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1. 发明授权

US09437400B2 Insulated dielectric window assembly of an inductively coupled plasma processing apparatus 有权
标题翻译：电感耦合等离子体处理装置的绝缘介电窗组件
公开(公告)号：US09437400B2
公开(公告)日：2016-09-06
申请号：US13462305
申请日：2012-05-02
申请人： David Setton , Gautam Bhattacharyya , Brett C. Richardson
发明人： David Setton , Gautam Bhattacharyya , Brett C. Richardson
IPC分类号： C23C16/00 , H01L21/326 , H01J37/32
CPC分类号： H01J37/32119 , Y10T29/49826
摘要： An insulated dielectric window assembly comprising a dielectric window of an inductively coupled plasma processing apparatus; an upper polymeric ring, and a lower polymeric ring. The upper polymeric ring insulates the outer edge of the dielectric window from a cooler ambient atmosphere and the lower polymeric ring insulates the lower surface of the dielectric window from a chamber surface supporting the window.
摘要翻译：一种绝缘电介质窗组件，包括电感耦合等离子体处理装置的电介质窗; 上聚合物环和下聚合物环。上部聚合物环将电介质窗口的外边缘与更冷的环境气氛绝缘，并且下部聚合物环将电介质窗口的下表面与支撑窗户的室表面绝缘。

2. 发明申请

US20130292055A1 INSULATED DIELECTRIC WINDOW ASSEMBLY OF AN INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS 有权
标题翻译：电感耦合等离子体加工设备的绝缘电介质窗组件
公开(公告)号：US20130292055A1
公开(公告)日：2013-11-07
申请号：US13462305
申请日：2012-05-02
申请人： David Setton , Gautam Bhattacharyya , Brett C. Richardson
发明人： David Setton , Gautam Bhattacharyya , Brett C. Richardson
IPC分类号： H05H1/24 , F28D15/00 , B32B3/24 , B23P17/04 , B44C1/22 , B32B3/02
CPC分类号： H01J37/32119 , Y10T29/49826
摘要： An insulated dielectric window assembly comprising a dielectric window of an inductively coupled plasma processing apparatus; an upper polymeric ring, and a lower polymeric ring. The upper polymeric ring insulates the outer edge of the dielectric window from a cooler ambient atmosphere and the lower polymeric ring insulates the lower surface of the dielectric window from a chamber surface supporting the window.
摘要翻译：一种绝缘电介质窗组件，包括电感耦合等离子体处理装置的电介质窗; 上聚合物环和下聚合物环。上部聚合物环将电介质窗口的外边缘与更冷的环境气氛绝缘，并且下部聚合物环将电介质窗口的下表面与支撑窗户的室表面绝缘。

3. 发明授权

US5803107A Method and apparatus for pressure control in vacuum processors 失效
标题翻译：真空处理器中压力控制的方法和装置
公开(公告)号：US5803107A
公开(公告)日：1998-09-08
申请号：US627711
申请日：1996-03-29
申请人： Farro Frank Kaveh , Michael S. Barnes , Brett C. Richardson , Christopher H. Olson
发明人： Farro Frank Kaveh , Michael S. Barnes , Brett C. Richardson , Christopher H. Olson
IPC分类号： H01L21/302 , B01J3/02 , F16K31/12 , F16K31/36 , G05D16/20 , H01L21/3065 , F17D1/16 , F16K17/34 , F17D1/18
CPC分类号： G05D16/202 , Y10S438/909 , Y10T137/0396 , Y10T137/2572 , Y10T137/7761
摘要： A method and apparatus is disclosed for controlling the pressure of reaction chamber in wafer processing equipment. The disclosed apparatus and method uses a ballast port for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve which is located between the reaction chamber and turbo pump. The disclosed apparatus and method further introduces process gases at higher rate than set point levels to reduce the transition time or stabilization time required when raising the pressure in the reaction chamber.
摘要翻译：公开了一种用于控制晶片加工设备中的反应室的压力的方法和装置。所公开的装置和方法使用用于将气体插入抽空系统中的压载端口，从而控制反应室中的压力。所公开的装置和方法还使用估计曲线来估计位于反应室和涡轮泵之间的受控闸阀的期望位置。所公开的装置和方法进一步介绍了比设定点水平更高的处理气体，以减少在提高反应室中的压力时所需的过渡时间或稳定时间。

