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1. 发明授权

US4855792A Optical alignment system for use in photolithography and having reduced reflectance errors 失效
标题翻译：用于光刻的光学对准系统并具有降低的反射率误差
公开(公告)号：US4855792A
公开(公告)日：1989-08-08
申请号：US193887
申请日：1988-05-13
申请人： David S. Holbrook , Craig R. Simpson
发明人： David S. Holbrook , Craig R. Simpson
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , H05K3/00
CPC分类号： G03F9/7069
摘要： A direct reticle reference alignment system for use in photolithography for use with substrates having optical transmissivity. The system includes a movable stage (14), a transmissive substrate (11) held by the stage and bearing at least one plate mark (15) upon its upper surface, an optical system having a light source (1) for illuminating and projecting a reticle alignment image (4) upon the substrate (11) for alignment with the plate mark (15), a sensor (17) mounted in the stage (14) below the substrate (11) and the plate mark (15) to receive light from the projected alignment image (4), the sensor (17) producing an electrical signal related to the degree of alignment, and a stage control actuated by the signal to position the stage (14) and, so, align the substrate (11) with the reticle (4). The sensor (17) includes a light channel (19), such as a fiber optic rod, positioned to receive images from the lower surface (13) of said substrate ( 11) and carry them to the photocell. The detector may include a quadcell and a corresponding light channel for each cell in the quadcell.

2. 发明授权

US08451162B2 Microwave datum tool 有权
标题翻译：微波基准工具
公开(公告)号：US08451162B2
公开(公告)日：2013-05-28
申请号：US12158456
申请日：2006-12-19
申请人： David S. Holbrook , Christopher P. Adams
发明人： David S. Holbrook , Christopher P. Adams
IPC分类号： G01S13/06
CPC分类号： G01N22/00
摘要： In one aspect, a measurement system is disclosed that includes a source of microwave radiation having one or more wavelengths capable of penetrating through a visibly opaque obstruction, e.g., a wall. The source can be movably positioned on one side of the obstruction for illuminating thereof. The system can further include a microwave reflecting element disposed on another side of the obstruction, where the reflecting element is capable of reflecting at least a portion of the radiation transmitted through the obstruction. A plurality of radiation sensors are positioned relative to the obstruction so as to differentially detect at least a portion of the reflected radiation transmitted through the obstruction so as to determine a position of the source relative to the reflective element.
摘要翻译：在一个方面，公开了一种测量系统，其包括具有一个或多个波长的微波辐射源，该波长能够穿透可见的不透明阻挡物，例如壁。源可以可移动地定位在障碍物的一侧以用于照明。该系统还可以包括设置在障碍物另一侧的微波反射元件，其中反射元件能够反射透过障碍物的辐射的至少一部分。多个辐射传感器相对于障碍物定位，以差异地检测透过障碍物的反射辐射的至少一部分，以便确定源相对于反射元件的位置。

3. 发明授权

US08278590B2 Apparatus for minimizing a heat affected zone during laser micro-machining 有权
标题翻译：用于在激光微加工期间最小化热影响区的装置
公开(公告)号：US08278590B2
公开(公告)日：2012-10-02
申请号：US11140341
申请日：2005-05-27
申请人： Brian Hall , David S. Holbrook , David L. Wall
发明人： Brian Hall , David S. Holbrook , David L. Wall
IPC分类号： B23K26/00 , B23K26/06
CPC分类号： B23K26/0661 , B23K26/066 , B23K26/067 , B23K26/0676 , B23K26/0738 , B23K26/361
摘要： Embodiments of the present invention are directed to methods and systems for laser micro-machining, which may include dividing a long line illumination field into a plurality of individual fields, wherein each of the plurality of fields includes an aspect ratio of about 4:1 or greater, directing the plurality of individual fields onto at least one mask, wherein each individual field illuminates a corresponding area on the mask and translating the mask and/or workpiece relative to one another along a scan axis.
摘要翻译：本发明的实施例涉及用于激光微加工的方法和系统，其可以包括将长线照明场分成多个单独的场，其中多个场中的每个场包括约4:1的纵横比或更多地，将多个单独的场引导到至少一个掩模上，其中每个单独的场照射掩模上的对应区域，并沿着扫描轴相对于彼此平移掩模和/或工件。

