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1. 发明申请

US20080274604A1 SUSCEPTOR WITH BACKSIDE AREA OF CONSTANT EMISSIVITY 有权
标题翻译：具有不断发生的背景区域的障碍物
公开(公告)号：US20080274604A1
公开(公告)日：2008-11-06
申请号：US11744760
申请日：2007-05-04
申请人： Errol Sanchez , David Carlson , Craig Metzner
发明人： Errol Sanchez , David Carlson , Craig Metzner
IPC分类号： H01L21/20 , C23C16/00
CPC分类号： H01L21/68757 , C23C16/4581 , C23C16/481 , C23C16/52
摘要： Methods and apparatus for providing constant emissivity of the backside of susceptors are provided. Provided is a susceptor comprising: a susceptor plate having a surface for supporting a wafer and a backside surface opposite the wafer supporting surface; a layer comprising an oxide, a nitride, an oxynitride, or combinations thereof located on the backside surface of the susceptor plate, the layer being stable in the presence of a reactive process gas. The layer comprises, for example, silicon dioxide, silicon nitride, silicon oxynitride, or combinations thereof. Also provided is a method comprising: providing a susceptor in a deposition chamber, the susceptor comprising a susceptor plate and a layer comprising an oxide, a nitride, an oxynitride, or combinations thereof, the layer being stable in the presence of the reactive process gases; locating the wafer on a support surface of the susceptor plate. The method can further comprises selectively depositing an epitaxial layer or a non-epitaxial layer on a surface of the wafer. The method further comprises selectively etching to maintain the oxide, nitride, oxynitride, or combinations thereof layer.
摘要翻译：提供了用于提供感受器背面恒定发射率的方法和装置。本发明提供一种基座，其特征在于，包括：具有用于支撑晶片的表面的基座板和与所述晶片支撑面相对的背面; 位于基座板的背面上的包含氧化物，氮化物，氧氮化物或其组合的层，该层在反应性工艺气体存在下是稳定的。该层包括例如二氧化硅，氮化硅，氮氧化硅或其组合。还提供了一种方法，其包括：在沉积室中提供感受器，所述基座包括基座板和包含氧化物，氮化物，氧氮化物或其组合的层，所述层在反应性工艺气体存在下是稳定的 ; 将晶片定位在基座板的支撑表面上。该方法还可以包括在晶片的表面上选择性地沉积外延层或非外延层。该方法还包括选择性蚀刻以维持氧化物，氮化物，氧氮化物或其组合层。

2. 发明申请

US20080014350A1 Apparatus and Methods for Chemical Vapor Deposition 有权
标题翻译：化学气相沉积的装置和方法
公开(公告)号：US20080014350A1
公开(公告)日：2008-01-17
申请号：US11697937
申请日：2007-04-09
申请人： David Carlson , Errol Sanchez , Satheesh Kuppurao
发明人： David Carlson , Errol Sanchez , Satheesh Kuppurao
IPC分类号： C23C16/00
CPC分类号： C23C16/4482
摘要： Methods and apparatus are disclosed for the formation of vaporizing liquid precursor materials. The methods or apparatus can be used as part of a chemical vapor deposition apparatus or system, for example for forming films on substrates. The methods and apparatus involve providing a vessel for containing a liquid precursor and diffusing element having external cross-section dimensions substantially equal to the internal cross-sectional dimensions of the vessel.
摘要翻译：公开了用于形成蒸发液体前体材料的方法和装置。方法或装置可以用作化学气相沉积装置或系统的一部分，例如用于在基底上形成膜。所述方法和装置包括提供用于容纳液体前体的容器和具有基本上等于容器的内部横截面尺寸的外部横截面尺寸的扩散元件。

3. 发明申请

US20070170148A1 Methods for in-situ generation of reactive etch and growth specie in film formation processes 有权
标题翻译：在膜形成过程中原位产生反应性蚀刻和生长物质的方法
公开(公告)号：US20070170148A1
公开(公告)日：2007-07-26
申请号：US11336178
申请日：2006-01-20
申请人： Satheesh Kuppurao , David Carlson , Howard Beckford , Errol Sanchez
发明人： Satheesh Kuppurao , David Carlson , Howard Beckford , Errol Sanchez
IPC分类号： B44C1/22 , H01L21/302 , H01L21/461 , C03C15/00
CPC分类号： H01L21/02532 , C23C16/452 , C30B25/02 , C30B29/06 , H01L21/02529 , H01L21/0262 , H01L21/02636
摘要： Methods and apparatus are disclosed for the formation and utilization of metastable specie in a reaction chamber for processing substrates. The metastable specie may be used for etching the surface of substrates in situ, deposition processes during processing of the substrate.
摘要翻译：公开了用于在处理衬底的反应室中形成和利用亚稳态物质的方法和装置。亚稳态物质可用于原位蚀刻衬底表面，在衬底加工过程中沉积过程。

