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1. 发明授权

US06844550B1 Multi-beam multi-column electron beam inspection system 失效
公开(公告)号：US06844550B1
公开(公告)日：2005-01-18
申请号：US10630619
申请日：2003-07-29
申请人： Edward M. Yin , Alan D. Brodie , N. William Parker , Frank Ching-Feng Tsai
发明人： Edward M. Yin , Alan D. Brodie , N. William Parker , Frank Ching-Feng Tsai
IPC分类号： G01Q20/02 , G01Q30/02 , G21K1/087 , G21K5/10 , H01J37/28 , G01N23/00 , G21K7/00
CPC分类号： G21K1/087 , G21K5/10 , H01J37/28 , H01J2237/2817
摘要： A multi-column electron beam inspection system is disclosed herein. The system is designed for electron beam inspection of semiconductor wafers with throughput high enough for in-line use. The system includes field emission electron sources, electrostatic electron optical columns, a wafer stage with six degrees of freedom of movement, and image storage and processing systems capable of handling multiple simultaneous image data streams. Each electron optical column is enhanced with an electron gun with redundant field emission sources, a voltage contrast plate to allow voltage contrast imaging of wafers, and an electron optical design for high efficiency secondary electron collection.

2. 发明授权

US06977375B2 Multi-beam multi-column electron beam inspection system 失效
标题翻译：多光束多列电子束检测系统
公开(公告)号：US06977375B2
公开(公告)日：2005-12-20
申请号：US09789180
申请日：2001-02-19
申请人： Edward M. Yin , Alan D. Brodie , N. William Parker , Frank Ching-Feng Tsai
发明人： Edward M. Yin , Alan D. Brodie , N. William Parker , Frank Ching-Feng Tsai
IPC分类号： G01Q20/02 , G01Q30/02 , G21K1/087 , G21K5/10 , H01J37/28 , G01N23/00 , G21K7/00
CPC分类号： G21K1/087 , G21K5/10 , H01J37/28 , H01J2237/2817
摘要： A multi-column electron beam inspection system is disclosed herein. The system is designed for electron beam inspection of semiconductor wafers with throughput high enough for in-line use. The system includes field emission electron sources, electrostatic electron optical columns, a wafer stage with six degrees of freedom of movement, and image storage and processing systems capable of handling multiple simultaneous image data streams. Each electron optical column is enhanced with an electron gun with redundant field emission sources, a voltage contrast plate to allow voltage contrast imaging of wafers, and an electron optical design for high efficiency secondary electron collection.
摘要翻译：本文公开了一种多列电子束检查系统。该系统设计用于半导体晶圆的电子束检查，其生产量足够高以便在线使用。该系统包括场发射电子源，静电电子光柱，具有六个自由度的晶片台，以及能够处理多个同时图像数据流的图像存储和处理系统。每个电子光学柱由具有冗余场致发射源的电子枪，用于允许晶片电压对比成像的电压对照板和用于高效二次电子收集的电子光学设计而增强。

3. 发明授权

US06777675B2 Detector optics for electron beam inspection system 有权
标题翻译：电子束检测系统的检测器光学
公开(公告)号：US06777675B2
公开(公告)日：2004-08-17
申请号：US10126943
申请日：2002-04-18
申请人： N. William Parker , Edward M. Yin , Frank Ching-Feng Tsai
发明人： N. William Parker , Edward M. Yin , Frank Ching-Feng Tsai
IPC分类号： H01J37244
CPC分类号： H01J37/244 , H01J37/05 , H01J37/28 , H01J2237/057
摘要： An electron beam column incorporating an asymmetrical detector optics assembly provides improved secondary electron collection. The electron beam column comprises an electron gun, an accelerating region, scanning deflectors, focusing lenses, secondary electron detectors and an asymmetrical detector optics assembly. The detector optics assembly comprises a field-free tube, asymmetrical with respect to the electron optical axis; the asymmetry can be introduced by offsetting the field-free tube from the electron optical axis or by chamfering the end of the tube. In other embodiments the detector optics assembly comprises a field-free tube and a voltage contrast plate, either or both of which are asymmetrical with respect to the electron optical axis.
摘要翻译：包含不对称检测器光学组件的电子束柱提供改进的二次电子收集。电子束柱包括电子枪，加速区，扫描偏转器，聚焦透镜，二次电子检测器和不对称检测器光学组件。检测器光学组件包括相对于电子光轴不对称的无磁场管; 可以通过将无场磁管与电子光轴偏移或通过倒角管的端部来引入不对称性。在其他实施例中，检测器光学组件包括无磁场管和电压对比板，其中一个或两个对于电子光轴是不对称的。

4. 发明授权

US06617587B2 Electron optics for multi-beam electron beam lithography tool 失效
标题翻译：多光束电子束光刻工具的电子光学
公开(公告)号：US06617587B2
公开(公告)日：2003-09-09
申请号：US10243585
申请日：2002-09-12
申请人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
发明人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
IPC分类号： H01J37147
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177
摘要： A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.
摘要翻译：本文公开了一种能够在高通量，多列，多光束电子束光刻系统中使用的电荷粒子光学列。该柱具有以下特性：纯静电成分; 小柱占地面积（20平方米）; 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。公开了一种电子枪，其使用微制造的场致发射源和微制造的孔径偏转器组件。孔径偏转器组件用作聚焦，转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。可以使用门控信号进行光束消隐，以减少在晶片上写入期间的光束模糊。

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