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1. 发明申请

US20070054214A1 Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions 有权
标题翻译：酸产生剂，磺酸，磺酰卤和辐射敏感性树脂组合物
公开(公告)号：US20070054214A1
公开(公告)日：2007-03-08
申请号：US10547769
申请日：2004-02-20
申请人： Satoshi Ebata , Yong Wang , Isao Nishimura
发明人： Satoshi Ebata , Yong Wang , Isao Nishimura
IPC分类号： G03C1/00
CPC分类号： C07C309/19 , C07C309/17 , C07C309/23 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D207/46 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/0757 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl, R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.
摘要翻译：本发明提供了新颖的酸产生剂，其在人体内的可燃性和积聚中是无问题的，并且可以产生具有高酸度和高沸点的酸，并且在抗蚀剂涂膜中显示适当短的扩散长度，并且允许形成抗蚀剂图案，具有极好的平滑性依赖于掩模图案的致密度; 酸产生器产生的磺酸; 用于合成酸发生剂的原料的磺酰卤; 和含有酸发生剂的辐射敏感性树脂组合物。酸产生剂具有由通式（I）表示的结构，其中R 1是一价取代基，例如烷氧基羰基，烷基磺酰基或烷氧基磺酰基，R 2至R“ > 4个各自为氢或烷基; k为0以上的整数; 并且n为0〜5的整数。在这些辐射敏感性树脂组合物中，除了上述酸产生剂之外，阳性物质含有具有酸解离基团的树脂，而负极性物质含有碱溶性树脂和交联除酸产生剂外还可加入。

2. 发明授权

US08043786B2 Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions 有权
标题翻译：酸产生剂，磺酸，磺酰卤和辐射敏感性树脂组合物
公开(公告)号：US08043786B2
公开(公告)日：2011-10-25
申请号：US10547769
申请日：2004-02-20
申请人： Satoshi Ebata , Yong Wang , Isao Nishimura
发明人： Satoshi Ebata , Yong Wang , Isao Nishimura
IPC分类号： G03F7/039 , G03F7/038 , C07C317/04 , C07C309/80
CPC分类号： C07C309/19 , C07C309/17 , C07C309/23 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D207/46 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/0757 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.
摘要翻译：本发明提供了新颖的酸产生剂，其在人体内的可燃性和积聚中是无问题的，并且可以产生具有高酸度和高沸点的酸，并且在抗蚀剂涂膜中显示适当短的扩散长度，并且允许形成抗蚀剂图案，具有极好的平滑性依赖于掩模图案的致密度; 酸产生器产生的磺酸; 用于合成酸发生剂的原料的磺酰卤; 和含有酸发生剂的辐射敏感性树脂组合物。酸产生剂具有由通式（I）表示的结构，其中R 1是一价取代基，例如烷氧基羰基，烷基磺酰基或烷氧基磺酰基; R2至R4各自为氢或烷基; k为0以上的整数; 并且n为0〜5的整数。在这些辐射敏感性树脂组合物中，除了上述酸产生剂之外，阳性物质含有具有酸解离基团的树脂，而负极性物质含有碱溶性树脂和交联除酸产生剂外还可加入。

3. 发明授权

US07371503B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition 有权
标题翻译：锍盐化合物，光酸产生剂和正色散辐射敏感树脂组合物
公开(公告)号：US07371503B2
公开(公告)日：2008-05-13
申请号：US10543092
申请日：2004-01-09
申请人： Takashi Miyamatsu , Hirokazu Niwata , Satoshi Ebata , Yong Wang
发明人： Takashi Miyamatsu , Hirokazu Niwata , Satoshi Ebata , Yong Wang
IPC分类号： G03F7/004 , C07D331/04 , C07D333/46 , C07D335/04
CPC分类号： C07D333/72 , C07D333/46 , C07D333/78 , G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator.The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X− indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.
摘要翻译：对于220nm以下的波长的紫外线的透明性优异的锍盐化合物，当用作光致酸产生剂，光致酸产生剂，具有良好平衡的优异性能，例如灵敏度，分辨率，图案形式，LER和储存稳定性包含锍盐化合物和含有光酸产生剂的正色散辐射敏感性树脂组合物。锍盐化合物由下式（I）表示，其中R 1表示卤素原子，烷基，一价脂环族烃基，烷氧基或-OR 3 其中R 3是一价脂环族烃基，R 2表示（取代的） - 烷基或两个或更多个R 2， / SUP>基团形成环状结构，p为0-7，q为0-6，n为0-3，X为 - 表示磺酸阴离子。正色辐射敏感性树脂组合物包含（A）锍盐化合物的光酸产生剂和（B）含酸解离基团的树脂。

