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    • 1. 发明授权
    • Method of testing a memory
    • 测试内存的方法
    • US06829736B1
    • 2004-12-07
    • US09831657
    • 2001-05-11
    • Erik Jan MarinissenGuillaume Elisabeth Andreas LousbergPaul Wielage
    • Erik Jan MarinissenGuillaume Elisabeth Andreas LousbergPaul Wielage
    • H03M1300
    • G11C29/44
    • A built-in self-diagnostic (BISD) memory device includes a two-dimension memory array provided with a redundant memory rows and columns that can be substituted for various ones in the two-dimension memory array by an external repair facility. A stimulus generator outputs multi-address test sequences to the memory array during a test mode. A response evaluator receives responses from the memory. A fault table stores evaluations of the responses, and communicates them to the external repair facility. A repair register indicates which memory columns have been intermediately scheduled for repair by the response evaluator. Column counters each accumulate the number of memory bit faults detected in a respective memory column. All are disposed in a single integrated circuit semiconductor device.
    • 内置自诊断(BISD)存储器件包括一个二维存储器阵列,其具有可由外部修复设备代替二维存储器阵列中的各种存储器行和列的冗余存储器行和列。 刺激发生器在测试模式期间向存储器阵列输出多地址测试序列。 响应评估器从内存接收响应。 故障表存储响应的评估,并将其传达给外部维修设施。 修复寄存器指示哪些内存列已被中间计划由响应评估程序进行修复。 列计数器每个累加在相应存储器列中检测到的存储器位故障的数量。 全部设置在单个集成电路半导体器件中。
    • 5. 发明授权
    • On-chip testing using time-to-digital conversion
    • 使用时间到数字转换的片上测试
    • US08680874B2
    • 2014-03-25
    • US13194818
    • 2011-07-29
    • Nikolaos MinasErik Jan Marinissen
    • Nikolaos MinasErik Jan Marinissen
    • G01R27/02
    • G01R31/2853
    • A method and system for testing the functionality of a through-silicon-via in an integrated circuit is disclosed. In one aspect, the functionality is tested by measuring its capacitance from one side only. The capacitance of the TSV can be determined by measuring a timing delay introduced in a measurement circuit due to the presence of the TSV. The timing delay is determined by comparing the timing of measurement signal from the measurement circuit with the timing of a reference signal provided by a reference circuit. The comparison is carried out using a digital timing measurement circuit, such as a time-to-digital converter.
    • 公开了一种用于测试集成电路中的硅通孔的功能的方法和系统。 在一个方面,通过仅从一侧测量其电容来测试功能。 可以通过测量由于TSV的存在而在测量电路中引入的定时延迟来确定TSV的电容。 定时延迟通过将来自测量电路的测量信号的定时与由参考电路提供的参考信号的定时进行比较来确定。 使用诸如时间 - 数字转换器的数字定时测量电路进行比较。
    • 8. 发明授权
    • Test circuit for testing through-silicon-vias in 3D integrated circuits
    • 用于在3D集成电路中测试硅通孔的测试电路
    • US08773157B2
    • 2014-07-08
    • US13174617
    • 2011-06-30
    • Mustafa BadarogluErik Jan MarinissenPaul Marchal
    • Mustafa BadarogluErik Jan MarinissenPaul Marchal
    • G01R31/26G01R31/00
    • G01R31/318513G01R31/2853G01R31/31717H01L22/34
    • A test circuit and method for testing through-silicon-vias (TSVs) in three-dimensional integrated circuits (ICs) during each phase of manufacturing is disclosed. In one aspect, the method includes testing for faults in each individual TSV, TSV-under-test, shorts between a TSV-under-test, and TSVs in close proximity and for connections between the TSV-under-test and another tier in the ICs. A test circuit has three switchable current paths connected to a power supply via a pull-up resistor and switches: a calibration path, a short path, and a current measurement path. A power supply is connected to the measurement path, and the calibration path and the short path are connected to ground via respective pull-down resistors. For each TSV-under-test, the desired operation mode is selected by the closure of different combinations of switches. The current flowing through the pull-up resistor in each operation mode indicates whether the TSV-under-test has passed or failed the test.
