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    • 3. 发明授权
    • Laser diode and method for fabricating same
    • 激光二极管及其制造方法
    • US08679876B2
    • 2014-03-25
    • US12826305
    • 2010-06-29
    • Arpan ChakrabortyMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • Arpan ChakrabortyMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • H01L21/00
    • H01S5/34333B82Y20/00H01S5/2004H01S5/3406
    • A laser diode and method for fabricating same, wherein the laser diode generally comprises an InGaN compliance layer on a GaN n-type contact layer and an AlGaN/GaN n-type strained super lattice (SLS) on the compliance layer. An n-type GaN separate confinement heterostructure (SCH) is on said n-type SLS and an InGaN multiple quantum well (MQW) active region is on the n-type SCH. A GaN p-type SCH on the MQW active region, an AlGaN/GaN p-type SLS is on the p-type SCH, and a p-type GaN contact layer is on the p-type SLS. The compliance layer has an In percentage that reduces strain between the n-type contact layer and the n-type SLS compared to a laser diode without the compliance layer. Accordingly, the n-type SLS can be grown with an increased Al percentage to increase the index of refraction. This along with other features allows for reduced threshold current and voltage operation.
    • 一种激光二极管及其制造方法,其中激光二极管通常包括在GaN n型接触层上的InGaN柔性层和在柔性层上的AlGaN / GaN n型应变超晶格(SLS)。 n型GaN分离限制异质结构(SCH)在所述n型SLS上,并且InGaN多量子阱(MQW)有源区在n型SCH上。 在MQW有源区上的GaN p型SCH,AlGaN / GaN p型SLS在p型SCH上,p型GaN接触层在p型SLS上。 顺应层具有与不具有柔顺层的激光二极管相比,n型接触层和n型SLS之间的应变的In百分比。 因此,n型SLS可以以增加的Al百分数生长以增加折射率。 这与其他功能一起允许降低阈值电流和电压操作。
    • 5. 发明授权
    • Composite high reflectivity layer
    • 复合高反射层
    • US07915629B2
    • 2011-03-29
    • US12316097
    • 2008-12-08
    • Ting LiMonica HansenJames Ibbetson
    • Ting LiMonica HansenJames Ibbetson
    • H01L33/00
    • H01L33/10H01L33/46H01L2224/48091H01L2224/48247H01L2924/00014
    • A high efficiency light emitting diode with a composite high reflectivity layer integral to said LED to improve emission efficiency. One embodiment of a light emitting diode (LED) chip comprises an LED and a composite high reflectivity layer integral to the LED to reflect light emitted from the active region. The composite layer comprises a first layer, and alternating plurality of second and third layers on the first layer, and a reflective layer on the topmost of said plurality of second and third layers. The second and third layers have a different index of refraction, and the first layer is at least three times thicker than the thickest of the second and third layers. For composite layers internal to the LED chip, conductive vias can be included through the composite layer to allow an electrical signal to pass through the composite layer to the LED.
    • 一种具有与所述LED集成的复合高反射层的高效率发光二极管,以提高发射效率。 发光二极管(LED)芯片的一个实施例包括LED和与LED成一体的复合高反射层,以反射从有源区发射的光。 所述复合层包括第一层和在第一层上交替的多个第二和第三层,以及在所述多个第二层和第三层的最上层的反射层。 第二层和第三层具有不同的折射率,并且第一层比第二层和第三层中最厚的层厚至少三倍。 对于LED芯片内部的复合层,可以通过复合层包括导电通孔,以允许电信号通过复合层到达LED。
    • 6. 发明授权
    • Pendeo epitaxial structures and devices
    • Pendeo外延结构和器件
    • US07682944B2
    • 2010-03-23
    • US11957154
    • 2007-12-14
    • George R. BrandesArpan ChakrabortyShuji NakamuraMonica HansenSteven Denbaars
    • George R. BrandesArpan ChakrabortyShuji NakamuraMonica HansenSteven Denbaars
    • H01L21/20
    • H01L21/02639H01L21/0237H01L21/0254H01L21/0265H01L29/2003H01L29/66462
    • A substrate comprising a trench lateral epitaxial overgrowth structure including a trench cavity, wherein the trench cavity includes a growth-blocking layer or patterned material supportive of a coalescent Pendeo layer thereon, on at least a portion of an inside surface of the trench. Such substrate is suitable for carrying out lateral epitaxial overgrowth to form a bridged lateral overgrowth formation overlying the trench cavity. The bridged lateral overgrowth formation provides a substrate surface on which epitaxial layers can be grown in the fabrication of microelectronic devices such as laser diodes, high electron mobility transistors, ultraviolet light emitting diodes, and other devices in which low dislocation density is critical. The epitaxial substrate structures of the invention can be formed without the necessity for deep trenches, such as are required in conventional Pendeo epitaxial overgrowth structures.