4. 发明申请

US20110011839A1 Method and apparatus for laser micromachining a conical surface 审中-公开
标题翻译：用于激光微加工锥形表面的方法和装置
公开(公告)号：US20110011839A1
公开(公告)日：2011-01-20
申请号：US12924174
申请日：2010-09-21
申请人： Sergey V. Broude , Rong Gu , David S. Holbrook , Kenneth T. McDaniel , Pascal Miller , David L. Wall
发明人： Sergey V. Broude , Rong Gu , David S. Holbrook , Kenneth T. McDaniel , Pascal Miller , David L. Wall
IPC分类号： B23K26/38
CPC分类号： B23K26/0823 , B23K26/066 , B23K26/361
摘要： Embodiments of the present invention are directed to methods and systems for micromachining a conical surface. In one embodiment, such a system may include a rotating platform for receiving a long line of laser illumination, a mask having a predetermined pattern comprising a sector of a planar ring, the mask being positioned on the rotating platform, a workpiece stage having a rotational axis for rotating a removably-affixed workpiece comprising a conical surface, wherein the sector comprises the planar image of the conical surface, an excimer laser for producing a laser beam, a homogenizer for homogenizing the laser beam in at least a single direction, at least one condenser lens, a turning mirror and at least one projection lens.
摘要翻译：本发明的实施例涉及用于微加工锥形表面的方法和系统。在一个实施例中，这样的系统可以包括用于接收长行激光照明的旋转平台，具有包括平面环的扇区的预定图案的掩模，所述掩模位于旋转平台上，工件台具有旋转用于旋转包括锥形表面的可拆卸固定的工件，其中所述扇形部包括所述锥形表面的平面图像，用于产生激光束的准分子激光器，用于至少在单个方向上均匀化所述激光束的均质器，至少一个聚光透镜，转向镜和至少一个投影透镜。

5. 发明授权

US5483345A Alignment system for use in lithography utilizing a spherical reflector having a centered etched-on projection object 失效
标题翻译：使用具有中心蚀刻投影物体的球面反射器的光刻中使用的对准系统
公开(公告)号：US5483345A
公开(公告)日：1996-01-09
申请号：US300649
申请日：1994-09-06
申请人： J. Casey Donaher , David S. Holbrook , Shepard D. Johnson , James A. Sozanski
发明人： J. Casey Donaher , David S. Holbrook , Shepard D. Johnson , James A. Sozanski
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/70
摘要： A system for aligning substrates when preparing flat panel displays by lithography. A spherical reflector (imaging mirror) is used to focus a small geometric object, such as a cross, etched at the center of the reflector. The cross is projected toward a beam splitter and is then reflected onto the mirror which, in turn, images it on the surface of the substrate being used in the lithographic process. This optical system, which has a numerical aperture of about 0.05 radians, provides maximum depth of field with essentially no aberrations, and produces a relatively large probe image on a large alignment mark.The surface of the substrate carries a grid of stepped patterns as an alignment mark. The steps diffract the light received, and the diffracted light passes through a lens system to a sensor associated with the lens system. The amount of light diffracted is dependent upon where the image strikes the steps in the grid. Thus, a correlation between position and the amount of light received by the sensor exists, and, so, the substrate can be precisely aligned.
摘要翻译：用于通过光刻制备平板显示器时用于对准衬底的系统。球形反射镜（成像镜）用于聚焦在反射体中心蚀刻的诸如十字的小几何物体。十字架朝向分束器投影，然后被反射到反射镜上，反射镜又将其图像在用于光刻工艺的基板的表面上。该光学系统具有大约0.05弧度的数值孔径，基本上没有像差提供最大景深，并且在大对准标记上产生相对较大的探测图像。基板的表面带有阶梯图案格栅作为对准标记。这些步骤衍射所接收的光，并且衍射光通过透镜系统到与透镜系统相关联的传感器。衍射的光量取决于图像撞击网格中的台阶。因此，存在位置与传感器接收的光量之间的相关性，因此可以精确地对准衬底。

6. 发明授权

US08593157B2 Electromagnetic scanning imager 有权
公开(公告)号：US08593157B2
公开(公告)日：2013-11-26
申请号：US12614745
申请日：2009-11-09
申请人： Christopher P. Adams , David S. Holbrook
发明人： Christopher P. Adams , David S. Holbrook
IPC分类号： G01R27/32
CPC分类号： G01R27/04 , G01S13/426 , G01S13/89 , H01Q19/065
摘要： In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.

