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1. 发明授权

US06908722B2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition 有权
标题翻译：酸产生剂，磺酸，磺酸衍生物和辐射敏感树脂组合物
公开(公告)号：US06908722B2
公开(公告)日：2005-06-21
申请号：US10183441
申请日：2002-06-28
申请人： Satoshi Ebata , Eiji Yoneda , Tomoki Nagai , Tatsuya Toneri , Yong Wang , Haruo Iwasawa , Yukio Nishimura
发明人： Satoshi Ebata , Eiji Yoneda , Tomoki Nagai , Tatsuya Toneri , Yong Wang , Haruo Iwasawa , Yukio Nishimura
IPC分类号： C07C309/17 , C07C309/19 , C07C309/23 , C07C381/12 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/004 , G03F7/039 , G03F7/075 , G03F7/00
CPC分类号： C07C309/23 , C07C309/17 , C07C309/19 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/114 , Y10S430/115
摘要： A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.
摘要翻译：一种含有下式（I）的结构的新型光酸产生剂，其中R为氟含量为50重量％以下的一价有机基团，硝基，氰基或氢原子，Z ^{1和Z 2各自独立地为氟原子或具有1-10个碳原子的直链或支链全氟烷基。当用于化学增强的辐射敏感性树脂组合物中时，光致酸产生剂显示出高透明度，较高的可燃性，并且没有生物累积性，并且产生在抗蚀涂层中表现出高酸度，高沸点，适度短扩散长度的酸，以及低对掩模图案密度的依赖。}

2. 发明授权

US07217492B2 Onium salt compound and radiation-sensitive resin composition 有权
标题翻译： ium盐化合物和辐射敏感性树脂组合物
公开(公告)号：US07217492B2
公开(公告)日：2007-05-15
申请号：US10743809
申请日：2003-12-24
申请人： Eiji Yoneda , Yong Wang , Yukio Nishimura
发明人： Eiji Yoneda , Yong Wang , Yukio Nishimura
IPC分类号： G03F7/038 , G03F7/039 , C07C303/00 , C07C307/00 , C07C315/00
CPC分类号： C07D317/72 , C07C317/14 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D319/08 , C07D333/46 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/115 , Y10S430/122
摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
摘要翻译：公开了具有下式（1）的阳离子部分的鎓盐化合物。其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar 1和Ar 2为（取代的）芳族烃基，P为-O-SO 2，（O）R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。

3. 发明申请

US20050053861A1 Onium salt compound and radiation-sensitive resin composition 有权
标题翻译： ium盐化合物和辐射敏感性树脂组合物
公开(公告)号：US20050053861A1
公开(公告)日：2005-03-10
申请号：US10743809
申请日：2003-12-24
申请人： Eiji Yoneda , Yong Wang , Yukio Nishimura
发明人： Eiji Yoneda , Yong Wang , Yukio Nishimura
IPC分类号： C07C317/14 , C07C381/12 , C07D317/72 , C07D319/08 , C07D333/46 , G03C1/76 , G03F7/004 , G03F7/039 , G03F7/075
CPC分类号： C07D317/72 , C07C317/14 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D319/08 , C07D333/46 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/115 , Y10S430/122
摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
摘要翻译：公开了具有下式（1）的阳离子部分的鎓盐化合物。其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar1和Ar2为（取代）芳族烃基，P为-O-SO2R，-OS（O） R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。

