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    • 8. 发明授权
    • Method of severing electrically conductive links with ultraviolet laser
output
    • 用紫外线激光输出切断导电连接的方法
    • US6057180A
    • 2000-05-02
    • US92490
    • 1998-06-05
    • Yunlong SunEdward J. Swenson
    • Yunlong SunEdward J. Swenson
    • H01L21/3205H01L21/768H01L21/82H01L23/52H01L71/82
    • H01L21/76894
    • Ultraviolet (UV) laser output (88) exploits the absorption characteristics of the materials from which an electrically conductive link (42), an underlying semiconductor substrate (50), and passivation layers (48 and 54) are made to effectively remove the link (42) without damaging the substrate (50). The UV laser output (88) forms smaller than conventional IR laser link-blowing spot diameters (58) because of its shorter wavelength, thus permitting the implementation of greater circuit density. A passivation layer positioned between the link and the substrate can be formulated to be sufficiently absorptive to UV laser energy and sufficiently thick to attenuate the laser energy to prevent it from damaging the substrate (50) in the laser beam spot area (43) in both the off-link and link-overlapped portions. The UV laser output (88) can be employed to controllably ablate a depthwise portion of the passivation layer (54) underlying the link (42) to facilitate complete removal of the link (42). In addition, direct ablation of the passivation layer (48) with the UV laser output (88) facilitates predictable and consistent link severing profiles. The absorption characteristics of the passivation material also reduces the risk of damage to neighboring links or other active structures.
    • 紫外线(UV)激光输出(88)利用材料的吸收特性,导电连接(42),下面的半导体衬底(50)和钝化层(48和54)被制成以有效地去除连接 42),而不损坏基板(50)。 紫外激光输出(88)由于其波长较短而小于传统的红外激光链接发射光点直径(58),因此允许实现更大的电路密度。 定位在连接件和衬底之间的钝化层可被配制为对UV激光能量具有足够的吸收性,并且足够厚以衰减激光能量,以防止激光能量损坏激光束光斑区域(43)中的衬底(50) 脱离链接和链接重叠部分。 可以使用UV激光输出(88)来​​可控制地消融链路(42)下面的钝化层(54)的深度方向部分,以便于完全去除链路(42)。 此外,用UV激光输出(88)直接消融钝化层(48)有助于可预测和一致的链路切断简档。 钝化材料的吸收特性也降低了损坏相邻链节或其他活性结构的风险。
    • 9. 发明授权
    • Laser system for functional trimming of films and devices
    • 用于膜和器件功能修整的激光系统
    • US5808272A
    • 1998-09-15
    • US959140
    • 1997-10-28
    • Yunlong SunEdward J. Swenson
    • Yunlong SunEdward J. Swenson
    • B23K26/00B23K26/06
    • B23K26/032B23K26/06B23K26/064B23K26/0643B23K26/0665B23K26/351
    • A laser system (50) and processing method exploit a wavelength range (40) in which devices, including any semiconductor material-based devices (10) affected by conventional laser wavelengths and devices having light-sensitive or photo-electronic portions integrated into their circuits, can be effectively functionally trimmed without inducing performance drift or malfunctions in the processed devices. True measurement values of operational parameters of the devices can, therefore, be obtained without delay for device recovery, i.e., can be obtained substantially instantaneously with laser impingement. Accordingly, the present invention allows faster functional laser processing, eases geometric restrictions on circuit design, and facilitates production of denser and smaller devices.
    • 激光系统(50)和处理方法利用波长范围(40),其中包括受常规激光波长影响的任何基于半导体材料的器件(10)的器件和具有集成到其电路中的光敏或光电子部分的器件 ,可以有效地进行功能修剪,而不会引起处理器件中的性能漂移或故障。 因此,可以无延迟地获得器件的操作参数的真实测量值,用于器件恢复,即可以通过激光冲击基本上即时获得。 因此,本发明允许更快的功能激光处理,简化了对电路设计的几何限制,并且便于生产更致密和更小的器件。