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1. 发明授权

US07826049B2 Inspection tools supporting multiple operating states for multiple detector arrangements 有权
标题翻译：检测工具支持多个检测器布置的多个操作状态
公开(公告)号：US07826049B2
公开(公告)日：2010-11-02
申请号：US12142416
申请日：2008-06-19
申请人： Dov Furman , Ehud Tirosh , Shai Silberstein
发明人： Dov Furman , Ehud Tirosh , Shai Silberstein
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/95623 , G01N2021/8825 , G01N2021/8848
摘要： An inspection system can support operation in multiple states. For instance, when inspecting an article, such as a semiconductor wafer, the tool can switch between imaging multiple locations using respective detectors to another operating state wherein multiple detectors operating in multiple imaging modes inspect a single location. An inspection system may combine the use of multiple detectors for multiple locations and the use of multiple viewing angles or modes for the same locations and thereby achieve high throughput. The different imaging modes can comprise, for example, different collection angles, polarizations, different spectral bands, different attenuations, different focal positions relative to the wafer, and other different types of imaging.
摘要翻译：检查系统可以支持多种状态的操作。例如，当检查诸如半导体晶片的物品时，工具可以使用相应的检测器在成像多个位置之间切换到另一操作状态，其中以多个成像模式操作的多个检测器检查单个位置。检查系统可以组合使用多个检测器用于多个位置，并且对于相同位置使用多个视角或模式，从而实现高吞吐量。不同的成像模式可以包括例如不同的收集角，极化，不同的光谱带，不同的衰减，相对于晶片的不同焦点位置以及其它不同类型的成像。

2. 发明申请

US20090201494A1 Inspection Tools Supporting Multiple Operating States for Multiple Detector Arrangements 有权
标题翻译：检测工具支持多个检测器布置的多个操作状态
公开(公告)号：US20090201494A1
公开(公告)日：2009-08-13
申请号：US12142416
申请日：2008-06-19
申请人： Dov Furman , Ehud Tirosh , Shai Silberstein
发明人： Dov Furman , Ehud Tirosh , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/95623 , G01N2021/8825 , G01N2021/8848
摘要： An inspection system can support operation in multiple states. For instance, when inspecting an article, such as a semiconductor wafer, the tool can switch between imaging multiple locations using respective detectors to another operating state wherein multiple detectors operating in multiple imaging modes inspect a single location. An inspection system may combine the use of multiple detectors for multiple locations and the use of multiple viewing angles or modes for the same locations and thereby achieve high throughput. The different imaging modes can comprise, for example, different collection angles, polarizations, different spectral bands, different attenuations, different focal positions relative to the wafer, and other different types of imaging.
摘要翻译：检查系统可以支持多种状态的操作。例如，当检查诸如半导体晶片的物品时，工具可以使用相应的检测器在成像多个位置之间切换到另一操作状态，其中以多个成像模式操作的多个检测器检查单个位置。检查系统可以组合使用多个检测器用于多个位置，并且对于相同位置使用多个视角或模式，从而实现高吞吐量。不同的成像模式可以包括例如不同的收集角，极化，不同的光谱带，不同的衰减，相对于晶片的不同焦点位置以及其它不同类型的成像。

3. 发明授权

US07719674B2 Image splitting in optical inspection systems 有权
标题翻译：光学检测系统中的图像分割
公开(公告)号：US07719674B2
公开(公告)日：2010-05-18
申请号：US11944677
申请日：2007-11-26
申请人： Dov Furman , Shai Silberstein , Effy Miklatzky , Daniel Mandelik , Martin Abraham
发明人： Dov Furman , Shai Silberstein , Effy Miklatzky , Daniel Mandelik , Martin Abraham
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/95607 , G01N2021/8825 , G01N2021/95615
摘要： In an optical inspection tool, an image of an object under inspection, such as a semiconductor wafer, may be obtained using imaging optics defining a focal plane. Light comprising the image can be detected using multiple detectors which each register a portion of the image. The image of the object at the focal plane can be split into two, three, or more parts by mirrors or other suitable reflecting elements positioned tangent to the focal plane and/or with at least some portion at the focal plane with additional portions past the focal plane so that the focal plane lies between the imaging optics and the splitting apparatus. In some embodiments, reflective planes may be arranged to direct different portions to different detectors. Some reflective planes may be separated by a gap so that some portions of the light are directed while some portions pass through the gap. Other splitting elements may comprise a group of transmissive and reflective areas interspersed in an element positioned at or in the focal plane, with some portions of the light are reflected to detectors while other portions pass through the element(s) to other detectors. Splitting apparatuses and elements may be cascaded.
摘要翻译：在光学检查工具中，可以使用限定焦平面的成像光学元件来获得被检查物体（诸如半导体晶片）的图像。可以使用多个检测器来检测包括图像的光，每个检测器记录图像的一部分。在焦平面处的物体的图像可以通过反射镜或与焦平面相切定位的其它合适的反射元件和/或与焦平面上的至少一些部分分离成两个，三个或更多个部分，附加部分经过该焦平面焦平面，使得焦平面位于成像光学元件和分割装置之间。在一些实施例中，可以布置反射平面以将不同部分引导到不同的检测器。一些反射面可以被间隙分离，使得一些部分的光被引导，而一些部分通过间隙。其他分裂元件可以包括散布在位于焦平面处或焦平面处的元件中的一组透射和反射区域，其中一些部分光被反射到检测器，而其他部分穿过元件到其它检测器。分割装置和元件可以级联。

