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1. 发明申请

US20050218342A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050218342A1
公开(公告)日：2005-10-06
申请号：US10813682
申请日：2004-03-31
申请人： Engelbertus Antonius Van Der Pasch , Marcel Hendrikus Beems , Martinus Hendrikus Leenders
发明人： Engelbertus Antonius Van Der Pasch , Marcel Hendrikus Beems , Martinus Hendrikus Leenders
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70575 , G03F7/7005
摘要： A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. A support is configured to support a patterning device, the patterning device is configured to impart the radiation with a pattern in its cross-section. A substrate table is configured to hold a substrate, and a projection system is configured to project the patterned radiation onto a target portion of a substrate. The first wavelength range is the primary wavelength of the lithographic apparatus. The second wavelength range is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.
摘要翻译：光刻设备包括被配置为向照明系统提供辐射的辐射源，所述辐射源被配置为提供在第一波长范围内且在第二波长范围内的第二波长范围与第一波长范围不同的辐射。支撑件被构造成支撑图案形成装置，图案形成装置被配置成在其横截面中赋予辐射图案。衬底台被配置为保持衬底，并且投影系统被配置为将图案化的辐射投影到衬底的目标部分上。第一波长范围是光刻设备的主要波长。第二波长范围用于光刻设备的设置，该设置包括校准，鉴定，性能测试和对准中的一个或多个。第二波长范围也可以用于另外的基底的曝光。

2. 发明申请

US20050128461A1 Lithographic apparatus and device manufacturing method, and measurement systems 审中-公开
标题翻译：平版印刷设备和器件制造方法以及测量系统
公开(公告)号：US20050128461A1
公开(公告)日：2005-06-16
申请号：US10970656
申请日：2004-10-22
申请人： Marcel Hendrikus Beems , Engelbertus Antonius Van Der Pasch
发明人： Marcel Hendrikus Beems , Engelbertus Antonius Van Der Pasch
IPC分类号： G01B11/00 , G03F7/20 , H01L21/027 , G03B27/58
CPC分类号： G03F7/70775
摘要： The invention pertains to a lithographic apparatus including a radiation system configured to condition a beam of radiation; a projection system configured to project the beam of radiation onto a target portion of a substrate; a displacement device configured to move the moveable object relative to the projection system in substantially a first direction and a second direction differing from the first direction; and a measuring device configured to measure a displacement of the moveable object in a third direction, which is substantially perpendicular to the first direction and to the second direction, wherein the measuring device may include an encoder system.
摘要翻译：本发明涉及一种包括配置成调节辐射束的辐射系统的光刻设备; 投影系统，被配置为将辐射束投影到基板的目标部分上; 位移装置，其构造成在基本上第一方向和与第一方向不同的第二方向上相对于投影系统移动可移动物体; 以及测量装置，被配置为测量所述可移动物体在基本上垂直于所述第一方向和所述第二方向的第三方向上的位移，其中所述测量装置可包括编码器系统。

3. 发明申请

US20060290914A1 Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method 有权
标题翻译：使用装有编码器的大面积FPD卡盘的光刻设备和器件制造方法进行编码器刻度校准方法
公开(公告)号：US20060290914A1
公开(公告)日：2006-12-28
申请号：US11165575
申请日：2005-06-24
申请人： Engelbertus Antonius Van Der Pasch , Harmen Van Der Schoot
发明人： Engelbertus Antonius Van Der Pasch , Harmen Van Der Schoot
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70625
摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The substrate table supports a substrate. The projection system projects the modulated radiation beam onto a target portion of the substrate, thereby applying a pattern to the target portion of the substrate. The pattern comprises a first line and a second line. The first line is offset from the second line. The position encoder determines a position of the substrate table. The position encoder comprises a position sensor and a scale. The scale comprises a plurality of lines intended to be straight and parallel to one another. The imaging device obtains an image of the first line and the second line. The image processing unit measures the separation between the first line and the second line in a plurality of locations, and determines the non-uniformity of at least a part of the scale from the plurality of separations.
摘要翻译：光刻设备包括照明系统，独立可控元件的阵列，衬底台，投影系统，位置编码器，成像设备和图像处理单元。照明系统调节辐射束。独立可控元件的阵列调制辐射束的横截面。衬底台支撑衬底。投影系统将调制的辐射束投影到基板的目标部分上，从而将图案施加到基板的目标部分。该图案包括第一行和第二行。第一行偏离第二行。位置编码器确定衬底台的位置。位置编码器包括位置传感器和秤。该刻度尺包括多条相互直线并平行的线。成像装置获得第一行和第二行的图像。图像处理单元测量多个位置中第一线和第二线之间的间隔，并且从多个分离中确定刻度的至少一部分的不均匀性。

