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1. 发明授权

US06824954B2 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same 有权
标题翻译：磺酰肟化合物和辐射敏感酸产生剂，正型辐射敏感树脂组合物和负型辐射敏感树脂组合物使用
公开(公告)号：US06824954B2
公开(公告)日：2004-11-30
申请号：US10226348
申请日：2002-08-23
申请人： Eiji Yoneda , Tatsuya Toneri , Yong Wang , Tsutomu Shimokawa
发明人： Eiji Yoneda , Tatsuya Toneri , Yong Wang , Tsutomu Shimokawa
IPC分类号： G03F7039
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： A sulfonyloxime compound is provided which is represented by a general formula (1): wherein, R1 represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R2 represents an alkyl group, an aryl group, or a heteroaryl group; X represents a halogen atom; Y represents —R3, a —CO—R3 group, —COO—R3 group, —CONR3R4 group, —S—R3 group, —SO—R3 group, —SO2—R3 group, a —CN group or a —NO2 group, and R3 and R4 within the Y group each represent a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group, although any two of R1, R2 and R3 may also be bonded together to form a cyclic structure, and furthermore dimers of a compound represented by the general formula (1) in which R1, R2 or Y groups from separate molecules are bonded together to form a single bivalent group, are also possible. This compound is very useful as a radiation sensitive acid generator which is sensitive to activated radiation such as far ultraviolet radiation or electron beams and the like, and displays superior heat stability and storage stability. Furthermore, chemically amplified positive type or negative type radiation sensitive resin compositions incorporating such a radiation sensitive acid generator are also provided.
摘要翻译：提供由通式（1）表示的磺酰肟化合物：其中，R 1表示氢原子，烷基，芳基或杂芳基; R 2表示烷基，芳基或杂芳基; X表示卤原子; Y表示-R 3，-CO-R 3基团，-COO-R 3基团，-CONR 3 R 4基团，-SR 3基团，-SO-R 3基团， 3个基团，-SO 2 -R 3基团，-CN基团或-NO 2基团，Y基团中的R 3和R 4各自表示氢原子，烷基，芳基或杂芳基，尽管R 1，R 2和R 3中的任何两个也可以键合在一起形成环状结构，此外由通式（1）表示的化合物的二聚体在来自分离的分子的R 1，R 2或Y基团结合在一起形成单个二价基团也是可能的。该化合物作为辐射敏感的酸产生剂是非常有用的，其对诸如远紫外线辐射或电子束等的活化辐射敏感，并且显示出优异的热稳定性和储存稳定性。此外，还提供了掺入这种辐射敏感性酸发生剂的化学放大阳性或负型辐射敏感性树脂组合物。

2. 发明授权

US06908722B2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition 有权
标题翻译：酸产生剂，磺酸，磺酸衍生物和辐射敏感树脂组合物
公开(公告)号：US06908722B2
公开(公告)日：2005-06-21
申请号：US10183441
申请日：2002-06-28
申请人： Satoshi Ebata , Eiji Yoneda , Tomoki Nagai , Tatsuya Toneri , Yong Wang , Haruo Iwasawa , Yukio Nishimura
发明人： Satoshi Ebata , Eiji Yoneda , Tomoki Nagai , Tatsuya Toneri , Yong Wang , Haruo Iwasawa , Yukio Nishimura
IPC分类号： C07C309/17 , C07C309/19 , C07C309/23 , C07C381/12 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/004 , G03F7/039 , G03F7/075 , G03F7/00
CPC分类号： C07C309/23 , C07C309/17 , C07C309/19 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/114 , Y10S430/115
摘要： A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.
摘要翻译：一种含有下式（I）的结构的新型光酸产生剂，其中R为氟含量为50重量％以下的一价有机基团，硝基，氰基或氢原子，Z ^{1和Z 2各自独立地为氟原子或具有1-10个碳原子的直链或支链全氟烷基。当用于化学增强的辐射敏感性树脂组合物中时，光致酸产生剂显示出高透明度，较高的可燃性，并且没有生物累积性，并且产生在抗蚀涂层中表现出高酸度，高沸点，适度短扩散长度的酸，以及低对掩模图案密度的依赖。}

