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1. 发明授权

US5930549A Developing device for semiconductor device fabrication and its controlling method 失效
标题翻译：半导体器件制造开发装置及其控制方法
公开(公告)号：US5930549A
公开(公告)日：1999-07-27
申请号：US969578
申请日：1997-11-13
申请人： Dong-ho Kim , Woung-kwan An , Je-eung Park , Byung-kwan Lee
发明人： Dong-ho Kim , Woung-kwan An , Je-eung Park , Byung-kwan Lee
IPC分类号： G03F7/30 , H01L21/027 , G03D5/00
CPC分类号： G03F7/3021
摘要： A developing device for a semiconductor device fabrication accomplishes complete removal of by-products formed during development of a photoresist, by inverting the wafer over a container of developer and dipping the pattern-forming face into the developer. While the wafer is still inverted over the container, the pattern-forming face is sprayed with a rinse and the wafer is spun to remove the rinse and by-products. The device includes the container provided on a table and supplied with developer, a spin chuck using vacuum suctioning the face of the wafer opposite to the pattern-forming face, a driving motor for rotating the spin chuck, a vertical driver for moving the wafer into and out of the container, and an inverting driver for rotating the spin chuck and the vertical driver so as to selectively turn the pattern-forming face of the wafer to look upward or downward.
摘要翻译：用于半导体器件制造的显影装置通过在显影剂容器上翻转晶片并将图案形成面浸入显影剂中来完成去除在光致抗蚀剂显影期间形成的副产物。当晶片仍然在容器上翻转时，用冲洗液喷射图案形成面，并且旋转晶片以除去漂洗和副产物。该装置包括设置在工作台上并提供有显影剂的容器，使用真空吸附与图案形成面相对的晶片表面的旋转卡盘，用于旋转旋转卡盘的驱动电机，用于将晶片移动的垂直驱动器并且离开容器，以及用于旋转旋转卡盘和垂直驱动器的反相驱动器，以便选择性地转动晶片的图案形成面以向上或向下看。

2. 发明授权

US5899690A Thermal processing apparatus for semiconductor wafer 失效
标题翻译：半导体晶圆热处理装置
公开(公告)号：US5899690A
公开(公告)日：1999-05-04
申请号：US923465
申请日：1997-09-04
申请人： Ki-hum Nam , Byung-kwan Lee , Dong-ho Kim , Woung-kwan An
发明人： Ki-hum Nam , Byung-kwan Lee , Dong-ho Kim , Woung-kwan An
IPC分类号： H01L21/66 , H01L21/02 , H01L21/22 , H01L21/324 , H01L21/677 , F27D3/12
CPC分类号： H01L21/67781
摘要： An apparatus for thermal processing of semiconductor wafers includes a table having in lateral sequence a heating chamber, a holding chamber, and a cassette stage and a boat for holding the wafers being processed. The apparatus further includes a boat transfer part for moving the boat between the holding chamber and the heating chamber, a wafer charging part for transferring the wafers loaded in a cassette on the cassette stage to the boat while it is in the holding chamber, and a wafer discharging part for transferring the wafers loaded in the boat back to the cassette on the cassette stage.
摘要翻译：一种用于半导体晶片的热处理的装置，包括一个具有加热室，一个保持室以及一个盒台的横向顺序的工作台以及用于保持被处理的晶片的舟皿。所述装置还包括用于在所述保持室和所述加热室之间移动所述船的船用传送部件，用于将装载在所述盒台上的盒中的所述晶片转移到所述容器的所述容纳室中的晶片充电部，以及用于将装载在舟皿中的晶片转移回盒式磁带上的盒的晶片排出部分。

3. 发明授权

US5872365A UV irradiation apparatus 失效
标题翻译：紫外线照射装置
公开(公告)号：US5872365A
公开(公告)日：1999-02-16
申请号：US679084
申请日：1996-07-12
申请人： Kyoon-hee Goh , Chul-hui Kim , Byung-kwan Lee , Seung-ug Kim , In-hyub Park , Young-chul Jeong , Woung-kwan An , Dong-ho Kim , Hun Cha , Choung-hyep Kim , Guk-hyeong Cho
发明人： Kyoon-hee Goh , Chul-hui Kim , Byung-kwan Lee , Seung-ug Kim , In-hyub Park , Young-chul Jeong , Woung-kwan An , Dong-ho Kim , Hun Cha , Choung-hyep Kim , Guk-hyeong Cho
IPC分类号： B29C71/04 , G03F7/20 , H01L21/00 , H01L21/304 , H01L21/683 , G01J1/00
CPC分类号： H01L21/6838 , G03F7/70691 , H01L21/67115
摘要： A UV irradiation apparatus, which includes a UV lamp installed in a chamber for generating UV rays; a vacuum chuck installed below the UV lamp for supporting and moving a wafer; and, a reflector surrounding the UV lamp for concentrating UV rays on the vacuum chuck. The apparatus further includes heating blocks for controlling the temperature at both sides of the vacuum chuck. Thus, it is possible to maintain an essentially constant temperature around the wafer supported by the vacuum chuck. As a result of the temperature control, when a protection tape attached to the front side of the wafer is irradiated with UV rays, an adhesive of the protective tape can be effectively degraded by a chemically reaction under optimum conditions, to thereby easily detach the protection tape from the wafer.
摘要翻译：一种UV照射装置，其包括安装在用于产生紫外线的室中的UV灯; 安装在UV灯下方的用于支撑和移动晶片的真空卡盘; 以及围绕UV灯的反射器，用于将UV射线聚集在真空吸盘上。该装置还包括用于控制真空吸盘两侧的温度的加热块。因此，可以在由真空卡盘支撑的晶片周围保持基本上恒定的温度。作为温度控制的结果，当用紫外线照射附着在晶片正面的保护带时，在最佳条件下可以通过化学反应有效地降低保护带的粘合剂，从而容易地分离保护胶带从晶圆。

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