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1. 发明授权

US5374829A Vacuum chuck 失效
标题翻译：真空吸盘
公开(公告)号：US5374829A
公开(公告)日：1994-12-20
申请号：US231785
申请日：1994-04-25
申请人： Eiji Sakamoto , Ryuichi Ebinuma , Shinichi Hara , Mitsuji Marumo
发明人： Eiji Sakamoto , Ryuichi Ebinuma , Shinichi Hara , Mitsuji Marumo
IPC分类号： C30B25/12 , C30B31/14 , H01L21/683 , H01J37/20
CPC分类号： C30B31/14 , C30B25/12 , H01L21/6838 , Y10T279/11
摘要： A wafer holding device of the vacuum attraction type includes a structural member having a protrusion for supporting a wafer and elastic members made of a material having an elasticity modulus smaller than that of the wafer and that of the structural member. The elastic members are distributed on a wafer attraction plane of the structural member.
摘要翻译：真空吸引型的晶片保持装置包括具有用于支撑晶片的突起的结构构件和由具有比晶片的弹性模量小的结构构件的弹性模量的材料制成的弹性构件。弹性构件分布在结构构件的晶片吸引面上。

2. 发明授权

US5220171A Wafer holding device in an exposure apparatus 失效
标题翻译：曝光装置中的保温装置
公开(公告)号：US5220171A
公开(公告)日：1993-06-15
申请号：US786885
申请日：1991-11-01
申请人： Shinichi Hara , Eiji Sakamoto , Ryuichi Ebinuma
发明人： Shinichi Hara , Eiji Sakamoto , Ryuichi Ebinuma
IPC分类号： G03F7/20 , H01L21/00 , H01L21/687
CPC分类号： H01L21/67109 , G03F7/707 , G03F7/70875
摘要： A substrate holding device includes a chuck having an attracting surface for holding a substrate, an inside space and an inside heat pipe structure provided in the inside space, the heat pipe structure removing generated heat by evaporation of a liquid medium; a temperature controlling block having a structure that allows flow of a temperature controlling medium therethrough, the temperature controlling block being thermally coupled to the attracting surface of the chuck through the heat pipe structure; and a stage for moving the chuck and the temperature controlling block as a unit, and for supporting the chuck through the temperature controlling block.

3. 发明授权

US5822389A Alignment apparatus and SOR X-ray exposure apparatus having same 失效
标题翻译：对准装置和具有该对准装置的SOR X射线曝光装置
公开(公告)号：US5822389A
公开(公告)日：1998-10-13
申请号：US464038
申请日：1995-06-05
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.
摘要翻译：同步加速器曝光包括用于产生同步加速器辐射束的同步加速器辐射源，以及具有用于保持掩模的掩模台和用于保持摇摆的晶片台的曝光单元，用于将辐射束引导到曝光单元的光束端口具有用于反射辐射束的反射镜的单元，用于使晶片相对于晶片台对准的预对准系统，用于使由晶片台保持的晶片相对于由掩模台保持的掩模对准的精细对准系统，用于存储掩模的掩模存储装置，用于存储晶片的晶片存储装置，用于在掩模存储装置和掩模台之间传送掩模的掩模传送装置和用于在晶片存储装置和掩模载台之间传送晶片的晶片传送装置晶圆台。

4. 发明授权

US5577552A Temperature controlling device for mask and wafer holders 失效
标题翻译：面罩和晶圆座的温度控制装置
公开(公告)号：US5577552A
公开(公告)日：1996-11-26
申请号：US412101
申请日：1995-03-28
申请人： Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
发明人： Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
IPC分类号： G03F7/20 , G05D23/19 , H05K7/20 , F28D15/00
CPC分类号： H05K7/20281 , G03F7/707 , G03F7/70875 , G05D23/1919
摘要： A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.
摘要翻译：可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模，以将掩模的图案印刷在晶片上。该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统，用于将供应的液体介质分配到多个流动通道中的分配系统，以将液体介质供应到多个控制对象，例如，掩模台，晶片台等。该装置还包括多个温度控制装置，每个温度控制装置设置在对应的一个流动通道中，用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。因此，能够以简单的结构有效地控制多个控制对象的温度。

5. 发明授权

US5524131A Alignment apparatus and SOR x-ray exposure apparatus having same 失效
标题翻译：对准装置和具有该对准装置的SOR x射线曝光装置
公开(公告)号：US5524131A
公开(公告)日：1996-06-04
申请号：US441641
申请日：1995-05-15
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A semiconductor device manufacturing SOR X-ray exposure apparatus wherein, after a mask and a semiconductor wafer are aligned, and SOR X-ray is used to transfer a semiconductor device pattern on the mask onto a resist on the semiconductor wafer. The apparatus includes a mirror unit and an exposure unit for exposing the wafer through the mask to the X-ray from the mirror unit. The mirror unit includes an X-ray mirror for diverging the X-ray in a desired direction, a first chamber for providing a desired vacuum ambience around the X-ray mirror and a first supporting device for supplying the X-ray mirror. The exposure unit includes a shutter for controlling the exposure, a mask stage for holding the mask, a wafer stage for holding the wafer, a second chamber for providing a desired He ambience around the mask stage and the wafer stage, a frame structure for mounting the mask stage and the wafer stage and a second supporting device for supporting the frame structure. By this, a more highly integrated semiconductor device can be produced.
摘要翻译：一种制造SOR X射线曝光装置的半导体器件，其中在掩模和半导体晶片对准之后，使用SOR X射线将掩模上的半导体器件图案转印到半导体晶片上的抗蚀剂上。该装置包括反射镜单元和曝光单元，用于将晶片通过掩模曝光到来自反射镜单元的X射线。镜单元包括用于沿所需方向分散X射线的X射线镜，用于在X射线反射镜周围提供期望的真空环境的第一腔室和用于供给X射线镜的第一支撑装置。曝光单元包括用于控制曝光的快门，用于保持掩模的掩模台，用于保持晶片的晶片台，用于在掩模台和晶片台周围提供期望的He环境的第二室，用于安装的框架结构掩模台和晶片台以及用于支撑框架结构的第二支撑装置。由此，可以制造更高度集成的半导体器件。

