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1. 发明授权

US06744020B2 Heat processing apparatus 失效
标题翻译：热处理设备
公开(公告)号：US06744020B2
公开(公告)日：2004-06-01
申请号：US10028789
申请日：2001-12-28
申请人： Eiichi Shirakawa , Tetsuo Fukuoka , Tsuyoshi Nogami
发明人： Eiichi Shirakawa , Tetsuo Fukuoka , Tsuyoshi Nogami
IPC分类号： H05B102
CPC分类号： F28D15/02 , F27D2019/0037 , F28D15/06 , H01L21/67103 , H01L21/67109 , H01L21/67248
摘要： A heat processing apparatus comprises a hot plate for putting the substrate on or near its surface, a ceiling with a first and second concentric regions with a first and second heat pipes, respectively, opposite to the hot plate surface, a member surrounding a space between the hot plate and the ceiling, a gas flow generator supplying gas to the a region from a circumference of the hot plate to a center of the ceiling, and a temperature control mechanism for controlling a regional temperature of the first region in such a manner that a heat emission is greater from a center of the substrate than from a circumference of the substrate, thus heating a substrate to a uniform temperature all over its surface.
摘要翻译：热处理装置包括用于将基板放置在其表面上或其表面附近的热板，具有第一和第二同心区域的顶板，分别具有与热板表面相对的第一和第二热管，围绕位于热板表面之间的空间的构件，热板和天花板，气体发生器，其从所述热板的圆周到所述顶板的中心向所述区域供应气体;以及温度控制机构，用于以这样的方式控制所述第一区域的区域温度：从衬底的中心散热比从衬底的圆周更大，从而将衬底加热至整个表面均匀的温度。

2. 发明申请

US20120181239A1 CHEMICAL LIQUID SUPPLY METHOD AND CHEMICAL LIQUID SUPPLY SYSTEM 有权
标题翻译：化学液体供应方法和化学液体供应系统
公开(公告)号：US20120181239A1
公开(公告)日：2012-07-19
申请号：US13351284
申请日：2012-01-17
申请人： Toshinobu Furusho , Takahiro Ookubo , Takashi Sasa , Tsuyoshi Nogami
发明人： Toshinobu Furusho , Takahiro Ookubo , Takashi Sasa , Tsuyoshi Nogami
IPC分类号： B01D57/00
CPC分类号： G03F7/162 , H01L21/67017 , H01L21/6715
摘要： There is provided a chemical liquid supply system configured to filter a chemical liquid by opening/closing operations of first and second opening/closing valves and a supply/exhaust operation. The chemical liquid supply system includes a pressure sensor, a flow meter, an electro-pneumatic regulator and a controller. The pressure sensor detects a pressure in the operation room when the first opening/closing valve is opened at a time of starting a replenishment of the chemical liquid into the chemical liquid pump. The flow rate sensor detects an exhaust flow rate exhausted from the operation room. The controller adjusts an exhaust pressure by controlling the electro-pneumatic regulator based on the detected pressure and the detected exhaust flow rate so as not to cause an excessive pressure change when the replenishment of the chemical liquid is started.
摘要翻译：提供了一种配置成通过第一和第二开/关阀的打开/关闭操作和供给/排出操作来过滤化学液体的化学液体供应系统。化学液体供应系统包括压力传感器，流量计，电动气动调节器和控制器。压力传感器在开始补充化学液体进入化学液体泵时开启第一开闭阀时检测手术室内的压力。流量传感器检测从手术室排出的排气流量。控制器通过基于检测到的压力和检测到的废气流量控制电动气动调节器来调节排气压力，以便在开始补充化学液体时不会引起过大的压力变化。

3. 发明授权

US09372405B2 Chemical liquid supply method and chemical liquid supply system 有权
标题翻译：化学液体供应方式和化学液体供应系统
公开(公告)号：US09372405B2
公开(公告)日：2016-06-21
申请号：US13351284
申请日：2012-01-17
申请人： Toshinobu Furusho , Takahiro Ookubo , Takashi Sasa , Tsuyoshi Nogami
发明人： Toshinobu Furusho , Takahiro Ookubo , Takashi Sasa , Tsuyoshi Nogami
IPC分类号： B01D57/00 , G03F7/16 , H01L21/67
CPC分类号： G03F7/162 , H01L21/67017 , H01L21/6715
摘要： The pressure sensor detects a pressure in the operation chamber when the first opening/closing valve is opened at a time of starting a replenishment of the chemical liquid into the chemical liquid pump. The flow rate sensor detects an exhaust flow rate exhausted from the operation chamber.
摘要翻译：压力传感器在开始补充化学液体进入药液泵时开启第一打开/关闭阀时检测操作室中的压力。流量传感器检测从操作室排出的排气流量。

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