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    • 1. 发明授权
    • Microwave datum tool
    • 微波基准工具
    • US08451162B2
    • 2013-05-28
    • US12158456
    • 2006-12-19
    • David S. HolbrookChristopher P. Adams
    • David S. HolbrookChristopher P. Adams
    • G01S13/06
    • G01N22/00
    • In one aspect, a measurement system is disclosed that includes a source of microwave radiation having one or more wavelengths capable of penetrating through a visibly opaque obstruction, e.g., a wall. The source can be movably positioned on one side of the obstruction for illuminating thereof. The system can further include a microwave reflecting element disposed on another side of the obstruction, where the reflecting element is capable of reflecting at least a portion of the radiation transmitted through the obstruction. A plurality of radiation sensors are positioned relative to the obstruction so as to differentially detect at least a portion of the reflected radiation transmitted through the obstruction so as to determine a position of the source relative to the reflective element.
    • 在一个方面,公开了一种测量系统,其包括具有一个或多个波长的微波辐射源,该波长能够穿透可见的不透明阻挡物,例如壁。 源可以可移动地定位在障碍物的一侧以用于照明。 该系统还可以包括设置在障碍物另一侧的微波反射元件,其中反射元件能够反射透过障碍物的辐射的至少一部分。 多个辐射传感器相对于障碍物定位,以差异地检测透过障碍物的反射辐射的至少一部分,以便确定源相对于反射元件的位置。
    • 4. 发明授权
    • Alignment system for use in lithography utilizing a spherical reflector
having a centered etched-on projection object
    • 使用具有中心蚀刻投影物体的球面反射器的光刻中使用的对准系统
    • US5483345A
    • 1996-01-09
    • US300649
    • 1994-09-06
    • J. Casey DonaherDavid S. HolbrookShepard D. JohnsonJames A. Sozanski
    • J. Casey DonaherDavid S. HolbrookShepard D. JohnsonJames A. Sozanski
    • G03F9/00G01B11/00
    • G03F9/70
    • A system for aligning substrates when preparing flat panel displays by lithography. A spherical reflector (imaging mirror) is used to focus a small geometric object, such as a cross, etched at the center of the reflector. The cross is projected toward a beam splitter and is then reflected onto the mirror which, in turn, images it on the surface of the substrate being used in the lithographic process. This optical system, which has a numerical aperture of about 0.05 radians, provides maximum depth of field with essentially no aberrations, and produces a relatively large probe image on a large alignment mark.The surface of the substrate carries a grid of stepped patterns as an alignment mark. The steps diffract the light received, and the diffracted light passes through a lens system to a sensor associated with the lens system. The amount of light diffracted is dependent upon where the image strikes the steps in the grid. Thus, a correlation between position and the amount of light received by the sensor exists, and, so, the substrate can be precisely aligned.
    • 用于通过光刻制备平板显示器时用于对准衬底的系统。 球形反射镜(成像镜)用于聚焦在反射体中心蚀刻的诸如十字的小几何物体。 十字架朝向分束器投影,然后被反射到反射镜上,反射镜又将其图像在用于光刻工艺的基板的表面上。 该光学系统具有大约0.05弧度的数值孔径,基本上没有像差提供最大景深,并且在大对准标记上产生相对较大的探测图像。 基板的表面带有阶梯图案格栅作为对准标记。 这些步骤衍射所​​接收的光,并且衍射光通过透镜系统到与透镜系统相关联的传感器。 衍射的光量取决于图像撞击网格中的台阶。 因此,存在位置与传感器接收的光量之间的相关性,因此可以精确地对准衬底。
    • 6. 发明申请
    • ELECTROMAGNETIC SCANNING IMAGER
    • 电磁扫描图像
    • US20100109680A1
    • 2010-05-06
    • US12614745
    • 2009-11-09
    • Christopher P. AdamsDavid S. Holbrook
    • Christopher P. AdamsDavid S. Holbrook
    • G01R27/04G01S13/00
    • G01R27/04G01S13/426G01S13/89H01Q19/065
    • In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.
    • 在一个方面,本发明提供一种成像器,优选便携式的,其包括能够在约1GHz至约2000GHz的范围内产生具有一个或多个频率的辐射的电磁辐射源。 光学耦合到源的光学系统将从其接收的辐射聚焦到物平面上,并将从物体平面传播的聚焦辐射的至少一部分引导到图像平面上。 成像器还包括耦合到光学系统的扫描机构,用于对其进行控制,以便将被聚焦的辐射移动到物体平面上。 在图像平面处光学耦合到透镜的检测器检测从物体平面中的多个扫描位置传播回来的辐射的至少一部分,从而产生检测信号。 与检测器通信的处理器基于检测信号产生对象平面的至少一部分的图像。
    • 8. 发明授权
    • Method and apparatus for tuning ion implanters
    • 用于调整离子注入机的方法和装置
    • US07282721B2
    • 2007-10-16
    • US09943625
    • 2001-08-30
    • Terence Sean SullivanDavid S. HolbrookClifford A. Lardin
    • Terence Sean SullivanDavid S. HolbrookClifford A. Lardin
    • H01J37/317
    • H01J37/244H01J37/304H01J37/3171H01J2237/24507H01J2237/31703
    • Methods and apparatus are provided for automatically tuning a charged particle beam system, such as an ion implanter. In one embodiment, a control parameter of a control component located upstream of a target component is modulated, and the beam current downstream of the target component is measured. The beam current measurements provide information that is used to evaluate tuning and, if necessary, to adjust the target component. The target component is typically a slow response component, such as a magnet. In another embodiment, evaluation of tuning is performed by modulating the target parameter and monitoring the effect of such modulation on the beam current. In a further embodiment, the spot size of the charged particle beam is evaluated by scanning the beam across the edge of an aperture and evaluating the sharpness of the beam focus. The tuning algorithms are preferably implemented in localized power supply interfaces for high speed operation.
    • 提供了用于自动调整带电粒子束系统的方法和装置,例如离子注入机。 在一个实施例中,调制位于目标部件上游的控制部件的控制参数,并测量目标部件下游的束电流。 光束电流测量提供用于评估调谐的信息,如有必要,调整目标分量。 目标部件通常是慢响应部件,例如磁体。 在另一实施例中,通过调制目标参数并监视这种调制对波束电流的影响来执行调谐评估。 在另一实施例中,通过扫描光束穿过孔的边缘并评估光束焦点的清晰度来评估带电粒子束的光斑尺寸。 调谐算法优选地在用于高速操作的局部电源接口中实现。