4. 发明申请

US20170340159A1 PORTABLE COFFEE BREWING DEVICE 审中-公开
公开(公告)号：US20170340159A1
公开(公告)日：2017-11-30
申请号：US15660504
申请日：2017-07-26
申请人： Brett C. Richardson
发明人： Brett C. Richardson
IPC分类号： A47J31/00 , A23F5/26 , A47J31/057 , A47J31/06
CPC分类号： A47J31/005 , A23F5/26 , A47J31/0576 , A47J31/0626
摘要： A portable coffee brewing device includes a lid pivotally connected to an upper end of the container by a hinge and button. A heating element housing and an electrical component housing is connected to a lower end of the container. A drain is positioned in a bottom wall of the container and is fluidly connected to a heating element positioned within the heating element housing. The heating element is controlled by electrical components positioned in the electrical components housing. A drip tube is fluidly connected to the heating element and the lid. A single serve coffee holding device is positioned below the lid. When the container is filled with fluid and the heating element is powered, heated fluid is forced up the drip tube through the passageway in the lid and into the coffee grounds holding device in a continuous cycle. The device is connectable to an external power source.

5. 发明申请

US20100108261A1 LOWER ELECTRODE ASSEMBLY OF PLASMA PROCESSING CHAMBER 有权
标题翻译：等离子体处理室的下电极组件
公开(公告)号：US20100108261A1
公开(公告)日：2010-05-06
申请号：US12609377
申请日：2009-10-30
申请人： Jason Augustino , Quan Chau , Keith William Gaff , Hanh Tuong Ha , Brett C. Richardson , Harmeet Singh
发明人： Jason Augustino , Quan Chau , Keith William Gaff , Hanh Tuong Ha , Brett C. Richardson , Harmeet Singh
IPC分类号： C23F1/08 , H01L21/306
CPC分类号： H01J37/20 , H01J37/32091 , H01J37/32541 , H01J37/3255 , H01J37/32642 , H01J37/32715
摘要： A lower electrode assembly for use in a plasma processing chamber comprises a metal base and upper and lower edge rings. The metal base comprises metal plates brazed together and forming a brazed line on a lower side surface of the base, an edge ring support surface extending horizontally inwardly from the lower side surface and an upper side surface above the edge ring support surface. The upper edge ring comprises a lower surface mounted on the edge ring support surface and the lower edge ring surrounds the lower side surface of the base with a gap between opposed surfaces of the upper and lower edge rings and between the lower edge ring and the outer periphery of the base. The gap has an aspect ratio of total gap length to average gap width sufficient to impede arcing at the location of the braze line.
摘要翻译：用于等离子体处理室的下部电极组件包括金属基座和上部和下部边缘环。金属基底包括钎焊在一起的金属板，在基座的下侧表面上形成钎焊线，从下侧表面向水平方向延伸的边缘环支撑表面和在边缘环支撑表面上方的上侧表面。上边缘环包括安装在边缘环支撑表面上的下表面，并且下边缘环围绕基底的下侧表面，在上边缘环和下边缘环的相对表面之间以及下边缘环和外侧边缘环的相对表面之间具有间隙基地周边。间隙具有总间隙长度与平均间隙宽度的宽高比，足以阻止钎焊线位置处的电弧。