4. 发明申请

US20060141383A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions 有权
标题翻译：锍盐，辐射敏感酸产生剂和阳离子敏感树脂组合物
公开(公告)号：US20060141383A1
公开(公告)日：2006-06-29
申请号：US10543092
申请日：2004-01-09
申请人： Takashi Miyamatsu , Hirokazu Niwata , Satoshi Ebata , Yong Wang
发明人： Takashi Miyamatsu , Hirokazu Niwata , Satoshi Ebata , Yong Wang
IPC分类号： G03C1/76
CPC分类号： C07D333/72 , C07D333/46 , C07D333/78 , G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/123
摘要： A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X− indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.
摘要翻译：对于220nm以下的波长的紫外线的透明性优异的锍盐化合物，当用作光致酸产生剂，光致酸发生剂时，具有良好的平衡性，例如灵敏度，分辨率，图案形式，LER和储存稳定性包含锍盐化合物和含有光酸产生剂的正色散辐射敏感性树脂组合物。锍盐化合物由下式（I）表示，其中R 1表示卤素原子，烷基，一价脂环族烃基，烷氧基或-OR 3 其中R 3是一价脂环族烃基，R 2表示（取代的） - 烷基或两个或更多个R 2， / SUP>基团形成环状结构，p为0-7，q为0-6，n为0-3，X为 - 表示磺酸阴离子。正色辐射敏感性树脂组合物包含（A）锍盐化合物的光酸产生剂和（B）含酸解离基团的树脂。

5. 发明授权

US06908722B2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition 有权
标题翻译：酸产生剂，磺酸，磺酸衍生物和辐射敏感树脂组合物
公开(公告)号：US06908722B2
公开(公告)日：2005-06-21
申请号：US10183441
申请日：2002-06-28
申请人： Satoshi Ebata , Eiji Yoneda , Tomoki Nagai , Tatsuya Toneri , Yong Wang , Haruo Iwasawa , Yukio Nishimura
发明人： Satoshi Ebata , Eiji Yoneda , Tomoki Nagai , Tatsuya Toneri , Yong Wang , Haruo Iwasawa , Yukio Nishimura
IPC分类号： C07C309/17 , C07C309/19 , C07C309/23 , C07C381/12 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/004 , G03F7/039 , G03F7/075 , G03F7/00
CPC分类号： C07C309/23 , C07C309/17 , C07C309/19 , C07C381/12 , C07C2602/42 , C07C2603/86 , C07D333/46 , C07D333/78 , C07D335/02 , C07D347/00 , G03F7/0045 , G03F7/0392 , G03F7/0757 , Y10S430/114 , Y10S430/115
摘要： A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.
摘要翻译：一种含有下式（I）的结构的新型光酸产生剂，其中R为氟含量为50重量％以下的一价有机基团，硝基，氰基或氢原子，Z ^{1和Z 2各自独立地为氟原子或具有1-10个碳原子的直链或支链全氟烷基。当用于化学增强的辐射敏感性树脂组合物中时，光致酸产生剂显示出高透明度，较高的可燃性，并且没有生物累积性，并且产生在抗蚀涂层中表现出高酸度，高沸点，适度短扩散长度的酸，以及低对掩模图案密度的依赖。}

6. 发明授权

US07241847B2 Process for producing cycloolefin addition polymer 有权
公开(公告)号：US07241847B2
公开(公告)日：2007-07-10
申请号：US10568423
申请日：2004-08-04
申请人： Noboru Oshima , Michitaka Kaizu , Satoshi Ebata , Takashi Imamura
发明人： Noboru Oshima , Michitaka Kaizu , Satoshi Ebata , Takashi Imamura
IPC分类号： C08F4/70 , C08F32/08
CPC分类号： C08F232/08 , C08F32/08
摘要： A process for producing a cycloolefin addition polymer in which one or more cycloolefin monomers can be (co)polymerized by addition polymerization with a small palladium catalyst amount to produce a cycloolefin addition (co)polymer while attaining high catalytic activity. The process for cycloolefin addition polymer production is characterized by addition-polymerizing one or more cycloolefin monomers comprising a cycloolefin compound represented by a specific formula in the presence of a multi-component catalyst comprising (a) a palladium compound and (b) a specific phosphorus compound.

7. 发明授权

US06875518B2 Ruthenium film, ruthenium oxide film and process for forming the same 有权
标题翻译：钌膜，氧化钌膜及其形成方法
公开(公告)号：US06875518B2
公开(公告)日：2005-04-05
申请号：US10168104
申请日：2001-10-16
申请人： Hiroshi Shiho , Hitoshi Kato , Yasuo Matsuki , Satoshi Ebata , Yoichiro Maruyama , Yasuaki Yokoyama
发明人： Hiroshi Shiho , Hitoshi Kato , Yasuo Matsuki , Satoshi Ebata , Yoichiro Maruyama , Yasuaki Yokoyama
IPC分类号： C07F15/00 , B32B15/04 , B32B9/00 , C07F17/02 , C23C16/00
CPC分类号： C07F15/0046 , Y10T428/31678
摘要： A composition capable of forming a metal ruthenium film and a ruthenium oxide film by a simple application/baking process, a process for forming a metal ruthenium film and a ruthenium oxide film from the composition, a metal ruthenium film and a ruthenium oxide film formed by the process, and electrodes formed of the films.A solution composition comprising a specific ruthenium complex. The coating film of this solution composition is heated in an atmosphere containing no oxygen or an atmosphere containing oxygen to form a metal ruthenium film or a ruthenium oxide film, respectively, and electrodes formed of the films.
摘要翻译：通过简单的涂布/烘烤法，能够形成金属钌膜和氧化钌膜的组合物，从组合物形成金属钌膜和氧化钌膜的方法，金属钌膜和氧化钌膜由该方法和由该膜形成的电极。一种包含特定钌络合物的溶液组合物。该溶液组合物的涂膜在不含氧的气氛或含氧的气氛中分别加热，形成金属钌膜或氧化钌膜，由电极形成电极。