4. 发明申请

US20060227309A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060227309A1
公开(公告)日：2006-10-12
申请号：US11224308
申请日：2005-09-13
申请人： Erik Loopstra , Engelbertus Antonius Van Der Pasch
发明人： Erik Loopstra , Engelbertus Antonius Van Der Pasch
IPC分类号： G03B27/42
CPC分类号： G03F7/70775
摘要： A lithographic apparatus includes a displacement measuring system configured to measure the position of a substrate table in at least three degrees of freedom. The displacement measuring system includes a first x-sensor configured to measure the position of the substrate table in a first direction and a first and a second y-sensor configured to measure the position of the substrate table in a second direction. Said displacement measuring system further comprises a second x-sensor. The first and second x-sensor and first and second y-sensors are encoder type sensors configured to measure the position of each of the sensors with respect to at least one grid plate. The displacement measuring system is configured to selectively use, depending on the position of the substrate table, three of the first and second x-sensors and the first and second y-sensors to determine the position of the substrate table in three degrees of freedom.

5. 发明申请

US20090002653A1 Lithographic apparatus having encoder type position sensor system 有权
标题翻译：光刻设备具有编码器型位置传感器系统
公开(公告)号：US20090002653A1
公开(公告)日：2009-01-01
申请号：US12153799
申请日：2008-05-23
申请人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Van Der Pasch , Ruud Antonius Beerens , Albertus Adrianus Smits
发明人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Van Der Pasch , Ruud Antonius Beerens , Albertus Adrianus Smits
IPC分类号： G03B27/54 , G03B27/74
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译：公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

6. 发明申请

US20070195296A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070195296A1
公开(公告)日：2007-08-23
申请号：US11358725
申请日：2006-02-22
申请人： Engelbertus Antonius Van Der Pasch , Emiel Eussen
发明人： Engelbertus Antonius Van Der Pasch , Emiel Eussen
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70725
摘要： A lithographic apparatus includes a displacement measuring system to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least three coplanar degrees of freedom (x, y, Rz) of an orthogonal x-y-z coordinate system centred in the center of the moveable object. The moveable object includes a support structure configured to support a patterning device or a substrate table configured to support a substrate. The displacement measuring system includes at least three sensor heads, each sensor head being positioned with a measuring direction substantially coplanar with the x-y plane of the coordinate system and each sensor head being furthermore positioned with the measuring direction substantially perpendicular to a connection line connecting the sensor head with the center of the movable object and extending coplanar with the x-y plane.
摘要翻译：光刻设备包括位移测量系统，用于以至少三个以共焦平面自由度（x，y，Rz）为中心的正交xyz坐标系统来测量可移动物体相对于光刻设备的参考系的位置可移动物体的中心。可移动物体包括支撑结构，其构造成支撑构造成支撑衬底的图案形成装置或衬底台。位移测量系统包括至少三个传感器头，每个传感器头被定位成具有与坐标系的xy平面基本上共面的测量方向，并且每个传感器头进一步定位，测量方向基本上垂直于连接传感器头部与可移动物体的中心并与xy平面延伸共面。