6. 发明授权

US06350697B1 Method of cleaning and conditioning plasma reaction chamber 有权
标题翻译：清洗和调理等离子体反应室的方法
公开(公告)号：US06350697B1
公开(公告)日：2002-02-26
申请号：US09469286
申请日：1999-12-22
申请人： Brett C. Richardson , Duane Outka
发明人： Brett C. Richardson , Duane Outka
IPC分类号： H01L21302
CPC分类号： H01J37/32477 , C23C16/4404 , H01J37/32862
摘要： A method for cleaning and conditioning interior surfaces of a plasma chamber in which substrates such as silicon wafers are processed. The method includes cleaning the chamber such as by a wet clean or in-situ plasma clean, introducing a conditioning gas into the chamber, energizing the conditioning gas into a plasma state, depositing a polymer coating on the interior surfaces and processing a substrate. The conditioning step can be performed without a substrate such as a wafer in the chamber and the processing step can be carried out without running conditioning wafers through the chamber prior to processing production wafers. In the case of a plasma chamber used for etching aluminum, the conditioning gas can include a fluorine-containing gas, a carbon-containing gas and a chlorine-containing gas.
摘要翻译：一种用于清洁和调节等离子体室内表面的方法，其中处理诸如硅晶片的衬底。该方法包括例如通过湿式清洁或原位等离子体清洁来清洁室，将调节气体引入室中，使调节气体进入等离子体状态，在聚合物涂层上沉积聚合物涂层并处理基板。调节步骤可以在没有诸如室内的晶片的基板的情况下进行，并且可以在处理生产晶片之前不经由室内运行调节晶片来执行处理步骤。在用于蚀刻铝的等离子体室的情况下，调节气体可以包括含氟气体，含碳气体和含氯气体。

7. 发明授权

US6060837A Method of and apparatus for minimizing plasma instability in an rf processor 有权
标题翻译：用于最小化rf处理器中的等离子体不稳定性的方法和装置
公开(公告)号：US6060837A
公开(公告)日：2000-05-09
申请号：US335493
申请日：1999-06-18
申请人： Brett C. Richardson , Tuan Ngo
发明人： Brett C. Richardson , Tuan Ngo
IPC分类号： H05H1/46 , H01J37/32 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/32935 , H01J37/321 , H01J37/32183 , H01J37/3299
摘要： Variable reactances of a matching network connected between an r.f. source and a plasma load of a vacuum plasma chamber processing a workpiece are varied so a tendency of the plasma to change in an unstable manner which can adversely affect processing of the workpiece is avoided while matching is approached. The plasma tendency to change in an unstable manner is detected by monitoring an electrical parameter resulting from r.f. current flowing between the source and load via the network. The parameter can be (1) statistically based, e.g. variance of percent delivered power, or (2) amplitude modulation in one or both of the 2-20 kHz and 50-200 kHz ranges.
摘要翻译：连接在r.f.之间的匹配网络的可变电抗处理工件的真空等离子体室的源极和等离子体负载变化，从而避免了等离子体以不稳定的方式改变的趋势，这可能不利地影响工件的加工，同时接近匹配。通过监测由r.f产生的电参数来检测等离子体以不稳定方式改变的趋势。通过网络在电源和负载之间流动的电流。参数可以是（1）统计学上的，例如传输功率百分比的变化，或（2）2-20 kHz和50-200 kHz范围中的一个或两个的幅度调制。

8. 发明授权

US10231568B2 Portable coffee brewing device 有权
公开(公告)号：US10231568B2
公开(公告)日：2019-03-19
申请号：US15660504
申请日：2017-07-26
申请人： Brett C. Richardson
发明人： Brett C. Richardson
IPC分类号： A47J31/00 , A47J31/057 , A47J31/06 , A23F5/26
摘要： A portable coffee brewing device includes a lid pivotally connected to an upper end of the container by a hinge and button. A heating element housing and an electrical component housing is connected to a lower end of the container. A drain is positioned in a bottom wall of the container and is fluidly connected to a heating element positioned within the heating element housing. The heating element is controlled by electrical components positioned in the electrical components housing. A drip tube is fluidly connected to the heating element and the lid. A single serve coffee holding device is positioned below the lid. When the container is filled with fluid and the heating element is powered, heated fluid is forced up the drip tube through the passageway in the lid and into the coffee grounds holding device in a continuous cycle. The device is connectable to an external power source.