6. 发明授权

US5157700A Exposure apparatus for controlling intensity of exposure radiation 失效
标题翻译：用于控制接触辐射强度的曝光装置
公开(公告)号：US5157700A
公开(公告)日：1992-10-20
申请号：US401615
申请日：1989-08-31
申请人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
发明人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
IPC分类号： G03F7/20
CPC分类号： G03F7/70691 , G03F7/70058 , G03F7/70091 , G03F7/702
摘要： An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.

7. 发明授权

US5138643A Exposure apparatus 失效
公开(公告)号：US5138643A
公开(公告)日：1992-08-11
申请号：US591252
申请日：1990-10-01
申请人： Eiji Sakamoto , Ryuichi Ebinuma , Mitsuaki Amemiya , Shunichi Uzawa , Koji Uda
发明人： Eiji Sakamoto , Ryuichi Ebinuma , Mitsuaki Amemiya , Shunichi Uzawa , Koji Uda
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70008 , G03F7/70691 , G03F7/70858 , G03F7/70866
摘要： An exposure apparatus includes a chamber for placing an article in a predetermined ambience; a holding device for holding the article in the chamber; a fluid supplying device for supplying a temperature adjusting fluid into the holding device through a flow passageway; a detecting device for detecting leakage of the fluid from the flow passageway; and a flow rate controlling device for controlling the flow rate of the fluid to be supplied to the holding device on the basis of the detection by the detecting device.

8. 发明授权

US5413167A Wafer cooling device 失效
标题翻译：晶圆冷却装置
公开(公告)号：US5413167A
公开(公告)日：1995-05-09
申请号：US235146
申请日：1994-04-28
申请人： Shinichi Hara , Ryuichi Ebinuma
发明人： Shinichi Hara , Ryuichi Ebinuma
IPC分类号： G03F7/20 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01L23/34 , H01L23/427 , F28F5/00
CPC分类号： H01L21/67103 , F28D15/0241 , G03F7/707 , G03F7/70875 , H01L21/6838 , H01L23/34 , H01L23/427 , H01L2924/0002
摘要： A wafer cooling device includes a wafer chuck; a heat exchanger having an internal structure for circulation of cooling water therethrough; and a flexible heat pipe for providing heat communication between the wafer chuck and the heat exchanger.
摘要翻译：晶片冷却装置包括晶片卡盘; 具有用于使冷却水循环通过的内部结构的热交换器; 以及用于在晶片卡盘和热交换器之间提供热连通的柔性热管。

9. 发明授权

US5593800A Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus 失效
标题翻译：掩模制造方法和使用由该方法或装置制造的掩模的装置和装置制造方法
公开(公告)号：US5593800A
公开(公告)日：1997-01-14
申请号：US367856
申请日：1995-01-03
申请人： Hidehiko Fujioka , Noriyuki Nose , Ryuichi Ebinuma , Shinichi Hara , Hiroshi Maehara
发明人： Hidehiko Fujioka , Noriyuki Nose , Ryuichi Ebinuma , Shinichi Hara , Hiroshi Maehara
IPC分类号： G03F1/00 , G03F1/22 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70475 , G03F1/22 , G03F7/70358
摘要： A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.
摘要翻译：掩模制造方法包括：通过第一阶段保持具有图案的主掩模版，通过第二阶段保持掩模基板，将曝光光束投射到由第一平台保持的主光栅的图案上，并将图案投影到掩模上基板以预定的缩小倍率保持第二阶段，并以定时关系和预定的速度比扫描第一和第二阶段，从而将主标线的图案转印到掩模基板。

10. 发明授权

US5796469A Exposure apparatus and device manufacturing method using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US5796469A
公开(公告)日：1998-08-18
申请号：US891803
申请日：1997-07-14
申请人： Ryuichi Ebinuma
发明人： Ryuichi Ebinuma
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F7/70833 , G03F7/70866 , G03F9/70
摘要： An exposure apparatus in which a portion of a pattern of a reticle is projected onto a wafer and in which the reticle and the wafer are scanned synchronously such that the pattern of the reticle is transferred to the wafer. The apparatus includes a reticle stage and a wafer stage for scanningly moving the reticle and the wafer, respectively, a measuring system for measuring a deviation of the reticle stage relative to the wafer stage in a predetermined direction other than the direction of scanning movement, and an adjusting device for adjusting the wafer stage on the basis of the measurement by the measuring system. In one aspect, the measuring system includes a laser interferometer. In another aspect, a frame member is provided for supporting the stages, and a flow passageway is provided in the frame member for flowing therethrough a temperature adjusting medium. In yet another aspect, the present invention is directed to an exposure method for the manufacture of microdevices.
摘要翻译：将掩模版图形的一部分投影到晶片上并且将掩模版和晶片同步扫描的曝光装置，使得标线片的图案被转印到晶片上。该装置包括：分划板台和用于分别扫描光罩和晶片的晶片台;测量系统，用于测量除了扫描方向以外的预定方向相对于晶片台的偏离;以及调整装置，用于基于测量系统的测量来调整晶片台。在一个方面，测量系统包括激光干涉仪。在另一方面，提供了一种用于支撑台架的框架构件，并且在框架构件中设置有用于流过温度调节介质的流动通道。在另一方面，本发明涉及一种用于制造微型器件的曝光方法。

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