8. 发明授权

US06503570B2 Cyclosilane compound, and solution composition and process for forming a silicon film 失效
标题翻译：环硅烷化合物，以及用于形成硅膜的溶液组成和工艺
公开(公告)号：US06503570B2
公开(公告)日：2003-01-07
申请号：US09802918
申请日：2001-03-12
申请人： Yasuo Matsuki , Satoshi Ebata
发明人： Yasuo Matsuki , Satoshi Ebata
IPC分类号： B05D302
CPC分类号： C23C18/1208 , C07F7/025 , C23C18/122 , H01L21/02532 , H01L21/02592 , H01L21/02595 , H01L21/0262 , H01L21/02628 , H01L21/02675
摘要： Silylcyclopentasilane and a solution composition for forming a silicon film containing the same, which is used for forming a silicon film on the surface of a substrate. There is also disclosed spiro[4.4] nonasilane.
摘要翻译：硅基环戊硅烷和用于形成含有它们的硅膜的溶液组合物，其用于在基材的表面上形成硅膜。还公开了螺[4.4]壬硅烷。

9. 发明授权

US07268196B2 Process for producing cycloolefin addition polymer 有权
标题翻译：制备环烯加成聚合物的方法
公开(公告)号：US07268196B2
公开(公告)日：2007-09-11
申请号：US11620202
申请日：2007-01-05
申请人： Noboru Oshima , Michitaka Kaizu , Satoshi Ebata , Takashi Imamura
发明人： Noboru Oshima , Michitaka Kaizu , Satoshi Ebata , Takashi Imamura
IPC分类号： C08F4/70 , C08F32/00
CPC分类号： C08F232/08 , C08F32/08
摘要： A process for producing a cycloolefin addition polymer in which one or more cycloolefin monomers can be (co)polymerized by addition polymerization with a small palladium catalyst amount to produce a cycloolefin addition (co)polymer while attaining high catalytic activity. The process for cycloolefin addition polymer production is characterized by addition-polymerizing one or more cycloolefin monomers comprising a cycloolefin compound represented by a specific formula in the presence of a multi-component catalyst comprising (a) a palladium compound and (b) a specific phosphorus compound.
摘要翻译：一种制备环烯加成聚合物的方法，其中一种或多种环烯烃单体可以通过加成聚合以小的钯催化剂量进行（共）聚合，从而产生环烯烃加成（共）聚合物同时达到高催化活性。环烯烃加成聚合物制备方法的特征在于在多组分催化剂存在下，加入聚合一种或多种环烯烃单体，所述环烯烃单体包括由特定式表示的环烯烃化合物，其包含（a）钯化合物和（b）特定磷复合。

10. 发明申请

US20070155922A1 Process for producing cycloolefin addition polymer 审中-公开
标题翻译：制备环烯加成聚合物的方法
公开(公告)号：US20070155922A1
公开(公告)日：2007-07-05
申请号：US10581525
申请日：2004-11-30
申请人： Satoshi Ebata , Michitaka Kaizu , Noboru Oshima
发明人： Satoshi Ebata , Michitaka Kaizu , Noboru Oshima
IPC分类号： C08F4/80
CPC分类号： C08F32/00
摘要： [Means to solve problems] The process for preparing a cycloolefin addition polymer comprises addition-polymerizing monomers containing a specific cycloolefin compound in the presence of ethylene and a multicomponent catalyst containing, as essential components, (a) a palladium compound, (b) a compound selected from an ionic boron compound, an ionic aluminum compound, a Lewis acidic aluminum compound and a Lewis acidic boron compound and (c) a specific phosphine compound or its phosphonium salt. [Effect] A cycloolefin compound is addition-polymerized using a specific palladium catalyst and using ethylene as a molecular weight modifier, whereby a cycloolefin addition polymer having a molecular weight preferable for a sheet or a film used for an optical material can be prepared using small amounts of the molecular weight modifier and the palladium catalyst.
摘要翻译：解决问题的手段制备环烯加成聚合物的方法包括在乙烯存在下加入聚合含有特定环烯烃化合物的单体和含有（a）钯化合物作为必要组分的多组分催化剂，（b）选自离子性硼化合物，离子型铝化合物，路易斯酸性铝化合物和路易斯酸性硼化合物的化合物和（c）特定膦化合物或其鏻盐。 [效果]环烯烃化合物使用特定的钯催化剂进行加成聚合，使用乙烯作为分子量调节剂，由此可以使用小型的用于光学材料的片材或膜的分子量优选的环烯加成聚合物量的分子量调节剂和钯催化剂。

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