3. 发明申请

US20060234154A1 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20060234154A1
公开(公告)日：2006-10-19
申请号：US10541032
申请日：2003-12-24
申请人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
发明人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
IPC分类号： G03C1/00
CPC分类号： G03F7/039 , G03F7/0046 , G03F7/0397 , G03F7/2006
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.
摘要翻译：一种辐射敏感性树脂组合物，其包含通过活性自由基聚合而获得的含酸不稳定基团的树脂，其具有不溶于或几乎不溶于碱，但通过酸的作用而变得碱溶性的特定结构和光酸产生剂，其中重均分子量与含酸不稳定基团树脂的数均分子量（重均分子量/数均分子量）的比例小于1.5。

4. 发明授权

US09348226B2 Radiation-sensitive resin composition 有权
公开(公告)号：US09348226B2
公开(公告)日：2016-05-24
申请号：US10541032
申请日：2003-12-24
申请人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
发明人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/039 , G03F7/0046 , G03F7/0397 , G03F7/2006
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.

5. 发明授权

US06517992B1 N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same 有权
标题翻译： N-磺酰氧基酰亚胺化合物和使用其的辐射敏感性树脂组合物
公开(公告)号：US06517992B1
公开(公告)日：2003-02-11
申请号：US09707939
申请日：2000-11-08
申请人： Yong Wang , Eiichi Kobayashi , Masaaki Miyaji , Jun Numata , Tsutomu Shimokawa
发明人： Yong Wang , Eiichi Kobayashi , Masaaki Miyaji , Jun Numata , Tsutomu Shimokawa
IPC分类号： G03F7004
CPC分类号： C07D207/46 , C07D209/76 , G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/121
摘要： An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X1 represents an organic group having an ester linkage, R1 represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m+n≦11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.
摘要翻译：具有式（1）的N-磺酰氧基酰亚胺化合物：其中X表示单键或双键，Y和Z表示氢原子等，可以结合形成环状结构; 并且R是具有式（2）的基团：其中X1表示具有酯键的有机基团，R1表示烷基或烷氧基; m为1〜11的整数，n为0〜10的整数，满足m + n <11。并提供使用该化合物的化学放大的正和负辐射敏感性树脂组合物。 N-磺酰氧基酰亚胺化合物是良好的辐射敏感性产酸剂，不存在挥发或副反应的问题，能够保持保存期间的黑色反应。该化合物可用作辐射敏感的化学放大抗蚀剂的组分。

6. 发明授权

US06770780B1 Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition 有权
标题翻译：乙烯基苯丙酸衍生物，其制备方法，其聚合物和辐射敏感树脂组合物
公开(公告)号：US06770780B1
公开(公告)日：2004-08-03
申请号：US10129119
申请日：2002-05-14
申请人： Yong Wang , Yasuaki Mutsuga , Shigeo Shimizu , Tsutomu Shimokawa , Atsushi Kumano
发明人： Yong Wang , Yasuaki Mutsuga , Shigeo Shimizu , Tsutomu Shimokawa , Atsushi Kumano
IPC分类号： C07F909
CPC分类号： G03F7/0397 , C07C67/343 , C07C69/618 , C07D309/12 , C08F30/02 , G03F7/0045 , G03F7/039
摘要： Vinylphenylpropionic acid derivatives; processes for producing the derivatives; polymers of the same; and radiosensitive resin compositions containing the polymers. The above polymers exhibit low radiation absorption and are useful as the resin component of radiosensitive resin compositions particularly suitable for chemically amplified resists. For example, t-butyl 4-vinylphenylpropionate is produced by (1) reacting t-butyl bromoacetate with tri(n-butyl)phosphine to obtain a quaternary phosphonium salt, (2) reacting this salt with a base to obtain a phosphorus ylide, (3) reacting this ylide with 2,4,6-tris(3′,5′-di-t-butyl-4′-hydroxybenzyl)methyl-styrene to obtain a quaternary phosphonium salt, and (4) hydrolyzing this salt.
摘要翻译：乙烯基苯丙酸衍生物; 制备衍生物的方法; 相同的聚合物; 和含有聚合物的放射敏感性树脂组合物。上述聚合物表现出低的辐射吸收，并且可用作特别适用于化学放大抗蚀剂的放射敏感树脂组合物的树脂组分。例如，通过（1）使溴乙酸叔丁酯与三（正丁基）膦反应得到季鏻盐，（2）使该盐与碱反应得到磷内叶立德，得到4-乙烯基苯基丙酸叔丁酯，（3）使该叶立德与2,4,6-三（3'，5'-二叔丁基-4'-羟基苄基）甲基苯乙烯反应，得到季鏻盐，（4）水解该盐。