4. 发明授权

US07633041B2 Apparatus for determining optimum position of focus of an imaging system 有权
标题翻译：用于确定成像系统的焦点的最佳位置的装置
公开(公告)号：US07633041B2
公开(公告)日：2009-12-15
申请号：US11524684
申请日：2006-09-21
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G02B7/04 , G01N21/86
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

5. 发明授权

US07714998B2 Image splitting in optical inspection systems 有权
标题翻译：光学检测系统中的图像分割
公开(公告)号：US07714998B2
公开(公告)日：2010-05-11
申请号：US11944684
申请日：2007-11-26
申请人： Dov Furman , Roy Kaner , Ori Gonen , Daniel Mandelik , Eran Tal , Shai Silberstein
发明人： Dov Furman , Roy Kaner , Ori Gonen , Daniel Mandelik , Eran Tal , Shai Silberstein
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/21 , G01N2021/95615 , G01N2201/068
摘要： In an optical inspection tool, an image of an object under inspection, such as a semiconductor wafer, may be obtained using imaging optics defining a focal plane. Light comprising the image can be split into portions that are detected using multiple detectors which each register a portion of the image. The image of the object at the focal plane can be split into two, three, or more parts by polarization-based beam splitters and/or lenses positioned tangent to the focal plane. The splitting apparatus may comprise a pair of arrays of half-cylinder lenses comprising a convex side and a flat side. The arrays can be positioned with the cylinder axes perpendicular to one another and the flat sides facing each other. Thus, the pair of arrays can divide incoming light into a plurality of rectangular portions without introducing non-uniformities which would occur if several spherical lenses are configured for use in a rectangular array.
摘要翻译：在光学检查工具中，可以使用限定焦平面的成像光学元件来获得被检查物体（诸如半导体晶片）的图像。包括图像的光可以被分割成使用多个检测器检测的部分，每个检测器记录图像的一部分。在焦平面处的物体的图像可以通过基于偏振的分束器和/或与焦平面相切的透镜分离成两个，三个或更多个部分。分割装置可以包括一对半柱透镜，其包括凸面和平坦侧。阵列可以被定位成使得圆柱轴线彼此垂直并且平坦的面朝向彼此。因此，一对阵列可以将入射光分成多个矩形部分，而不会引入不均匀性，如果若干球形透镜配置为用于矩形阵列，则会发生不均匀性。

6. 发明授权

US07961763B2 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US07961763B2
公开(公告)日：2011-06-14
申请号：US11476342
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： H01S3/10 , H01S3/11 , H01S3/0915
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅立叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

7. 发明授权

US07804993B2 Method and apparatus for detecting defects in wafers including alignment of the wafer images so as to induce the same smear in all images 有权
标题翻译：用于检测晶片中的缺陷的方法和装置，包括晶片图像的对准，以便在所有图像中引起相同的涂片
公开(公告)号：US07804993B2
公开(公告)日：2010-09-28
申请号：US11068711
申请日：2005-02-28
申请人： Yuval Dorphan , Ran Zaslavsky , Mark Wagner , Dov Furman , Shai Silberstein
发明人： Yuval Dorphan , Ran Zaslavsky , Mark Wagner , Dov Furman , Shai Silberstein
IPC分类号： G06K9/00 , G06K9/40
CPC分类号： G01N21/9501 , G01N21/95607
摘要： A method for inspecting a wafer including a multiplicity of dies, the method including dividing an image of at least a portion of the wafer into a plurality of sub-images each representing a sub-portion of the wafer and selecting at least one defect candidate within each sub-image by comparing each sub-image to a corresponding sub-image of a reference including a representation, which is assumed to be faultless, of the portion of the wafer.
摘要翻译：一种用于检查包括多个管芯的晶片的方法，所述方法包括将晶片的至少一部分的图像划分成多个子图像，每个子图像表示晶片的子部分，并且选择至少一个缺陷候选物每个子图像通过将每个子图像与包括晶片的该部分的被认为是无故障的表示的参考的对应子图像进行比较。

8. 发明申请

US20060244956A1 System for detection of wafer defects 有权
公开(公告)号：US20060244956A1
公开(公告)日：2006-11-02
申请号：US11476322
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

9. 发明申请

US20060193506A1 Method and apparatus for detecting defects in wafers including alignment of the wafer images so as to induce the same smear in all images 有权
标题翻译：用于检测晶片中的缺陷的方法和装置，包括晶片图像的对准，以便在所有图像中引起相同的涂片
公开(公告)号：US20060193506A1
公开(公告)日：2006-08-31
申请号：US11068711
申请日：2005-02-28
申请人： Yuval Dorphan , Ran Zaslavsky , Mark Wagner , Dov Furman , Shai Silberstein
发明人： Yuval Dorphan , Ran Zaslavsky , Mark Wagner , Dov Furman , Shai Silberstein
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/95607
摘要： A method for inspecting a wafer including a multiplicity of dies, the method including dividing an image of at least a portion of the wafer into a plurality of sub-images each representing a sub-portion of the wafer and selecting at least one defect candidate within each sub-image by comparing each sub-image to a corresponding sub-image of a reference including a representation, which is assumed to be faultless, of the portion of the wafer.
摘要翻译：一种用于检查包括多个管芯的晶片的方法，所述方法包括将晶片的至少一部分的图像划分成多个子图像，每个子图像表示晶片的子部分，并且选择至少一个缺陷候选物每个子图像通过将每个子图像与包括晶片的该部分的被认为是无故障的表示的参考的对应子图像进行比较。

10. 发明授权

US07843559B2 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US07843559B2
公开(公告)日：2010-11-30
申请号：US11476358
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

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