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1. 发明授权

US6147321A Configuration for the automatic inscription or reinscription of wafers 有权
标题翻译：自动刻录或重新刻录晶片的配置
公开(公告)号：US6147321A
公开(公告)日：2000-11-14
申请号：US128387
申请日：1998-08-03
申请人： Eckhard Marx , Detlef Gerhard , Jens Muller
发明人： Eckhard Marx , Detlef Gerhard , Jens Muller
IPC分类号： H01L23/544 , B23K26/00
CPC分类号： H01L23/544 , H01L2924/0002
摘要： A configuration for the automatic inscription or reinscription of wafers provides the wafers with a marking for identification and for process management during the production of semiconductor components. The wafer must be moved between different stations for the automatic inscription of a wafer in an appropriate device. Considerable transport movements are saved by the integration of a read station in an inscription chamber having a positioning unit for the wafer.
摘要翻译：用于晶片的自动铭刻或重新标注的配置为晶片提供了用于识别标记和在半导体部件生产期间的过程管理的标记。晶片必须在不同的工位之间移动，以便在合适的装置中自动刻录晶片。通过将阅读站集成在具有用于晶片的定位单元的刻录室中来节省相当多的运输运动。

2. 发明授权

US06745637B2 Self-supporting adaptable metrology device 有权
标题翻译：自适应测量装置
公开(公告)号：US06745637B2
公开(公告)日：2004-06-08
申请号：US10090259
申请日：2002-03-04
申请人： Volker Tegeder , Detlef Gerhard , Johannes Lechner , Eckhard Marx
发明人： Volker Tegeder , Detlef Gerhard , Johannes Lechner , Eckhard Marx
IPC分类号： G01N1900
CPC分类号： H01L21/67775 , H01L21/67253 , Y10S414/135
摘要： A metrology device is described which is couplable to a load port of a semiconductor product handling and/or processing tool. The tool encloses a mini-environmental atmosphere and has a load port table for supporting devices to be coupled to the load port. The metrology device contains a housing preserving an inner atmosphere, a coupling region for connecting the inner atmosphere to the mini-environmental atmosphere and a measuring device for measuring a property of a semiconductor product. The metrology device further has a support which is movable by a transport device and which is dimensioned such that the metrology device is self-supporting in a position appropriate for coupling the coupling region to the load port. The metrology device is thereby couplable to the load port without being supported by the load port table.
摘要翻译：描述了可耦合到半导体产品处理和/或处理工具的负载端口的计量装置。该工具包含迷你环境氛围，并具有一个负载端口台，用于支持要耦合到负载端口的设备。测量装置包括保持内部空气的壳体，用于将内部空气连接到迷你环境气氛的耦合区域和用于测量半导体产品的性质的测量装置。测量装置还具有可由运输装置移动的支撑件，其尺寸使得计量装置在适于将联接区域耦合到负载端口的位置自支撑。因此，测量设备可以连接到负载端口，而不受负载端口表的支持。

3. 发明授权

US06261382B1 Wafer marking 有权
标题翻译：晶圆标记
公开(公告)号：US06261382B1
公开(公告)日：2001-07-17
申请号：US09495795
申请日：2000-02-01
申请人： Eckhard Marx , Detlef Gerhard , Steffen Franke
发明人： Eckhard Marx , Detlef Gerhard , Steffen Franke
IPC分类号： H01L2930
CPC分类号： H01L23/544 , H01L2223/54433 , H01L2223/54473 , H01L2924/0002 , H01L2924/00
摘要： A wafer marking is disclosed, which is represented by a large number of soft marks incorporated into a surface of a wafer. The soft marks each have a depth of at least 4 &mgr;m, an internal diameter of at least 50 &mgr;m and, in a particularly advantageous manner, a minimum gradient their surface of 0.2. These depressions can be proded, using appropriate technology, with depths of up to &mgr;m.
摘要翻译：公开了一种晶片标记，其由并入晶片表面的大量软标记表示。软标记各自具有至少4μm的深度，至少50μm的内径，并且以特别有利的方式，其表面为0.2的最小梯度。这些凹陷可以使用适当的技术，深度达到妈妈。