7. 发明授权

US07217492B2 Onium salt compound and radiation-sensitive resin composition 有权
标题翻译： ium盐化合物和辐射敏感性树脂组合物
公开(公告)号：US07217492B2
公开(公告)日：2007-05-15
申请号：US10743809
申请日：2003-12-24
申请人： Eiji Yoneda , Yong Wang , Yukio Nishimura
发明人： Eiji Yoneda , Yong Wang , Yukio Nishimura
IPC分类号： G03F7/038 , G03F7/039 , C07C303/00 , C07C307/00 , C07C315/00
CPC分类号： C07D317/72 , C07C317/14 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D319/08 , C07D333/46 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/115 , Y10S430/122
摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
摘要翻译：公开了具有下式（1）的阳离子部分的鎓盐化合物。其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar 1和Ar 2为（取代的）芳族烃基，P为-O-SO 2，（O）R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。

8. 发明申请

US20050053861A1 Onium salt compound and radiation-sensitive resin composition 有权
标题翻译： ium盐化合物和辐射敏感性树脂组合物
公开(公告)号：US20050053861A1
公开(公告)日：2005-03-10
申请号：US10743809
申请日：2003-12-24
申请人： Eiji Yoneda , Yong Wang , Yukio Nishimura
发明人： Eiji Yoneda , Yong Wang , Yukio Nishimura
IPC分类号： C07C317/14 , C07C381/12 , C07D317/72 , C07D319/08 , C07D333/46 , G03C1/76 , G03F7/004 , G03F7/039 , G03F7/075
CPC分类号： C07D317/72 , C07C317/14 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D319/08 , C07D333/46 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/115 , Y10S430/122
摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
摘要翻译：公开了具有下式（1）的阳离子部分的鎓盐化合物。其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar1和Ar2为（取代）芳族烃基，P为-O-SO2R，-OS（O） R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。

9. 外观设计

USD982255S1 Tumbler toy for pets 有权
公开(公告)号：USD982255S1
公开(公告)日：2023-03-28
申请号：US29755817
申请日：2020-10-23
申请人： Yong Wang
设计人： Yong Wang

10. 发明申请

US20200272245A1 Context-Dependent Touchbands 审中-公开
公开(公告)号：US20200272245A1
公开(公告)日：2020-08-27
申请号：US16286387
申请日：2019-02-26
申请人： Yong Wang
发明人： Yong Wang
IPC分类号： G06F3/02 , G06F3/0488 , G06F3/0486 , G06F3/0482 , G06F3/0354 , G06F1/16
摘要： A computer system comprises a keyboard with a plurality of touchbands, each of which is a narrow multi-touch touchpad, a display device and a computer touchband device application program executable on the computer processor configured to manage a multi-level context-dependent cascading menu interface wherein each menu item includes a plurality of drag-control functions, a plurality of tap commands and a plurality of submenu items; specify a plurality of menu operations, a plurality of control-drag operations and a plurality of command-tap operations from the multi-touch gestures on the touchbands; move the highlight in the menu structure based on the menu operations and display highlighted menu item contents under the active menu layer; change the value of the specified drag-control function listed for the highlighted menu item when detected a control-drag operation; trigger the specified tap command listed for the highlighted menu item when detected a command-tap operation.

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