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    • 1. 发明申请
    • TRANSITION-AWARE SIGNALING
    • 过渡信号
    • US20050030066A1
    • 2005-02-10
    • US10389320
    • 2003-03-14
    • Dennis SylvesterHimanshu Kaul
    • Dennis SylvesterHimanshu Kaul
    • H03K3/3565H03K5/08H03K5/1534H03K5/22H04L25/02
    • H04L25/0292H03K3/3565H03K5/084H03K5/088H03K5/1534
    • An improved receiver circuit for use on an integrated chip is disclosed. The receiver circuit is interposed in an interconnect line between electrical components in an integrated circuit. The receiver circuit has a transition detection circuit that generates a transition signal in response to a detection of a transition from a first state to a second state on the interconnect line and further generates the transition signal in response to a detection of a transition from the second state to the first state on said interconnect line. The receiver further includes an output signal control circuit that, in response to the transition signal, selectively outputs either a present state of said interconnect line or a next state of the interconnect line stored in the receiver.
    • 公开了一种用于集成芯片上的改进的接收机电路。 接收器电路插入在集成电路中的电气部件之间的互连线中。 接收器电路具有转换检测电路,其响应于在互连线上从第一状态到第二状态的转变的检测而产生转换信号,并且响应于检测到来自第二状态的转变而产生转换信号 状态到所述互连线上的第一状态。 接收机还包括输出信号控制电路,响应于转换信号,选择性地输出所述互连线的当前状态或存储在接收机中的互连线的下一状态。
    • 2. 发明授权
    • Tool for modifying mask design layout
    • 修改蒙版设计布局的工具
    • US08103981B2
    • 2012-01-24
    • US12566925
    • 2009-09-25
    • Andrew B. KahngPuneet GuptaDennis SylvesterJie Yang
    • Andrew B. KahngPuneet GuptaDennis SylvesterJie Yang
    • G06F17/50
    • G06F17/5068
    • An embodiment of the invention provides a tool for modifying a mask design layout to be printed. The tool is executed by a computer system, and includes code for establishing a first level of correction for a mask design layout for a predetermined parametric yield without cost of correction to area of the mask design layout. The tool also includes code for correcting the mask design layout at said first level of correction based on a correction algorithm, the correction algorithm selecting a cell of the mask design layout having an edge placement error (EPE) for each gate feature in the cell. The correction algorithm selects the cell without loss to parametric yield as established by the predetermined parametric yield.
    • 本发明的实施例提供了一种用于修改要印刷的掩模设计布局的工具。 该工具由计算机系统执行,并且包括用于为掩模设计布局建立用于预定参数产量的第一级校正的代码,而不需要对掩模设计布局的区域进行校正的代价。 该工具还包括用于基于校正算法在所述第一校正级别校正掩模设计布局的代码,所述校正算法选择具有针对单元中的每个门特征的边缘放置误差(EPE)的掩模设计布局的单元。 校正算法选择不损失参数产量的单元,由参数产量确定。