7. 发明申请

US20070058172A1 Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit 有权
标题翻译：位置测量单元，测量系统和包括该位置测量单元的光刻设备
公开(公告)号：US20070058172A1
公开(公告)日：2007-03-15
申请号：US11226460
申请日：2005-09-15
申请人： Engelbertus Antonius Van Der Pasch , Erik Loopstra
发明人： Engelbertus Antonius Van Der Pasch , Erik Loopstra
IPC分类号： G01B9/02
CPC分类号： G01B9/02051 , G01B9/02029 , G01B2290/70 , G03F7/70775
摘要： A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.
摘要翻译：用于确定第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。衍射型编码器通过第一和第二衍射光栅上的衍射来确定第二光栅相对于第一光栅的第一维度中的位置。干涉仪确定反射镜的第二维度中的位置。测量单元包括用于传送编码器测量光束以及干涉仪测量光束的组合光学单元。此外，测量单元可以包括用于编码器的组合光源以及干涉仪。第一和第二衍射光栅中的一个可进一步示出一些零级反射以提供干涉仪的反射镜。

8. 发明申请

US20070132980A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070132980A1
公开(公告)日：2007-06-14
申请号：US11296871
申请日：2005-12-08
申请人： Carolus Johannes Schoormans , Emiel Jozef Eussen , Willem Herman Koenen , Nicolas Lallemant , Engelbertus Antonius Van Der Pasch , Johannes Mathias Adriaens
发明人： Carolus Johannes Schoormans , Emiel Jozef Eussen , Willem Herman Koenen , Nicolas Lallemant , Engelbertus Antonius Van Der Pasch , Johannes Mathias Adriaens
IPC分类号： G03B27/58
CPC分类号： G03F7/70775
摘要： A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射到衬底上，其中可移动物体的位置使用多个传感器以多个自由度确定，传感器的数量大于自由度的数量其中，利用每个传感器的信号来确定可移动物体的位置，其中，所述传感器的信号是基于每个传感器的噪声水平之差而被称重的。在光刻设备中，可移动物体的位置测量精度和/或覆盖和聚焦性能得到改善。

9. 发明申请

US20070263197A1 Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method 有权
标题翻译：位移测量系统，光刻设备，位移测量方法和设备制造方法
公开(公告)号：US20070263197A1
公开(公告)日：2007-11-15
申请号：US11430196
申请日：2006-05-09
申请人： Bernardus Antonius Luttikhuis , Henrikus Cox , Erik Loopstra , Engelbertus Antonius Van Der Pasch , Harmen Van Der Schoot
发明人： Bernardus Antonius Luttikhuis , Henrikus Cox , Erik Loopstra , Engelbertus Antonius Van Der Pasch , Harmen Van Der Schoot
IPC分类号： G03B27/52
CPC分类号： G03B27/53 , G03F7/70733 , G03F7/70775
摘要： A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.
摘要翻译：提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。

10. 发明申请

US20070051160A1 Position measurement system and lithographic apparatus 有权
标题翻译：位置测量系统和平版印刷设备
公开(公告)号：US20070051160A1
公开(公告)日：2007-03-08
申请号：US11217670
申请日：2005-09-02
申请人： Wouter Pril , Emiel Eussen , Engelbertus Antonius Van Der Pasch
发明人： Wouter Pril , Emiel Eussen , Engelbertus Antonius Van Der Pasch
IPC分类号： G21G5/00
CPC分类号： G03F7/70775
摘要： A position measurement system for measuring a position of an object is described, the system including: a first incremental measurement unit for measuring a first number of first distance steps in a distance between a reference frame and the object, wherein the first number equals a first integer value plus a first fraction, and a second incremental measurement unit for measuring a second number of second distance steps in a distance between the reference frame and the object, wherein the second number equals a second integer value plus a second fraction, wherein the position measurement system is constructed and arranged to initialize the second incremental measurement unit on the basis of the first number and the second fraction.
摘要翻译：描述了一种用于测量物体位置的位置测量系统，该系统包括：第一增量测量单元，用于测量参考系和物体之间的距离中的第一数量的第一距离步骤，其中第一数量等于第一以及第二增量测量单元，用于测量所述参考帧和所述对象之间的距离中的第二数量的第二距离步长，其中所述第二数字等于第二整数值加上第二分数，其中所述位置测量系统被构造和布置为基于第一数量和第二分数来初始化第二增量测量单元。

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