7. 发明授权

US07812280B2 Method and apparatus for laser micromachining a conical surface 有权
标题翻译：用于激光微加工锥形表面的方法和装置
公开(公告)号：US07812280B2
公开(公告)日：2010-10-12
申请号：US11292691
申请日：2005-12-02
申请人： Sergey V. Broude , Rong Gu , David S. Holbrook , Kenneth T. McDaniel , Pascal Miller , David L. Wall
发明人： Sergey V. Broude , Rong Gu , David S. Holbrook , Kenneth T. McDaniel , Pascal Miller , David L. Wall
IPC分类号： B23K26/38
CPC分类号： B23K26/0823 , B23K26/066 , B23K26/361
摘要： Embodiments of the present invention are directed to methods and systems for micromachining a conical surface. In one embodiment, such a system may include a rotating platform for receiving a long line of laser illumination, a mask having a predetermined pattern comprising a sector of a planar ring, the mask being positioned on the rotating platform, a workpiece stage having a rotational axis for rotating a removably-affixed workpiece comprising a conical surface, wherein the sector comprises the planar image of the conical surface, an excimer laser for producing a laser beam, a homogenizer for homogenizing the laser beam in at least a single direction, at least one condenser lens, a turning mirror and at least one projection lens.
摘要翻译：本发明的实施例涉及用于微加工锥形表面的方法和系统。在一个实施例中，这样的系统可以包括用于接收长行激光照明的旋转平台，具有包括平面环的扇区的预定图案的掩模，所述掩模位于旋转平台上，工件台具有旋转用于旋转包括锥形表面的可拆卸固定的工件，其中所述扇形部包括所述锥形表面的平面图像，用于产生激光束的准分子激光器，用于至少在单个方向上均匀化所述激光束的均质器，至少一个聚光透镜，转向镜和至少一个投影透镜。

8. 发明申请

US20100117885A1 ELECTROMAGNETIC SCANNING IMAGER 有权
公开(公告)号：US20100117885A1
公开(公告)日：2010-05-13
申请号：US12628445
申请日：2009-12-01
申请人： David S. Holbrook , Christopher P. Adams , Brent Gregorich , Umesh Rajani , Jason Porter Whitmire , Scott D. Bublitz , Jeffrey C. Hessenberger , John S. Scott , Mark Huggins , Matthew J. Mergener
发明人： David S. Holbrook , Christopher P. Adams , Brent Gregorich , Umesh Rajani , Jason Porter Whitmire , Scott D. Bublitz , Jeffrey C. Hessenberger , John S. Scott , Mark Huggins , Matthew J. Mergener
IPC分类号： G01S13/00
CPC分类号： H04N1/107 , G01S7/024 , G01S7/03 , G01S7/046 , G01S13/0209 , G01S13/86 , G01S13/887 , G01S13/89 , H04N7/18
摘要： In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.

9. 发明申请

US20090153392A1 MICROWAVE DATUM TOOL 有权
标题翻译： MICROWAVE DATUM工具
公开(公告)号：US20090153392A1
公开(公告)日：2009-06-18
申请号：US12158456
申请日：2006-12-19
申请人： David S. Holbrook , Christopher P. Adams
发明人： David S. Holbrook , Christopher P. Adams
IPC分类号： G01S13/00
CPC分类号： G01N22/00
摘要： In one aspect, a measurement system is disclosed that includes a source of microwave radiation having one or more wavelengths capable of penetrating through a visibly opaque obstruction, e.g., a wall. The source can be movably positioned on one side of the obstruction for illuminating thereof. The system can further include a microwave reflecting element disposed on another side of the obstruction, where the reflecting element is capable of reflecting at least a portion of the radiation transmitted through the obstruction. A plurality of radiation sensors are positioned relative to the obstruction so as to differentially detect at least a portion of the reflected radiation transmitted through the obstruction so as to determine a position of the source relative to the reflective element.
摘要翻译：在一个方面，公开了一种测量系统，其包括具有一个或多个波长的微波辐射源，该波长能够穿透可见的不透明阻挡物，例如壁。源可以可移动地定位在障碍物的一侧以用于照明。该系统还可以包括设置在障碍物另一侧的微波反射元件，其中反射元件能够反射透过障碍物的辐射的至少一部分。多个辐射传感器相对于障碍物定位，以差异地检测透过障碍物的反射辐射的至少一部分，以便确定源相对于反射元件的位置。

10. 发明授权

US07626400B2 Electromagnetic scanning imager 有权
标题翻译：电磁扫描成像仪
公开(公告)号：US07626400B2
公开(公告)日：2009-12-01
申请号：US11353882
申请日：2006-02-14
申请人： David S. Holbrook , Christopher P. Adams
发明人： David S. Holbrook , Christopher P. Adams
IPC分类号： G01R27/32 , G01S13/00
CPC分类号： H01Q19/065 , G01S13/42 , G01S13/426 , G01S13/88 , G01S13/89
摘要： In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.
摘要翻译：在一个方面，本发明提供一种成像器，优选便携式的，其包括能够在约1GHz至约2000GHz的范围内产生具有一个或多个频率的辐射的电磁辐射源。光学耦合到源的光学系统将从其接收的辐射聚焦到物平面上，并将从物体平面传播的聚焦辐射的至少一部分引导到图像平面上。成像器还包括耦合到光学系统的扫描机构，用于对其进行控制，以便将被聚焦的辐射移动到物体平面上。在图像平面处光学耦合到透镜的检测器检测从物体平面中的多个扫描位置传播回来的辐射的至少一部分，从而产生检测信号。与检测器通信的处理器基于检测信号产生对象平面的至少一部分的图像。

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