专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100108261A1 LOWER ELECTRODE ASSEMBLY OF PLASMA PROCESSING CHAMBER 有权
标题翻译：等离子体处理室的下电极组件
公开(公告)号：US20100108261A1
公开(公告)日：2010-05-06
申请号：US12609377
申请日：2009-10-30
申请人： Jason Augustino , Quan Chau , Keith William Gaff , Hanh Tuong Ha , Brett C. Richardson , Harmeet Singh
发明人： Jason Augustino , Quan Chau , Keith William Gaff , Hanh Tuong Ha , Brett C. Richardson , Harmeet Singh
IPC分类号： C23F1/08 , H01L21/306
CPC分类号： H01J37/20 , H01J37/32091 , H01J37/32541 , H01J37/3255 , H01J37/32642 , H01J37/32715
摘要： A lower electrode assembly for use in a plasma processing chamber comprises a metal base and upper and lower edge rings. The metal base comprises metal plates brazed together and forming a brazed line on a lower side surface of the base, an edge ring support surface extending horizontally inwardly from the lower side surface and an upper side surface above the edge ring support surface. The upper edge ring comprises a lower surface mounted on the edge ring support surface and the lower edge ring surrounds the lower side surface of the base with a gap between opposed surfaces of the upper and lower edge rings and between the lower edge ring and the outer periphery of the base. The gap has an aspect ratio of total gap length to average gap width sufficient to impede arcing at the location of the braze line.
摘要翻译：用于等离子体处理室的下部电极组件包括金属基座和上部和下部边缘环。金属基底包括钎焊在一起的金属板，在基座的下侧表面上形成钎焊线，从下侧表面向水平方向延伸的边缘环支撑表面和在边缘环支撑表面上方的上侧表面。上边缘环包括安装在边缘环支撑表面上的下表面，并且下边缘环围绕基底的下侧表面，在上边缘环和下边缘环的相对表面之间以及下边缘环和外侧边缘环的相对表面之间具有间隙基地周边。间隙具有总间隙长度与平均间隙宽度的宽高比，足以阻止钎焊线位置处的电弧。

2. 发明授权

US09412555B2 Lower electrode assembly of plasma processing chamber 有权
标题翻译：等离子处理室的下电极组件
公开(公告)号：US09412555B2
公开(公告)日：2016-08-09
申请号：US12609377
申请日：2009-10-30
申请人： Jason Augustino , Quan Chau , Keith William Gaff , Hanh Tuong Ha , Brett C. Richardson , Harmeet Singh
发明人： Jason Augustino , Quan Chau , Keith William Gaff , Hanh Tuong Ha , Brett C. Richardson , Harmeet Singh
IPC分类号： H01J37/20 , H01J37/32
CPC分类号： H01J37/20 , H01J37/32091 , H01J37/32541 , H01J37/3255 , H01J37/32642 , H01J37/32715
摘要： A lower electrode assembly for use in a plasma processing chamber comprises a metal base and upper and lower edge rings. The metal base comprises metal plates brazed together and forming a brazed line on a lower side surface of the base, an edge ring support surface extending horizontally inwardly from the lower side surface and an upper side surface above the edge ring support surface. The upper edge ring comprises a lower surface mounted on the edge ring support surface and the lower edge ring surrounds the lower side surface of the base with a gap between opposed surfaces of the upper and lower edge rings and between the lower edge ring and the outer periphery of the base. The gap has an aspect ratio of total gap length to average gap width sufficient to impede arcing at the location of the braze line.
摘要翻译：用于等离子体处理室的下部电极组件包括金属基座和上部和下部边缘环。金属基底包括钎焊在一起的金属板，在基座的下侧表面上形成钎焊线，从下侧表面向水平方向延伸的边缘环支撑表面和在边缘环支撑表面上方的上侧表面。上边缘环包括安装在边缘环支撑表面上的下表面，并且下边缘环围绕基底的下侧表面，在上边缘环和下边缘环的相对表面之间以及下边缘环和外侧边缘环的相对表面之间具有间隙基地周边。间隙具有总间隙长度与平均间隙宽度的宽高比，足以阻止钎焊线位置处的电弧。

3. 发明申请

US20080223401A1 Cleaning hardware kit for composite showerhead electrode assemblies for plasma processing apparatuses 有权
标题翻译：用于等离子体处理设备的复合喷头电极组件的清洁硬件套件
公开(公告)号：US20080223401A1
公开(公告)日：2008-09-18
申请号：US12073651
申请日：2008-03-07
申请人： Jason Augustino , Charles Rising
发明人： Jason Augustino , Charles Rising
IPC分类号： B08B13/00 , B08B3/08 , B08B5/00
CPC分类号： C23C14/564 , C23C16/4405
摘要： Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode carrier to hold an electrode assembly, a treatment stand to allow access to the electrode assembly, a spider plate to clamp the electrode assembly in the electrode carrier, a nitrogen purge plate to supply nitrogen gas to the backside of the electrode assembly during acid cleaning of the electrode, a water rinse plate to supply water to the electrode face, a blow dry plate to supply nitrogen to dry the electrode assembly and a bake stand to support the electrode assembly during a bake before placing the clean electrode assembly in a bag.
摘要翻译：用于清洁硅电极组件表面的装置，其控制或消除电极组件接合材料的可能的化学侵蚀，并且消除在酸处理期间与待清洁部件的直接操作接触，喷雾冲洗，吹干，烘烤和装袋。该装置的方面包括一种套件，其包括用于保持电极组件的电极载体，用于允许接触电极组件的处理台，将电极组件夹持在电极载体中的蜘蛛板，将氮气供应到在电极的酸洗期间电极组件的背面，向电极面供水的水冲洗板，用于供应氮气以干燥电极组件的吹干板和烘烤架，以在烘烤期间支撑电极组件将清洁的电极组件放置在袋中。