4. 发明授权

US07361921B2 Device and method for plane-parallel orientation of a the surface of an object to be examined in relation to a focus plane of a lens 有权
标题翻译：相对于透镜的聚焦平面的待检查物体的表面的平面平行取向的装置和方法
公开(公告)号：US07361921B2
公开(公告)日：2008-04-22
申请号：US10490053
申请日：2004-03-19
申请人： Detlef Gerhard , Johannes Lechner
发明人： Detlef Gerhard , Johannes Lechner
IPC分类号： G01R31/02
CPC分类号： G02B21/245 , G01N21/9501 , G02B21/24 , G02B21/241
摘要： The orientation of the surface of an object to be examined is changed by adjusting the distance thereof to an optical measuring system in a plane-parallel manner in relation to a focusing plane of the optical measuring system, enabling high speeds of examination to be obtained during examination of the extended surfaces of the object. A distance-measurement system which is mounted in an auxiliary manner with regard to the measuring head enables fluctuations in the topography inside the surface of the object to be compensated in such a way that a currently received point or area can be optically sharpened.
摘要翻译：通过调整与光学测量系统相对于光学测量系统的聚焦平面的平面平行方式的距离来改变被检查物体的表面的取向，使得能够在检查物体的延伸表面。以关于测量头的辅助方式安装的距离测量系统使得可以以当前接收的点或区域被光学锐化的方式补偿待补偿物体表面内的形貌的波动。

5. 发明授权

US09255303B2 Method for determining at least one state variable of an electric arc furnace, and electric arc furnace 有权
标题翻译：用于确定电弧炉和电弧炉的至少一个状态变量的方法
公开(公告)号：US09255303B2
公开(公告)日：2016-02-09
申请号：US12862011
申请日：2010-08-24
申请人： Dieter Fink , Detlef Gerhard , Thomas Matschullat , Detlef Rieger , Reinhard Sesselmann
发明人： Dieter Fink , Detlef Gerhard , Thomas Matschullat , Detlef Rieger , Reinhard Sesselmann
IPC分类号： C21C5/52 , F27B3/28 , F27D19/00 , C21C5/46
CPC分类号： C21C5/5211 , C21C5/4673 , C21C2005/5288 , F27B3/28 , F27D19/00 , Y02P10/216
摘要： In a method for determining a state variable of an electric arc furnace, especially for determining the level of the foamed slag (15) in a furnace, the energy supplied to the furnace is determined with the aid of at least one electric sensor while solid-borne noise is measured in the form of oscillations on the furnace. The state variable is determined by a transfer function which is determined by evaluating the measured oscillations and evaluating measured data of the electric sensor. The state of the foamed slag level can thus be reliably recognized and be monitored over time. The foamed slag level is decisive for the effectiveness with which energy is fed into the furnace. Furthermore, losses caused by radiation are reduced by covering the arc with the foamed slag. The improved measuring method allows the foamed slag level to be automatically controlled or regulated in a reliable manner.
摘要翻译：在用于确定电弧炉的状态变量的方法中，特别是用于确定炉中发泡炉渣（15）的水平时，借助于至少一个电传感器确定供应给炉的能量，在炉子上以振荡的形式测量负载噪声。状态变量由传递函数确定，传递函数通过评估测量的振荡和评估电传感器的测量数据来确定。因此，可以可靠地识别发泡渣水平的状态并随时间进行监测。泡沫炉渣水平对于将能量送入炉子的有效性是决定性的。此外，通过用发泡炉渣覆盖电弧来减少由辐射造成的损失。改进的测量方法允许以可靠的方式自动控制或调节泡沫炉渣水平。