    • 公开了在每个制造阶段在三维集成电路(IC)中测试穿硅通孔(TSV)的测试电路和方法。 在一个方面,该方法包括测试每个单独的TSV,TSV未测试中的TSV测试之间的短路,以及紧邻的TSV之间的短路以及TSV未测试之间的连接以及 ICs。 测试电路具有通过上拉电阻连接到电源的三个可切换电流路径,并且切换:校准路径,短路径和电流测量路径。 电源连接到测量路径,校准路径和短路通过相应的下拉电阻连接到地。 对于每个TSV低于测试,通过关闭开关的不同组合来选择所需的操作模式。 在每种运行模式下流过上拉电阻的电流表示TSV未测试是否已通过或失败。
    • 9. 发明申请
    • FAULT MODE CIRCUITS
    • 故障电路
    • US20130002272A1
    • 2013-01-03
    • US13174617
    • 2011-06-30
    • Mustafa BadarogluErik Jan MarinissenPaul Marchal
    • Mustafa BadarogluErik Jan MarinissenPaul Marchal
    • G01R31/02
    • G01R31/318513G01R31/2853G01R31/31717H01L22/34
    • A test circuit and method for testing through-silicon-vias (TSVs) in three-dimensional integrated circuits (ICs) during each phase of manufacturing is disclosed. In one aspect, the method includes testing for faults in each individual TSV, TSV-under-test, shorts between a TSV-under-test, and TSVs in close proximity and for connections between the TSV-under-test and another tier in the ICs. A test circuit has three switchable current paths connected to a power supply via a pull-up resistor and switches: a calibration path, a short path, and a current measurement path. A power supply is connected to the measurement path, and the calibration path and the short path are connected to ground via respective pull-down resistors. For each TSV-under-test, the desired operation mode is selected by the closure of different combinations of switches. The current flowing through the pull-up resistor in each operation mode indicates whether the TSV-under-test has passed or failed the test.
    • 公开了在每个制造阶段在三维集成电路(IC)中测试穿硅通孔(TSV)的测试电路和方法。 在一个方面,该方法包括测试每个单独的TSV,TSV未测试中的TSV测试之间的短路,以及紧邻的TSV之间的短路以及TSV未测试之间的连接以及 ICs。 测试电路具有通过上拉电阻连接到电源的三个可切换电流路径,并且切换:校准路径,短路径和电流测量路径。 电源连接到测量路径,校准路径和短路通过相应的下拉电阻连接到地。 对于每个TSV低于测试,通过关闭开关的不同组合来选择所需的操作模式。 在每种运行模式下流过上拉电阻的电流表示TSV未测试是否已通过或失败。
    • 10. 发明申请
    • ON-CHIP TESTING USING TIME-TO-DIGITAL CONVERSION
    • 使用时间到数字转换的片上测试
    • US20120025846A1
    • 2012-02-02
    • US13194818
    • 2011-07-29
    • Nikolaos MinasErik Jan Marinissen
    • Nikolaos MinasErik Jan Marinissen
    • G01R27/02
    • G01R31/2853
    • A method and system for testing the functionality of a through-silicon-via in an integrated circuit is disclosed. In one aspect, the functionality is tested by measuring its capacitance from one side only. The capacitance of the TSV can be determined by measuring a timing delay introduced in a measurement circuit due to the presence of the TSV. The timing delay is determined by comparing the timing of measurement signal from the measurement circuit with the timing of a reference signal provided by a reference circuit. The comparison is carried out using a digital timing measurement circuit, such as a time-to-digital converter.
    • 公开了一种用于测试集成电路中的硅通孔的功能的方法和系统。 在一个方面,通过仅从一侧测量其电容来测试功能。 可以通过测量由于TSV的存在而在测量电路中引入的定时延迟来确定TSV的电容。 定时延迟通过将来自测量电路的测量信号的定时与由参考电路提供的参考信号的定时进行比较来确定。 使用诸如时间 - 数字转换器的数字定时测量电路进行比较。