4. 发明申请

US20070042117A1 Method and apparatus to control semiconductor film deposition characteristics 有权
标题翻译：控制半导体膜沉积特性的方法和装置
公开(公告)号：US20070042117A1
公开(公告)日：2007-02-22
申请号：US11205647
申请日：2005-08-17
申请人： Satheesh Kuppurao , David Carlson , Manish Hemkar , Andrew Lam , Errol Sanchez , Howard Beckford
发明人： Satheesh Kuppurao , David Carlson , Manish Hemkar , Andrew Lam , Errol Sanchez , Howard Beckford
IPC分类号： C23C16/00
CPC分类号： C23C16/46 , C23C16/4411 , C23C16/52 , H01L21/67115 , H01L21/67248
摘要： Methods, systems and apparatus are disclosed for adjusting the temperature of at least a portion of the surface of a reaction chamber during a film formation process to control film properties. More than one portion of the chamber surface may be temperature-modulated.
摘要翻译：公开了用于在成膜过程中调节反应室表面的至少一部分的温度以控制膜性质的方法，系统和装置。腔表面的多于一个部分可以进行温度调制。

5. 发明申请

US20080072820A1 MODULAR CVD EPI 300MM REACTOR 审中-公开
标题翻译：模块化CVD EPI 300MM反应器
公开(公告)号：US20080072820A1
公开(公告)日：2008-03-27
申请号：US11767619
申请日：2007-06-25
申请人： Brian Burrows , Craig Metzner , Dennis Demars , Roger Anderson , Juan Chacin , David Carlson , David Ishikawa , Jeffrey Campbell , Richard Collins , Keith Magill , Imran Afzal
发明人： Brian Burrows , Craig Metzner , Dennis Demars , Roger Anderson , Juan Chacin , David Carlson , David Ishikawa , Jeffrey Campbell , Richard Collins , Keith Magill , Imran Afzal
IPC分类号： B05C11/00
CPC分类号： H01L21/67115 , H01L21/67017 , H01L21/6719
摘要： The present invention provides methods and apparatus for processing semiconductor substrates. Particularly, the present invention provides a modular processing cell to be used in a cluster tool. The modular semiconductor processing cell of the present invention comprises a chamber having an inject cap, a gas panel module configured to supply one or more processing gas to the chamber through the inject cap, wherein the gas panel module is position adjacent the inject cap. The processing cell further comprises a lamp module positioned below the chamber. The lamp module comprises a plurality of vertically oriented lamps.
摘要翻译：本发明提供了半导体衬底的处理方法和装置。特别地，本发明提供了一种在群集工具中使用的模块化处理单元。本发明的模块化半导体处理单元包括具有注入盖的腔室，配置成通过喷射盖向腔室供应一种或多种处理气体的气体面板模块，其中气体面板模块位于与喷射盖相邻的位置。处理室还包括位于室下方的灯模块。灯模块包括多个垂直取向的灯。

6. 发明申请

US20210055627A1 TANTALA RING RESONATOR AND METHOD FOR FABRICATING NONLINEAR PHOTONIC DEVICES 有权
公开(公告)号：US20210055627A1
公开(公告)日：2021-02-25
申请号：US16501134
申请日：2020-07-10
申请人： Su-Peng Yu , Scott B. Papp , David Carlson , Kartik Srinivasan , Hojoog Jung
发明人： Su-Peng Yu , Scott B. Papp , David Carlson , Kartik Srinivasan , Hojoog Jung
IPC分类号： G02F1/35 , G02F1/355 , C23C14/34 , C23C14/08 , C23C14/58 , G03F7/20
摘要： A tantala ring resonator includes a tantala ring resonator formed by ion-beam sputtering of tantalum pentoxide and exhibiting an optical quality factor in excess of 3×106, and a substrate to which the tantala ring resonator is attached. A method for fabricating nonlinear photonic devices includes depositing tantalum pentoxide with ion-beam sputtering to form a tantala layer onto a substrate, annealing the tantala layer, and etching the tantala layer to form a photonic device.

7. 发明授权

US08580058B2 Structurally reinforced members 有权
公开(公告)号：US08580058B2
公开(公告)日：2013-11-12
申请号：US11944075
申请日：2007-11-21
申请人： Michael J. Czaplicki , David Carlson
发明人： Michael J. Czaplicki , David Carlson
IPC分类号： B29C65/00
CPC分类号： B62D29/002 , B29C70/70 , B29C70/84 , Y10T428/249981 , Y10T428/249983 , Y10T428/249984 , Y10T428/249987 , Y10T428/28 , Y10T428/2813 , Y10T428/2848
摘要： There is disclosed a reinforcement material for forming reinforced members. The reinforcement material includes a strengthening material which is preferably a fabric disposed at least partially between portions of matrix material.

