐射的波长下涂覆有多层的4mm厚的透明玻璃基板的吸收大于或等于10％。

10. 发明授权

US07993503B2 Method for preparing by thermal spraying a silicon-and zirconium-based target 有权
标题翻译：通过热喷涂基于硅和锆的靶材制备方法
公开(公告)号：US07993503B2
公开(公告)日：2011-08-09
申请号：US11815588
申请日：2006-02-03
申请人： Nicolas Nadaud , Dominique Billieres
发明人： Nicolas Nadaud , Dominique Billieres
IPC分类号： C23C14/06
CPC分类号： C23C14/3414 , H01J37/34 , H01J37/3429 , H01J37/3491 , Y02T50/67 , Y10T428/2982
摘要： Method of producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound based on atoms of different types chosen especially from the constituents M belonging to the (Zr, Mo, Ti, Nb, Ta, Hf, Cr) family and silicon, characterized in that at least one fraction of said compound, the constituents of which are bonded by covalent and/or ionic and/or metallic bonds, is injected into a plasma jet, said plasma jet spraying the constituents of said compound onto the target so as to deposit a coating of said compound on a surface portion of said target.
摘要翻译：通过热喷涂，特别是通过等离子体喷涂制造靶的方法，所述靶包含至少一种基于不同类型的原子的化合物，特别是选自属于（Zr，Mo，Ti，Nb，Ta，Hf，Cr ）族和硅，其特征在于将至少一部分所述化合物（其组分通过共价和/或离子和/或金属键键合）注入等离子体射流中，所述等离子体射流喷射所述化合物的组分以在所述靶的表面部分上沉积所述化合物的涂层。

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