6. 发明申请

US20050072944A1 Device and method for plane-parallel orientation of a the surface of an object to be examined in relation to a focus plane of a lens 有权
标题翻译：相对于透镜的聚焦平面的待检查物体的表面的平面平行取向的装置和方法
公开(公告)号：US20050072944A1
公开(公告)日：2005-04-07
申请号：US10490053
申请日：2002-09-19
申请人： Detlef Gerhard , Johannes Lechner
发明人： Detlef Gerhard , Johannes Lechner
IPC分类号： G01N21/95 , G02B21/24 , H01J40/14 , G01N21/86
CPC分类号： G02B21/245 , G01N21/9501 , G02B21/24 , G02B21/241
摘要： The orientation of the surface of an object to be examined is changed by adjusting the distance thereof to an optical measuring system in a plane-parallel manner in relation to a focusing plane of the optical measuring system, enabling high speeds of examination to be obtained during examination of the extended surfaces of the object. A distance-measurement system which is mounted in an auxiliary manner with regard to the measuring head enables fluctuations in the topography inside the surface of the object to be compensated in such a way that a currently received point or area can be optically sharpened.
摘要翻译：通过调整与光学测量系统相对于光学测量系统的聚焦平面的平面平行方式的距离来改变被检查物体的表面的取向，使得能够在检查物体的延伸表面。以关于测量头的辅助方式安装的距离测量系统使得可以以当前接收的点或区域被光学锐化的方式补偿待补偿物体表面内的形貌的波动。

7. 发明申请

US20080285615A1 Method for Determining at Least One State Variable of an Electric Arc Furnace, and Electric Arc Furnace 审中-公开
标题翻译：用于确定电弧炉最小一个状态变量的方法和电弧炉
公开(公告)号：US20080285615A1
公开(公告)日：2008-11-20
申请号：US11996020
申请日：2006-07-12
申请人： Dieter Fink , Detlef Gerhard , Thomas Matschullat , Detlef Rieger , Reinhard Sesselmann
发明人： Dieter Fink , Detlef Gerhard , Thomas Matschullat , Detlef Rieger , Reinhard Sesselmann
IPC分类号： H05B7/148
CPC分类号： C21C5/5211 , C21C5/4673 , C21C2005/5288 , F27B3/28 , F27D19/00 , F27D21/00 , Y02P10/216
摘要： In a method for determining a state variable of an electric arc furnace, especially for determining the level of the foamed slag (15) in a furnace, the energy supplied to the furnace is determined with the aid of at least one electric sensor while solid-borne noise is measured in the form of oscillations on the furnace. The state variable is determined by a transfer function which is determined by evaluating the measured oscillations and evaluating measured data of the electric sensor. The state of the foamed slag level can thus be reliably recognized and be monitored over time. The foamed slag level is decisive for the effectiveness with which energy is fed into the furnace. Furthermore, losses caused by radiation are reduced by covering the arc with the foamed slag. The improved measuring method allows the foamed slag level to be automatically controlled or regulated in a reliable manner.
摘要翻译：在用于确定电弧炉的状态变量的方法中，特别是用于确定炉中发泡炉渣（15）的水平时，借助于至少一个电传感器确定供应给炉的能量，在炉子上以振荡的形式测量负载噪声。状态变量由传递函数确定，传递函数通过评估测量的振荡和评估电传感器的测量数据来确定。因此，可以可靠地识别发泡渣水平的状态并随时间进行监测。泡沫炉渣水平对于将能量送入炉子的有效性是决定性的。此外，通过用发泡炉渣覆盖电弧来减少由辐射造成的损失。改进的测量方法允许以可靠的方式自动控制或调节泡沫炉渣水平。