9. 发明申请

US20160360917A1 Portable Coffee Brewing Device 审中-公开
标题翻译：便携式咖啡冲泡装置
公开(公告)号：US20160360917A1
公开(公告)日：2016-12-15
申请号：US15246598
申请日：2016-08-25
申请人： Brett C. Richardson
发明人： Brett C. Richardson
IPC分类号： A47J31/00 , A47J31/52 , A47J31/06 , A23F5/26 , A47J31/46
CPC分类号： A47J31/005 , A23F5/26 , A47J31/0576 , A47J31/0626
摘要： A portable coffee brewing device includes a lid pivotally connected to an upper end of the container by a hinge and button. A heating element housing and an electrical component housing is connected to a lower end of the container. A drain is positioned in a bottom wall of the container and is fluidly connected to a heating element positioned within the heating element housing. The heating element is controlled by electrical components positioned in the electrical components housing. A drip tube is fluidly connected to the heating element and the lid. A single serve coffee holding device is positioned below the lid. When the container is filled with fluid and the heating element is powered, heated fluid is forced up the drip tube through the passageway in the lid and into the coffee grounds holding device in a continuous cycle. The device is connectable to an external power source.
摘要翻译：便携式咖啡冲泡装置包括通过铰链和按钮枢转地连接到容器的上端的盖子。加热元件壳体和电气部件壳体连接到容器的下端。排水管定位在容器的底壁中，并且流体地连接到位于加热元件壳体内的加热元件。加热元件由位于电气部件壳体中的电气部件控制。滴管与加热元件和盖子流体连接。单一咖啡保持装置位于盖的下方。当容器充满流体并且加热元件被供电时，加热的流体被迫通过盖子中的通道并且连续循环进入咖啡渣保持装置中。该设备可连接到外部电源。

10. 发明授权

US07028696B2 Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method 有权
标题翻译：使用双步无晶圆自动清洁方法对沉积室残留物进行等离子体清洁
公开(公告)号：US07028696B2
公开(公告)日：2006-04-18
申请号：US10139042
申请日：2002-05-03
申请人： Brett C. Richardson , Vincent Wong
发明人： Brett C. Richardson , Vincent Wong
IPC分类号： B08B7/04
CPC分类号： H01J37/32862 , B08B3/06 , B08B7/0035 , C23C16/4405 , H01J37/32935 , H01J37/32963 , Y10S438/905
摘要： A method involving plasma cleaning of deposit residues in process chamber using duo-step wafer-less auto clean method is detailed. Specifically, the method involves cleaning the processing chamber by flowing a first gaseous composition with at least about 75% of fluorine-containing compound of the formula XyFz, into a processing chamber and then forming a first etchant plasma which removes silicon and silicon based byproducts from the interior surfaces of the processing chamber. The method then involves flowing a second gaseous composition into the processing chamber with a composition of at least about 50% O2 and forming a plasma from the second gaseous composition to provide a second etchant plasma which removes carbon and carbon based byproducts from the interior surfaces of the processing chamber. A system configured to execute the two step cleaning process is also provided.
摘要翻译：详细介绍了使用二步无硅自动清洁方法对处理室中沉积物残留物进行等离子体清洗的方法。具体地说，该方法包括通过将具有至少约75％的通式为X Y Y Z Z的含氟化合物的第一气态组合物流入到然后形成第一蚀刻剂等离子体，其从处理室的内表面去除硅和硅基副产物。该方法然后包括使第二气态组合物以至少约50％O 2 2的组成流入处理室并从第二气态组合物形成等离子体以提供第二蚀刻剂等离子体，其除去碳和来自处理室的内表面的基于碳的副产物。还提供了被配置为执行两步清洁处理的系统。

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