4. 发明申请

US20070042292A1 Radiation sensitive resin composition 审中-公开
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20070042292A1
公开(公告)日：2007-02-22
申请号：US11504809
申请日：2006-08-16
申请人： Eiji Yoneda , Hirokazu Sakakibara , Hiromitsu Nakashima , Hiroki Nakagawa , Yukio Nishimura
发明人： Eiji Yoneda , Hirokazu Sakakibara , Hiromitsu Nakashima , Hiroki Nakagawa , Yukio Nishimura
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition which is a resist having properties such as excellent sensitivity, a small degree of line edge roughness of patterns, capability of inhibiting pattern collapsing, and the like is provided. The radiation-sensitive resin composition comprises an acid-dissociable group-containing polymer having recurring units of the following formulas (1-1) and (1-2), an additive of the following formula (1-3), and an acid generator, in the formula (1-1), R1 represents a methyl group and the like and X represents a specific polycyclic alicyclic hydrocarbon group and the like, in the formula (1-2), R1 represents a methyl group and the like and Z represents an acid-dissociable group which is dissociable by the action of an acid, and in the formula (1-3), n is an integer from 1-8 and A individually represents a hydroxyl group and the like.
摘要翻译：提供了作为抗敏剂的耐辐射敏感性树脂组合物，其具有优异的灵敏度，图案的线边缘粗糙度，抑制图案折叠的能力等。辐射敏感性树脂组合物包含具有下式（1-1）和（1-2）的重复单元的酸解离基团的聚合物，下式（1-3）的添加剂和酸发生剂在式（1-1）中，R 1表示甲基等，X表示特定的多环脂肪族烃基等，式（1-2）中，R' SUP> 1表示甲基等，Z表示可通过酸的作用而离解的酸解离基，在式（1-3）中，n为1-8的整数 A独立地表示羟基等。

5. 发明授权

US09598520B2 Radiation-sensitive resin composition, polymer and method for forming a resist pattern 有权
公开(公告)号：US09598520B2
公开(公告)日：2017-03-21
申请号：US13473957
申请日：2012-05-17
申请人： Yuko Kiridoshi , Takehiko Naruoka , Yukio Nishimura , Yusuke Asano , Takanori Kawakami , Hiromitsu Nakashima
发明人： Yuko Kiridoshi , Takehiko Naruoka , Yukio Nishimura , Yusuke Asano , Takanori Kawakami , Hiromitsu Nakashima
IPC分类号： G03F7/004 , G03F7/38 , C08F220/24 , C08F228/00 , C08F220/22 , C08L33/14 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： C08F220/22 , C08F220/24 , C08F228/00 , C08L33/14 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , C08L101/00
摘要： A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.

6. 发明授权

US08435718B2 Upper layer-forming composition and photoresist patterning method 有权
标题翻译：上层形成组合物和光致抗蚀剂图案化方法
公开(公告)号：US08435718B2
公开(公告)日：2013-05-07
申请号：US13272501
申请日：2011-10-13
申请人： Atsushi Nakamura , Hiroki Nakagawa , Hiromitsu Nakashima , Takayuki Tsuji , Hiroshi Dougauchi , Daita Kouno , Yukio Nishimura
发明人： Atsushi Nakamura , Hiroki Nakagawa , Hiromitsu Nakashima , Takayuki Tsuji , Hiroshi Dougauchi , Daita Kouno , Yukio Nishimura
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11 , G03F7/40
CPC分类号： G03F7/11 , C08F220/18 , C08F220/30 , G03F7/0046 , G03F7/2041
摘要： An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group. R1—O—R2 (1)
摘要翻译：上层形成组合物包括树脂和溶剂。该树脂可溶于用于由上层形成组合物覆盖以形成通过辐射照射的图案的光致抗蚀剂膜的显影剂。溶剂溶解在溶剂中的树脂。溶剂包括由式（1）表示的化合物。 R 1和R 2各自独立地表示碳原子数1〜8的烃基或卤代烃基。 R1-O-R2（1）

7. 发明授权

US08307141B2 Multi-core processor, control method thereof, and information processing apparatus 有权
标题翻译：多核处理器，其控制方法和信息处理装置
公开(公告)号：US08307141B2
公开(公告)日：2012-11-06
申请号：US12574337
申请日：2009-10-06
申请人： Satoru Nishita , Yukio Nishimura
发明人： Satoru Nishita , Yukio Nishimura
IPC分类号： G06F13/14 , G06F15/167 , G06F9/54
CPC分类号： G06F15/167 , G06F9/544 , G06F12/084
摘要： A multi-core processor which includes a plurality of processor dies. The multi-core processor has a first processor core which processes a first task and a second processor core which processes a second task. The first processor core and the second processor core are formed on each of the plurality of processor dies. When the first processor core makes a request for the second task processing in processing the first task, information on the second task is stored in a memory area used by the first processor core and interrupt notification is made to each of the second processor cores provided respectively on the plurality of processor dies. Each of the second processor cores having received the interrupt notification accesses the memory area used by the first processor core provided on the same processor die as the processor die on which the second processor core is provided.
摘要翻译：一种包括多个处理器管芯的多核处理器。多核处理器具有处理第一任务的第一处理器核和处理第二任务的第二处理器核。第一处理器核心和第二处理器核心形成在多个处理器管芯中的每一个上。当第一处理器核心在处理第一任务时请求第二任务处理时，关于第二任务的信息被存储在由第一处理器核心使用的存储区域中，并且分别对分别提供的每个第二处理器核心进行中断通知在多个处理器管芯上。已经接收到中断通知的第二处理器核心中的每一个访问由与提供第二处理器核心的处理器管芯相同的处理器管芯上提供的第一处理器核心使用的存储器区域。