    • 一种衬底,包括包括沟槽腔的沟槽横向外延生长结构,其中所述沟槽腔在所述沟槽的内表面的至少一部分上包括支撑其上的聚结Pendeo层的生长阻挡层或图案化材料。 这种衬底适用于进行横向外延过度生长以形成覆盖在沟槽腔上的桥接横向过度生长层。 桥接的横向过生长形成提供衬底表面,在衬底表面上,可以在其中制造微电子器件(例如激光二极管,高电子迁移率晶体管,紫外发光二极管以及低位错密度至关重要的其它器件)中生长外延层。 可以形成本发明的外延衬底结构,而不需要诸如常规Pendeo外延过度生长结构中所需的深沟槽。
    • 7. 发明授权
    • Laser diode and method for fabricating same
    • 激光二极管及其制造方法
    • US07769066B2
    • 2010-08-03
    • US11600604
    • 2006-11-15
    • Arpan ChakrabortyMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • Arpan ChakrabortyMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • H01S5/00
    • H01S5/34333B82Y20/00H01S5/2004H01S5/3406
    • A laser diode and method for fabricating same, wherein the laser diode generally comprises an InGaN compliance layer on a GaN n-type contact layer and an AlGaN/GaN n-type strained super lattice (SLS) on the compliance layer. An n-type GaN separate confinement heterostructure (SCH) is on said n-type SLS and an InGaN multiple quantum well (MQW) active region is on the n-type SCH. A GaN p-type SCH on the MQW active region, an AlGaN/GaN p-type SLS is on the p-type SCH, and a p-type GaN contact layer is on the p-type SLS. The compliance layer has an In percentage that reduces strain between the n-type contact layer and the n-type SLS compared to a laser diode without the compliance layer. Accordingly, the n-type SLS can be grown with an increased Al percentage to increase the index of refraction. This along with other features allows for reduced threshold current and voltage operation.
    • 一种激光二极管及其制造方法,其中激光二极管通常包括在GaN n型接触层上的InGaN柔性层和在柔性层上的AlGaN / GaN n型应变超晶格(SLS)。 n型GaN分离限制异质结构(SCH)在所述n型SLS上,并且InGaN多量子阱(MQW)有源区在n型SCH上。 在MQW有源区上的GaN p型SCH,AlGaN / GaN p型SLS在p型SCH上,p型GaN接触层在p型SLS上。 顺应层具有与不具有柔顺层的激光二极管相比,n型接触层和n型SLS之间的应变的In百分比。 因此,n型SLS可以以增加的Al百分数生长以增加折射率。 这与其他功能一起允许降低阈值电流和电压操作。
    • 9. 发明申请
    • LASER DIODE AND METHOD FOR FABRICATING SAME
    • 激光二极管及其制造方法
    • US20100273281A1
    • 2010-10-28
    • US12826305
    • 2010-06-29
    • ARPAN CHAKRABORTYMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • ARPAN CHAKRABORTYMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • H01L21/20
    • H01S5/34333B82Y20/00H01S5/2004H01S5/3406
    • A laser diode and method for fabricating same, wherein the laser diode generally comprises an InGaN compliance layer on a GaN n-type contact layer and an AlGaN/GaN n-type strained super lattice (SLS) on the compliance layer. An n-type GaN separate confinement heterostructure (SCH) is on said n-type SLS and an InGaN multiple quantum well (MQW) active region is on the n-type SCH. A GaN p-type SCH on the MQW active region, an AlGaN/GaN p-type SLS is on the p-type SCH, and a p-type GaN contact layer is on the p-type SLS. The compliance layer has an In percentage that reduces strain between the n-type contact layer and the n-type SLS compared to a laser diode without the compliance layer. Accordingly, the n-type SLS can be grown with an increased Al percentage to increase the index of refraction. This along with other features allows for reduced threshold current and voltage operation.
    • 一种激光二极管及其制造方法,其中激光二极管通常包括在GaN n型接触层上的InGaN柔性层和在柔性层上的AlGaN / GaN n型应变超晶格(SLS)。 n型GaN分离限制异质结构(SCH)在所述n型SLS上,并且InGaN多量子阱(MQW)有源区在n型SCH上。 在MQW有源区上的GaN p型SCH,AlGaN / GaN p型SLS在p型SCH上,p型GaN接触层在p型SLS上。 顺应层具有与不具有柔顺层的激光二极管相比,n型接触层和n型SLS之间的应变的In百分比。 因此,n型SLS可以以增加的Al百分数生长以增加折射率。 这与其他功能一起允许降低阈值电流和电压操作。