4. 发明授权

US08603292B2 Quartz window for a degas chamber 有权
标题翻译：用于脱气室的石英窗
公开(公告)号：US08603292B2
公开(公告)日：2013-12-10
申请号：US12607659
申请日：2009-10-28
申请人： Jason Augustino , Tim Hart
发明人： Jason Augustino , Tim Hart
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/32467 , Y10T137/8359
摘要： A five-sided quartz window configured to be mounted on a degas chamber as a UV-transmissive window. The quartz window is made of synthetic quartz and has a uniform thickness. The shape of the quartz window is defined by an upper surface, a lower surface and a sidewall therebetween. The sidewall has five straight sections interconnected by five arcuate sections. The quartz window has four arcuate recesses extending into the sidewall.
摘要翻译：五面石英窗构造成安装在脱气室作为紫外线透射窗。石英窗由合成石英制成，厚度均匀。石英窗的形状由上表面，下表面和侧壁之间限定。侧壁具有由五个弧形部分相互连接的五个直线部分。石英窗有四个弧形凹槽延伸到侧壁。

5. 发明授权

US08171877B2 Backside mounted electrode carriers and assemblies incorporating the same 有权
标题翻译：背面安装的电极载体和包含其的组件
公开(公告)号：US08171877B2
公开(公告)日：2012-05-08
申请号：US12164285
申请日：2008-06-30
申请人： Jason Augustino , Armen Avoyan , Yan Fang , Duane Outka , Hong Shih , Stephen Whitten
发明人： Jason Augustino , Armen Avoyan , Yan Fang , Duane Outka , Hong Shih , Stephen Whitten
IPC分类号： B05C13/00 , B05C13/02 , B05C21/00 , C23C16/00 , C23C16/50 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32568 , H01J37/32091 , H01J37/32605
摘要： A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to limit lateral movement of an electrode positioned in the aperture. The electrode accommodating aperture further comprises one or more sidewall projections that support the weight of an electrode positioned in the aperture. The electrode mounting hardware is configured to engage an electrode positioned in the electrode accommodating aperture from the backside of the carrier and urge the electrode against the sidewall projections so as to limit axial movement of the electrode in the electrode accommodating aperture. Additional embodiments of broader and narrower scope are contemplated.
摘要翻译：提供的载体组件包括背面安装的电极载体和电极安装硬件。背面安装的电极载体包括电极容纳孔，电极容纳孔又包括被配置为限制定位在孔中的电极的横向移动的侧壁结构。电极容纳孔还包括支撑位于孔中的电极的重量的一个或多个侧壁突起。电极安装硬件被配置成从位于载体的背面的电极容纳孔中的电极接合，并且将电极推靠在侧壁突起上，以限制电极在电极容纳孔中的轴向移动。考虑到更广泛和更窄范围的另外的实施例。

6. 发明申请

US20110306213A1 OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICONDUCTOR SUBSTRATES 有权
标题翻译： OZONE PLENUM作为紫外线快门或TUNABLE紫外线过滤器用于清洁半导体基板
公开(公告)号：US20110306213A1
公开(公告)日：2011-12-15
申请号：US12797196
申请日：2010-06-09
申请人： Yen-Kun Victor Wang , Shang-I Chou , Jason Augustino
发明人： Yen-Kun Victor Wang , Shang-I Chou , Jason Augustino
IPC分类号： H01L21/465 , B32B3/26 , B32B17/00 , C03B23/20
CPC分类号： H01L21/268 , C03B20/00 , H01L21/02041 , H01L21/67028 , H01L21/67115
摘要： A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber.
摘要翻译：具有内部增压室的石英窗口可通过向气室供应含臭氧的气体而在脱气室中作为快门或UV过滤器操作。可以调节增压室中的压力以阻止UV光透射到脱气室中或调节通过窗口的UV光的透射率。当集气室抽真空时，增压室允许最大限度地将UV光透射到脱气室中。