8. 发明申请

US20070273891A1 Illumination Unit And Method For The Operation Thereof 失效
标题翻译：照明单元及其操作方法
公开(公告)号：US20070273891A1
公开(公告)日：2007-11-29
申请号：US10586247
申请日：2005-01-17
申请人： Detlef Gerhard , Martin Renner
发明人： Detlef Gerhard , Martin Renner
IPC分类号： G01B11/30
CPC分类号： G02B6/0006 , G02B6/4296 , G02B6/4298
摘要： An illumination unit comprising a high-power light source (1), a first optical element (12) for focusing the light emitted from the high-power light source (1), a photometric head (8) for illuminating an object (3) in a predefinable manner, an optical waveguide (2) for transmitting the emitted and focused light to the photometric head (8), a displacement unit (6) for varying the axial distance between the high-power light source (1) with the first optical element (12) and the inlet of the optical waveguide, wherein the cross-sectional surface of the focal point is at least twice as large as the cross-sectional surface of the optical waveguide (2) on the light inlet side, and the intensity of the light coupled into the optical waveguide (2) can be varied by axial displacement of the high-power light source (1).
摘要翻译：一种照明单元，包括高功率光源（1），用于聚焦从大功率光源（1）发射的光的第一光学元件（12），用于照亮物体（3）的光度测量头（8）以预定的方式，将用于将发射和聚焦的光传输到测光头（8）的光波导（2），用于改变高功率光源（1）与第一光学元件（12）和光波导的入口，其中焦点的横截面为光入口侧的光波导（2）的横截面的至少两倍，并且耦合到光波导（2）中的光的强度可以通过大功率光源（1）的轴向位移而变化。

9. 发明授权

US08183581B2 LED arrangement 有权
标题翻译： LED布置
公开(公告)号：US08183581B2
公开(公告)日：2012-05-22
申请号：US12736835
申请日：2009-05-11
申请人： Detlef Gerhard
发明人： Detlef Gerhard
IPC分类号： F21S8/10 , F21V21/00
CPC分类号： H01L25/0753 , H01L33/483 , H01L33/486 , H01L33/62 , H01L33/647 , H01L2224/48227 , H01L2224/48091 , H01L2924/00014
摘要： An LED arrangement (light emitting diode) has a plurality of adjacent radiating LEDs that are nearly identically aligned for forming an extended area light source. The LEDs are attached to a metallic multi-film support having sandwich-like insulating intermediate layers and having at least a step-like structure with at least one step. At least one LED chip is placed on each step on a metal film and the metal layer directly above is formed of a corresponding shortening or recess for mounting an LED.
摘要翻译： LED布置（发光二极管）具有多个相邻的辐射LED，其几乎相同地对准以形成扩展区域光源。 LED连接到具有夹层状绝缘中间层并具有至少一个阶梯状结构的金属多层载体。在金属膜上的每一步上放置至少一个LED芯片，并且直接在上方的金属层由相应的用于安装LED的缩短或凹槽形成。

10. 发明授权

US07427731B2 Illumination unit and method for the operation thereof 失效
标题翻译：照明单元及其操作方法
公开(公告)号：US07427731B2
公开(公告)日：2008-09-23
申请号：US10586247
申请日：2005-01-17
申请人： Detlef Gerhard , Martin Renner
发明人： Detlef Gerhard , Martin Renner
IPC分类号： G01J1/32 , F21V19/02
CPC分类号： G02B6/0006 , G02B6/4296 , G02B6/4298
摘要： An illumination unit comprising a high-power light source (1), a first optical element (12) for focusing the light emitted from the high-power light source (1), a photometric head (8) for illuminating an object (3) in a predefinable manner, an optical waveguide (2) for transmitting the emitted and focused light to the photometric head (8), a displacement unit (6) for varying the axial distance between the high-power light source (1) with the first optical element (12) and the inlet of the optical waveguide, wherein the cross-sectional surface of the focal point is at least twice as large as the cross-sectional surface of the optical waveguide (2) on the light inlet side, and the intensity of the light coupled into the optical waveguide (2) can be varied by axial displacement of the high-power light source (1).
摘要翻译：一种照明单元，包括高功率光源（1），用于聚焦从大功率光源（1）发射的光的第一光学元件（12），用于照亮物体（3）的光度测量头（8）以预定的方式，将用于将发射和聚焦的光传输到测光头（8）的光波导（2），用于改变高功率光源（1）与第一光学元件（12）和光波导的入口，其中焦点的横截面为光入口侧的光波导（2）的横截面的至少两倍，并且耦合到光波导（2）中的光的强度可以通过大功率光源（1）的轴向位移而变化。

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