8. 发明申请

US20120221369A1 METHOD, APPARATUS AND COMPUTER PROGRAM PRODUCT FOR SUGGESTING IMPERFECT TIMES FOR CYCLICAL APPOINTMENTS 审中-公开
标题翻译：方法，设备和计算机程序产品，用于建议循环任务的不正确时间
公开(公告)号：US20120221369A1
公开(公告)日：2012-08-30
申请号：US13034153
申请日：2011-02-24
申请人： Kent Braatem , David Carlson
发明人： Kent Braatem , David Carlson
IPC分类号： G06Q10/00 , G06Q50/00
CPC分类号： G06Q10/06
摘要： A method for developing cost-effective pathways for treatment using an evidence-based approach may include enabling suggestions of imperfect times for cyclical appointments may include receiving availability information defining available periods for a healthcare related asset, receiving appointment parameters defining a number and frequency of recurring appointments to be scheduled, determining, via processing circuitry, periods of overlap between the available periods and the appointment parameters, and determining an inconsistent schedule pattern based on the periods of overlap. A corresponding computer program product and apparatus are also provided.
摘要翻译：使用基于证据的方法开发用于治疗的成本效益途径的方法可以包括实现周期性约会的不完美时间的建议可以包括接收定义与保健相关资产的可用时段的可用性信息，接收定义重复次数和频率的约定参数通过处理电路确定可用时间段与预约参数之间的重叠周期，以及基于重叠周期来确定不一致的调度模式。还提供了相应的计算机程序产品和装置。

9. 发明申请

US20100179787A2 AERIAL ROOF ESTIMATION SYSTEM AND METHOD 有权
标题翻译： AERIAL屋顶估计系统和方法
公开(公告)号：US20100179787A2
公开(公告)日：2010-07-15
申请号：US12148439
申请日：2008-04-17
申请人： Chris Pershing , David Carlson
发明人： Chris Pershing , David Carlson
IPC分类号： G01B13/20
CPC分类号： G06Q30/0206 , G06Q10/00 , G06Q30/0283 , G06Q40/08 , G06Q50/16
摘要： A system that allows the remote measurement of the size, geometry, pitch and orientation of the roof sections of a building and then uses the information to provide an estimate to repair or replace the roof, or to install equipment thereon. The system includes an aerial image file database that shows aerial images of buildings in a designated area according to address. The slope and orientation images are typically oblique perspective views and top plan views of the buildings in the area. The system also includes an image analysis and calibration feature that enables the viewer to closely estimate the size, geometry and orientation of the building's roof sections. The information can then be used to prepare a cost estimate for the repair or replacement of the roof or installation of roof equipment. By simply inputting the potential customer's address, the company is able to determine the size, geometry, pitch and orientation of the roof sections of the building at that address, and then quickly provide an accurate estimate to the customer.
摘要翻译：允许远程测量建筑物屋顶部分的尺寸，几何形状，俯仰和方向的系统，然后使用该信息来提供对屋顶的修理或更换或在其上安装设备的估计。该系统包括一个航空图像文件数据库，根据地址显示指定区域内的建筑物的空中图像。倾斜和定向图像通常是该区域的建筑物的倾斜透视图和俯视图。该系统还包括图像分析和校准功能，使得观看者可以仔细估计建筑物屋顶部分的尺寸，几何形状和方向。然后可以使用这些信息来准备屋顶设备的屋顶或安装的修理或更换的成本估算。通过简单地输入潜在客户的地址，公司能够确定该地址的建筑物屋顶部分的尺寸，几何形状，倾斜度和方向，然后快速为客户提供准确的估计。

10. 发明申请

US20080029214A1 MULTIPLE OR SINGLE STAGE CURE ADHESIVE MATERIAL AND METHOD OF USE 审中-公开
标题翻译：多种或单级固化粘合材料及其使用方法
公开(公告)号：US20080029214A1
公开(公告)日：2008-02-07
申请号：US11782806
申请日：2007-07-25
申请人： Christopher Hable , Matthew Harthcock , David Carlson , David Kosal , Brandon Madaus
发明人： Christopher Hable , Matthew Harthcock , David Carlson , David Kosal , Brandon Madaus
IPC分类号： C09J5/06
CPC分类号： C09J5/06 , C08J5/121 , C08K5/16 , C09J163/00 , C09J2463/00
摘要： An adhesive is provided for bonding to a first surface, a second surface or both. The adhesive typically includes at least one curing agent that cures through exposure to a condition such as heat, moisture or a combination thereof.
摘要翻译：提供粘合剂用于结合到第一表面，第二表面或两者。粘合剂通常包括至少一种通过暴露于诸如热，水分或其组合的条件下固化的固化剂。

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