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1. 发明授权

US07399806B2 Synthesis of photoresist polymers 失效
标题翻译：光致抗蚀剂聚合物的合成
公开(公告)号：US07399806B2
公开(公告)日：2008-07-15
申请号：US11734474
申请日：2007-04-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08F2/38 , C08F4/04
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译：本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。用作单体体积大的酯单体作为聚合组分。链转移剂的使用包括在聚合工艺条件中。描述了包含杂原子的聚合物末端基团的切割。

2. 发明授权

US07250475B2 Synthesis of photoresist polymers 失效
标题翻译：光致抗蚀剂聚合物的合成
公开(公告)号：US07250475B2
公开(公告)日：2007-07-31
申请号：US10877110
申请日：2004-06-25
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08F2/38 , C08F4/04
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译：本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。用作单体体积大的酯单体作为聚合组分。链转移剂的使用包括在聚合工艺条件中。描述了包含杂原子的聚合物末端基团的切割。

3. 发明授权

US07517634B2 Photoresist polymers 有权
标题翻译：光致抗蚀剂聚合物
公开(公告)号：US07517634B2
公开(公告)日：2009-04-14
申请号：US11300658
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08F220/28 , C08F20/18 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译：本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。用作单体体积大的酯单体作为聚合组分。链转移剂的使用包括在聚合工艺条件中。描述了包含杂原子的聚合物末端基团的切割。

4. 发明申请

US20060257781A1 Photoresist polymer compositions 有权
公开(公告)号：US20060257781A1
公开(公告)日：2006-11-16
申请号：US11300657
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Isao Nishimura , Akimasa Soyano , Kenji Okamoto , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Isao Nishimura , Akimasa Soyano , Kenji Okamoto , Yong Wang
IPC分类号： G03C1/00
CPC分类号： C08F220/18 , C08F20/18 , C08F220/28 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

5. 发明申请

US20060122346A9 Synthesis of photoresist polymers 失效
标题翻译：光致抗蚀剂聚合物的合成
公开(公告)号：US20060122346A9
公开(公告)日：2006-06-08
申请号：US10877110
申请日：2004-06-25
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08F2/00
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译：本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。用作单体体积大的酯单体作为聚合组分。链转移剂的使用包括在聚合工艺条件中。描述了包含杂原子的聚合物末端基团的切割。

6. 发明授权

US07510817B2 Photoresist polymer compositions 有权
标题翻译：光致抗蚀剂聚合物组合物
公开(公告)号：US07510817B2
公开(公告)日：2009-03-31
申请号：US11300657
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Isao Nishimura , Akimasa Soyano , Kenji Okamoto , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Isao Nishimura , Akimasa Soyano , Kenji Okamoto , Yong Wang
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08F220/18 , C08F20/18 , C08F220/28 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译：本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。用作单体体积大的酯单体作为聚合组分。链转移剂的使用包括在聚合工艺条件中。描述了包含杂原子的聚合物末端基团的切割。

7. 发明申请

US20070185276A1 Synthesis of Photresist Polymers 失效
标题翻译：光聚合物的合成
公开(公告)号：US20070185276A1
公开(公告)日：2007-08-09
申请号：US11734474
申请日：2007-04-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08F287/00
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译：本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。用作单体体积大的酯单体作为聚合组分。链转移剂的使用包括在聚合工艺条件中。描述了包含杂原子的聚合物末端基团的切割。

8. 发明申请

US20060217519A1 Photoresist polymers 有权
公开(公告)号：US20060217519A1
公开(公告)日：2006-09-28
申请号：US11300658
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08G63/00
CPC分类号： C08F220/28 , C08F20/18 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

9. 发明申请

US20050059787A1 Synthesis of photoresist polymers 失效
标题翻译：光致抗蚀剂聚合物的合成
公开(公告)号：US20050059787A1
公开(公告)日：2005-03-17
申请号：US10877110
申请日：2004-06-25
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08F2/38 , C08F20/30 , C08F220/18 , C08F220/30 , C08F293/00 , G03F7/004 , G03F7/039 , C08F2/00
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译：本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。用作单体体积大的酯单体作为聚合组分。链转移剂的使用包括在聚合工艺条件中。描述了包含杂原子的聚合物末端基团的切割。

10. 发明申请

US20070054214A1 Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions 有权
标题翻译：酸产生剂，磺酸，磺酰卤和辐射敏感性树脂组合物
公开(公告)号：US20070054214A1
公开(公告)日：2007-03-08
申请号：US10547769
申请日：2004-02-20
申请人： Satoshi Ebata , Yong Wang , Isao Nishimura
发明人： Satoshi Ebata , Yong Wang , Isao Nishimura
IPC分类号： G03C1/00
CPC分类号： C07C309/19 , C07C309/17 , C07C309/23 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D207/46 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/0757 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl, R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.
摘要翻译：本发明提供了新颖的酸产生剂，其在人体内的可燃性和积聚中是无问题的，并且可以产生具有高酸度和高沸点的酸，并且在抗蚀剂涂膜中显示适当短的扩散长度，并且允许形成抗蚀剂图案，具有极好的平滑性依赖于掩模图案的致密度; 酸产生器产生的磺酸; 用于合成酸发生剂的原料的磺酰卤; 和含有酸发生剂的辐射敏感性树脂组合物。酸产生剂具有由通式（I）表示的结构，其中R 1是一价取代基，例如烷氧基羰基，烷基磺酰基或烷氧基磺酰基，R 2至R“ > 4个各自为氢或烷基; k为0以上的整数; 并且n为0〜5的整数。在这些辐射敏感性树脂组合物中，除了上述酸产生剂之外，阳性物质含有具有酸解离基团的树脂，而负极性物质含有碱溶性树脂和交联除酸产生剂外还可加入。

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