8. 发明授权

US08247165B2 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern 有权
标题翻译：用于液浸的上层成膜组合物和形成光致抗蚀剂图案的方法
公开(公告)号：US08247165B2
公开(公告)日：2012-08-21
申请号：US10586187
申请日：2005-01-14
申请人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
发明人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
IPC分类号： G03C1/00 , G03F7/00 , C08F18/20
CPC分类号： G03F7/2041 , C08F214/182 , C08F214/186 , C08F216/10 , C08F220/18 , C08F220/24 , G03F7/11 , C08F220/06 , C08F2222/1013
摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.
摘要翻译：提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂，和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上的侧链上含有氟烷基的具有醇羟基的树脂成分。

9. 发明申请

US20100203447A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100203447A1
公开(公告)日：2010-08-12
申请号：US12701592
申请日：2010-02-07
申请人： Noboru Otsuka , Takanori Kawakami , Yukio Nishimura , Makoto Sugiura
发明人： Noboru Otsuka , Takanori Kawakami , Yukio Nishimura , Makoto Sugiura
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： C08F220/12 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
摘要翻译：辐射敏感性树脂组合物包括（A）通过酸的作用变成碱溶性的酸不稳定基团的树脂，（B）辐射敏感性酸产生剂和（C）溶剂。树脂（A）包括由式（1）和（2）表示的重复单元，其中R 1和R 2表示氢原子或取代或未取代的具有1至4个碳原子的烷基，R 3表示取代或未取代的烷基， 1至4个碳原子，X表示氢原子，羟基或酰基，m表示1至18的整数，n表示4至8的整数。

10. 发明申请

US20100095040A1 MULTI-CORE PROCESSOR, CONTROL METHOD THEREOF, AND INFORMATION PROCESSING APPARATUS 有权
标题翻译：多核处理器，其控制方法及信息处理装置
公开(公告)号：US20100095040A1
公开(公告)日：2010-04-15
申请号：US12574337
申请日：2009-10-06
申请人： Satoru NISHITA , Yukio Nishimura
发明人： Satoru NISHITA , Yukio Nishimura
IPC分类号： G06F13/24 , G06F9/46
CPC分类号： G06F15/167 , G06F9/544 , G06F12/084
摘要： A multi-core processor which includes a plurality of processor dies. The multi-core processor has a first processor core which processes a first task and a second processor core which processes a second task. The first processor core and the second processor core are formed on each of the plurality of processor dies. When the first processor core makes a request for the second task processing in processing the first task, information on the second task is stored in a memory area used by the first processor core and interrupt notification is made to each of the second processor cores provided respectively on the plurality of processor dies. Each of the second processor cores having received the interrupt notification accesses the memory area used by the first processor core provided on the same processor die as the processor die on which the second processor core is provided.
摘要翻译：一种包括多个处理器管芯的多核处理器。多核处理器具有处理第一任务的第一处理器核和处理第二任务的第二处理器核。第一处理器核心和第二处理器核心形成在多个处理器管芯中的每一个上。当第一处理器核心在处理第一任务时请求第二任务处理时，关于第二任务的信息被存储在由第一处理器核心使用的存储区域中，并且分别对分别提供的每个第二处理器核心进行中断通知在多个处理器管芯上。已经接收到中断通知的第二处理器核心中的每一个访问由与提供第二处理器核心的处理器管芯相同的处理器管芯上提供的第一处理器核心使用的存储器区域。

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