7. 发明申请

US20110086513A1 UPPER ELECTRODE BACKING MEMBER WITH PARTICLE REDUCING FEATURES 有权
标题翻译：具有颗粒减少特性的上电极背部构件
公开(公告)号：US20110086513A1
公开(公告)日：2011-04-14
申请号：US12967750
申请日：2010-12-14
申请人： Anthony De La Llera , Allan K. Ronne , Jaehyun Kim , Jason Augustino , Rajinder Dhindsa , Yen-Kun Wang , Saurabh J. Ullal , Anthony J. Norell , Keith Comendant , William M. Denty, JR.
发明人： Anthony De La Llera , Allan K. Ronne , Jaehyun Kim , Jason Augustino , Rajinder Dhindsa , Yen-Kun Wang , Saurabh J. Ullal , Anthony J. Norell , Keith Comendant , William M. Denty, JR.
IPC分类号： H01L21/04 , C23C16/455
CPC分类号： H01J37/32449 , H01J37/32009 , H01J37/32541 , H01J37/3255
摘要： Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.
摘要翻译：等离子体处理装置的组件包括具有气体通道的背衬构件，气体通道连接到具有气体通道的上部电极。为了补偿金属背衬构件和上部电极之间的热膨胀系数的差异，气体通道的定位和尺寸使得它们在环境温度下不对准并且在升高的处理温度下基本上同心。由于热膨胀，弹性粘合材料中可能会产生不均匀的剪切应力。剪切应力可以通过施加不同厚度的弹性粘合材料或使用包括多个片的背衬构件来适应。

8. 发明申请

US20080141941A1 Showerhead electrode assembly with gas flow modification for extended electrode life 有权
标题翻译：喷头电极组件，具有气流改性，延长电极寿命
公开(公告)号：US20080141941A1
公开(公告)日：2008-06-19
申请号：US11640193
申请日：2006-12-18
申请人： Jason Augustino , Anthony De La Llera , Allan K. Ronne , Jaehyun Kim , Rajinder Dhindsa , Yen-Kun Wang , Saurabh J. Ullal , Anthony J. Norell , Keith Comendant , William M. Denty
发明人： Jason Augustino , Anthony De La Llera , Allan K. Ronne , Jaehyun Kim , Rajinder Dhindsa , Yen-Kun Wang , Saurabh J. Ullal , Anthony J. Norell , Keith Comendant , William M. Denty
IPC分类号： C23C16/00 , H01L21/31
CPC分类号： H01L21/67069 , C23C16/45565 , C23C16/45582 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01L21/67017
摘要： A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.
摘要翻译：提供了一种用于等离子体处理装置的喷头电极组件。喷头电极组件包括附接到第二构件的第一构件。第一和第二构件具有流体连通的第一和第二气体通道。当处理气体流过气体通道时，跨越第一和第二气体通道产生总压降。跨越第二气体通道的总压降的一小部分大于跨越第一气体通道的总压降的一部分。

9. 发明授权

US08702866B2 Showerhead electrode assembly with gas flow modification for extended electrode life 有权
标题翻译：喷头电极组件，具有气流改性，延长电极寿命
公开(公告)号：US08702866B2
公开(公告)日：2014-04-22
申请号：US11640193
申请日：2006-12-18
申请人： Jason Augustino , Anthony De La Llera , Allan K. Ronne , Jaehyun Kim , Rajinder Dhindsa , Yen-Kun Wang , Saurabh J. Ullal , Anthony J. Norell , Keith Comendant , William M. Denty, Jr.
发明人： Jason Augustino , Anthony De La Llera , Allan K. Ronne , Jaehyun Kim , Rajinder Dhindsa , Yen-Kun Wang , Saurabh J. Ullal , Anthony J. Norell , Keith Comendant , William M. Denty, Jr.
IPC分类号： C23C16/455 , C23C16/50 , H01L21/3065
CPC分类号： H01L21/67069 , C23C16/45565 , C23C16/45582 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01L21/67017
摘要： A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.
摘要翻译：提供了一种用于等离子体处理装置的喷头电极组件。喷头电极组件包括附接到第二构件的第一构件。第一和第二构件具有流体连通的第一和第二气体通道。当处理气体流过气体通道时，跨越第一和第二气体通道产生总压降。跨越第二气体通道的总压降的一小部分大于跨越第一气体通道的总压降的一部分。

10. 发明申请

US20110097900A1 QUARTZ WINDOW FOR A DEGAS CHAMBER 有权
标题翻译： QUARTZ WINDOW FOR DEGAS CHAMBER
公开(公告)号：US20110097900A1
公开(公告)日：2011-04-28
申请号：US12607659
申请日：2009-10-28
申请人： Jason Augustino , Tim Hart
发明人： Jason Augustino , Tim Hart
IPC分类号： H01L21/306 , B32B3/02 , F17D3/00
CPC分类号： H01J37/32467 , Y10T137/8359
摘要： A five-sided quartz window configured to be mounted on a degas chamber as a UV-transmissive window. The quartz window is made of synthetic quartz and has a uniform thickness. The shape of the quartz window is defined by an upper surface, a lower surface and a sidewall therebetween. The sidewall has five straight sections interconnected by five arcuate sections. The quartz window has four arcuate recesses extending into the sidewall.
摘要翻译：五面石英窗构造成安装在脱气室作为紫外线透射窗。石英窗由合成石英制成，厚度均匀。石英窗的形状由上表面，下表面和侧壁之间限定。侧壁具有由五个弧形部分相互连接的五个直线部分。石英窗有四个弧形凹槽延伸到侧壁。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式