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    • 3. 发明申请
    • Electrode for electrochemical machining
    • 电化学加工用电极
    • US20070215458A1
    • 2007-09-20
    • US11375010
    • 2006-03-15
    • Alexander ParkhomovskyLev DvoskinRoger AddyRobert Pelstring
    • Alexander ParkhomovskyLev DvoskinRoger AddyRobert Pelstring
    • C25D17/00B23H3/04
    • B23H9/00B23H3/04B23H3/06B23H2200/10C25D5/022
    • An electrode containing a dielectric layer on a surface of the electrode and an active zone containing a metal embedded below the surface of the electrode, wherein the electrode is configured to form a groove pattern on a workpiece by an electrochemical machining process is disclosed. The electrode is capable of manufacturing a workpiece such as a counter plate, a sleeve journal or a conical bearing containing a groove pattern for fluid dynamics bearing, the groove pattern having a pitch of less than 80 microns. The electrode could be made by a method including depositing a dielectric layer on a surface of a metal, depositing a photoresist layer on the dielectric layer, printing a groove pattern on the photoresist layer, etching or physico-chemically removing portions of the dielectric photoresist layers to form grooves in the dielectric layer; removing the photoresist layer; and filling the grooves with a metal to produce the electrode.
    • 公开了一种在电极表面上含有电介质层的电极和含有嵌入在电极表面下方的金属的活性区,其中电极通过电化学加工工艺在工件上形成凹槽图案。 电极能够制造工件,例如对置板,套筒轴颈或含有用于流体动力学轴承的凹槽图案的锥形轴承,凹槽图案具有小于80微米的间距。 电极可以通过包括在金属表面上沉积电介质层,在电介质层上沉积光致抗蚀剂层,在光致抗蚀剂层上印刷凹槽图案,蚀刻或物理化学去除电介质光致抗蚀剂层的部分的方法 在介电层中形成凹槽; 去除光致抗蚀剂层; 并用金属填充凹槽以产生电极。